Abstract: An etching composition that includes a quaternary ammonium salt having 8 or more carbon atoms and selectively dissolves silicon over silicon germanium, and may further include a chelating agent, an etching method comprising etching a structure that contains silicon and silicon germanium by using the etching composition, a method for manufacturing a semiconductor device, and a method for manufacturing a gate-all-around-type transistor using the etching composition.

Abstract: In culturing a poly(3-hydroxyalkanoate)-producing microorganism, an oil A and an oil B are used as the carbon source. The proportion of the oil B to the total amount of the oils A and B used during the entire course of the culturing is 10 wt % or more. The oil A is the total oil used until the amount of the poly(3-hydroxyalkanoate) accumulated in the poly(3-hydroxyalkanoate)-producing microorganism reaches 16 wt %, and the average unsaturated fatty acid content in constituent fatty acids is from 25 wt % to less than 75 wt % in the total oil A. The unsaturated fatty acid content in constituent fatty acids in the oil B is higher than the average unsaturated fatty acid content in the total oil A.

Abstract: A microorganism is cultivated in the presence of a carbon source. The microorganism is a transformed microorganism having an introduced fadH gene encoding 2,4-dienoyl-CoA reductase. That is, the transformed microorganism has an introduced foreign gene encoding a protein having an amino acid sequence of SEQ ID NO: 1 or an introduced foreign gene encoding a protein having an amino acid sequence that is at least 85% identical to the amino acid sequence of SEQ ID NO: 1. The carbon source contains an oil containing unsaturated fatty acids as constituents or free unsaturated fatty acids.

Abstract: A culturing system is equipped with a culturing tank and a supply device for supplying a culturing solution to the culturing tank. The culturing tank includes a plurality of accommodation sections capable of accommodating the culturing solution. The supply device includes a liquid delivery device for delivering the culturing solution to the plurality of accommodation sections, and supply pipes for supplying the culturing solution to the plurality of accommodation sections, respectively. The culturing system includes first float valves that can open and close the supply pipes. The first float valves each include a first float.

Abstract: A culture system includes a culture device that includes a culture tank for culturing microalgae, and a collection device that collects a culture solution. The culture tank includes a bottom portion located at the lowest position in the depth direction. The collection device includes a collection tube housed in the culture tank. The collection tube is a tubular body having an internal space. The collection tube includes a bottom side collection portion that extends along the bottom portion of the culture tank. The bottom side collection portion includes an open port formed at a site facing upward in the depth direction of the culture tank.

Abstract: A culture device includes an accommodation portion that accommodates a culture solution and microalgae. The accommodation portion is provided with a guide portion and a gas supply portion. The gas supply portion includes an extended tube section that extends from an upper portion to a lower portion of the guide portion in the depth direction. The extended tube portion supplies gas at the lower portion of the guide portion in the depth direction. This gas causes convection in the culture solution. The convection includes an upward flow from a lower portion to an upper portion of the accommodation portion in the depth direction. The extended tube portion is located in an upward flow region where the upward flow region is the portion through which the upward flow passes.

Abstract: An etching composition that includes a quaternary ammonium salt having 8 or more carbon atoms and selectively dissolves silicon over silicon germanium, and may further include a chelating agent, an etching method comprising etching a structure that contains silicon and silicon germanium by using the etching composition, a method for manufacturing a semiconductor device, and a method for manufacturing a gate-all-around-type transistor using the etching composition.

Abstract: In culturing a poly(3-hydroxyalkanoate)-producing microorganism, an oil A and an oil B are used as the carbon source. The proportion of the oil B to the total amount of the oils A and B used during the entire course of the culturing is 10 wt% or more. The oil A is the total oil used until the amount of the poly(3-hydroxyalkanoate) accumulated in the poly(3-hydroxyalkanoate)-producing microorganism reaches 16 wt%, and the average unsaturated fatty acid content in constituent fatty acids is from 25 wt% to less than 75 wt% in the total oil A. The unsaturated fatty acid content in constituent fatty acids in the oil B is higher than the average unsaturated fatty acid content in the total oil A.

Abstract: Provided is an assembly method using an assembly tool used when a component is assembled to each of a plurality of connection ports to provided at an upper surface of a fuel-cell stack and communicating with a plurality of communication holes. The assembly tool includes a base portion positioned on the upper surface of the fuel-cell stack and a plurality of covering portions covering the plurality of connection ports. Each of the plurality of covering portions is, relative to the base portion, provided movably between a covering position for covering a corresponding one of the connection ports and a non-covering position accessible to a corresponding one of the connection ports.

Abstract: The present invention relates to a cleaning liquid containing a component (A): a compound represented by the following formula (1), component (B): alkylamine, component (C): polycarboxylic acid, and component (D): ascorbic acid, in which a mass ratio of the component (A) to a total mass of the component (B) and the component (C) is 1 to 15, and in the formula (1), R1, R2, and R3 each have a definition same as the definition described in the description,

Abstract: An observation apparatus and method that avoids drawbacks of a Lorentz method and observes a weak scatterer or a phase object with in-focus, high resolution, and no azimuth dependency, by a Foucault method observation using a hollow-cone illumination that orbits and illuminates an incident electron beam having a predetermined inclination angle, an electron wave is converged at a position (height) of an aperture plate downstream of a sample, and a bright field condition in which a direct transmitted electron wave of the sample passes through the aperture plate, a dark field condition in which the transmitted electron wave is shielded, and a Schlieren condition in which approximately half of the transmitted wave is shielded as a boundary condition of both of the above conditions are controlled, and a spatial resolution of the observation image is controlled by selecting multiple diameters and shapes of the opening of the aperture plate.

