Abstract: A Toolbox and Instrument software design and runtime system which simulates real-world Tools by providing Instruments for the Tools' configuration, control, and state monitoring before, during, and after runtime. A Tool is a software function which may be used to modify an existing object or to create a new object. Tools with related functionality are grouped by their containment within appropriately named, static classes, or object references, their grouping which represents a Toolbox. Each Tool accepts one or more input (operand) objects to be changed or zero operands if a new object will be created, and each Tool also a Configuration Instrument, a State monitoring instrument, and optional Control Instrument. Alternatively, the Control and State Instrument's functionality can be consolidated into a single Instrument, or the Control and Configuration Instrument's functionality can be consolidated into a single Instrument.

Abstract: A refinish coating composition is provided comprising: a) at least one refinish coating resin; b) at least one solvent; c) at least one pigment; d) optionally, at least one crosslinking agent; e) at least one cellulose mixed ester having a weight average molecular weight (Mw) greater than 10,000 and f) at least one low molecular weight cellulose mixed ester. In addition, processes for coating the refinish coating composition on a substrate are also provided.

Abstract: The process of producing a dual damascene structure used for the interconnect architecture of semiconductor chips. More specifically the use of imprint lithography to fabricate dual damascene structures in a dielectric and the fabrication of dual damascene structured molds.

Abstract: The process of producing a dual damascene structure used for the interconnect architecture of semiconductor chips. More specifically the use of imprint lithography to fabricate dual damascene structures in a dielectric and the fabrication of dual damascene structured molds.

Abstract: An absorbent structure made at least in part from a superabsorbent material having a retention capacity (CRC) as determined by a Centrifuge Retention Capacity Test of at least about 25 g/g and a free swell gel bed permeability (GBP) as determined by a Free Swell Gel Bed Permeability Test of at least 575×10?9 cm2. In another embodiment, the absorbent structure is made at least in part from a superabsorbent material having a retention capacity (CRC) as determined by a Centrifuge Retention Capacity Test of at least about 25 g/g, an absorbency under load (AUL) at 0.9 psi as determined by an Absorbency Under Load Test of at least 18 and a free swell gel bed permeability (GBP) as determined by a Free Swell Gel Bed Permeability Test of at least about 350×10?9 cm2.

Abstract: A basecoat composition is provided comprising: a) at least one film-forming polymer selected from the group consisting of acrylic polyols and polyester polyols; b) at least one rheological modifier; c) at least one solvent; d) at least one pigment; e) optionally, at least one microgel; f) optionally, at least one crosslinking agent; and g) at least one cellulose mixed ester. A wet-on-wet-on wet process is also provided. The process for coating a substrate comprises: a) applying a primer to said substrate to produce a primed substrate; b) applying a basecoat composition to said primed substrate while said primer is wet to produce a basecoated substrate; and c) applying a clearcoat composition to said basecoated substrate while said basecoat composition is wet and optionally said primer is wet to produce a coated substrate. Coated articles are also provided.

Abstract: Cellulose mixed esters are disclosed having low molecular weights and low degrees of polymerization. These new cellulose mixed esters include cellulose acetate propionate and cellulose acetate butyrate. The esters exhibit solubility in a wide range of organic solvents with minimal viscosity increase, are compatible with a wide variety of resins, and are useful in coatings and inks compositions as binder resins and rheology modifiers.

Abstract: Disclosed is a method comprising disposing a functionalized patternable material on a substrate, wherein the functionalized patternable material comprises a first click chemical moiety; patterning the functionalized patternable material; and reacting the first click chemical moiety with a complementary reactant to form an functionalized patterned surface, the complementary reactant comprising a second click chemical moiety that reacts with the first click chemical moiety; the complementary reactant comprising an functional group.

Abstract: Cellulose mixed esters are disclosed having low molecular weights and low degrees of polymerization. These new cellulose mixed esters include cellulose acetate propionate and cellulose acetate butyrate. The esters exhibit solubility in a wide range of organic solvents with minimal viscosity increase, are compatible with a wide variety of resins, and are useful in coatings and inks compositions as binder resins and rheology modifiers.

