Patents by Inventor Kinya Kato

Kinya Kato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6096530
    Abstract: A biologically pure culture of Pseudomonas cepacia strain KK01 (FERM BP-4235) is capable of degrading trichloroethylene. A method for obtaining microorganisms having a trichloroethylene degrading ability comprises the steps of culturing microorganisms separated from the bodies of termites in a culture medium. A method for remediating a soil contaminated with trichloroethylene comprises the steps of providing a soil contaminated with trichloroethylene and bringing microorganisms having a trichloroethylene degrading ability derived from intestine of termites into contact with the soil, and biodegrading trichloroethylene in the soil.
    Type: Grant
    Filed: March 3, 1997
    Date of Patent: August 1, 2000
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kinya Kato, Shinya Kozaki, Takeshi Imamura, Masanori Sakuranaga
  • Patent number: 6049372
    Abstract: Apparatus and methods are disclosed for transferring a pattern defined by a mask onto a surface of a substrate. The apparatus includes an illumination optical system for illuminating the pattern on the mask. A projection optical system forms an erect image of the pattern on the substrate. For exposure, the mask and substrate are movable together in a scanning direction relative to the projection optical system. First and second relative-displacement measuring systems, the first being separated from the second by a predetermined distance perpendicular to the scanning direction, measure displacement of the mask relative to the substrate in the scanning direction. First and second detection systems detect displacement of the mask and substrate, respectively, in the direction perpendicular to the scanning direction. A position-adjusting system adjusts the position of at least one of the mask and substrate.
    Type: Grant
    Filed: June 23, 1997
    Date of Patent: April 11, 2000
    Assignee: Nikon Corporation
    Inventors: Kinya Kato, Hiroshi Shirasu, Yukio Kakizaki, Kei Nara
  • Patent number: 5993658
    Abstract: There are here provided a method for biodegrading trichloroethylene which comprises the step of bringing an aqueous medium containing trichloroethylene into contact with microorganisms having a trichloroethylene degrading ability derived from intestines of termites to degrade trichloroethylene; a method for obtaining the microorganisms; a method for remediating a soil by the use of the microorganisms; and a method for biodegrading an chlorinated organic compound with the microorganisms.
    Type: Grant
    Filed: September 24, 1996
    Date of Patent: November 30, 1999
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kinya Kato, Shinya Kozaki, Takeshi Imamura, Toshiyuki Komatsu
  • Patent number: 5900926
    Abstract: A projection exposure apparatus performs focus adjustment to correct variations in the focal position of a projection optical system which are caused by absorption of exposure light by a refraction system in the projection optical system. The projection optical system arranged in this projection exposure apparatus includes a refraction system having a positive refracting power, and a reflecting mirror positioned to be coaxial with the refraction system. The projection exposure apparatus includes a photodetection device for detecting light, of light emitted from an illumination optical system and transmitted through a first substrate, which is transmitted through the reflecting mirror, and an adjustment device for adjusting the in-focus state between the first substrate, a second substrate, and the projection optical system in accordance with an output from the photodetection device.
    Type: Grant
    Filed: October 4, 1996
    Date of Patent: May 4, 1999
    Assignee: Nikon Corporation
    Inventor: Kinya Kato
  • Patent number: 5856868
    Abstract: A foreign substance inspecting apparatus and method for detecting a foreign substance on a surface, includes a light source for providing light; a plurality of condensing optical systems for collecting the light from the light source and for forming a plurality of light spots on the surface; a scanning system for scanning the surface using the light spots formed by the condensing optical systems; a detecting optical system for detecting light scattered from at least one of the light spots by the foreign substance on the surface; and a surface shape measuring system for measuring a shape of the surface, wherein a focus of each one of the condensing optical systems is individually adjusted according to the surface shape measured by the surface shape measuring system.
    Type: Grant
    Filed: July 8, 1997
    Date of Patent: January 5, 1999
    Assignee: Nikon Corporation
    Inventors: Kinya Kato, Yumi Nakagawa
  • Patent number: 5850279
    Abstract: Disclosed is a projection exposure method for transferring a pattern formed on a mask onto a photosensitive substrate through a projection optical system. A light beam having a first wavelength for exposure is radiated through the projection optical system onto a first mark area including a fiducial mark on a fiducial plate installed on a substrate stage, reflected light from the first mark area is detected to obtain a position of the fiducial mark. A light beam having a second wavelength to which the photosensitive substrate is not photosensitive is radiated through the projection optical system onto the first mark area, reflected light from the first mark area is detected to obtain a position of the fiducial mark. A positional discrepancy of the fiducial mark caused by the difference in wavelength between the first and second wavelengths is previously calculated on the basis of results of the detection.
    Type: Grant
    Filed: March 20, 1996
    Date of Patent: December 15, 1998
    Assignee: Nikon Corporation
    Inventors: Kei Nara, Masaki Kato, Kinya Kato, Tsuyoshi Narabe
  • Patent number: 5838449
    Abstract: An exposure apparatus of a large-substrate single scan-exposure type by which a mask mark and a plate mark are two-dimensionally scanned in relatively narrow respective scan areas at the same time to effect highly accurate alignment. In the present invention, a first substrate and a second substrate are relatively moved in a predetermined direction with respect to a projection optical system, while an image of a pattern formed in the first substrate projectively impinges on the second substrate by way of the projection optical system. The projection optical system comprises a plurality of projection optical units arranged in a direction orthogonal to the scanning direction in order to form, on the second substrate, a same-magnification erected image of the pattern formed on the first substrate.