Abstract: The present invention relates to: a shape correction device for a frame body; and a method for manufacturing an electrolyte film/electrode structure that is provided with a resin frame for a fuel cell. A shape correction device, which corrects the shape of a frame body that is provided with a rectangular opening, is equipped with a pressing mechanism that applies, to each side of the frame body, a pressing force directed from the inner side to the outer side of the opening. The pressing mechanism may have a first bar and a second bar, which apply the pressing force by being in contact with inner wall surfaces of each side of the frame body.

Abstract: A cleaning liquid containing at least one surfactant (A) selected from the group consisting of a polyoxyalkylene alkyl ether phosphoric acid, a polyoxyalkylene alkyl ether acetic acid and a polyoxyalkylene alkyl ether sulfonic acid and a chelating agent (C), which has a pH of 8 or more, and a cleaning liquid containing an oxidizing agent (B) and a chelating agent (C), which has a pH of 8 or more.

Abstract: Provided is an assembly method using an assembly tool used when a component is assembled to each of a plurality of connection ports to provided at an upper surface of a fuel-cell stack and communicating with a plurality of communication holes. The assembly tool includes a base portion positioned on the upper surface of the fuel-cell stack and a plurality of covering portions covering the plurality of connection ports. Each of the plurality of covering portions is, relative to the base portion, provided movably between a covering position for covering a corresponding one of the connection ports and a non-covering position accessible to a corresponding one of the connection ports.

Abstract: An observation apparatus and method that avoids drawbacks of a Lorentz method and observes a weak scatterer or a phase object with in-focus, high resolution, and no azimuth dependency, by a Foucault method observation using a hollow-cone illumination that orbits and illuminates an incident electron beam having a predetermined inclination angle, an electron wave is converged at a position (height) of an aperture plate downstream of a sample and a bright field condition in which a direct transmitted electron wave of the sample passes through the aperture plate, a dark field condition in which the transmitted electron wave is shielded and a Schlieren condition in which approximately half of the transmitted wave is shielded as a boundary condition of both of the above conditions are controlled, and a spatial resolution of the observation image is controlled by selecting multiple diameters and shapes of the opening of the aperture plate.

Abstract: According to the present invention, there is provided a cleaning agent composition for a semiconductor device substrate including at least one of wiring and an electrode in which the wiring and the electrode contain cobalt or a cobalt alloy, the cleaning agent composition including a component (A): at least one compound selected from the group consisting of specific compounds; and a component (B): water.

Abstract: The present invention relates to a cleaning liquid containing a component (A): a compound represented by the following formula (1), component (B): alkylamine, component (C): polycarboxylic acid, and component (D): ascorbic acid, in which a mass ratio of the component (A) to a total mass of the component (B) and the component (C) is 1 to 15, and in the formula (1), R1, R2, and R3 each have a definition same as the definition described in the description,

Abstract: A lensless Fourier transform holography high accuracy reconstruction method using a charged particle beam apparatus which holds a sample on a diffraction surface of a diffraction grating provided on the downstream side of a traveling direction of the charged particle beam and which is formed of a material having permeability. The charged particle beam passed through the diffraction surface is image-formed, and the formed image is detected. An opening region of the diffraction grating is smaller than an irradiation region of the charged particle beam on the diffraction grating. Image data is obtained in a state where the irradiation region of the charged particle beam diffracted with the diffraction grating is within the irradiation region of the charged particle beam transmitted through the diffraction grating. Plural holograms obtained based on the image data are Fourier transformed and an intensity distribution image is displayed and stored.

Abstract: The present invention relates to: a shape correction device for a frame body; and a method for manufacturing an electrolyte film/electrode structure that is provided with a resin frame for a fuel cell. A shape correction device, which corrects the shape of a frame body that is provided with a rectangular opening, is equipped with a pressing mechanism that applies, to each side of the frame body, a pressing force directed from the inner side to the outer side of the opening. The pressing mechanism may have a first bar and a second bar, which apply the pressing force by being in contact with inner wall surfaces of each side of the frame body.

Abstract: An interferometric electron microscope with increased irradiating electric current density which causes electron waves to interfere with each other and includes: an electron source; an irradiating lens system a focusing lens system an observational plane an artificial grating disposed between the electron source and the irradiating lens system and diffracting the electron beam emitted from the electron source to produce a first electron wave and a second electron wave; an electron beam biprism deflecting the first electron wave and the second electron wave to pass the first electron wave through the specimen for use as an object wave and to use the second electron wave as a reference wave; and an electron beam biprism in a focusing system deflecting the objective wave and the reference wave to superimpose the objective wave and the reference wave on the observational plane to produce an image.