Patents by Inventor Klaus Simon
Klaus Simon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20090002652Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.Type: ApplicationFiled: May 15, 2008Publication date: January 1, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Antonius Theodorus Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Mulkens, Roelof Aeilko Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
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Publication number: 20080218717Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.Type: ApplicationFiled: February 7, 2008Publication date: September 11, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
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Publication number: 20080218726Abstract: Lithographic Apparatus and Device Manufacturing Method In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.Type: ApplicationFiled: April 9, 2008Publication date: September 11, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen, Sjoerd Nicolaas Lambertus Donders
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Patent number: 7411650Abstract: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.Type: GrantFiled: February 9, 2005Date of Patent: August 12, 2008Assignee: ASML Holding N.V.Inventors: Herman Vogel, Klaus Simon, Antonius Theodorus Anna Maria Derksen
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Patent number: 7408624Abstract: A lithographic apparatus includes a substrate table constructed to hold a first substrate of a first type, the first substrate having a polished surface; and a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The polished surface supports a second substrate of a second type and the projection system is configured to project the patterned radiation beam onto the second substrate.Type: GrantFiled: June 30, 2005Date of Patent: August 5, 2008Assignee: ASML Netherlands B.V.Inventors: Michael Josephus Evert Van De Moosdijk, Klaus Simon, Wilhelmus Johannes Maria De Laat
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Publication number: 20080180645Abstract: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.Type: ApplicationFiled: April 1, 2008Publication date: July 31, 2008Applicant: ASML Holding N.V.Inventors: Herman Vogel, Klaus Simon, Antonius Theodorus Anna Maria Derksen
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Patent number: 7388648Abstract: A lithographic projection apparatus includes a liquid confinement structure extending along at least a part of a boundary of a space between a projection system and a substrate table. The liquid confinement structure is positioned adjacent a final surface of the projection system and includes a first inlet configured to supply a liquid, through which a patterned beam is to be projected, to the space, and a second inlet configured to supply gas and formed in a face of the structure. The face is arranged to oppose a surface of the substrate and the second inlet is located radially outward, with respect to an optical axis of the projection system, of the space and has a porous member to evenly distribute gas flow over an area of the second inlet.Type: GrantFiled: September 30, 2005Date of Patent: June 17, 2008Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
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Patent number: 7372541Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.Type: GrantFiled: September 30, 2005Date of Patent: May 13, 2008Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen, Sjoerd Nicolaas Lambertus Donders
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Patent number: 7359030Abstract: A flowcell including a plurality of separate chambers is provided on the substrate table so that a fluid can be brought into contact with exposed areas of the substrate to interact therewith. A series of exposures and chemical processes can thereby be carried out without removing the substrate from the substrate table.Type: GrantFiled: December 1, 2003Date of Patent: April 15, 2008Assignee: ASML Netherlands B.V.Inventors: Klaus Simon, Joeri Lof, Arthur Winfried Eduardus Minnaert, Erik Marie Jose Smeets
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Patent number: 7352434Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.Type: GrantFiled: May 13, 2004Date of Patent: April 1, 2008Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Levinus Pieter Bakker, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
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Publication number: 20070268471Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.Type: ApplicationFiled: February 26, 2007Publication date: November 22, 2007Applicant: ASML Netherlands B.V.Inventors: Joeri Lof, Hans Butler, Sjoerd Donders, Aleksey Kolesnychenko, Erik Loopstra, Hendricus Meijer, Jeroen Johannes Mertens, Johannes Mulkens, Roelof Ritsema, Frank Schaik, Timotheus Sengers, Klaus Simon, Joannes De Smit, Alexander Straaijer, Helmar Santen
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Publication number: 20070258080Abstract: According to one of the aspects of the present invention there is provided a substrate carrier arranged to hold a substrate in position using a vacuum, the vacuum being established in a sealed space created between the substrate carrier and the substrate.Type: ApplicationFiled: May 5, 2006Publication date: November 8, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Enno Brink, Henricus Wilhelmus Van Buel, Joseph Consolini, Gerardus Johannes Keijsers, Klaus Simon, Johannes De Smit, Richard Travers, Maurice Anton Teuwen, Arnout Meester, Frederick Hafner, Vinyu Greenlee, Hubertus Antonius Baijens
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Publication number: 20070178707Abstract: A method for patterning a polished silicon surface is disclosed, the method including steps leading to an organic monolayer on at least a part of the silicon surface, the monolayer being functionalized in specific desired locations. The method can be used to produce a device comprising one or more FET structures, the gate of the FET being formed by the functionalized organic monolayer. The functionalized monolayer preferably contains oligosaccharides or oligopeptides which are capable of interacting with biological substance, such that the device acts as a bio-sensor.Type: ApplicationFiled: June 24, 2004Publication date: August 2, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Johannes Zuilhof, Klaus Simon, Ernst Sudholter, Qiao-Yu Sun
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Publication number: 20070141191Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.Type: ApplicationFiled: December 21, 2005Publication date: June 21, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Yvonne Kruijt-Stegeman, Raymond Knaapen, Johan Dijksman, Krassimir Krastev, Sander Wuister, Aleksey Kolesnychenko, Karel Van Der Mast, Klaus Simon
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Publication number: 20070132979Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.Type: ApplicationFiled: July 7, 2006Publication date: June 14, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Erik Maria Bijlaart, Roelof Aeilko Ritsema, Frank Schaik, Timotheus Sengers, Klaus Simon, Joannes De Smit, Arie Den Boef, Hans Butler, Sjoerd Lambertus Donders, Christiaan Hoogendam, Marcus Van De Kerkhof, Aleksey Kolesnychenko, Mark Kroon, Erik Loopstra, Hendricus Maria Meijer, Jeroen Sophia Maria Mertens, Johannes Hubertus Mulkens, Joost Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Santen
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Publication number: 20070132970Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.Type: ApplicationFiled: June 8, 2006Publication date: June 14, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Joeri Lof, Erik Bijlaart, Hans Butler, Sjoerd Donders, Christiaan Hoogendam, Aleksey Kolesnychenko, Erik Loopstra, Hendricus Meijer, Jeroen Johannes Mertens, Johannes Catharinus Mulkens, Roelof Ritsema, Frank Van Schaik, Thimotheus Sengers, Klaus Simon, Joannes De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
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Publication number: 20070132972Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.Type: ApplicationFiled: July 7, 2006Publication date: June 14, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Antonius Theodorus Derksen, Joeri Lof, Klaus Simon, Alexander Straaijer
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Publication number: 20070102838Abstract: A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.Type: ApplicationFiled: March 1, 2006Publication date: May 10, 2007Applicant: ASML NETHERLANDS B.V.Inventor: Klaus Simon
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Publication number: 20070102844Abstract: A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.Type: ApplicationFiled: March 1, 2006Publication date: May 10, 2007Applicant: ASML NETHERLANDS B.V.Inventors: Klaus Simon, Karel Van Der Mast, Johan Dijksman
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Patent number: 7213963Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.Type: GrantFiled: June 1, 2004Date of Patent: May 8, 2007Assignee: ASML Netherlands B.V.Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Arie Jeffrey Maria Den Boef, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Marcus Adrianus Van de Kerkhof, Aleksey Yurievich Kolesnychenko, Mark Kroon, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Joost Jeroen Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen