Abstract: An apparatus includes a plurality of projection optical systems, each including optical elements arranged in an optical path between a first plane and a second plane and forming a radiation pattern from the first plane onto an exposure field on the second plane via the optical elements. A movable portion is disposed in the side of the second plane with respect to the projection optical systems, which holds an object to be moved relative to the exposure field in a first direction in the second plane during scanning exposure of the object in which the radiation patterns are formed on the object as the object is moved in the first direction. The projection optical systems may include an adjustable wedge prism. The projection optical systems may include first and second optical units, optical axes of the first and second optical units being decentered from each other.

Abstract: An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

Abstract: An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

Abstract: An optical device includes a transparent material layer having a desired curved surface configuration, a layer including a variable refractive index material having a dielectric constant anisotropy, at least two transparent electrodes arranged to sandwich the transparent material layer and the variable refractive index material, and a driving device supplying a voltage including driving frequencies f1 and f2 between the transparent electrodes. The difference ?? in the dielectric constant of the variable refractive index material due to the anisotropy is positive at one of the driving frequencies and negative at the other driving frequency.

Abstract: An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

Abstract: A pair of upper die and lower die having forming surfaces corresponding to optical glass elements are prepared. A locating member having a plurality of locating holes for locating preforms is arranged on the lower die. A plurality of preforms are supplied to the locating holes, respectively, and the preforms are hot-press-molded between the paired upper die and lower die. According to this method, since a plurality of optical glass elements can be formed simultaneously, the high-precision optical glass elements can be manufactured at low cost.

Abstract: An optical device includes a transparent material layer having a desired curved surface configuration, a layer including a variable refractive index material having a dielectric constant anisotropy, at least two transparent electrodes arranged to sandwich the transparent material layer and the variable refractive index material, and a driving device supplying a voltage including driving frequencies f1 and f2 between the transparent electrodes. The difference ?? in the dielectric constant of the variable refractive index material due to the anisotropy is positive at one of the driving frequencies and negative at the other driving frequency.

Abstract: Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g.

Abstract: A decomposition apparatus that decomposes a decomposition target is provided. The decomposition apparatus includes a decomposition chamber having a decomposition section that continuously decomposes the decomposition target, an introducing device that continuously introduces the decomposition target into the decomposition chamber, a discharging device that discharges decomposition products produced in the decomposition chamber, and a selection section that selects a set of drive conditions from a plurality of sets of conditions for the decomposition section such that the concentration of the decomposition target within the decomposition chamber during decomposition of the decomposition target is at the predetermined concentration.

Abstract: A method for decomposing a gaseous aliphatic hydrocarbon halide compound more simply is provided. The method includes the steps of mixing the gaseous aliphatic hydrocarbon halide compound and a chlorine gas-containing gas and emitting light to a mixture gas of the gaseous aliphatic hydrocarbon halide compound and the chlorine gas.

Abstract: There is provided a method of treating a substance to be degraded comprising the steps of: degrading the substance to produce a degraded product; contacting the product obtained in the degrading step with a liquid; and entrapping a component of the product not trapped by the liquid in a medium by contacting the component with the medium. Also, the apparatus for conducting the method is provided.

Abstract: A decomposition apparatus and a decomposition method using the apparatus in which a substance to be decomposed is decomposed with high efficiency are disclosed. A decomposition apparatus includes condensation means for increasing the concentration of the substance, and decomposition means provided with a decomposition chamber (predetermined space) for receiving and decomposing the substance. The substance of which concentration is increased by the condensation means, in a gaseous state, is directly transported to the decomposition chamber and is decomposed.

Abstract: An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

Abstract: A polluted soil remediation apparatus comprising a treatment tank in which pollutants degradable with light irradiation in the presence of chlorine is extracted as a gas containing the pollutants from polluted soil and a mixture of the gas containing the pollutants and chlorine-containing air is irradiated with light to degrade the pollutants, wherein the apparatus comprises a unit for aspirating the gas containing the pollutants from the polluted soil, a chlorine-containing air generation unit for generating the chlorine-containing gas, a mixing unit for mixing the gas containing the pollutants extracted by the aspiration unit and the chorine-containing air generated by the chlorine-containing gas generation unit to form a mixed gas, the treatment tank comprising a treatment region where the mixed gas is introduced and a light irradiation unit for irradiating the treatment region with light to degrade the pollutants contained in the mixed gas, and an exhaust unit for exhausting the degradation-treated gas fr

Abstract: Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g.

Abstract: A decomposition apparatus for decomposition of decomposition targets such as organic chlorinated compounds is provided. The decomposition apparatus includes a contact section with an internal space to allow a decomposition target to come into contact with and be taken into a liquid, a flow path to lead along with the liquid the decomposition target taken into the liquid to a position different from the internal space, a decomposing device positioned along the flow path in a state cut off from the outside air to decompose the decomposition target that has been led through the flow path, and a device to introduce to the contact section a liquid that contains products produced from the decomposition of the decomposition target by the decomposing device.

Abstract: Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g.

Abstract: A scanning projection exposure apparatus transfers a pattern of a mask onto a photosensitive substrate while moving the photosensitive substrate along a scanning direction. The scanning projection exposure apparatus can include an illumination optical system optically connected to a light source, and a projection optical system arranged in an optical path between the mask and the substrate. The illumination optical system illuminates the mask with linearly polarized light whose polarization direction extends along one of the scanning direction and a direction perpendicular to the scanning direction, without losses in quantity of light. The illumination optical system of the scanning projection exposure apparatus also can include a wave plate which is rotatable about a traveling direction of the light.

Abstract: A method for processing substances to be degraded is provided. The method includes a decomposing step in which a mixed gas containing chlorine and the substances to be degraded is irradiated with light to decompose the substances to be degraded, a contact step in which gas generated through the decomposing step is contacted with an alkaline solution to trap chlorine contained in the gas generated through the decomposing step in the alkaline solution, and a reusing step in which the alkaline solution containing the chlorine as a source of generating the chlorine is used again in the decomposing step.

Abstract: The present invention enables efficient decomposition without involving burdensome operations of carrying out decomposition of undecomposed pollutants discharged at the time of starting decomposition processing and undecomposed pollutants remaining at the time of interruption and termination of decomposition processing, separately from primary decomposition. At the time of starting decomposition, the steps of supplying a substance, which functions to decompose the pollutant, to a decomposition area, applying light to the decomposition area and supplying a decomposition target substance to the reaction area are carried out in the recited order, while at the time of ending decomposition, the operations of supplying the decomposition target substance, applying light to the decomposition area and supplying the substance, which functions to decompose the pollutant to the decomposition area are carried out in the recited order.