Abstract: A side lobe in a capacitive transducer is reduced. Provided is a capacitive transducer including an element including a plurality of cells supported such that a vibrating membrane including one of a pair of electrodes formed with an gap between the electrodes is capable of vibration, wherein a distance between cells in an end portion of the element is greater than a distance between cells in a middle portion of the element.

Abstract: An electromechanical transducer includes a first electrode; a silicon oxide film disposed on the first electrode; and a vibration film including a silicon nitride film disposed on the silicon oxide film with a space therebetween and a second electrode disposed on the silicon nitride film so as to oppose the first electrode.

Abstract: A capacitance type transducer includes a plurality of cells each having a structure in which a vibrating film is supposed so as to be vibrated. The vibrating film includes: a second electrode formed so that a gap is interposed between the second electrode and a first electrode; and an insulating film formed on the second electrode. The capacitance transducer manufacturing method includes: forming a sacrificial layer on the first electrode; forming a layer including a vibrating film on the sacrificial layer; forming an etching hole to remove the sacrificial layer; and forming a sealing film for sealing the etching hole. Before forming the etching hole to remove the sacrificial layer, a through hole is formed in an insulating film on the second electrode, and a conductor film is formed on the insulating film having the through hole to electrically connect a conductor in the through hole and the second electrode.

Abstract: A capacitive micromachined ultrasonic transducer having a wide reception band is provided. The capacitive micromachined ultrasonic transducer includes an element including a first sub-element and a second sub-element each including a cell. The cell includes a vibrating membrane that includes one of two electrodes formed with a spacing therebetween and that is vibratably supported. The capacitive micromachined ultrasonic transducer further includes a first detection circuit, a second detection circuit, and a combining circuit that combines a signal from the first detection circuit and a signal from the second detection circuit. The first sub-element is electrically connected to the first detection circuit, and the second sub-element is electrically connected to the second detection circuit. The first detection circuit and the second detection circuit have different cut-off frequencies.

Abstract: A capacitive micromachined ultrasonic transducer includes a first insulating film and a second insulating film disposed with a gap therebetween, a first electrode and a second electrode disposed on outer surfaces of the first and second insulating films, respectively, with the gap therebetween, at least one cell having an electrostatic capacitance between the first and second electrodes that varies with a variation of a thickness of the gap caused by displacement of the second insulating film and the second electrode, and a voltage applying unit configured to apply a voltage to between the first electrode and the second electrode. An electric field strength applied to the first insulating film is closer to an electric field strength that causes dielectric breakdown than an electric field strength applied to the second insulating film.

Abstract: Provided are a method, a device and the like for driving a capacitance transducer that enable reduction of transmission sound pressure variation caused by variation in characteristics of a capacitance transducer used for, e.g., an ultrasound conversion element. A method for driving a capacitance transducer including a plurality of elements each including cells each having a structure in which a vibration membrane including one electrode of a pair of electrodes formed with a cavity therebetween is supported in such a manner that the vibration membrane can vibrate is provided.

Abstract: A transducer includes at least one element including a plurality of cells. Each of the cells includes a pair of electrodes disposed with a gap therebetween and a vibrating membrane including one of the electrodes, and the vibrating membrane is vibratably supported. First and second cells of the plurality of cells in the element have the gaps that communicate with each other, and the first cell and a third cell in the element have the gaps that do not communicate with each other.

Abstract: A method for manufacturing a capacitive transducer is provided having a structure in which a vibrating film is supported to be able to vibrate. The method includes forming a sacrificial layer on a first electrode; forming a layer on the sacrificial layer, the layer forming at least part of the vibrating film; removing the sacrificial layer, including forming etching holes to communicate with the sacrificial layer; forming a sealing layer for sealing the etching holes; and etching at least part of the sealing layer. Before forming the sealing layer, an etching stop layer is formed on the layer forming at least part of the vibrating film. In the step of etching at least part of the sealing layer, the sealing layer is removed until the etching stop layer is reached.

Abstract: A method of producing an electromechanical transducer includes forming an insulating film on a first electrode, forming a sacrificial layer on the insulating film, forming a first membrane on the sacrificial layer, forming a second electrode on the first membrane, forming an etching-hole in the first membrane and removing the sacrificial layer through the etching-hole, and forming a second membrane on the second electrode, and sealing the etching-hole. Forming the second membrane and sealing the etching-hole are performed in one operation.

Abstract: A capacitance type transducer includes a plurality of cells each having a structure in which a vibrating film is supposed so as to be vibrated. The vibrating film includes: a second electrode formed so that a gap is interposed between the second electrode and a first electrode; and an insulating film formed on the second electrode. The capacitance transducer manufacturing method includes: forming a sacrificial layer on the first electrode; forming a layer including a vibrating film on the sacrificial layer; forming an etching hole to remove the sacrificial layer; and forming a sealing film for sealing the etching hole. Before forming the etching hole to remove the sacrificial layer, a through hole is formed in an insulating film on the second electrode, and a conductor film is formed on the insulating film having the through hole to electrically connect a conductor in the through hole and the second electrode.