    Type: Grant
    Filed: August 14, 1997
    Date of Patent: November 17, 1998
    Assignee: Nikon Corporation
    Inventors: Kinya Kato, Masaki Kato, Kei Nara
  • Patent number: 5830643
    Abstract: A method for forming an oligonucleotide comprises the steps of synthesizing a pair of oligonucleotides, one oligonucleotide having a base sequence portion comlementary to that of the other at a part of the terminal end region thereof; binding the pair of oligonucleotides at the complementary base sequence portions; and polymerizing nucleic acid bases onto the resulting pair of oligonuceotides. The method may further comprise the step of separating the oligonucleotides thus obtained into single strands.
    Type: Grant
    Filed: November 10, 1992
    Date of Patent: November 3, 1998
    Assignee: Canon Kabushiki Kaisha
    Inventors: Nobuko Yamamoto, Kinya Kato, Harumi Iwashita, Masanori Sakuranaga
  • Patent number: 5807736
    Abstract: A bacterial strain J1 (FERM BP-5102) which can effectively degrade aromatic compounds and/or chlorinated organic compounds such as trichloroethylene (TCE) is disclosed. Also the degradation occurs at a lower temperature such as 15.degree.. Further, a method for purifying waste water, soil or a gas polluted with the above chemical compounds utilizing the bacterium is disclosed.
    Type: Grant
    Filed: May 30, 1995
    Date of Patent: September 15, 1998
    Assignee: Canon Kabushiki Kaisha
    Inventors: Shinya Kozaki, Kinya Kato, Tetsuya Yano, Takeshi Imamura
  • Patent number: 5764361
    Abstract: This invention relates an interferometer having a structure for suppressing measurement errors arising from leakage light by minimizing nonlinear errors due to the leakage light in a polarization beam splitter for splitting incident light into a first polarized light component and a second polarized light component, and apparatuses to which the interferometer is applied. The interferometer includes an adjustment mechanism for adjusting the angle of light incidence on the beam splitting surface of the polarization beam splitter such that the extinction ratio of the polarization beam splitter is minimized by using the dependence of the polarization beam splitter on the incident angle.
    Type: Grant
    Filed: October 21, 1996
    Date of Patent: June 9, 1998
    Assignee: Nikon Corporation
    Inventors: Kinya Kato, Shigeru Takemoto
  • Patent number: 5751452
    Abstract: A polymer dispersed liquid crystal optical device is presented which has optical elements which control reflection, transmission and diffraction of incident light entering the device by adjusting the magnitude of the electrical field applied to the device between a maximum and a minimum limits. An optical element consists of a polymer material having an electrical field-independent refractive index, and a liquid crystal material having an electrical field-dependent refractive index. The optical elements are distributed through the device at specific inter-element spacings, thus enabling to generate reflection of incident light in accordance with Bragg's law of reflection. The inter-element spacings can also be varied by the application of the field, thus enabling to generate reflection of light of a desired wavelength. Such optical elements are ideal for use in full color optical display apparatus of a matrix driven type.
    Type: Grant
    Filed: February 18, 1994
    Date of Patent: May 12, 1998
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventors: Keiji Tanaka, Kinya Kato, Shinji Tsuru, Shigenobu Sakai
  • Patent number: 5748272
    Abstract: A polymer dispersed liquid crystal optical device is presented which has optical elements which control reflection, transmission and diffraction of incident light entering the device by adjusting the magnitude of the electrical field applied to the device between a maximum and a minimum limits. An optical element consists of a polymer material having an electrical field-independent refractive index, and a liquid crystal material having an electrical field-dependent refractive index. The optical elements are distributed through the device at specific inter-element spacings, thus enabling to generate reflection of incident light in accordance with Bragg's law of reflection. The inter-element spacings can also be varied by the application of the field, thus enabling to generate reflection of light of a desired wavelength. Such optical elements are ideal for use in full color optical display apparatus of a matrix driven type.
    Type: Grant
    Filed: June 10, 1996
    Date of Patent: May 5, 1998
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventors: Keiji Tanaka, Kinya Kato, Shinji Tsuru, Shigenobu Sakai
  • Patent number: 5729331
    Abstract: There is disclosed an exposure apparatus for, while moving a first object and a second object in a certain moving direction, effecting projection exposure of an image of the first object onto the second object.
    Type: Grant
    Filed: May 30, 1995
    Date of Patent: March 17, 1998
    Assignee: Nikon Corporation
    Inventors: Masashi Tanaka, Masato Kumazawa, Kinya Kato, Masaki Kato, Hiroshi Chiba, Hiroshi Shirasu
  • Patent number: 5726757
    Abstract: In an exposure apparatus, an alignment-detecting light component of a mask and that of a plate are spatially separated from each other, thereby enabling highly accurate alignment with little influence of the light from the plate on detection of the mask position.
