Patents by Inventor Kenichi Kobayashi

Kenichi Kobayashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230085645
    Abstract: Provided is a positive electrode active material for a non-aqueous electrolyte secondary battery. Also provided is a method for producing a positive electrode active material for a non-aqueous electrolyte secondary battery, comprising: providing a lithium transition metal composite oxide having a ratio D50/DSEM of 1 or more and 4 or less, having a layered structure, and having a ratio of a number of moles of nickel to a total number of moles of metals other than lithium of 0.3 or more and less than 1, and a ratio of a number of moles of cobalt to the total number of moles of metals other than lithium of 0 or more and less than 0.5; bringing the lithium transition metal composite oxide into contact with a cobalt compound to obtain an adhered material; and heat-treating the adhered material at a temperature higher than 700° C. and lower than 1100° C.
    Type: Application
    Filed: January 26, 2021
    Publication date: March 23, 2023
    Applicant: NICHIA CORPORATION
    Inventors: Masato SONOO, Hideaki HAMADA, Kenichi KOBAYASHI, Jota MORIMOTO
  • Patent number: 11604408
    Abstract: A method and system for imprinting a substrate supported on a moveable stage is provided and includes contacting a liquid resist on the substrate with a template and aligning the substrate with the template using a feedback-feedforward control process with a first set of control parameters. Calibration data is obtained and the viscosity of at least a portion of the resist is increased. The substrate is then with the template using the feedback-feedforward control process with a second set of control parameters after the viscosity of the resist has increased, the second set of control parameters are determined based on the calibration data and the resist is cured under the template.
    Type: Grant
    Filed: February 24, 2021
    Date of Patent: March 14, 2023
    Assignee: Canon Kabushiki Kaisha
    Inventors: Mingji Lou, Takahiro Yoshida, Steven T. Jenkins, Kenichi Kobayashi, Tatsuya Arakawa
  • Publication number: 20230061381
    Abstract: The imprint apparatus according to the present invention for forming a pattern by curing a resin in a state in which a pattern region in a mold is brought into contact with the resin on a shot region in a substrate, includes an element configured to adjust an irradiation region of light from a light source with which the substrate is irradiated, a measurement unit configured to measure a position of a mark formed in the mold, and a controller configured to control a position of the irradiation region with respect to the position of the mark in a plane parallel to a surface of the substrate, based on a measurement result of the position of the mark by the measurement unit.
    Type: Application
    Filed: July 27, 2022
    Publication date: March 2, 2023
    Inventors: Tatsuya Arakawa, Kenichi Kobayashi
  • Publication number: 20230039292
    Abstract: An imaging device according to the present disclosure includes a housing, a lens unit, a heater, an imaging unit, a temperature sensor, and a heater control unit. The lens unit is attached to the housing. The heater is provided in the lens unit. The imaging unit, the temperature sensor, and the heater control unit are housed in the housing. The imaging unit outputs an optical image formed by a light flux transmitted through the lens unit as an image signal. The heater control unit controls the heater in accordance with a temperature detection value by the temperature sensor.
    Type: Application
    Filed: October 18, 2022
    Publication date: February 9, 2023
    Applicant: Panasonic Intellectual Property Management Co., Ltd.
    Inventors: Kenichi KOBAYASHI, Tomio SHIMIZU
  • Publication number: 20230045181
    Abstract: A method of producing a positive electrode for a non-aqueous electrolyte secondary battery, includes: providing a lithium transition metal composite oxide having a layered structure, having a ratio D50/DSEM of 1 or more and 4 or less, and having a certain content of nickel and a certain content of cobalt; bringing the lithium transition metal composite oxide into contact with a cobalt compound to obtain an adhered material; heat-treating the adhered material at a temperature higher than 700° C. and lower than 1100° C. to obtain a heat-treated product; obtaining a positive electrode composition containing the heat-treated product, a conductive auxiliary agent, and a binder; and applying and pressurizing the positive electrode composition onto a collector to form an active material layer having a density of 2.7 g/cm3 or more and 3.9 g/cm3 or less on the collector.
