Patents by Inventor Keng Moy
Keng Moy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180320289Abstract: A flow inlet element for a chemical vapor deposition reactor is formed from a plurality of elongated tubular elements extending side-by-side with one another in a plane transverse to the upstream to downstream direction of the reactor. The tubular elements have inlets for ejecting gas in the downstream direction. A wafer carrier rotates around an upstream to downstream axis. The gas distribution elements may provide a pattern of gas distribution which is asymmetrical with respect to a medial plane extending through the axis.Type: ApplicationFiled: July 3, 2018Publication date: November 8, 2018Applicant: Veeco Instruments Inc.Inventors: Mikhail Belousov, Bojan Mitrovic, Keng Moy
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Patent number: 10017876Abstract: A flow inlet element for a chemical vapor deposition reactor is formed from a plurality of elongated tubular elements extending side-by-side with one another in a plane transverse to the upstream to downstream direction of the reactor. The tubular elements have inlets for ejecting gas in the downstream direction. A wafer carrier rotates around an upstream to downstream axis. The gas distribution elements may provide a pattern of gas distribution which is asymmetrical with respect to a medial plane extending through the axis.Type: GrantFiled: January 8, 2014Date of Patent: July 10, 2018Assignee: Veeco Instruments Inc.Inventors: Mikhail Belousov, Bojan Mitrovic, Keng Moy
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Patent number: 9816184Abstract: A structure for a chemical vapor deposition reactor desirably includes a reaction chamber having an interior, a spindle mounted in the reaction chamber, and a wafer carrier releasably mounted onto the spindle for rotation therewith. The spindle desirably has a shaft extending along a vertical rotational axis and a key projecting outwardly from the shaft. The wafer carrier preferably has a body defining oppositely-facing top and bottom surfaces and at least one wafer-holding feature configured so that a wafer can be held therein with a surface of the wafer exposed at the top surface of the body. The wafer carrier desirably further has a recess extending into the body from the bottom surface of the body and a keyway projecting outwardly from a periphery of the recess along a first transverse axis. The shaft preferably is engaged in the recess and the key preferably is engaged into the keyway.Type: GrantFiled: March 20, 2012Date of Patent: November 14, 2017Assignee: Veeco Instruments Inc.Inventors: Sandeep Krishnan, Keng Moy, Alexander I. Gurary, Matthew King, Vadim Boguslavskiy, Steven Krommenhoek
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Publication number: 20170191157Abstract: A structure for a chemical vapor deposition reactor desirably includes a reaction chamber having an interior, a spindle mounted in the reaction chamber, and a wafer carrier releasably mounted onto the spindle for rotation therewith. The spindle desirably has a shaft extending along a vertical rotational axis and a key projecting outwardly from the shaft. The wafer carrier preferably has a body defining oppositely-facing top and bottom surfaces and at least one wafer-holding feature configured so that a wafer can be held therein with a surface of the wafer exposed at the top surface of the body. The wafer carrier desirably further has a recess extending into the body from the bottom surface of the body and a keyway projecting outwardly from a periphery of the recess along a first transverse axis. The shaft preferably is engaged in the recess and the key preferably is engaged into the keyway.Type: ApplicationFiled: March 21, 2017Publication date: July 6, 2017Inventors: Sandeep Krishnan, Keng Moy, Alex Gurary, Matthew King, Vadim Boguslavskiy, Steven Krommenhoek
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Publication number: 20170076972Abstract: A wafer carrier for a plurality of wafers, the wafer carrier having a platen with a plurality of openings and a plurality of wafer retention platforms, the platen configured to rotate about a first axis, the plurality of wafer retention platforms configured to rotate about respective second axes, each of the wafer retention platforms rotatably coupled to one of the plurality of openings by friction reducing bearings, the platen and the plurality of wafer retention platforms and the friction reducing bearings all being constructed of the same material.Type: ApplicationFiled: September 15, 2016Publication date: March 16, 2017Inventors: Sandeep Krishnan, Lukas Urban, Alexander Gurary, Keng Moy, Ajit Paranjpe
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Patent number: 9388493Abstract: A chemical vapor deposition reactor and a method of wafer processing are provided. The reactor can include a reaction chamber having an interior and an entry port for insertion and removal of substrates, a gas inlet manifold communicating with the interior of the chamber for admitting process gasses to form a deposit on substrates held within the interior, a shutter mounted to the chamber, and one or more cleaning elements mounted within the chamber. The shutter can be movable between (i) a run position in which the cleaning elements are remote from the exhaust channel and (ii) a cleaning position in which the one or more cleaning elements engage with the shutter so that the cleaning elements remove deposited particles from the shutter upon movement of the shutter to the cleaning position.Type: GrantFiled: January 8, 2013Date of Patent: July 12, 2016Assignee: Veeco Instruments Inc.Inventors: Chenghung Paul Chang, Keng Moy, Alexander I. Gurary
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Patent number: 9273413Abstract: Wafer carrier arranged to hold a plurality wafers and to inject a fill gas into gaps between the wafers and the wafer carrier for enhanced heat transfer and to promote uniform temperature of the wafers. The apparatus is arranged to vary the composition, flow rate, or both of the fill gas so as to counteract undesired patterns of temperature non-uniformity of the wafers. In various embodiments, the wafer carrier utilizes at least one plenum structure contained within the wafer carrier to source a plurality of weep holes for passing a fill gas into the wafer retention pockets of the wafer carrier. The plenum(s) promote the uniformity of the flow, thus providing efficient heat transfer and enhanced uniformity of wafer temperatures.Type: GrantFiled: March 14, 2013Date of Patent: March 1, 2016Assignee: Veeco Instruments Inc.Inventors: Sandeep Krishnan, Alexander I. Gurary, Keng Moy
