Abstract: A stable etching process is realized at an earlier stage by specifying the combination of wavelength and time interval, which exhibits a minimum prediction error of etching processing result within a short period. For this, the combination of wavelength and time interval is generated from wavelength band of plasma emission generated upon etching of the specimen, the prediction error upon prediction of etching process result is calculated with respect to each combination of wavelength and time interval, the wavelength combination is specified based on the calculated prediction error, the prediction error is further calculated by changing the time interval with respect to the specified wavelength combination, and the combination of wavelength and time interval, which exhibits the minimum value of calculated prediction error is selected as the wavelength and the time interval used for predicting the etching processing process.

Abstract: An abnormality monitoring process milt (2) divides sensor data collected from a monitoring-target apparatus (8) into sensor data for each of a plurality of condition modes based on a condition-mode transition point detected by a condition-mode transition point detecting process unit (21), and sorts the divided sensor data into a plurality of groups. Next, for each condition mode and each group, each piece of sensor data is compared with past statistic data, thereby detecting an abnormality. A causal diagnosis process unit (3) diagnoses an abnormality cause using link models before and after an abnormality is detected built based on a correlation coefficient between two pieces of sensor data in each group.

Abstract: The problem to be solved by the present invention is to provide a substrate for providing early warning of degradation in a semiconductor device. The problem is solved by providing a substrate comprising an actual device comprising a semiconductor component and a solder joint, and a dummy device closely placed to the actual device on the substrate and connected electrically in parallel circuit to the actual device, comprising a dummy semiconductor component and a solder joint comprising an outer solder joint part and an inner solder joint part, wherein the outer solder joint part has same characteristic to the solder joint of the actual device and the inner solder joint part accelerates the crack growth faster than the outer solder joint, and percentage area of outer solder joint part is smaller than the predetermined failure criterion of delamination percentage in actual device corresponding to the threshold value of electrical change.

Abstract: A task-directing system that directs tasks for the purposes of repairing a device and including a storage unit, a processing unit, and an output unit wherein: the storage unit contains a diagnostic-information storage unit and a repair-probability storage unit; the diagnostic-information storage unit stores diagnostic information, said diagnostic information comprising a plurality of levels containing diagnostic tasks and action tasks for the purposes of repair, and the duration or cost of each task; for each action task, the repair-probability storage unit stores a repair probability indicating the probability that the device would be repaired by said action task; the processing unit has a repair-probability update unit and an optimal-task computation unit; on the basis of input diagnostic-task results, the repair-probability update unit updates the repair probabilities stored in the repair-probability storage unit.

Abstract: A stable etching process is realized at an earlier stage by specifying the combination of wavelength and time interval, which exhibits a minimum prediction error of etching processing result within a short period. For this, the combination of wavelength and time interval is generated from wavelength band of plasma emission generated upon etching of the specimen, the prediction error upon prediction of etching process result is calculated with respect to each combination of wavelength and time interval, the wavelength combination is specified based on the calculated prediction error, the prediction error is further calculated by changing the time interval with respect to the specified wavelength combination, and the combination of wavelength and time interval, which exhibits the minimum value of calculated prediction error is selected as the wavelength and the time interval used for predicting the etching processing process.

Abstract: A stable etching process is realized at an earlier stage by specifying the combination of wavelength and time interval, which exhibits a minimum prediction error of etching processing result within a short period. For this, the combination of wavelength and time interval is generated from wavelength band of plasma emission generated upon etching of the specimen, the prediction error upon prediction of etching process result is calculated with respect to each combination of wavelength and time interval, the wavelength combination is specified based on the calculated prediction error, the prediction error is further calculated by changing the time interval with respect to the specified wavelength combination, and the combination of wavelength and time interval, which exhibits the minimum value of calculated prediction error is selected as the wavelength and the time interval used for predicting the etching processing process.

Abstract: A fixing apparatus included in an image forming apparatus includes a fixing heater that performs heat fixing, a control unit that controls the fixing heater based on control patterns, a temperature sensor that detects temperature of the fixing heater, and a voltage detection unit that detects a voltage that is applied to the fixing heater. In each control pattern, turn-on period of the fixing heater and turn-off period of the fixing heater are set according to a control cycle of a half cycle duty control. The control unit controls the switching unit to turn on or off the fixing heater using a combination of the control patterns each satisfying a standard for preventing a flicker during each control period of time that is integral multiplication of the control cycle according to the temperature of the fixing heater and the voltage value allied to the fixing heater.

Abstract: When changing the turn-on/off patterns, a controller of a fixing device sets a control interval of the turn-on/off pattern so as to be longer than a first period of time that does not exert any influence to a flicker value and to be shorter than a second period of time that does not exert any influence to a response to temperature control. The controller of the fixing device selects a third turn-on/off pattern in which power difference between power of a first turn-on/off pattern before the change in the turn-on/off pattern and power of a second turn-on/off pattern after the change in the turn-on/off pattern is smaller than a set reference power difference.

Abstract: An image forming apparatus is provided with a fixing unit in which flickers can be effectively reduced while inhibiting electric current imbalance. The fixing unit comprises a fixing heater, a switching unit for switching the fixing heater on/off with an AC power source, and a control unit which controls the switching unit to switch in units of the half wave period of the AC power source AC, and a storing unit for storing a plurality of energization patterns which define the ways of performing the switch control. Each energization pattern corresponds to a control cycle which contains a three or more odd number of the half wave periods each of which is either an OFF period and an ON period, and all the half wave periods of the smaller in number of the ON periods and the OFF periods are not successively arranged.

