Abstract: An optical modulator has, on a substrate having electro-optic effect, an optical waveguide including an input optical waveguide, two branching optical waveguides which branch a light beam incident to the input optical waveguide into two beams, two interaction optical waveguides which modulate a light beam phase by applying a voltage between a center electrode and ground electrodes, a multiplexing optical waveguide which multiplexes the light beams which propagate through the two interaction optical waveguides, and an output optical waveguide which is connected to the multiplexing optical waveguide through a multiplexing point.

Abstract: A photomask unit includes a mask substrate having patterns arranged at a pitch P; and a pellicle which protects the mask substrate, wherein the pellicle is configured so that transmittance of incident light of an incident angle ?(0°<?<90°) is higher than transmittance of incident light of an incident angle 0°.

Abstract: A semiconductor light-receiving module includes a semiconductor light-receiving element and an incident light direction device. The semiconductor light-receiving element includes a substrate, at least a light absorbing layer and an upper cladding layer formed sequentially on the substrate, a light incident facet formed at least at one facet of the substrate and the light absorbing layer, and electrodes which output an electric signal generated by absorption of the light entering from the light incident facet in the light absorbing layer. The incident light direction device directs to irradiate the light obliquely to the light incident facet of the semiconductor light-receiving element, and to cause at least part of the light to irradiate the light absorbing layer at the light incident facet.

Abstract: A pattern forming method comprises forming a photosensitive resin film on a substrate, exposing the photosensitive resin film, forming a pattern of the photosensitive resin film by supplying a developing solution to the photosensitive resin film, and slimming to remove a surface layer of the pattern by causing the pattern to contact with an activated water.

Abstract: A method of processing a substrate, comprising forming a chemically amplified resist film on a substrate, irradiating energy beams to the chemically amplified resist film to form a latent image therein, carrying out heat treatment with respect to the chemically amplified resist film, heating treatment being carried out in a manner of relatively moving a heating section for heating the chemically amplified resist film and the substrate forming a gas stream flowing reverse to the relatively moving direction of the heating section between the lower surface of the heating section and the chemically amplified resist film.

Abstract: An exposure method includes preparing a photomask having first and second main openings by which corresponding patterns are to be formed in a photo resist and first and second assist openings by which no corresponding patterns are to be formed in the photo resist, preparing an illumination having first and second light emitting areas, and irradiating the photo resist with illumination light from the illumination via the photomask, the first light emitting area and the second light emitting area being symmetric with respect to a center of the illumination, the first light emitting area and the second light emitting area containing a first point and a second point, respectively, the first point and the second point being symmetric with respect to the center of the illumination, the first point and the second point being symmetric with respect to a straight line extending through the center of the illumination.

Abstract: A processing method for selectively reducing or removing the region to be exposed with energy ray in a film formed on a substrate, comprising relatively scanning a first exposure light whose shape on the substrate is smaller than the whole first region to be exposed against the whole first region to be exposed to selectively remove or reduce the first region to be exposed, and exposing a whole second region to be exposed inside the whole first region to be exposed with a second exposure light to selectively expose the whole second region to be exposed.

Abstract: An optical modulator has, on a substrate having electro-optic effect, an optical waveguide including an input optical waveguide, two branching optical waveguides which branch a light beam incident to the input optical waveguide into two beams, two interaction optical waveguides which modulate a light beam phase by applying a voltage between a center electrode and ground electrodes, a multiplexing optical waveguide which multiplexes the light beams which propagate through the two interaction optical waveguides, and an output optical waveguide which is connected to the multiplexing optical waveguide through a multiplexing point.

Abstract: A processing method for selectively reducing or removing the region to be exposed with energy ray in a film formed on a substrate, comprising relatively scanning a first exposure light whose shape on the substrate is smaller than the whole first region to be exposed against the whole first region to be exposed to selectively remove or reduce the first region to be exposed, and exposing a whole second region to be exposed inside the whole first region to be exposed with a second exposure light to selectively expose the whole second region to be exposed.

Abstract: A waveguide type optical device has an optical waveguide formed on a substrate, functional optical waveguide an optical input end face and an optical output end face which are provided to respective substrate end faces an input optical waveguide connecting the optical input end face and the functional optical waveguides, an output optical waveguide connecting the optical output end face and the functional optical waveguides, and a signal light monomode optical fiber. The input optical waveguide and the output optical waveguide is formed so as to form angles other than 0° with the functional optical waveguides at the optical input end face and the optical output end face respectively, such that an angle between each of the input optical waveguide and the output optical waveguide with respect to a corresponding one of the substrate end faces is other than 90°.