    Type: Application
    Filed: July 25, 2022
    Publication date: February 9, 2023
    Applicant: NICHIA CORPORATION
    Inventors: Masato SONOO, Masahiro MURAYAMA, Kenichi KOBAYASHI, Hideaki HAMADA, Jota MORIMOTO
  • Patent number: 11568300
    Abstract: A machine learning management apparatus identifies a maximum prediction performance score amongst a plurality of prediction performance scores corresponding to a plurality of models generated by executing each of a plurality of machine learning algorithms. As for a first machine learning algorithm having generated a model corresponding to the maximum prediction performance score, the machine learning management apparatus determines a first training dataset size to be used when the first machine learning algorithm is executed next time based on the maximum prediction performance score, first estimated prediction performance scores, and first estimated runtimes.
    Type: Grant
    Filed: June 30, 2017
    Date of Patent: January 31, 2023
    Assignee: FUJITSU LIMITED
    Inventors: Kenichi Kobayashi, Akira Ura, Haruyasu Ueda
  • Patent number: 11550875
    Abstract: A processing system includes: a first statistical operator configured to divide data output from each sensor of a target apparatus according to each processing division of a processing performed by the target apparatus, and perform a statistical operation for each processing division; a second statistical operator configured to divide data output from each sensor of a comparative apparatus according to each processing division of the processing performed by the comparative apparatus, and perform a statistical operation for each processing division; a calculator configured to calculate a difference value between a result of the statistical operation performed by the first statistical operator and a result of the statistical operation performed by the second statistical operator, for each processing division; and a display controller configured to display the difference value for each processing division in a graph.
    Type: Grant
    Filed: June 15, 2020
    Date of Patent: January 10, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Ryota Aoi, Kenichi Kobayashi
  • Patent number: 11511389
    Abstract: Disclosed is a polishing head for a polishing apparatus for polishing a quadrangular substrate using a polishing pad attached to a polishing table, comprising a head body portion, a plurality of elastic bags disposed in a surface of the head body portion, which is to face the polishing table, and a substrate holding plate for holding the substrate, the substrate holding plate being pressed by the elastic bags in a direction away from the head body portion, the head body portion being provided with channels for bags, which are in communication with the respective elastic bags, the polishing head further including at least two support plates disposed between the elastic bags on one hand and the substrate holding plate on the other, the elastic bags being configured to press the substrate holding plate through the support plates.
    Type: Grant
    Filed: September 19, 2019
    Date of Patent: November 29, 2022
    Assignee: EBARA CORPORATION
    Inventors: Kenichi Akazawa, Makoto Kashiwagi, Yu Ishii, Atsushi Yoshida, Kenichi Kobayashi, Tetsuji Togawa, Hozumi Yasuda
  • Patent number: 11515955
    Abstract: To provide a demodulation circuit, a processing circuit, a processing method, and a processing device that are capable of implementing more prompt acquisition of alert information.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: November 29, 2022
    Assignee: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
    Inventors: Satoshi Okada, Kenichi Kobayashi
  • Patent number: 11499776
    Abstract: Provided is a method of constructing a natural gas liquefaction plant, which can shorten a construction time period by minimizing effect of a lead time for the refrigerant compressor thereon, the method including: transporting a refrigerant compression module body 175 to an installation area 85, wherein the refrigerant compression module body is provided with a frame 120 configured to allow refrigerant compressor 150 for compressing a refrigerant for cooling natural gas to be mounted therein; installing the refrigerant compression module body 175 to the installation area 85; and mounting the refrigerant compressor 150 into a mounting space 130 predefined in the frame 120 of the installed refrigerant compression module body.
