Abstract: An optical lighting system comprising either an optical system or an optical mirror system. In the optical lens and optical mirror systems, the light incident and exiting planes of the lenses and mirrors, are formed to satisfy given equations. Accordingly, in a contact or proximity exposure system, it is possible to unify irradiance on a surface to be irradiated and reduce the optical path length, thus reducing the overall device size. In a projections system, it is possible to unify irradiance on an image surface while efficiently utilizing light by omitting a gradient filter.

Abstract: An optical lighting system comprising either an optical system or an optical mirror system. In the optical lens and optical mirror systems, the light incident and exiting planes of the lenses and mirrors, are formed to satisfy given equations. Accordingly, in a contact or proximity exposure system, it is possible to unify irradiance on a surface to be irradiated and reduce the optical path length, thus reducing the overall device size. In a projection system, it is possible to unify irradiance on an image surface while efficiently utilizing light by ommitting a gradient filter.

Abstract: An illumination system applicable to contact or proximity exposure apparatuses provides excellently collimated light without any irradiance reduction in the peripheral area of an object to be illuminated and includes a light source, an ellipsoidal mirror positioned with respect to the light source, an optical system designed so that the entrance height of the light received in the entrance pupil thereof is substantially proportioned to the tangent of the exit angle in the exit pupil thereof, and a single Fresnel lens designed so that light passing therethrough is abated in the spherical aberration. Light exiting from the optical system is received on the front surface of the Fresnel lens, where the irradiance distribution is uniform through the surface, and the Fresnel lens transmits light received with abated spherical aberration to a mask film bearing a desired circuit pattern.

Abstract: A semiconductor laser comprises an active layer of a quantum well structure, and a current confinement structure for avoiding the injection of carriers into regions of the active layer in the vicinities of resonator facets. The current confinement structure is different in conduction type from that of one of cladding layer, and is formed by a semiconductor layer which is transparent for a laser light. The semiconductor laser further comprises an optical waveguide structure provided between the resonator facets. In this semiconductor laser, the catastrophic damage is avoided, and the high output power is obtained.

Abstract: Disclosed is a novel optical system for illuminating an object which provides an increased irradiance in the peripheral area of the object. The optical system includes a light source, an entrance pupil for receiving light from the light source, an exit pupil for passing the light received to the object, and an optical axis which extends through the optical system to the light source and the object, respectively, wherein the relationship among the incident height h to the entrance pupil, an illumination height H on the object, and a changing rate (dh/dH) of the incident height and the illumination height is defined by a function, f(H)=(h/H)(dh/dH). The optical system is designed so as to satisfy the following formula in the peripheral area of the object: f(0)<f(H). The function f(0) is represented by f(0)=[fa'/(a'-f)b'}].sup.2, where a' is a distance between the light source and the primary principal point of the optical system, and b' is a distance between the real image of the light source and the object.

Abstract: A laser exposure system for use in scanning and recording images, the system comprising subdividing the laser beam from the laser source into several parallel traces of laser beams; modulating the laser beams individually in response to the image signals be means of a multi-channel optical modulator; directing the modulated laser beams through a first mirror and a second mirror so as to enable the laser beams from the second mirror to be in parallel with the reference plane with respect to the sub-scanning direction; varying the distance between the modulator and the first mirror; and adjusting the angles of the first and second mirrors to the reference plane so that a possible decline of the laser beams in the sub-scanning direction is compensated.

Abstract: A laser exposure system for use in scanning and recording images, the system comprising subdividing the laser beam from the laser source into several parallel traces of laser beams; modulating the laser beams individually in response to the image signals by means of a multi-channel optical modulator; directing the modulated laser beams through a first mirror and a second mirror so as to enable the laser beams from the second mirror to be in parallel with the reference plane with respect to the sub-scanning direction; varying the distance between the modulator and the first mirror; and adjusting the angles of the first and second mirrors to the reference plane so that a possible decline of the laser beams in the subscanning direction is compensated.

Abstract: A dielectric ceramic body for use in a band-pass filter. The ceramic body has a plurality of through holes formed to extend transversely from one side surface to another side surface which is opposite to the one side surface and arranged in series along a longitudinal direction of the body. Slits are formed on one of the aforementioned two side surfaces between respective two holes. The slits have depths which increase toward end portions of the ceramic body.