Abstract: A resist underlayer film forming composition for lithography that can be used as a hard mask. The composition can improve pattern resolution due to having a trihalogenoacetamide skeleton. A resist underlayer film forming composition for lithography comprising a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis condensate thereof, or a combination thereof as a silane, wherein the hydrolyzable silane comprises a silane having a halogen-containing carboxylic acid amide group.

Abstract: A lighting device (100A) includes: at least one light-emitting device (10) that emits light; and a light guide plate (20) having a light-receiving end face (20a) that receives light which is emitted from the at least one light-emitting device (10) and an outgoing face (20b) that crosses the light-receiving end face (20a). The lighting device (100A) further includes a substrate (30) of a rectangular ring shape, the substrate having four side portions (30a, 30b, 30c, 30d). The at least one light-emitting device (10) is provided on the substrate (30).

Abstract: A composition for forming a resist underlayer film has excellent storage stability at normal temperature. A composition for forming a resist underlayer film for lithography including a nitrogen-containing compound having 2 to 6 substituents of the following Formula (1) which bond to nitrogen atoms in one molecule, a polymer, a compound that promotes a crosslinking reaction, and an organic solvent. The nitrogen-containing compound having 2 to 6 substituents of Formula (1) in one molecule is for example a glycoluril derivative of the following Formula (1A). In the formula, each R1 is a methyl group or an ethyl group, and R2 and R3 are independently a hydrogen atom, a C1-4 alkyl group, or phenyl group.

Abstract: The present invention provides a lighting device that is excellent in luminance uniformity and light use efficiency and allows for a narrower frame, and a display device including the lighting device. Provided is a lighting device including: a light guide plate; a light source disposed posterior to the light guide plate; a reflection member including a reflective surface facing a light emitting surface of the light source and a light incident surface of the light guide plate, disposed lateral to the light guide plate and the light source, the lighting device further including a reflective polarizing layer on the light incident surface of the light guide plate.

Abstract: The present invention achieves a light-guide plate with less uneven light emission. The light-guide plate includes a front surface and a back surface, which are surfaces different from an end face of light incident surface and face each other. A dot pattern including a main dot and a sub-dot having different shapes from each other is disposed on the back surface.

Abstract: The present invention provides a resist underlayer film-forming composition for lithography for forming a resist underlayer film that can be used as a hard mask with use of hydrolysis-condensation product of a hydrolyzable silane which also absorbs KrF laser. A resist underlayer film-forming composition for lithography comprising, as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof, wherein the hydrolyzable silane includes a hydrolyzable silane of Formula (1): R1aR2bSi(R3)4?(a+b)??Formula (1) [where R1 is an organic group of Formula (2): and is bonded to a silicon atom through a Si?C bond; R3 is an alkoxy group, an acyloxy group, or a halogen group; a is an integer of 1; b is an integer of 0 to 2; and a+b is an integer of 1 to 3], and a ratio of sulfur atoms to silicon atoms is 7% by mole or more in the whole of the silane.

Abstract: A film-forming composition having favorable effects such as curability and embeddability and resist underlayer film for use in lithography process for semiconductor devices.

Abstract: A lighting device (100A) includes: at least one light-emitting device (10) that emits light; and a light guide plate (20) having a light-receiving end face (20a) that receives light which is emitted from the at least one light-emitting device (10) and an outgoing face (20b) that crosses the light-receiving end face (20a). The lighting device (100A) further includes a substrate (30) of a rectangular ring shape, the substrate having four side portions (30a, 30b, 30c, 30d). The at least one light-emitting device (10) is provided on the substrate (30).

Abstract: A resist underlayer film composition for lithography, including: a silane: at least one among a hydrolyzable organosilane, a hydrolysis product thereof, and a hydrolysis-condensation product thereof, wherein the silane includes a silane having a cyclic organic group containing as atoms making up the ring, a carbon atom, a nitrogen atom, and a hetero atom other than a carbon and nitrogen atoms. The hydrolyzable organosilane may be a hydrolyzable organosilane of Formula (1), wherein, at least one group among R1, R2, and R3 is a group wherein a —Si(X)3 group bonds to C1-10 alkylene group, and other group(s) among R1, R2, and R3 is(are) a hydrogen atom, C1-10 alkyl group, or C6-40 aryl group; a cyclic organic group of 5-10 membered ring containing atoms making up the ring, a carbon atom, at least one of nitrogen, sulfur or oxygen atoms; and X is an alkoxy group, acyloxy group, or halogen atom.

