Patents by Inventor Keiji Iwata

Keiji Iwata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11801355
    Abstract: The exemplary embodiments disclose a method, a computer program product, and a computer system for determining a duration of use left in an oxygen tank. The exemplary embodiments may include collecting data of a user and corresponding oxygen tank, extracting one or more features from the collected data, and determining a duration of use left in the oxygen tank based on the extracted one or more features and one or more models.
    Type: Grant
    Filed: November 20, 2020
    Date of Patent: October 31, 2023
    Assignee: Kyndryl, Inc.
    Inventors: Isabel Carolina Zorzi de Miranda, Sergio Varga, Claudio Keiji Iwata, Marcia Ito, Maria Clara Verçosa Da Silva Rodrigues
  • Publication number: 20230290631
    Abstract: A substrate processing method is provided. The substrate processing method includes: (S7) supplying a water repellent agent (SMT) to a substrate (W); (S11) supplying dilute isopropyl alcohol (dIPA) to the substrate (W) after the supplying a water repellent agent (SMT), the dilute isopropyl alcohol (dIPA) being obtained by diluting isopropyl alcohol; and (S12) drying the substrate (W) after the supplying dilute isopropyl alcohol (dIPA).
    Type: Application
    Filed: June 22, 2021
    Publication date: September 14, 2023
    Inventors: Tetsuya EMOTO, Shigeru YAMAMOTO, Daiki FUJII, Kenji EDAMITSU, Keiji IWATA, Yuya KAWAI, Kenichi ITO
  • Publication number: 20230035447
    Abstract: A substrate treatment method includes a first gas treating step, a water-repellency treatment step, and a spraying step. In the first gas treating step, a first gas is supplied to the substrate inside the chamber in a state in which the inside of the chamber is decompressed. The first gas includes gas of an organic solvent. The water-repellency treatment step is executed after the first gas treating step. In the water-repellency treatment step, the inside of the chamber is in the decompressed state, and a water-repellent agent is supplied to the substrate inside the chamber. The spraying step is executed after the water-repellency treatment step. In the spraying step, the inside of the chamber is in the decompressed state, and a first liquid is sprayed over the substrate inside the chamber. The first liquid includes liquid of an organic solvent.
    Type: Application
    Filed: July 29, 2022
    Publication date: February 2, 2023
    Applicant: SCREEN Holdings Co., Ltd.
    Inventors: Shigeru YAMAMOTO, Kenji EDAMITSU, Daiki FUJII, Keiji IWATA, Kenichi ITO, Yuya KAWAI
  • Publication number: 20230035562
    Abstract: The substrate treatment method includes a first decompressing step, a first pressurizing step, and a first atmospheric pressure step. In the first decompressing step, the inside of a chamber is in a decompressed state, and a first gas is supplied to a substrate inside the chamber. The first gas includes an organic solvent. The first pressurizing step is executed after the first decompressing step. In the first pressurizing step, mixed gas is supplied to the substrate inside the chamber, and the inside of the chamber is pressurized from the decompressed state to an atmospheric pressure state. The mixed gas includes an organic solvent and inert gas. The first atmospheric pressure step is executed after the first pressurizing step. In the first atmospheric pressure step, the inside of the chamber is maintained in the atmospheric pressure state, and at least any of liquid discharge treatment and substrate treatment is performed.
    Type: Application
    Filed: July 29, 2022
    Publication date: February 2, 2023
    Applicant: SCREEN Holdings Co., Ltd.
    Inventors: Shigeru YAMAMOTO, Keiji IWATA, Daiki FUJII, Kenji EDAMITSU, Yuya KAWAI, Kenichi ITO
  • Publication number: 20220208545
    Abstract: A substrate treatment method includes a rinsing step of performing treatment of a substrate with a rinse liquid, an immersing step of immersing the substrate in a diluted isopropyl alcohol (dIPA) stored in a treatment tank after the rinsing step, a first isopropyl alcohol treatment step of performing treatment of the substrate with an isopropyl alcohol after the immersing step, and a water-repellent treatment step of performing water-repellent treatment of the substrate after the first isopropyl alcohol treatment step.
    Type: Application
    Filed: December 22, 2021
    Publication date: June 30, 2022
    Applicant: SCREEN Holdings Co., Ltd.
    Inventors: Shigeru YAMAMOTO, Daiki FUJII, Keiji IWATA, Kenji EDAMITSU, Yuya KAWAI, Kenichi ITO
  • Publication number: 20220160976
    Abstract: The exemplary embodiments disclose a method, a computer program product, and a computer system for determining a duration of use left in an oxygen tank. The exemplary embodiments may include collecting data of a user and corresponding oxygen tank, extracting one or more features from the collected data, and determining a duration of use left in the oxygen tank based on the extracted one or more features and one or more models.
    Type: Application
    Filed: November 20, 2020
    Publication date: May 26, 2022
    Inventors: Isabel Carolina Zorzi de Miranda, Sergio Varga, Claudio Keiji Iwata, Marcia Ito, Maria Clara Verçosa Da Silva Rodrigues
  • Publication number: 20220101996
    Abstract: Detection and monitoring of health conditions that are accompanied by an injury site includes receiving, by one or more processors, an identifier associated with a patient and an associated first image, the first image corresponding to an injury in the injury site. The one or more processors analyze the associated first image using a machine learning model that includes an inference engine and a knowledge base. The machine learning model compares the associated first image against a patient data history and a tracking database. In response to a determination the injury site is associated with the health condition, the one or more processors generate a first result including sending a report containing the first result to a healthcare professional caring for the patient and display the first result informing the patient and healthcare professional the injury needs special care including requiring an appointment.
    Type: Application
    Filed: September 30, 2020
    Publication date: March 31, 2022
    Inventors: Claudio Keiji Iwata, Sergio Varga, Isabel Carolina Zorzi de Miranda, Maria Clara Verçosa da Silva Rodrigues, Marcia Ito
  • Patent number: 10464107
    Abstract: A substrate processing method for removing a resist from a substrate, the substrate comprising a surface layer which has been cured, and having a pattern disposed inside the resist. The method includes an SPM supplying step of supplying an SPM, formed by mixing sulfuric acid and a hydrogen peroxide solution, to the substrate and a liquid temperature increasing step of changing, in parallel to the SPM supplying step, a mixing ratio of the sulfuric acid and the hydrogen peroxide solution used to form the SPM to increase the liquid temperature of the SPM supplied to the substrate in the SPM supplying step.
    Type: Grant
    Filed: October 21, 2014
    Date of Patent: November 5, 2019
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Keiji Iwata, Sei Negoro, Tomohiro Uemura, Yuji Sugahara
  • Patent number: 10290511
    Abstract: A substrate treatment method is used for removing a resist from a front surface of a substrate. A substrate treatment apparatus includes a substrate holding unit which holds the substrate, and a sulfuric acid ozone/water mixture supplying unit which supplies a sulfuric acid ozone/water mixture to the front surface of the substrate held by the substrate holding unit, the sulfuric acid ozone/water mixture being a mixture which is prepared by a method including mixing water with sulfuric acid ozone prepared by dissolving ozone gas in sulfuric acid.
    Type: Grant
    Filed: February 15, 2017
    Date of Patent: May 14, 2019
    Assignee: SCREEN Holdings Co., Ltd
    Inventors: Keiji Iwata, Hiroki Tsujikawa, Shotaro Tsuda, Seiji Ano
  • Publication number: 20180128999
    Abstract: A surface emitting element that is a photoelectric conversion element and includes a substrate, first and second electrode patterns, and first and second electrode structures. The substrate has a first surface and a second surface facing each other. The substrate emits light from the first surface. The first and second electrode patterns are formed on the substrate and used for photoelectric conversion. The first electrode structure is connected to the first electrode pattern, and the second electrode structure is connected to the second electrode pattern. The first and second electrode structures are formed on a first side surface that is orthogonal to the first and second surfaces of the substrate in shapes protruding from the first side surface.