Abstract: A medium stores computer-executable programs. The programs cause an information processing apparatus including a communication unit communicable with a scanner to perform: displaying a first window including a first icon which causes the scanner to execute a scanning process; judging whether a selection operation to the first icon is performed; transmitting a scan command to the scanner in a case that the information processing apparatus judges that the selection operation to the first icon is performed; receiving scan data from the scanner via the communication unit as a response to the scan instruction; and displaying a second window, on a display unit, which displays an image based on the scan data received from the scanner.

Abstract: A non-transitory computer-readable medium stores computer-executable programs. The programs cause an information processing apparatus provided with a display unit having a display surface and an operation unit configured to output a signal depending on user operations to perform: displaying a target image which is an image to be selected in a first area of the display surface; specifying a selected area corresponding to a part of the target image or a whole of the target image, based on the signal outputted from the operation unit depending on the user operation with respect to the target image; and displaying a selected-area image which is an image corresponding to the selected area that has been specified, in a second area which is different from the first area, with a size same as a size of the selected area that has been specified.

Abstract: A fixing apparatus included in an image forming apparatus includes a fixing heater that performs heat fixing, a control unit that controls the fixing heater based on control patterns, a temperature sensor that detects temperature of the fixing heater, and a voltage detection unit that detects a voltage that is applied to the fixing heater. In each control pattern, turn-on period of the fixing heater and turn-off period of the fixing heater are set according to a control cycle of a half cycle duty control. The control unit controls the switching unit to turn on or off the fixing heater using a combination of the control patterns each satisfying a standard for preventing a flicker during each control period of time that is integral multiplication of the control cycle according to the temperature of the fixing heater and the voltage value allied to the fixing heater.

Abstract: An electric vehicle includes a main battery, a motor generating drive power of the vehicle by supply of electric power from the main battery, an output control circuit for the motor, a charging connector for supplying electric power from an external to the main battery, and a meter display device. The meter display device includes a display section including at least a vehicle speed displaying portion and a charging connector condition displaying portion displaying information related to the condition of the charging connector. The charging connector condition displaying portion displays information on maintenance of the charging connector and is disposed adjacent the vehicle speed displaying portion. A main battery residual displaying portion and a sub battery residual displaying portion are disposed around the vehicle speed displaying portion.

Abstract: In a maintenance-part replacement timing interval management system 100, a machine working time information collection unit 107, a maintenance-part supply history information collection unit 109, a machine-basis demand forecast unit 102, an area-basis demand forecast unit 103, a demand-supply gap calculation unit 104, a replacement timing interval update unit 105, etc.

Abstract: Among the multiple OES data wavelengths, an analysis device identifies the wavelength of light emissions from a substance contained in the plasma from among multiple light emission wavelengths within the chamber by way of the steps of: measuring the light emission within the chamber during etching processing of the semiconductor wafer; finding the time-based fluctuation due to changes over time on each wavelength in the measured intensity of the light emissions in the chamber; comparing the time-based fluctuations in the wavelength of the light emitted from the pre-specified substance; and by using the comparison results, identifying the wavelength of the light emitted from the substance caused by light emission within the chamber.

Abstract: A throttle control apparatus is configured to be capable of easy assembly. The throttle control apparatus also includes a rotor and an intermediate casing, which surrounds a portion of the rotor. The intermediate casing also houses a position sensor for detecting a rotational angle of the rotor. The rotor and the intermediate casing are both encased in an outer housing, which is configured and adapted to be mounted on a motorcycle handlebar. A return spring, for returning the rotor to an original position, has one end engaged with a first retaining pin on the rotor, and the other end of the return spring is engaged with a second retaining pin on the intermediate casing.

Abstract: An image forming apparatus receives setting of an object to be adjusted, on an adjustment object selection screen when selecting an adjustment mode. After the object to be adjusted is set, camera(s) photograph(s) the object to be adjusted so that the image forming apparatus obtains photographed data of current object to be adjusted. Next, the apparatus searches photographed data of the object to be adjusted in the ideal state thereof from the database. Name of the object to be adjusted and related information in the photographed data agree with those of the photographed data of current object to be adjusted. The higher ranked related information is preferentially searched and it is determined whether or not pieces of the higher ranked related information thus preferentially searched agree with each other.

Abstract: A sheet of paper is set on a paper-supplying portion of a top surface gloss processing apparatus while its top surface is faced upward. A gloss level sensor measures gloss level of the top surface of the sheet of paper. Data of this measurement is compared with a previously set threshold value. Based on this comparison, it is determined whether or not the gloss processing has been performed on the top surface thereof. When determining that the gloss processing has been already performed, a warning message such that the gloss processing has been already performed on the top surface of the sheet, of paper is displayed on a screen. On the other hand, when determining that the gloss processing has not performed, the top surface gloss processing apparatus performs the gloss processing on the top surface thereof.

Abstract: There is provided a method of analyzing data obtained from an etching apparatus for micromachining a wafer using plasma. This method includes the following steps: acquiring the plasma light-emission data indicating light-emission intensities at a plurality of different wavelengths and times, the plasma light-emission data being measured under a plurality of different etching processing conditions, and being obtained at the time of the etching processing, evaluating the relationship between changes in the etching processing conditions and changes in the light-emission intensities at the plurality of different wavelengths and times with respect to the wavelengths and times of the plasma light-emission data, and identifying the wavelength and the time of the plasma light-emission data based on the evaluation result, the wavelength and the time being to be used for the adjustment of the etching processing condition.

Abstract: A technology is provided to enable lowering the fault generation rate related to a parts installation device. A parts installation device (100) (calculation device (150)) fetches or calculates state parameter values that represent the relative position relationship or the distance of a part holder and a part during the operation of removing and holding, calculates the fluctuation values of the state parameters, and corrects parameters having a small increase in the cycle time and is effective in reducing fluctuations among the parameter values of the holding position of the part holder, stop time, operating speed, and operation acceleration when the value of the fluctuations exceeds a first threshold.