Patents by Inventor Kevin Shaw
Kevin Shaw has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7098571Abstract: A method and apparatus are described that may be used to provide decoupled rotation of structures about different pivot points. The apparatus may include one or more fixed blades mounted to a frame or substrate, one or more movable blades mounted to each structure to be moved, and flexures on which the structures are suspended. Separate movable blades may be provided for each degree of freedom. When voltage is applied between the fixed and movable blades, the electrostatic attraction generates a force attracting movable blades toward blades that are fixed relative to the moveable blades, causing a structure to rotate about the flexures. The angle of rotation that results may be related to the size, number and spacing of the blades, the stiffness of the flexures and the magnitude of the voltage difference applied to the blades. The blades are fabricated using deep silicon etching.Type: GrantFiled: January 27, 2004Date of Patent: August 29, 2006Assignee: Calient Networks, Inc.Inventors: Scott Adams, Tim Davis, Scott Miller, Kevin Shaw, John Matthew Chong, Seung (Chris) Bok Lee
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Patent number: 6985929Abstract: A distributed object-oriented geospatial database system and method thereof over the Internet using Web-based technology to perform data-driven queries, such as retrieving, viewing and updating, geospatial data of the object oriented geospatial database, such as vector, raster, hypertext and multimedia data, including data types or formats of ESRI shape files, GSF, oceanographic ASCII text data by NAVOCEANO and geospatial data with temporal information and supporting 3D display of the geospatial data. The object-oriented geospatial database system is implemented in a heterogeneous object-oriented development and integration environment through the Common Object Request Broker Architecture (CORBA).Type: GrantFiled: August 31, 2000Date of Patent: January 10, 2006Assignee: The United States of America as represented by the Secretary of the NavyInventors: Ruth Wilson, Miyi Chung, Maria Cobb, Kevin Shaw, Roy Ladner
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Patent number: 6969470Abstract: Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as “latent masking”, defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as “simultaneous multi-level etching (SMILE)”, provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as “delayed LOCOS”, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes.Type: GrantFiled: October 23, 2003Date of Patent: November 29, 2005Assignee: Kionix, Inc.Inventors: James E. Moon, Timothy J. Davis, Gregory J. Galvin, Kevin A. Shaw, Paul C. Waldrop, Sharlene A. Wilson
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Publication number: 20050222384Abstract: The present invention relates to a peptide derivative represented by the general formula (I) or a salt thereof: Z-(CH2)n—CO—NH-Leu-Ile-Gly-AA1-AA2-CO—R (I) wherein Z represents an aryl group which may or may not have a substituent or a heteroaryl group which may or may not have a substituent; n represents 0, 1 or 2: AA1-AA2 represents Lys-Val or Arg-Leu; and R represents —OH or —NH2, and relates to a pharmaceutical composition comprising a peptide derivative represented by the general formula (I) or a salt thereof, and a pharmaceutically acceptable carrier thereof.Type: ApplicationFiled: June 10, 2003Publication date: October 6, 2005Inventors: Robert Ramage, Robin Plevin, Kevin Shaw, Lu Jiang, Louise Young, Alan Harvey, Pu Wang, Toru Kanke, Junichi Kawagoe, Mototsugu Kabeya
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Patent number: 6913701Abstract: Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as “latent masking”, defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as “simultaneous multi-level etching (SMILE)”, provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as “delayed LOCOS”, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes.Type: GrantFiled: October 16, 2003Date of Patent: July 5, 2005Assignee: Kionix, Inc.Inventors: James E. Moon, Timothy J. Davis, Gregory J. Galvin, Kevin A. Shaw, Paul C. Waldrop, Sharlene A. Wilson
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Publication number: 20050091223Abstract: An object-oriented system for building and maintaining a spatial data structure for use in topological applications. The data is organized in a database which incorporates spatial feature location, attributes, and metadata information in a relational framework across a hierarchy. The system provides for the instantiation of the objects and levels that make up the database and for spatially indexing the data among the objects across hierarchical levels. The data can be updated while preserving the spatial linking among objects and levels, and the data can be exported to a relational vector product format database.Type: ApplicationFiled: September 10, 2003Publication date: April 28, 2005Inventors: Kevin Shaw, Miyi Chung, Maria Cobb
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Publication number: 20040246306Abstract: A method and apparatus are described that may be used to provide decoupled rotation of structures about different pivot points. The apparatus may include one or more fixed blades mounted to a frame or substrate, one or more movable blades mounted to each structure to be moved, and flexures on which the structures are suspended. Separate movable blades may be provided for each degree of freedom. When voltage is applied between the fixed and movable blades, the electrostatic attraction generates a force attracting movable blades toward blades that are fixed relative to the moveable blades, causing a structure to rotate about the flexures. The angle of rotation that results may be related to the size, number and spacing of the blades, the stiffness of the flexures and the magnitude of the voltage difference applied to the blades. The blades are fabricated using deep silicon etching.Type: ApplicationFiled: January 27, 2004Publication date: December 9, 2004Inventors: Scott Adams, Tim Davis, Scott Miller, Kevin Shaw, John Matthew Chong, Seung Bok (Chris) Lee