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Publication number: 20140190405Abstract: A chemical vapor deposition reactor and a method of wafer processing are provided. The reactor can include a reaction chamber having an interior and an entry port for insertion and removal of substrates, a gas inlet manifold communicating with the interior of the chamber for admitting process gasses to form a deposit on substrates held within the interior, a shutter mounted to the chamber, and one or more cleaning elements mounted within the chamber. The shutter can be movable between (i) a run position in which the cleaning elements are remote from the exhaust channel and (ii) a cleaning position in which the one or more cleaning elements engage with the shutter so that the cleaning elements remove deposited particles from the shutter upon movement of the shutter to the cleaning position.Type: ApplicationFiled: January 8, 2013Publication date: July 10, 2014Applicant: VEECO INSTRUMENTS INC.Inventors: Chenghung Paul Chang, Keng Moy, Alexander I. Gurary
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Publication number: 20140116330Abstract: A flow inlet element for a chemical vapor deposition reactor is formed from a plurality of elongated tubular elements extending side-by-side with one another in a plane transverse to the upstream to downstream direction of the reactor. The tubular elements have inlets for ejecting gas in the downstream direction. A wafer carrier rotates around an upstream to downstream axis. The gas distribution elements may provide a pattern of gas distribution which is asymmetrical with respect to a medial plane extending through the axis.Type: ApplicationFiled: January 8, 2014Publication date: May 1, 2014Applicant: VEECO INSTRUMENTS INC.Inventors: Mikhail Belousov, Bojan Mitrovic, Keng Moy
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Patent number: 8636847Abstract: A flow inlet element (22) for a chemical vapor deposition reactor (10) is formed from a plurality of elongated tubular elements (64, 65) extending side-by-side with one another in a plane transverse to the upstream to downstream direction of the reactor. The tubular elements have inlets for ejecting gas in the downstream direction. A wafer carrier (14) rotates around an upstream to downstream axis. The gas distribution elements may provide a pattern of gas distribution which is asymmetrical with respect to a medial plane (108) extending through the axis.Type: GrantFiled: September 7, 2012Date of Patent: January 28, 2014Assignee: Veeco Instruments Inc.Inventors: Mikhail Belousov, Bojan Mitrovic, Keng Moy
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Publication number: 20130252404Abstract: A structure for a chemical vapor deposition reactor desirably includes a reaction chamber having an interior, a spindle mounted in the reaction chamber, and a wafer carrier releasably mounted onto the spindle for rotation therewith. The spindle desirably has a shaft extending along a vertical rotational axis and a key projecting outwardly from the shaft. The wafer carrier preferably has a body defining oppositely-facing top and bottom surfaces and at least one wafer-holding feature configured so that a wafer can be held therein with a surface of the wafer exposed at the top surface of the body. The wafer carrier desirably further has a recess extending into the body from the bottom surface of the body and a keyway projecting outwardly from a periphery of the recess along a first transverse axis. The shaft preferably is engaged in the recess and the key preferably is engaged into the keyway.Type: ApplicationFiled: March 20, 2012Publication date: September 26, 2013Applicant: VEECO INSTRUMENTS INC.Inventors: Sandeep Krishnan, Keng Moy, Alexander I. Gurary, Matthew King, Vadim Boguslavskiy, Steven Krommenhoek
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Patent number: D690671Type: GrantFiled: March 20, 2012Date of Patent: October 1, 2013Assignee: Veeco Instruments Inc.Inventors: Alexander I. Gurary, Keng Moy, Chenghung Paul Chang
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Patent number: D695241Type: GrantFiled: March 20, 2012Date of Patent: December 10, 2013Assignee: Veeco Instruments Inc.Inventors: Alexander I. Gurary, Keng Moy, Chenghung Paul Chang
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Patent number: D695242Type: GrantFiled: March 20, 2012Date of Patent: December 10, 2013Assignee: Veeco Instruments Inc.Inventors: Alexander I. Gurary, Keng Moy, Paul Chang
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Patent number: D711332Type: GrantFiled: March 20, 2012Date of Patent: August 19, 2014Assignee: Veeco Instruments Inc.Inventors: Sandeep Krishnan, Keng Moy, Alexander I. Gurary, Matthew King, Vadim Boguslavskiy, Steven Krommenhoek
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Patent number: D712852Type: GrantFiled: March 20, 2012Date of Patent: September 9, 2014Assignee: Veeco Instruments Inc.Inventors: Sandeep Krishnan, Keng Moy, Alexander I. Gurary, Matthew King, Vadim Boguslavskiy, Steven Krommenhoek
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Patent number: D726133Type: GrantFiled: March 20, 2012Date of Patent: April 7, 2015Assignee: Veeco Instruments Inc.Inventors: Sandeep Krishnan, Keng Moy, Alexander I. Gurary, Matthew King, Vadim Boguslavskiy, Steven Krommenhoek
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Patent number: D744967Type: GrantFiled: August 11, 2014Date of Patent: December 8, 2015Assignee: Veeco Instruments Inc.Inventors: Sandeep Krishnan, Keng Moy, Alexander I. Gurary, Matthew King, Vadim Boguslavskiy, Steven Krommenhoek
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Patent number: D748591Type: GrantFiled: January 14, 2015Date of Patent: February 2, 2016Assignee: Veeco Instruments Inc.Inventors: Sandeep Krishnan, Keng Moy, Alexander I. Gurary, Matthew King, Vadim Boguslavskiy, Steven Krommenhoek
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Patent number: D793972Type: GrantFiled: March 27, 2015Date of Patent: August 8, 2017Assignee: Veeco Instruments Inc.Inventors: Sandeep Krishnan, Keng Moy