Abstract: A method for evaluating a local flare in an exposure tool, includes: measuring a projection light intensity distribution by transferring a monitor mask pattern onto a semiconductor substrate; calculating a first ratio between an illumination light intensity on the monitor mask pattern and a first projection light intensity calculated based on the monitor mask pattern; calculating a distribution function of a local flare, due to a mask pattern coverage of the monitor mask pattern, based on the first ratio and the projection light intensity distribution; dividing a design mask pattern into a plurality of unit areas; calculating a second ratio between the illumination light intensity on each of the unit areas and a second projection light intensity calculated based on the design mask pattern; and calculating a local flare intensity in each of the unit areas, based on the second ratio and the distribution function.

Abstract: A semiconductor light-receiving module includes a semiconductor light-receiving element and an incident light direction device. The semiconductor light-receiving element includes a substrate, at least a light absorbing layer and an upper cladding layer formed sequentially on the substrate, a light incident facet formed at least at one facet of the substrate and the light absorbing layer, and electrodes which output an electric signal generated by absorption of the light entering from the light incident facet in the light absorbing layer. The incident light direction device directs to irradiate the light obliquely to the light incident facet of the semiconductor light-receiving element, and to cause at least part of the light to irradiate the light absorbing layer at the light incident facet.

Abstract: A method of processing a substrate, comprising forming a chemically amplified resist film on a substrate, irradiating energy beams to the chemically amplified resist film to form a latent image therein, carrying out heat treatment with respect to the chemically amplified resist film, heating treatment being carried out in a manner of relatively moving a heating section for heating the chemically amplified resist film and the substrate forming a gas stream flowing reverse to the relatively moving direction of the heating section between the lower surface of the heating section and the chemically amplified resist film.

Abstract: A processing method for selectively reducing or removing the region to be exposed with energy ray in a film formed on a substrate, comprising relatively scanning a first exposure light whose shape on the substrate is smaller than the whole first region to be exposed against the whole first region to be exposed to selectively remove or reduce the first region to be exposed, and exposing a whole second region to be exposed inside the whole first region to be exposed with a second exposure light to selectively expose the whole second region to be exposed.

Abstract: A relay unit capable of avoiding the occurrence of simultaneous switching whatever data is received and thereby preventing malfunction of the device due to impulse noise, and a memory product having stored therein a computer program are provided. The relay unit includes a latch unit that temporarily stores converted parallel data; a determining unit that compares received data with subsequent data to be received subsequently and thereby determines whether to invert bits of data; and an inverting unit that invert bits of converted serial data. When the determining unit determines that bit-inverted parallel data is received as subsequent data, the determining unit transmits to the latch unit a signal instructing to prohibit from storing temporarily the received subsequent data and transmits to the inverting unit a signal instructing to invert bits of data.

Abstract: The present invention provide a coating material composition comprising at least fine hollow particles and a matrix-forming material, wherein when the coating material composition is applied and dried to form a coating film having a low refractive index, the matrix-forming material forms a porous matrix.

Abstract: A rotary electric component includes a case for accommodating a rotary body having a cylindrical operation portion and for rotatably supporting the rotary body and a substrate having a rotation detecting means linked to the rotary body at a lower portion of the case. A guide groove whose distance from the center of rotation of the rotary body is continuously changed is formed in a bottom surface of the rotary body. The rotary detecting means of the substrate has a sliding portion fitted to the guide groove of the rotary body to slide according to the rotation of the rotary body, and outputs a signal according to a movement location of the sliding portion.

Abstract: A slider is provided with projections. Each projection is formed with tapered surfaces. A casing is provided with concave portions having the same shape as the projections. During the return of an operating body, the slider ascends while being inclined, and the slider stands upright as the tapered surface of the projection and the tapered surface of the concave portion of the casing slide on each other. Then, each projection is fitted into the corresponding concave portion, thereby positioning the slider.

Abstract: Distributors can verify a signature without acquisition of a certificate for each signer from the certificate authority. A signature part calculates a hash value of distribution information and sets it to a variable h (step S412). Signer private information is taken out from a first signer private information storage part and set to the variable d (step S413). A signature key information selection part takes out signature key information corresponding to a product identifier pid from a signature key information storage part and sets it to the variable t, n (step S414). A signature part calculates a first signature value to the variable h by use of signer private information d and sets it to the variable r1 (step S415). A distribution information generating part calculates a second signature value to the variable h by use of a signature key information t according to the variable h (step S416). A signature value to the final variable h is calculated by use of the results r1 and r2.

Abstract: A waveguide type optical device has an optical waveguide formed on a substrate, functional optical waveguides provided to the optical waveguide, at least one of an optical input end face and an optical output end face for the optical waveguide which are provided to substrate end faces which are ends at longitudinal direction sides of the substrate, and at least one of an input optical waveguide connecting the optical input end face and the functional optical waveguides, and an output optical waveguide connecting the optical output end face and the functional optical waveguides. At least one of the input optical waveguide and the output optical waveguide is formed so as to form angles other than 0 with the functional optical waveguides at the at least one of the optical input end face and the optical output end face, and so as to make angles formed to the substrate end faces at the respective sides different from 90°.