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Publication number: 20040245890Abstract: A method and apparatus are described that may be used to provide decoupled rotation of structures about different pivot points. The apparatus may include one or more fixed blades mounted to a frame or substrate, one or more movable blades mounted to each structure to be moved, and flexures on which the structures are suspended. Separate movable blades may be provided for each degree of freedom. When voltage is applied between the fixed and movable blades, the electrostatic attraction generates a force attracting movable blades toward blades that are fixed relative to the moveable blades, causing a structure to rotate about the flexures. The angle of rotation that results may be related to the size, number and spacing of the blades, the stiffness of the flexures and the magnitude of the voltage difference applied to the blades. The blades are fabricated using deep silicon etching.Type: ApplicationFiled: January 27, 2004Publication date: December 9, 2004Inventors: Scott Adams, Tim Davis, Scott Miller, Kevin Shaw, John Matthew Chong, Seung Bok Lee
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Patent number: 6824697Abstract: Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as “latent masking”, defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as “simultaneous multi-level etching (SMILE)”, provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as “delayed LOCOS”, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes.Type: GrantFiled: November 2, 2001Date of Patent: November 30, 2004Assignee: Kionix, Inc.Inventors: James E. Moon, Timothy J. Davis, Gregory J. Galvin, Kevin A. Shaw, Paul C. Waldrop, Sharlene A. Wilson
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Patent number: 6780336Abstract: Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as “latent masking”, defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as “simultaneous multi-level etching (SMILE)”, provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as “delayed LOCOS”, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes.Type: GrantFiled: November 2, 2001Date of Patent: August 24, 2004Inventors: James E. Moon, Timothy J. Davis, Gregory J. Galvin, Kevin A. Shaw, Paul C. Waldrop, Sharlene A. Wilson
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Patent number: 6753638Abstract: A method and apparatus are described that may be used to provide decoupled rotation of structures about different pivot points. The apparatus may include one or more fixed blades mounted to a frame or substrate, one or more movable blades mounted to each structure to be moved, and flexures on which the structures are suspended. Separate movable blades may be provided for each degree of freedom. When voltage is applied between the fixed and movable blades, the electrostatic attraction generates a force attracting movable blades toward blades that are fixed relative to the moveable blades, causing a structure to rotate about the flexures. The angle of rotation that results may be related to the size, number and spacing of the blades, the stiffness of the flexures and the magnitude of the voltage difference applied to the blades. The blades are fabricated using deep silicon etching.Type: GrantFiled: February 2, 2001Date of Patent: June 22, 2004Assignee: Calient Networks, Inc.Inventors: Scott Adams, Tim Davis, Scott Miller, Kevin Shaw, John Matthew Chong, Seung Bok (Chris) Lee
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Publication number: 20040082088Abstract: Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as “latent masking”, defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as “simultaneous multi-level etching (SMILE)”, provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as “delayed LOCOS”, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes.Type: ApplicationFiled: October 23, 2003Publication date: April 29, 2004Applicant: Kionix, Inc.Inventors: James E. Moon, Timothy J. Davis, Gregory J. Galvin, Kevin A. Shaw, Paul C. Waldrop, Sharlene A. Wilson
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Publication number: 20040079723Abstract: Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as “latent masking”, defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as “simultaneous multi-level etching (SMILE)”, provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as “delayed LOCOS”, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes.Type: ApplicationFiled: October 16, 2003Publication date: April 29, 2004Inventors: James E. Moon, Timothy J. Davis, Gregory J. Galvin, Kevin A. Shaw, Paul C. Waldrop, Sharlene A. Wilson
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Patent number: 6706200Abstract: Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as “latent masking”, defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as “simultaneous multi-level etching (SMILE)”, provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as “delayed LOCOS”, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes.Type: GrantFiled: November 2, 2001Date of Patent: March 16, 2004Assignee: Kionix, Inc.Inventors: James E. Moon, Timothy J. Davis, Gregory J. Galvin, Kevin A. Shaw, Paul C. Waldrop, Sharlene A. Wilson