    Type: Grant
    Filed: March 15, 2018
    Date of Patent: November 15, 2022
    Assignee: Chiyoda Corporation
    Inventors: Kenichi Kobayashi, Takeshi Kaji, Makoto Yamagata
  • Publication number: 20220293939
    Abstract: A positive electrode active material for a nonaqueous electrolyte secondary battery includes particles of a lithium-transition metal composite oxide that contains nickel in the composition thereof and has a layered structure. The particles have an average particle size DSEM based on electron microscopic observation in a range of 1 ?m to 7 ?m in which a ratio D50/DSEM of a 50% particle size D50 in volume-based cumulative particle size distribution to the average particle size based on electron microscopic observation is in a range of 1 to 4, and a ratio D90/D10 of a 90% particle size D90 to a 10% particle size D10 in volume-based cumulative particle size distribution is 4 or less.
    Type: Application
    Filed: May 31, 2022
    Publication date: September 15, 2022
    Applicants: HONDA MOTOR CO., LTD., NICHIA CORPORATION
    Inventors: Atsushi OGAWA, Soshi KAWAMURA, Toru SUKIGARA, Hiroto MAEYAMA, Kenichi KOBAYASHI
  • Patent number: 11440161
    Abstract: A polishing liquid is supplied without passing through a rotary joint in a face-up type polishing apparatus. This application discloses a polishing head for the face-up type polishing apparatus used by mounting a polishing pad on a lower surface as one embodiment. The polishing head includes a liquid reservoir portion that receives a liquid and a liquid discharge port that discharges the liquid received by the liquid reservoir portion. The liquid reservoir portion is disposed around a rotation axis of the polishing head. The liquid discharge port is disposed on the lower surface of the polishing head. An annular opening centering on the rotation axis of the polishing head is formed on an upper portion of the polishing head. The liquid reservoir portion is communicated with a space outside the polishing head via the opening.
    Type: Grant
    Filed: January 3, 2019
    Date of Patent: September 13, 2022
    Assignee: EBARA CORPORATION
    Inventors: Kenichi Kobayashi, Tetsuji Togawa
  • Patent number: 11426834
    Abstract: An apparatus for processing a substrate is disclosed. The apparatus includes a polishing section configured to polish a substrate, a transfer mechanism configured to transfer the substrate, and a cleaning section configured to clean and dry the polished substrate. The cleaning section has plural cleaning lines for cleaning plural substrates. The plural cleaning lines have plural cleaning modules and plural transfer robots for transferring the substrates.
    Type: Grant
    Filed: October 18, 2019
    Date of Patent: August 30, 2022
    Assignee: EBARA CORPORATION
    Inventors: Mitsuru Miyazaki, Seiji Katsuoka, Naoki Matsuda, Junji Kunisawa, Kenichi Kobayashi, Hiroshi Sotozaki, Hiroyuki Shinozaki, Osamu Nabeya, Shinya Morisawa, Takahiro Ogawa, Natsuki Makino
  • Publication number: 20220269166
    Abstract: A method and system for imprinting a substrate supported on a moveable stage is provided and includes contacting a liquid resist on the substrate with a template and aligning the substrate with the template using a feedback-feedforward control process with a first set of control parameters. Calibration data is obtained and the viscosity of at least a portion of the resist is increased. The substrate is then with the template using the feedback-feedforward control process with a second set of control parameters after the viscosity of the resist has increased, the second set of control parameters are determined based on the calibration data and the resist is cured under the template.
    Type: Application
    Filed: February 24, 2021
    Publication date: August 25, 2022
    Inventors: Mingji LOU, Takahiro YOSHIDA, Steven T. JENKINS, Kenichi KOBAYASHI, Tatsuya ARAKAWA
  • Patent number: 11423263
    Abstract: A processor builds a plurality of learning models using training data of a plurality of first sample sizes according to a first machine learning algorithm, and calculates a plurality of measured prediction performances. The processor calculates a plurality of estimated variances on the basis of relationship information indicating the relationship between expected value and variance with respect to prediction performance and the plurality of measured prediction performances. The processor creates a first prediction performance curve through a regression analysis using the plurality of measured prediction performances and the plurality of estimated variances. The processor calculates a first evaluation value on the basis of the first prediction performance curve and a second sample size. The processor compares the first evaluation value with a second evaluation value calculated based on a second prediction performance curve corresponding to a second machine learning algorithm and the second sample size.
