Abstract: Embodiments of the present disclosure generally relate to encapsulated optical devices and methods for fabricating the encapsulated optical devices. In one or more embodiments, a method for encapsulating an optical device includes depositing a metallic silver layer on a substrate, depositing a barrier layer on the metallic silver layer, where the barrier layer contains silicon nitride, a metallic element, a metal nitride, or any combination thereof, and depositing an encapsulation layer containing silicon oxide on the barrier layer.

Abstract: Embodiments of the present disclosure generally relate to imprint compositions and materials and related processes useful for nanoimprint lithography (NIL). In one or more embodiments, an imprint composition is provided and contains a plurality of passivated nanoparticles, one or more solvents, a surface ligand, an additive, and an acrylate. Each passivated nanoparticle contains a core and one or more shells, where the core contains one or more metal oxides and the shell contains one or more passivation materials. The passivation material of the shell contains one or more atomic layer deposition (ALD) materials, one or more block copolymers, or one or more silicon-containing compounds.

Abstract: Embodiments of the present disclosure generally relate to methods for cleaning aerospace components having oxidation, corrosion, contaminants, and/or other degradations. In one or more embodiments, a cleaning method includes positioning the aerospace component into a processing region of a processing chamber, introducing hydrogen gas into the processing region, maintaining the processing region at a pressure of about 100 mTorr to about 5,000 mTorr, and heating the aerospace component at a temperature of about 500° C. to about 1,200° C. for about 0.5 hours to about 24 hours to produce a cleaned surface on the aerospace component. In other embodiments, a cleaning method includes exposing the aerospace component to ozone while maintaining the aerospace component at a temperature of about 15° C. to about 500° C. for 0.25 hours to about 24 hours to produce a cleaned surface on the aerospace component.

Abstract: Embodiments of the present disclosure generally relate to methods for detecting end-points of cleaning processes for aerospace components containing corrosion. The method includes exposing the aerospace component to a first solvent, exposing the aerospace component to a first water rinse, and analyzing a first aliquot of the first water rinse by absorbance spectroscopy to determine an intermediate solute concentration in the first aliquot, where the intermediate solute concentration is greater than a reference solute concentration.

Abstract: Apparatus and methods to control the phase of power sources for plasma process regions in a batch process chamber. A master exciter controls the phase of the power sources during the process sequence based on feedback from the match circuits of the respective plasma sources.

Abstract: Embodiments described herein relate to encapsulated optical devices and methods of forming optical devices with controllable air-gapped encapsulation. In one embodiment, a plurality of openings are formed in a support layer surrounding the plurality of optical device structures to create a high refractive index contrast between the optical device structures, the support layer, and the openings. In another embodiment, sacrificial material is disposed in-between the optical device structures and then an encapsulation layer is disposed on the optical device structures. The sacrificial material is removed, forming a space bounded by the encapsulation layer, the substrate, and each of the optical device structures. In yet another embodiment, the encapsulation layer is disposed over the optical device structures forming a space bounded by the encapsulation layer, the substrate, and each of the optical device structures.

Abstract: Embodiments of the present disclosure generally relate to methods for refurbishing aerospace components by removing corrosion and depositing protective coatings. In one or more embodiments, a method of refurbishing an aerospace component includes exposing the aerospace component containing corrosion to an aqueous cleaning solution. The aerospace component contains a nickel superalloy, an aluminide layer disposed on the nickel superalloy, and an aluminum oxide layer disposed on the aluminide layer. The method includes removing the corrosion from a portion of the aluminum oxide layer with the aqueous cleaning solution to reveal the aluminum oxide layer, then exposing the aluminum oxide layer to a post-rinse, and forming a protective coating on the aluminum oxide layer.

Abstract: Embodiments of the present disclosure generally relate to oxide layer compositions for turbine engine components and methods for depositing the oxide layer compositions. In one or more embodiments, a turbine engine component includes a superalloy substrate and a bond coat disposed over the superalloy substrate. The turbine engine component includes an oxide layer disposed over the bond coat, where the oxide layer includes aluminum oxide and a metal dopant. The turbine engine component includes a thermal barrier coating disposed over the oxide layer.

Abstract: Apparatus and methods to control the phase of power sources for plasma process regions in a batch process chamber. A master exciter controls the phase of the power sources during the process sequence based on feedback from the match circuits of the respective plasma sources.

Abstract: Embodiments of the present disclosure generally relate to densified nanoimprint films and processes for making these densified nanoimprint films, as well as optical devices containing the densified nanoimprint films. In one or more embodiments, a densified nanoimprint film contains a base nanoimprint film and a metal oxide disposed on the base nanoimprint film and in between the nanoparticles. The base nanoimprint film contains nanoparticles, where the nanoparticles contain titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, hafnium oxide, chromium oxide, indium tin oxide, silicon nitride, or any combination thereof. The metal oxide contains aluminum oxide, titanium oxide, zirconium oxide, niobium oxide, tantalum oxide, indium oxide, indium tin oxide, hafnium oxide, chromium oxide, scandium oxide, tin oxide, zinc oxide, yttrium oxide, praseodymium oxide, magnesium oxide, silicon oxide, silicon nitride, silicon oxynitride, or any combination thereof.

