Patents by Inventor Kenji Hiratsuka

Kenji Hiratsuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080283852
    Abstract: A light-emitting device and a method to from the device are is described. The device described herein may realize the transversely single mode operation by the buried mesa configuration even when the active layer contains aluminum. The method provides a step to form the mesa on a semiconductor substrate with an average dislocation density of 500 to 5000 cm?2, a step to form a protection layer, which prevents the active layer from oxidizing, at least on a side of the active layer, and a step to from a blocking layer so as to cover the protection layer and to bury the mesa.
    Type: Application
    Filed: May 13, 2008
    Publication date: November 20, 2008
    Inventors: Yukihiro TSUJI, Kenji Hiratsuka, Mitsuo Takahashi
  • Publication number: 20070155031
    Abstract: The present invention is to provide a method for manufacturing a semiconductor optical device, in which the unevenness of the burying of the mesa structure may be reduced. The process is configured to form a mask extending along [011] direction on the cap layer, to form a mesa structure by etching the upper cladding layer made of InP, the active region, and the lower cladding layer, to form a surfaces with the (01-1) and the (0-11) planes on both sides of the mesa structure, respectively, by causing the mass transportation, and finally to form the blocking layer by using the mask formed in advance. A semiconductor region with the second conduction type, which is the same with that of the upper cladding layer and is different from that of the lower cladding layer, is grown on the upper cladding layer after removing the mask and the cap layer.
    Type: Application
    Filed: December 11, 2006
    Publication date: July 5, 2007
    Inventors: Kouichiro Yamazaki, Kenji Hiratsuka
  • Patent number: 6818521
    Abstract: This invention provides a method for manufacturing a hetero-junction bipolar transistor, in which a hole concentration of a base layer doped with carbon can be increased. The method comprises the following steps. 1) A sub-collector 30, a collector 50, a base 60 doped with carbon are sequentially grown after setting a semiconductor substrate on the stage in the growth chamber; 2) an emitter 70 and an emitter contact 80 are grown at a temperature T; and 3) grown layers are annealed at a temperature TA, where the relation of T<Ta≦600° C. is satisfied. This process enhances the activation of carbon atoms by dissociating hydrogen atoms captured in the base 60 to the ambience.
    Type: Grant
    Filed: April 23, 2003
    Date of Patent: November 16, 2004
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventor: Kenji Hiratsuka
  • Publication number: 20030232478
    Abstract: This invention provides a method for manufacturing a hetero-junction bipolar transistor, in which a hole concentration of a base layer doped with carbon can be increased. The method comprises the following steps. 1) A sub-collector 30, a collector 50, a base 60 doped with carbon are sequentially grown after setting a semiconductor substrate on the stage in the growth chamber; 2) an emitter 70 and an emitter contact 80 are grown at a temperature T; and 3) grown layers are annealed at a temperature TA, where the relation of T<Ta≦600° is satisfied. This process enhances the activation of carbon atoms by dissociating hydrogen atoms captured in the base 60 to the ambience.
    Type: Application
    Filed: April 23, 2003
    Publication date: December 18, 2003
    Inventor: Kenji Hiratsuka
  • Patent number: 4186234
    Abstract: A translucent, high density elastic resin composition which comprises 100 wt. parts of a thermoplastic resin or a mixture of a plasticizer and a thermoplastic resin, and 100-500 wt. parts of a powdered glass having a refractive index of N.sub.D =1.5-2.2. This composition is suitable for fabricating translucent soundbarriers.
    Type: Grant
    Filed: April 17, 1978
    Date of Patent: January 29, 1980
    Assignee: Dai Nippon Toryo Company
    Inventors: Kazumi Sakashita, Kenji Hiratsuka, Yutaka Umezu, Nobuo Nakamura, Haruhisa Noda