Abstract: An additive for a resist underlayer film-forming composition containing a copolymer having structural units of Formulae (1) to (4), and a resist underlayer film-forming composition containing the additive: (where each R1 is independently a hydrogen atom or methyl group, Ar is arylene group, Pr is a protecting group or a hydrogen atom, X is a direct bond or a —C(?O)O—R2— group, R2 constituting the —C(?O)O—R2— group is a C1-3 alkylene group, the alkylene group is bonded to a sulfur atom, R3 is a hydrogen atom, methyl group, methoxy group, or halogeno group, R4 is a C1-3 alkyl group in which at least one hydrogen atom is substituted with a fluoro group, and Z is an organic group having 4 to 7-membered ring lactone skeleton, adamantane skeleton, or norbornane skeleton).

Abstract: Provided is a display device serving as a see-through display which is capable of ensuring the clarity of a displayed image while maintaining high transparency and is less likely to be limited in terms of the location of installation. A dot-printed light-emitting area of a light guiding plate (60) emits, as backlight, light whose intensity is so high that the intensity of ambient light can be negligible, and therefore, the observer on the front side of a liquid crystal display device (10) is able to see a clear image displayed in an image display area (75) of a liquid crystal panel (20). Moreover, ambient light is transmitted through a light-transmissive area (72) of the light guiding plate (60) to be incident on a transparent display area of the liquid crystal panel (20), and therefore, the observer can see a background displayed with high transparency in the transparent display area (76).

Abstract: Provided is a display device serving as a see-through display which is capable of ensuring the clarity of a displayed image while maintaining high transparency and is less likely to be limited in terms of the location of installation. A dot-printed light-emitting area of a light guiding plate (60) emits, as backlight, light whose intensity is so high that the intensity of ambient light can be negligible, and therefore, the observer on the front side of a liquid crystal display device (10) is able to see a clear image displayed in an image display area (75) of a liquid crystal panel (20). Moreover, ambient light is transmitted through a light-transmissive area (72) of the light guiding plate (60) to be incident on a transparent display area of the liquid crystal panel (20), and therefore, the observer can see a background displayed with high transparency in the transparent display area (76).

Abstract: An illuminator (100) includes: a light guide plate (10); and an LED unit (20) disposed near a side face of the light guide plate, the LED unit including a substrate (22) and a plurality of LEDs (24) provided on the substrate. The substrate (22) has a bent or curved shape such that, past the points of bending or curving, a first face (s1) of the substrate and a second face (s2) which is continuous with the first face oppose each other at a distance. The plurality of LEDs include a plurality of first LEDs (24a) provided on the first face of the substrate and a plurality of second LEDs (24b) provided on the second face. The plurality of first LEDs (24a) and the plurality of second LEDs (24b) are disposed in two stories to emit light toward the side face of the light guide plate (10) within a space that is interposed between the first face and the second face of the substrate.

Abstract: A radiation sensitive composition including a siloxane polymer exhibiting phenoplast crosslinking reactivity as a base resin, which is excellent in resolution and can be used as a radiation sensitive composition capable of allowing a pattern having a desired-shape to be formed with sufficient precision. A radiation sensitive composition including as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof; and a photoacid generator, in which the hydrolyzable silane includes hydrolyzable silanes of Formula (1) R1 aR2bSi(R3)4-(a+b) ??Formula (1) wherein R1 is an organic group of Formula (1-2) and is bonded to a silicon atom through a Si—C bond or a Si—O bond, and R3 is a hydrolyzable group; and Formula (2) R7cR8dSi(R9)4-(c+d) ??Formula (2) wherein R7 is an organic group of Formula (2-1) and is bonded to a silicon atom through a Si—C bond or a Si—O bond, and R9 is a hydrolyzable group.