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Patent number: 6702950Abstract: Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as “latent masking”, defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as “simultaneous multi-level etching (SMILE)”, provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as “delayed LOCOS”, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes.Type: GrantFiled: November 2, 2001Date of Patent: March 9, 2004Inventors: James E. Moon, Timothy J. Davis, Gregory J. Galvin, Kevin A. Shaw, Paul C. Waldrop, Sharlene A. Wilson
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Patent number: 6673253Abstract: Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as “latent masking”, defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as “simultaneous multi-level etching (SMILE)”, provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as “delayed LOCOS”, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes.Type: GrantFiled: November 2, 2001Date of Patent: January 6, 2004Assignee: Kionix, Inc.Inventors: James E. Moon, Timothy J. Davis, Gregory J. Galvin, Kevin A. Shaw, Paul C. Waldrop, Sharlene A. Wilson
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Patent number: 6601894Abstract: A mobile chiropractic vehicle comprising a rectangular enclosure have two opposed end walls, two opposed lateral walls, a ceiling and a floor defining an interior area; at least one axle having a pair of wheels, each on opposite ends of the axle, the at least one axle being secured transversely to the rectangular enclosure adjacent the floor to enable movement of the rectangular enclosure; a first arrangement associated with one of the two opposed end walls to transport the rectangular enclosure to selected locations; a second arrangement associated with the other of the two opposed end walls to provide handicapped access to the rectangular enclosure; and a retractable arrangement disposed between the two opposed lateral walls in a spaced relationship with the two opposed end walls to divide the interior area into a patient waiting area adjacent the second arrangement and an examining, diagnostic and adjusting area adjacent the one of the two opposed end walls when the retractable arrangement is closed and aType: GrantFiled: March 22, 2001Date of Patent: August 5, 2003Inventor: Kevin Shaw
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Publication number: 20030019838Abstract: Packaging of micromechanical and microelectromechanical devices is carried out by mechanical couplers for connecting pairs or arrays of optical fibers in end-to-end alignment. In another embodiment, a coupler interconnects one or more optical components on a substrate. The electrical components may be active elements such as light sources or light sensors, while the optical components may be waveguides. The fibers are secured in a coupler block, and a substrate carrying the light detector or light source is mounted on or in the block and is secured in alignment with the fibers. The fibers are removably secured within the block by spring fingers.Type: ApplicationFiled: August 8, 2002Publication date: January 30, 2003Inventors: Kevin A. Shaw, James S. Sutherland
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Patent number: 6464892Abstract: Three fundamental and three derived aspects of the present invention are disclosed. The three fundamental aspects each disclose a process sequence that may be integrated in a full process. The first aspect, designated as “latent masking”, defines a mask in a persistent material like silicon oxide that is held abeyant after definition while intervening processing operations are performed. The latent oxide pattern is then used to mask an etch. The second aspect, designated as “simultaneous multi-level etching (SMILE)”, provides a process sequence wherein a first pattern may be given an advanced start relative to a second pattern in etching into an underlying material, such that the first pattern may be etched deeper, shallower, or to the same depth as the second pattern. The third aspect, designated as “delayed LOCOS”, provides a means of defining a contact hole pattern at one stage of a process, then using the defined pattern at a later stage to open the contact holes.Type: GrantFiled: November 2, 2001Date of Patent: October 15, 2002Inventors: James E. Moon, Timothy J. Davis, Gregory J. Galvin, Kevin A. Shaw, Paul C. Waldrop, Sharlene A. Wilson
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Publication number: 20020135193Abstract: A mobile chiropractic vehicle comprising a rectangular enclosure have two opposed end walls, two opposed lateral walls, a ceiling and a floor defining an interior area; at least one axle having a pair of wheels, each on opposite ends of the axle, the at least one axle being secured transversely to the rectangular enclosure adjacent the floor to enable movement of the rectangular enclosure; a first arrangement associated with one of the two opposed end walls to transport the rectangular enclosure to selected locations; a second arrangement associated with the other of the two opposed end walls to provide handicapped access to the rectangular enclosure, and a retractable arrangement disposed between the two opposed lateral walls in a spaced relationship with the two opposed end walls to divide the interior area into a patient waiting area adjacent the second arrangement and an examining, diagnostic and adjusting area adjacent the one of the two opposed end walls when the retractable arrangement is closed and aType: ApplicationFiled: March 22, 2001Publication date: September 26, 2002Inventor: Kevin Shaw