    Type: Grant
    Filed: September 25, 1996
    Date of Patent: March 10, 1998
    Assignee: Nikon Corporation
    Inventors: Masaki Kato, Kinya Kato, Kei Nara
  • Patent number: 5658795
    Abstract: A method of biodegradation of a polluting substance by a microorganism is disclosed, wherein the microorganism is an auxotrophic microorganism and the action of the auxotrophic microorganism is controlled by the amount of a required nutrient for the auxotrophic microorganism. A carrier for supporting an auxotrophic microorganism for use for biodegradation contains a required nutrient for the auxotrophic microorganism.
    Type: Grant
    Filed: December 13, 1995
    Date of Patent: August 19, 1997
    Assignee: Canon Kabushiki Kaisha
    Inventors: Kinya Kato, Kazumi Tanaka, Masanori Sakuranaga, Shinya Kozaki
  • Patent number: 5640227
    Abstract: An exposure apparatus and an exposure method which minimize defocusing of the transferred pattern even with a large-sized mask. When the exposure apparatus is used which transfers the pattern formed on a first substrate through a substantially real-size projection optical system onto a second substrate, the positions of the mask and the substrate are detected, and based on the information on the positions the distance between the mask and the substrate is controlled to be substantially constant. According to the present invention, defocusing of the transferred pattern may be substantially avoided by detecting positions of the mask and the plate by making use of, e.g., an obliquely incident light focus detection optical system, and controlling the distance therebetween to be held constant or at a predetermined distance.
    Type: Grant
    Filed: December 6, 1994
    Date of Patent: June 17, 1997
    Assignee: Nikon Corporation
    Inventors: Kinya Kato, Kazuaki Saiki, Masami Seki, Masaki Kato
  • Patent number: 5614988
    Abstract: A projection exposure apparatus and method having a projection optical system with a plurality of projection optical units and being excellent in matching between images formed through the respective projection optical units. First and second substrates are moved relatively to a projection optical system to project a pattern formed on the first substrate through the projection optical system onto the second substrate to effect exposure thereon. The projection optical system is provided with a plurality of projection optical units each forming a real-size erect image of the pattern formed on the first substrate on the second substrate. Each of the projection optical units has a plurality of reflective surfaces and is telecentric at least on an image side. The projection exposure apparatus also has a correcting mechanism disposed to correct an error of orientation between a plurality of images formed on the second substrate by the plurality of projection optical units.
    Type: Grant
    Filed: December 5, 1994
    Date of Patent: March 25, 1997
    Assignee: Nikon Corporation
    Inventors: Kinya Kato, Masami Seki
  • Patent number: 5374715
    Abstract: A method for forming a proteoliposome comprises incorporating into a liposome a membrane protein combined with a carrier. Further, a method for preparing a giant proteoliposome, comprises freezing and thawing an alkali metal salt solution containing a membrane protein and a lipid, and subsequently dialyzing against a second salt solution or a buffer solution having a lower osmotic pressure than that of said alkali metal salt solution. Further, a method for forming a proteoliposome, comprises by freezing and thawing an alkali metal salt solution containing a membrane protein combined with a carrier and a lipid.
    Type: Grant
    Filed: March 17, 1993
    Date of Patent: December 20, 1994
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tsunehiro Kanno, Junji Ohyama, Masanori Sakuranaga, Hiroyoshi Kishi, Nobuko Yamamoto, Kinya Kato, Harumi Iwashita, Yasuko Tomida
  • Patent number: 5288517
    Abstract: A method of forming a lipid planar membrane of a bilayer membrane composed of lipid and protein comprises the step of immersing a substrate, which has a long-chain hydrocarbon group at least on the surface of one side thereof, in a suspension of liposome or proteoliposome, respectively. The long-chain hydrocarbon group is introduced into the substrate by bonding a long-chain alkylsilane coupling agent or a long-chain alkyltitanate coupling agent.
    Type: Grant
    Filed: February 18, 1992
    Date of Patent: February 22, 1994
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tsunehiro Kanno, Kinya Kato, Harumi Iwashita, Junji Ohyama, Nobuko Yamamoto, Masanori Sakuranaga
  • Patent number: 5227470
    Abstract: A method for forming a proteoliposome comprises incorporating into a liposome a membrane protein combined with a carrier. Further, a method for preparing a giant proteoliposome, comprises freezing and thawing an alkali metal salt solution containing a membrane protein and a lipid, and subsequently dialyzing against a second salt solution or a buffer solution having a lower osmotic pressure than that of said alkali metal salt solution. Further, a method for forming a proteoliposome, comprises freezing and thawing an alkali metal salt solution containing a membrane protein combined with a carrier and a lipid.
    Type: Grant
    Filed: August 19, 1992
    Date of Patent: July 13, 1993
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tsunehiro Kanno, Junji Ohyama, Masanori Sakuranaga, Hiroyoshi Kishi, Nobuko Yamamoto, Kinya Kato, Harumi Iwashita, Yasuko Tomida