    Type: Application
    Filed: January 11, 2018
    Publication date: May 10, 2018
    Inventors: Takatoshi Kato, Keiji Iwata
  • Publication number: 20180131156
    Abstract: A surface emitting element including a semiconductor substrate and a casing. The substrate includes an optical element having a photoelectric conversion function. First and second terminal electrodes are disposed on the substrate. The casing has a depression for accommodating the substrate. Moreover, first and second connection electrodes are formed in the casing. The first and second terminal electrodes are formed so as to protrude from the side surfaces of the substrate. The first and second connection electrodes are formed so as to protrude toward the depression side in the casing. The first terminal electrode and the first connection electrode are in contact with each other, and the second terminal electrode and the second connection electrode are in contact with each other.
    Type: Application
    Filed: January 9, 2018
    Publication date: May 10, 2018
    Inventors: Masashi Yanagase, Keiji Iwata
  • Patent number: 9865994
    Abstract: A VCSEL array includes a base substrate, a plurality of VCSEL devices and an inter-device line. Each of the plurality of VCSEL devices is disposed on a front side of the base substrate. The inter-device line connects two of the plurality of VCSEL devices that are adjacent to each other, the two VCSEL devices being connected in series such that forward directions of the two VCSEL devices are the same. An insulating groove that electrically insulates the two VCSEL devices is formed on the base substrate.
    Type: Grant
    Filed: January 21, 2016
    Date of Patent: January 9, 2018
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Ippei Matsubara, Takayuki Kona, Keiji Iwata
  • Patent number: 9698568
    Abstract: A cathode electrode, cathode pad electrodes, cathode wiring electrodes, an anode electrode, an anode pad electrode, and an anode wiring electrode are disposed on the surface of a vertical-cavity surface-emitting laser device. A light-emitting-region multilayer portion having active layers sandwiched by clad layers and DBR layers is formed directly below the anode electrode. A region where the light-emitting-region multilayer portion is formed serves as a light-emitting region. The light-emitting region is positioned closer to one end of the first direction than is a suction region onto which a flat collet sucks with respect to the first direction, in such a way that the light-emitting region is substantially in contact with or spaced a predetermined distance from the suction region.
    Type: Grant
    Filed: November 11, 2014
    Date of Patent: July 4, 2017
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Keiji Iwata, Ippei Matsubara, Takayuki Kona, Hiroshi Watanabe, Masashi Yanagase
  • Patent number: 9692211
    Abstract: A VCSEL array includes a base substrate, VCSEL element columns arranged in a row direction (y direction) on a front-surface side of the base substrate and parallel wiring lines that connect the VCSEL element columns in parallel with each other. Each of the VCSEL element columns includes a plurality of VCSEL elements arranged in a column direction (x direction) and a plurality of series wiring lines. The plurality of series wiring lines serially connect every two VCSEL elements that are adjacent to each other in the column direction among the plurality of VCSEL elements in such an orientation that the forward directions of the two VCSEL elements match. Insulating grooves are formed on the base substrate. The insulating grooves electrically insulate the VCSEL element columns from each other. The insulating grooves electrically insulate the VCSEL elements from each other.
    Type: Grant
    Filed: January 21, 2016
    Date of Patent: June 27, 2017
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Ippei Matsubara, Takayuki Kona, Keiji Iwata
  • Publication number: 20170162400
    Abstract: A substrate treatment method is used for removing a resist from a front surface of a substrate. A substrate treatment apparatus includes a substrate holding unit which holds the substrate, and a sulfuric acid ozone/water mixture supplying unit which supplies a sulfuric acid ozone/water mixture to the front surface of the substrate held by the substrate holding unit, the sulfuric acid ozone/water mixture being a mixture which is prepared by a method including mixing water with sulfuric acid ozone prepared by dissolving ozone gas in sulfuric acid.