Abstract: The technology concerning improvement of resolution of an acoustic wave sensor having a hemispherical shape or the like is provided. An ultrasonic transducer unit includes an ultrasonic transducer having a plurality of ultrasonic transducer elements, and a probe casing configured to support a plurality of the ultrasonic transducers, and to have a concave portion facing a subject. The plurality of ultrasonic transducer elements is arranged on a same plane facing a center of curvature of the probe casing. The plurality of ultrasonic transducer elements is arranged in a rotationally symmetrical manner about a normal line connecting the center of curvature of the probe casing to a point on a plane of the ultrasonic transducer.

Abstract: A capacitance type transducer includes a plurality of cells each having a structure in which a vibrating film is supposed so as to be vibrated. The vibrating film includes: a second electrode formed so that a gap is interposed between the second electrode and a first electrode; and an insulating film formed on the second electrode. The capacitance transducer manufacturing method includes: forming a sacrificial layer on the first electrode; forming a layer including a vibrating film on the sacrificial layer; forming an etching hole to remove the sacrificial layer; and forming a sealing film for sealing the etching hole. Before forming the etching hole to remove the sacrificial layer, a through hole is formed in an insulating film on the second electrode, and a conductor film is formed on the insulating film having the through hole to electrically connect a conductor in the through hole and the second electrode.

Abstract: An electrostatic capacitance type transducer includes one or more elements 2. The one or more elements each include a plurality of cell groups 14 each including a cell 1 including a first electrode 4 and a second electrode 5 arranged with a gap therebetween, the second electrode being electrically connected to a shared signal extraction electrode 15. In the cell group, each of the cells has an equal wiring length from the shared signal extraction electrode 15. The electrostatic capacitance of the plurality of cell groups, the wiring resistance between two adjacent cell groups, the number of cell groups in the element, and the central frequency of the element satisfy a predetermined relationship to increase transmission efficiency or reception sensitivity.

Abstract: An electromechanical transducer includes a first electrode; a silicon oxide film disposed on the first electrode; and a vibration film including a silicon nitride film disposed on the silicon oxide film with a space therebetween and a second electrode disposed on the silicon nitride film so as to oppose the first electrode.

Abstract: An electromechanical transducer includes a first electrode; a silicon oxide film disposed on the first electrode; and a vibration film including a silicon nitride film disposed on the silicon oxide film with a space therebetween and a second electrode disposed on the silicon nitride film so as to oppose the first electrode.

Abstract: An electromechanical transducer includes a substrate, a first electrode disposed on the substrate, and a vibration film including a membrane disposed on the first electrode with a space therebetween and a second electrode disposed on the membrane so as to oppose the first electrode. The first electrode has a surface roughness value of 6 nm RMS or less.

Abstract: Provided is a capacitive transducer having broadband frequency characteristics. The capacitive transducer includes an element which has multiple kinds of cells, each cell including: a first electrode; a vibrating film including a second electrode, the second electrode being opposed to the first electrode with a gap; and a support portion that supports the vibrating film so as to form the gap. The multiple kinds of cells have different ratios of an area of one of the first electrode and the second electrode to an area of the gap when viewed from a normal direction of the vibrating film. The first electrodes or the second electrodes in the multiple kinds of cells are electrically connected together.

Abstract: A capacitive micromachined ultrasonic transducer includes a first insulating film and a second insulating film disposed with a gap therebetween, a first electrode and a second electrode disposed on outer surfaces of the first and second insulating films, respectively, with the gap therebetween, at least one cell having an electrostatic capacitance between the first and second electrodes that varies with a variation of a thickness of the gap caused by displacement of the second insulating film and the second electrode, and a voltage applying unit configured to apply a voltage to between the first electrode and the second electrode. An electric field strength applied to the first insulating film is closer to an electric field strength that causes dielectric breakdown than an electric field strength applied to the second insulating film.

Abstract: Provided are a method, a device and the like for driving a capacitance transducer that enable reduction of transmission sound pressure variation caused by variation in characteristics of a capacitance transducer used for, e.g., an ultrasound conversion element. A method for driving a capacitance transducer including a plurality of elements each including cells each having a structure in which a vibration membrane including one electrode of a pair of electrodes formed with a cavity therebetween is supported in such a manner that the vibration membrane can vibrate is provided.

Abstract: A capacitance type transducer includes a plurality of cells each having a structure in which a vibrating film is supposed so as to be vibrated. The vibrating film includes: a second electrode formed so that a gap is interposed between the second electrode and a first electrode; and an insulating film formed on the second electrode. The capacitance transducer manufacturing method includes: forming a sacrificial layer on the first electrode; forming a layer including a vibrating film on the sacrificial layer; forming an etching hole to remove the sacrificial layer; and forming a sealing film for sealing the etching hole. Before forming the etching hole to remove the sacrificial layer, a through hole is formed in an insulating film on the second electrode, and a conductor film is formed on the insulating film having the through hole to electrically connect a conductor in the through hole and the second electrode.