Abstract: A recyclable blister pack system is provided, including a substrate having a dry tack cohesive adhesive layer deposited on one of its surfaces and a blister layer for receiving a product. The properties of the dry tack cohesive are selected so the blister layer is separable from the substrate without leaving substantial substrate residue on the blister layer. This improves the recyclability of the blister layer.

Abstract: The process of producing a dual damascene structure used for the interconnect architecture of semiconductor chips. More specifically the use of imprint lithography to fabricate dual damascene structures in a dielectric and the fabrication of dual damascene structured molds.

Abstract: A method of forming a patterned functional layer on a substrate using a poly(hydroxyethyl methacrylate) lift-off layer is described. The method can be used with substrates that would not tolerate the organic solvents required for processing of known poly(methyl methacrylate) lift-off layers. When used in combination with known nanoimprint lithography and step-and-flash imprint lithography techniques, the method can be used to generate patterned functional structures with dimensions as small as five nanometers.

Abstract: The process of producing a dual damascene structure used for the interconnect architecture of semiconductor chips. More specifically the use of imprint lithography to fabricate dual damascene structures in a dielectric and the fabrication of dual damascene structured molds.

Abstract: The process of producing a dual damascene structure used for the interconnect architecture of semiconductor chips. More specifically the use of imprint lithography to fabricate dual damascene structures in a dielectric and the fabrication of dual damascene structured molds.

Abstract: A high concentration, aqueous liquid surfactant composition is disclosed, comprising at least one amphoteric and/or anionic surfactant and a liquid-stabilizing amount of at least one liquid-stabilizing agent. The liquid-stabilizing agent is a succinic acid derivative, glutaric acid derivative or a combination thereof. The composition is pourable and pumpable at ambient room temperature.

Abstract: A system for loading, unloading and carrying a boat, upright with motor, on a vehicle includes a raised carrying rack positioned at an incline above the vehicle and a loading arm extending rearwardly from the back of the vehicle and supported in cantilever fashion by cables. A winch, cable and pulley system pulls the boat out of the water, onto the loading arm, up onto rollers at the rear of the carrying rack, and to the forward end of the carrying rack where it is secured. The loading arm may be folded upright after the boat is loaded on the carrying rack.

Abstract: The process of producing a dual damascene structure used for the interconnect architecture of semiconductor chips. More specifically the use of imprint lithography to fabricate dual damascene structures in a dielectric and the fabrication of dual damascene structured molds.

Abstract: A method of synthesizing a poly(9,9-disubstituted-fluorene) includes reacting a 9,9-disubstituted-fluorene with an alkyl lithium in the presence of a catalytic amount of a nickel amine complex. The 9,9-disubstituted-fluorene includes solubility-enhancing substituents in the 9-position and leaving groups in the 2-position and the 7-position. The product poly(9,9-disubstituted-fluorene)s are fluorescent conjugated polymers that are useful as, for example, blue light-emitting materials.

Abstract: A closed loop continuous emulsion polymerization apparatus at least comprising a circulation pump, a reactor tube which connects the outlet of the circulation pump to its inlet, at least one feed for supplying raw materials, an outlet, and means for cooling the tube, characterized in that the reactor further comprises an additional tube for by-passing a pig around the circulation pump, a pig receiving station which is in parallel connection with the circulation pump or the reactor tube, and optionally means for directing a pig into the pig receiving station. The invention allows simple removal of the pig from the reactor, afforts great freedom in selecting the type of circulation pump and material and shape of the pig, and enables total control over the launching of the pig substantially independent of the reaction medium flow.

Abstract: A high concentration, aqueous liquid surfactant composition is disclosed, comprising at least one amphoteric or anionic surfactant and a liquid-stabilizing amount of at least one liquid-stabilizing agent. The liquid-stabilizing agent is a succinic acid derivative, glutaric acid derivative or a combination thereof. The composition is pourable and pumpable at ambient room temperature.