Abstract: Provided are a light source device and a display device with an assembly constitution that can reduce the size of a frame and make the frame less conspicuous. A light source device is constituted such that a front cabinet having a U-shaped cross-section and a front cover are attached as a unit on an outer peripheral part of a backlight unit, and A display device is constituted such that the front cabinet having a U-shaped cross-section and the front cover are attached as a unit on an outer peripheral part of a liquid-crystal unit, a lens cover is attached by joining joining-groove parts to lens fixing claws provided on the front cabinet and the peripheral edge part of the lens cover is held by a pressing piece on the front cover.

Abstract: A resist underlayer film forming composition for lithography that can be used as a hard mask. The composition can improve pattern resolution due to having a trihalogenoacetamide skeleton. A resist underlayer film forming composition for lithography comprising a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis condensate thereof, or a combination thereof as a silane, wherein the hydrolyzable silane comprises a silane having a halogen-containing carboxylic acid amide group.

Abstract: A method of producing a silane compound having a Formula (1) sulfonyl bond includes reacting a Formula (I) chlorosulfonyl compound with sodium sulfite in water as a solvent in the presence of a base, to produce a Formula (II) sulfinic acid sodium salt: and adding an aromatic hydrocarbon solvent to carry out azeotropic dehydration, and adding an aprotic polar solvent and a Formula (III) chloroalkylsilane compound. (wherein R1, R2, R3, R4, and R5 are each independently a substituent selected from a hydrogen atom, halogen atom, alkyl group, alkoxy group, haloalkyl group, haloalkoxy group, cyano group, and nitro group, R2 and R1 or R3 may form —CH?CH—CH?CH —together, R6 and R7 are each independently a C1-5 alkyl group, L is a single bond or saturated or unsaturated divalent C1-19 hydrocarbon group having a linear, branched, cyclic structure, or a combination thereof, and q is an integer of 1 to 3).

Abstract: A resist underlayer film allows an excellent resist pattern shape to be formed when an upper resist layer is exposed to light and developed using an alkaline developing solution or organic solvent; and composition for forming the resist underlayer film. A resist underlayer film-forming composition for lithography, the composition including, as a silane, hydrolyzable silane, hydrolysis product thereof, hydrolysis-condensation product thereof, or combination, wherein the hydrolyzable silane includes hydrolyzable silane of Formula (1): R1aR2bSi(R3)4?(a+b) ??Formula (1) [where R1 is an organic group of Formula (2): —R4—R5—R6 ??Formula (2) (where R4 is optionally substituted C1-10 alkylene group; R5 is a sulfonyl group or sulfonamide group; and R6 is a halogen-containing organic group)]. In Formula (2), R6 may be a fluorine-containing organic group like trifluoromethyl group.

Abstract: A method of producing a silane compound having a Formula (1) sulfonyl bond includes reacting a Formula (I) chlorosulfonyl compound with sodium sulfite in water as a solvent in the presence of a base, to produce a Formula (II) sulfinic acid sodium salt: and adding an aromatic hydrocarbon solvent to carry out azeotropic dehydration, and adding an aprotic polar solvent and a Formula (III) chloroalkylsilane compound. (wherein R1, R2, R3, R4, and R5 are each independently a substituent selected from a hydrogen atom, halogen atom, alkyl group, alkoxy group, haloalkyl group, haloalkoxy group, cyano group, and nitro group, R2 and R1 or R3 may form —CH?CH—CH?CH —together, R6 and R7 are each independently a C1-5 alkyl group, L is a single bond or saturated or unsaturated divalent C1-19 hydrocarbon group having a linear, branched, cyclic structure, or a combination thereof, and q is an integer of 1 to 3.

Abstract: The present invention provides a resist underlayer film-forming composition for lithography for forming a resist underlayer film that can be used as a hard mask with use of hydrolysis-condensation product of a hydrolyzable silane which also absorbs K.& laser. A resist underlayer film-forming composition for lithography comprising, as a silane, a hydrolyzable silane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof, wherein the hydrolyzable silane includes a hydrolyzable silane of Formula (1): R1aR2bSi(R3)4?(a+b) ??Formula (1) [where R1 is an organic group of Formula (2): and is bonded to a silicon atom through a Si?C bond; R3 is an alkoxy group, an acyloxy group, or a halogen group; a is an integer of 1; b is an integer of 0 to 2; and a+b is an integer of 1 to 3], and a ratio of sulfur atoms to silicon atoms is 7% by mole or more in the whole of the silane.