Abstract: Embodiments of the present disclosure generally relate to optically densified nanoimprint films and processes for making these optically densified nanoimprint films, as well as optical devices containing the optically densified nanoimprint films. In one or more embodiments, a method of forming a nanoimprint film includes positioning a substrate containing a porous nanoimprint film within a processing chamber, where the porous nanoimprint film contains nanoparticles and voids between the nanoparticles, and the porous nanoimprint film has a refractive index of less than 2. The method also includes depositing a metal oxide on the porous nanoimprint film and within at least a portion of the voids to produce an optically densified nanoimprint film during an atomic layer deposition (ALD) process.

Abstract: Provided are an alignment method and an alignment device by which, immediately before aligning, the leg parts of adjacent conductors do not interfere with each other. The alignment method, in which by providing a plurality of coil elements (40) in an annular shape and moving the plurality of coil elements (40) in a direction in which the diameter of the annular shape is reduced, the plurality of coil elements (40) are aligned in a state where turn sections (42) provided at substantially apex portions are alternately overlapped, wherein the plurality of coil elements (40) are aligned by moving each of the plurality of coil elements (40) toward an annularly shaped center, and while doing so, rotating the plurality of coil elements about a rotation axis (231e) that is parallel to the central axis (C1) of the annular shape.

Abstract: Apparatus and methods for depositing and treating or etching a film are described. A batch processing chamber includes a plurality of processing regions with at least one plasma processing region. A low frequency bias generator is connected to a susceptor assembly to intermittently apply a low frequency bias to perform a directional treatment or etching the deposited film.

Abstract: Embodiments of the present disclosure generally relate to protective coatings on turbine blades, turbine disks, and other aerospace components and methods for depositing the protective coatings. In one or more embodiments, a turbine blade includes a blade portion and a root coupled to the blade portion, where the root contains a protective coating disposed thereon. The protective coating is or contains one or more deposited crystalline film containing at least one of a metal oxide, a metal nitride, or a metal oxynitride and has a thickness of about 100 nm to about 10 ?m. In some examples, a turbine blade assembly includes a disk and a plurality of the turbine blades coupled to the disk. The protective coating is disposed on the root on the turbine blade and/or a receiving surface on the turbine disk.

Abstract: The alignment method of the electrical conductors includes an aligning step of aligning a plurality of electrical conductors 40 in an annular shape while being overlapped in a circumferential direction of the annular shape by moving gripping devices 230 inward in a radial direction of the annular shape, in which the gripping device 230 has a pair of claws 232g1 and 232g2 capable of pinching one leg portions 41 of the substantially U-shaped electrical conductors 40 one by one, one claw 232g1 has a length capable of gripping one leg portion 41, and the other claw 232g2 has a length capable of gripping one leg portion 41 of one substantially U-shaped electrical conductor 40-1 and gripping the other leg portion 44 of the other substantially U-shaped electrical conductor 40-2.

Abstract: Methods are provided for manufacturing well-controlled, solid-state nanopores and arrays of well-controlled, solid-state nanopores by a cyclic process including atomic layer deposition (ALD), or chemical vapor deposition (CVD), and etching. One or more features are formed in a thin film deposited on a topside of a substrate. A dielectric material is deposited over the substrate having the one or more features in the thin film. An etching process is then used to etch a portion of the dielectric material deposited over the substrate having the one or more features in the thin film. The dielectric material deposition and etching processes are optionally repeated to reduce the size of the features until a well-controlled nanopore is formed through the thin film on the substrate.

Abstract: Embodiments of the present disclosure generally relate to protective coatings on substrates and methods for depositing the protective coatings. In one or more embodiments, a method of forming a protective coating on a substrate includes depositing a chromium oxide layer containing amorphous chromium oxide on a surface of the substrate during a first vapor deposition process and heating the substrate containing the chromium oxide layer comprising the amorphous chromium oxide to convert at least a portion of the amorphous chromium oxide to crystalline chromium oxide during a first annealing process. The method also includes depositing an aluminum oxide layer containing amorphous aluminum oxide on the chromium oxide layer during a second vapor deposition process and heating the substrate containing the aluminum oxide layer disposed on the chromium oxide layer to convert at least a portion of the amorphous aluminum oxide to crystalline aluminum oxide during a second annealing process.

Abstract: To provide a video projector which improves visibility in response to changes in projection environment, a video projector has an initial level setter, a level adjuster, a projection display, an image capture, and a projection histogram calculator. The initial level setter performs a prescribed initial level setting on an input video signal and outputs an initial display signal. The level adjuster adjusts the level of the initial display signal on the basis of a projection image and outputs a display signal. The image capture captures the projection image projected on a projection surface by the projection display based on the display signal. The projection histogram calculator prepares a projection histogram for each color. The level adjuster adjusts the level of the initial display signal for each color on the basis of the projection histogram.

Abstract: An alignment apparatus is configured to include an alignment mechanism. At least one of first legs or second legs of electric conductors are retained so as to be aligned in an arcuate shape or a circular shape by a plurality of holders that make up the alignment mechanism. Thereafter, the plurality of holders are rotated. Accordingly, the electric conductors, which are aligned in an arcuate or circular shape, are rotated and arranged on the same circumference. In other words, the electric conductors are aligned in an annular shape.

Abstract: A communication device according to an embodiment is capable of communicating with another communication device via a first network and a second network each transmitting radio signal data by different communication methods. The communication device includes: a first communicator capable of communicating with another communication device via the first network; a second communicator capable of communicating with another communication device via the second network; a delay parameter acquirer to acquire a delay parameter of the first network; and a delay parameter reflector to reflect the delay parameter of the first network acquired by the delay parameter acquirer on a delay parameter of the second network.