    Type: Application
    Filed: February 15, 2017
    Publication date: June 8, 2017
    Inventors: Keiji IWATA, Hiroki TSUJIKAWA, Shotaro TSUDA, Seiji ANO
  • Patent number: 9555452
    Abstract: A substrate treatment method is provided, which includes a liquid film retaining step of retaining a liquid film of a treatment liquid on a major surface of a substrate, and a heater heating step of locating a heater in opposed relation to the major surface of the substrate to heat the treatment liquid film by the heater in the liquid film retaining step, wherein an output of the heater is changed from a previous output level in the heater heating step.
    Type: Grant
    Filed: August 11, 2014
    Date of Patent: January 31, 2017
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Sei Negoro, Yasuhiko Nagai, Keiji Iwata
  • Publication number: 20160236241
    Abstract: A substrate processing method includes an SPM supplying step of supplying SPM having high temperature to an upper surface of a substrate, a DIW supplying step of supplying, after the SPM supplying step, DIW having room temperature to the upper surface of the substrate to rinse off a liquid remaining on the substrate, and a hydrogen peroxide water supplying step of supplying, after the SPM supplying step and before the DIW supplying step, hydrogen peroxide water of a liquid temperature lower than the temperature of the SPM and not less than room temperature, to the upper surface of the substrate in a state where the SPM remains on the substrate.
    Type: Application
    Filed: April 22, 2016
    Publication date: August 18, 2016
    Inventors: Sei NEGORO, Ryo MURAMOTO, Yasuhiko NAGAI, Tsutomu OSUKA, Keiji IWATA
  • Patent number: 9403187
    Abstract: A substrate processing method includes an SPM supplying step of supplying SPM having high temperature to an upper surface of a substrate, a DIW supplying step of supplying, after the SPM supplying step, DIW having room temperature to the upper surface of the substrate to rinse off the liquid remaining on the substrate, a hydrogen peroxide water supplying step of supplying, after the SPM supplying step and before the DIW supplying step, hydrogen peroxide water of a liquid temperature lower than the temperature of the SPM and not less than room temperature, to the upper surface of the substrate in a state where the SPM remains on the substrate, and a temperature decrease suppressing step of supplying, in parallel to the hydrogen peroxide water supplying step, pure water having high temperature to a lower surface of the substrate.
    Type: Grant
    Filed: September 2, 2014
    Date of Patent: August 2, 2016
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Sei Negoro, Ryo Muramoto, Yasuhiko Nagai, Tsutomu Osuka, Keiji Iwata
  • Publication number: 20160156157
    Abstract: A VCSEL array includes a base substrate, a plurality of VCSEL devices and an inter-device line. Each of the plurality of VCSEL devices is disposed on a front side of the base substrate. The inter-device line connects two of the plurality of VCSEL devices that are adjacent to each other, the two VCSEL devices being connected in series such that forward directions of the two VCSEL devices are the same. An insulating groove that electrically insulates the two VCSEL devices is formed on the base substrate.
    Type: Application
    Filed: January 21, 2016
    Publication date: June 2, 2016
    Applicant: MURATA MANUFACTURING CO., LTD.
    Inventors: Ippei MATSUBARA, Takayuki KONA, Keiji IWATA
  • Publication number: 20160141839
    Abstract: A VCSEL array includes a base substrate, VCSEL element columns arranged in a row direction (y direction) on a front-surface side of the base substrate and parallel wiring lines that connect the VCSEL element columns in parallel with each other. Each of the VCSEL element columns includes a plurality of VCSEL elements arranged in a column direction (x direction) and a plurality of series wiring lines. The plurality of series wiring lines serially connect every two VCSEL elements that are adjacent to each other in the column direction among the plurality of VCSEL elements in such an orientation that the forward directions of the two VCSEL elements match. Insulating grooves are formed on the base substrate. The insulating grooves electrically insulate the VCSEL element columns from each other. The insulating grooves electrically insulate the VCSEL elements from each other.
    Type: Application
    Filed: January 21, 2016
    Publication date: May 19, 2016
    Applicant: MURATA MANUFACTURING CO., LTD.
    Inventors: Ippei MATSUBARA, Takayuki KONA, Keiji IWATA