Patents by Inventor Klaus Simon

Klaus Simon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 8154708
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Grant
    Filed: July 7, 2006
    Date of Patent: April 10, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Erik Theodorus Maria Bijlaart, Christiaan Alexander Hoogendam, Helmar Van Santen, Marcus Adrianus Van De Kerhof, Mark Kroon, Arie Jeffrey Den Boef, Joost Jeroen Ottens, Jeroen Johannes Sophia Maria Mertens
  • Imprint lithography
    Patent number: 8131078
    Abstract: An imprinting method is disclosed that, in embodiment, includes contacting first and second spaced target regions of an imprintable medium on a substrate with first and second templates respectively to form respective first and second imprints in the medium and separating the first and second templates from the imprinted medium.
    Type: Grant
    Filed: November 10, 2009
    Date of Patent: March 6, 2012
    Assignee: ASML Netherlands B.V.
    Inventor: Klaus Simon
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120044468
    Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
    Type: Application
    Filed: November 2, 2011
    Publication date: February 23, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Bob STREEFKERK, Antonius Theodorus Anna Maria Derksen, Joeri Lof, Klaus Simon, Alexander Straaijer
  • Imprint lithography
    Patent number: 8100684
    Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.
    Type: Grant
    Filed: February 24, 2009
    Date of Patent: January 24, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Yvonne Wendela Kruijt-Stegeman, Johan Frederik Dijksman, Aleksey Yurievich Kolesnychenko, Karel Diederick Van Der Mast, Klaus Simon, Raymond Jacobus Knaapen, Krassimir Todorov Krastev, Sander Frederik Wuister
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110285977
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Application
    Filed: August 1, 2011
    Publication date: November 24, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri LOF, Erik Theodorus Maria Bijlaart, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van De Kerkhof, Aleksey Yurievich Kolesnychenko, Mark Kroon, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Joost Jeroen Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • IMPRINT LITHOGRAPHY
    Publication number: 20110283937
    Abstract: A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.
    Type: Application
    Filed: August 4, 2011
    Publication date: November 24, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Klaus SIMON
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110279800
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Application
    Filed: July 29, 2011
    Publication date: November 17, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van De Kerkhof, Aleksey Yurievich Kolesnychenko, Mark Kroon, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Joost Jeroen Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110279795
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Application
    Filed: July 22, 2011
    Publication date: November 17, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110273683
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Application
    Filed: July 21, 2011
    Publication date: November 10, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendman, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
  • IMMERSION PHOTOLITHOGRAPHY SYSTEM AND METHOD USING MICROCHANNEL NOZZLES
    Publication number: 20110273680
    Abstract: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.
    Type: Application
    Filed: July 20, 2011
    Publication date: November 10, 2011
    Applicant: ASML HOLDING N.V.
    Inventors: Herman Vogel, Klaus Simon, Antonius Theodorus Anna Maria Derksen
  • IMMERSION PHOTOLITHOGRAPHY SYSTEM AND METHOD USING MICROCHANNEL NOZZLES
    Publication number: 20110273676
    Abstract: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.
    Type: Application
    Filed: July 19, 2011
    Publication date: November 10, 2011
    Applicant: ASML HOLDING N.V.
    Inventors: Herman VOGEL, Klaus Simon, Antonius Theodorus Anna Maria Derksen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110228241
    Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
    Type: Application
    Filed: May 31, 2011
    Publication date: September 22, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri LOF, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Imprint lithography
    Patent number: 8011915
    Abstract: A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.
    Type: Grant
    Filed: March 1, 2006
    Date of Patent: September 6, 2011
    Assignee: ASML Netherlands B.V.
    Inventor: Klaus Simon
  • Immersion photolithography system and method using microchannel nozzles
    Patent number: 8004649
    Abstract: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.
    Type: Grant
    Filed: April 1, 2008
    Date of Patent: August 23, 2011
    Assignee: ASML Holding N.V.
    Inventors: Herman Vogel, Klaus Simon, Antonius Theodorus Anna Maria Derksen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110181859
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Application
    Filed: April 7, 2011
    Publication date: July 28, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
  • Immersion lithographic apparatus and device manufacturing method with gas supply
    Patent number: 7982850
    Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
    Type: Grant
    Filed: May 15, 2008
    Date of Patent: July 19, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110170077
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
    Type: Application
    Filed: August 4, 2010
    Publication date: July 14, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Joeri LOF, Erik Theodorus Maria Bijlaart, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method
    Patent number: 7936444
    Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.
    Type: Grant
    Filed: February 7, 2008
    Date of Patent: May 3, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110027721
    Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
    Type: Application
    Filed: August 9, 2010
    Publication date: February 3, 2011
    Inventors: JOERI LOF, JOANNES THEODOOR DE SMIT, ROELOF AEILKO SIEBRAND RITSEMA, KLAUS SIMON, THEODORUS MARINUS MODDERMAN, JOHANNES CATHARINUS HUBERTUS MULKENS, HENDRICUS JOHANNES MARIA MEIJER, ERIK ROELOF LOOPSTRA
  • Imprint lithography
    Patent number: 7878791
    Abstract: A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.
    Type: Grant
    Filed: March 1, 2006
    Date of Patent: February 1, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Klaus Simon, Karel Diederick Van Der Mast, Johan Frederik Dijksman