    Type: Grant
    Filed: March 29, 2018
    Date of Patent: August 23, 2022
    Assignee: FUJITSU LIMITED
    Inventor: Kenichi Kobayashi
  • Publication number: 20220245395
    Abstract: A non-transitory computer-readable recording medium stores a determination program for causing a computer to execute processing including: specifying a difference between feature amounts of a plurality of first images that is captured in chronological order or of which the difference between the feature amounts is equal to or less than a threshold; referring to information in which the difference is associated with a data augmentation processing type and determining one or a plurality of data augmentation processing types used for processing of generating machine learning data on the basis of the specified difference between the feature amounts; and outputting a result of the determination processing.
    Type: Application
    Filed: November 3, 2021
    Publication date: August 4, 2022
    Applicant: FUJITSU LIMITED
    Inventors: Akihito Yoshii, Kenichi KOBAYASHI
  • Patent number: 11400561
    Abstract: According to one embodiment, there is provided a top ring for holding a substrate. The top ring comprises a substrate supporting surface, a retainer member disposed to surround an outer periphery of the substrate supporting surface, and a retainer guiding device configured to guide the retainer member so as to allow the retainer member to be displaced in a direction perpendicular to the substrate supporting surface, and support the retainer member so as to inhibit the retainer member from being displaced in a direction parallel to and away from the substrate supporting surface. The retainer guiding device is disposed in an inner side of the retainer member surrounding the substrate supporting surface.
    Type: Grant
    Filed: August 2, 2019
    Date of Patent: August 2, 2022
    Assignee: EBARA CORPORATION
    Inventors: Kenichi Kobayashi, Asagi Matsugu, Makoto Kashiwagi, Manao Hoshina
  • Publication number: 20220237475
    Abstract: A creation method that is executed by a computer, the creation method includes acquiring scores representing accuracy of classification of a machine learning model that classifies input data into classes; acquiring a difference in the scores between a first class that has a highest score and a second class that has a next highest score after the first class; and generating a first detection model that determines the classification is undecided when the difference is equal to or less than a first threshold value.
    Type: Application
    Filed: April 13, 2022
    Publication date: July 28, 2022
    Applicant: FUJITSU LIMITED
    Inventors: Kenichi KOBAYASHI, Yoshihiro OKAWA, Yasuto YOKOTA, Katsuhito NAKAZAWA
  • Patent number: 11380892
    Abstract: A positive electrode active material for a nonaqueous electrolyte secondary battery includes particles of a lithium-transition metal composite oxide that contains nickel in the composition thereof and has a layered structure. The particles have an average particle size DSEM based on electron microscopic observation in a range of 1 ?m to 7 ?m in which a ratio D50/DSEM of a 50% particle size D50 in volume-based cumulative particle size distribution to the average particle size based on electron microscopic observation is in a range of 1 to 4, and a ratio D90/D10 of a 90% particle size D90 to a 10% particle size D10 in volume-based cumulative particle size distribution is 4 or less.
    Type: Grant
    Filed: March 4, 2020
    Date of Patent: July 5, 2022
    Assignees: NICHIA CORPORATION, HONDA MOTOR CO., LTD.
    Inventors: Atsushi Ogawa, Soshi Kawamura, Toru Sukigara, Hiroto Maeyama, Kenichi Kobayashi
  • Patent number: 11370080
    Abstract: To reduce a risk generated at a time of collision of a substrate with a retainer. According to one embodiment, a head for holding a polygonal substrate as a polishing object of a polishing apparatus is provided. The head includes a substrate holding surface configured to hold a substrate and a retainer positioned outside the substrate holding surface. The retainer has an end region. The end region is arranged adjacent to a corner portion of the substrate held onto the head. The end region has an end surface on a side of the substrate holding surface. The end surface is configured to increase in distance from the substrate holding surface with approaching an end portion in a longitudinal direction of the retainer.
    Type: Grant
    Filed: March 17, 2020
    Date of Patent: June 28, 2022
    Assignee: EBARA CORPORATION
    Inventors: Kenichi Kobayashi, Makoto Kashiwagi