Patents by Inventor Klaus Simon

Klaus Simon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 7199858
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when edge portions of the substrate or other object are, for example, imaged or illuminated.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: April 3, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Erik Theodorus Maria Bijlaart, Hans Butler, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Hendricus Johannes Maria Meijer, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Frank Van Schaik, Timotheus Franciscus Sengers, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method with substrate measurement not through liquid
    Patent number: 7193232
    Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: March 20, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Joannes Theodoor De Smit, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Hendricus Johannes Maria Meijer, Erik Roelof Loopstra
  • Lithographic apparatus and device manufacturing method
    Publication number: 20070040133
    Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
    Type: Application
    Filed: March 9, 2006
    Publication date: February 22, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Joannes De Smit, Roelof Aeilko Ritsema, Klaus Simon, Theodorus Modderman, Johannes Catharinus Mulkens, Hendricus Johannes Meijer, Erik Roelof Loopstra
  • Lithographic apparatus and device manufacturing method
    Publication number: 20070002303
    Abstract: A lithographic apparatus includes a substrate table constructed to hold a first substrate of a first type, the first substrate having a polished surface; and a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The polished surface supports a second substrate of a second type and the projection system is configured to project the patterned radiation beam onto the second substrate.
    Type: Application
    Filed: June 30, 2005
    Publication date: January 4, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Michael Van De Moosdijk, Klaus Simon, Wilhelmus Maria De Laat
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060232756
    Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.
    Type: Application
    Filed: September 30, 2005
    Publication date: October 19, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Antonius Theodorus Derksen, Christiaan Hoogendam, Aleksey Kolesnychenko, Erik Loopstra, Theodorus Modderman, Johannes Catharinus Mulkens, Roelof Aeilko Ritsema, Klaus Simon, Joannes De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Santen, Sjoerd Nicolaas Donders
  • Lithographic apparatus and device manufacturing method
    Patent number: 7081943
    Abstract: In an immersion lithography apparatus, a member surrounds a space between a projection system and a substrate table. A seal is formed to contain liquid in the space.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: July 25, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Joannes Theodoor De Smit, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Theodorus Marinus Modderman
  • Imprint lithography
    Publication number: 20060159305
    Abstract: An imprinting method is disclosed that, in embodiment, includes contacting first and second spaced target regions of an imprintable medium on a substrate with first and second templates respectively to form respective first and second imprints in the medium and separating the first and second templates from the imprinted medium.
    Type: Application
    Filed: December 16, 2005
    Publication date: July 20, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Klaus Simon
  • Radiation exposure apparatus comprising a gas flushing system
    Publication number: 20060146300
    Abstract: An exposure apparatus is provided with a radiation source, a patterning structure, a projection system, a substrate, and a gas flushing system for removing gas from an area between the projection system and the substrate.
    Type: Application
    Filed: December 6, 2005
    Publication date: July 6, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Klaus Simon, Enno Van Den Brink, Gerardus Keijsers, Adrianus Van Dijk, Hubertus Baijens
  • Imprint lithography
    Publication number: 20060137555
    Abstract: An imprinting method is disclosed that, in embodiment, includes contacting first and second spaced target regions of an imprintable medium on a substrate with first and second templates respectively to form respective first and second imprints in the medium and separating the first and second templates from the imprinted medium.
    Type: Application
    Filed: December 23, 2004
    Publication date: June 29, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Klaus Simon
  • Radiation exposure apparatus comprising a gas flushing system
    Publication number: 20060119811
    Abstract: An exposure apparatus is provided with a radiation source, a patterning structure, a projection system, a substrate, and a gas flushing system for introducing flushing gas in an area between the projection system and the substrate.
    Type: Application
    Filed: January 18, 2005
    Publication date: June 8, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Klaus Simon
  • Lithographic apparatus and device manufacturing method
    Patent number: 7038760
    Abstract: The pressure and/or height of liquid in a liquid reservoir of an immersion lithography apparatus is obtained by a measurement device. The pressure and/or height can be used to determine the height and/or tilt of the substrate.
    Type: Grant
    Filed: June 23, 2004
    Date of Patent: May 2, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Catharinus Hubertus Mulkens, Antonius Theodorus Anna Maria Derksen, Joeri Lof, Klaus Simon, Alexander Straaijer, Bob Streefkerk
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060023189
    Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
    Type: Application
    Filed: September 30, 2005
    Publication date: February 2, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Antonius Theodorus Derksen, Christiaan Hoogendam, Aleksey Kolesnychenko, Erik Loopstra, Theodorus Modderman, Johannes Catharinus Mulkens, Roelof Aeilko Ritsema, Klaus Simon, Joannes De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Santen
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050264778
    Abstract: A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
    Type: Application
    Filed: June 1, 2004
    Publication date: December 1, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Joeri Lof, Erik Bijlaart, Roelof Aeilko Ritsema, Frank Schaik, Timotheus Sengers, Klaus Simon, Joannes De Smit, Arie Den Boef, Hans Butler, Sjoerd Donders, Christiaan Hoogendam, Marcus Van De Kerkhof, Aleksey Kolesnychenko, Mark Kroon, Erik Loopstra, Hendricus Meijer, Jeroen Maria Mertens, Johannes Mulkens, Joost Ottens, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Lithographic apparatus and device manufacturing method
    Patent number: 6952253
    Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: October 4, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Joeri Lof, Antonius Theodorus Anna Maria Derksen, Christiaan Alexander Hoogendam, Aleksey Kolesnychenko, Erik Roelof Loopstra, Theodorus Marinus Modderman, Johannes Catharinus Hubertus Mulkens, Roelof Aeilko Siebrand Ritsema, Klaus Simon, Joannes Theodoor De Smit, Alexander Straaijer, Bob Streefkerk, Helmar Van Santen
  • Printing apparatus and device manufacturing method
    Publication number: 20050211161
    Abstract: The printing apparatus, presented herein, comprises a patterning device having a curved member that supports a stamp on its surface. The curved member is adapted to roll over a substrate to be printed on to transfer the pattern onto the substrate. An illumination system directs light onto the region of the substrate that is being printed in order to set a layer of resist, which has been sprayed onto the substrate. The light is directed via a pattern that is made on the surface of the stamp, thereby transferring the pattern to the substrate.
    Type: Application
    Filed: March 1, 2005
    Publication date: September 29, 2005
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Klaus Simon
  • Printing apparatus and device manufacturing method
    Publication number: 20050193944
    Abstract: The printing apparatus, presented herein, comprises a patterning device having a curved member that supports a stamp on its surface. The curved member is adapted to roll over a substrate to be printed on to transfer the pattern onto the substrate. An illumination system directs light onto the region of the substrate that is being printed in order to set a layer of resist, which has been sprayed onto the substrate. The light is directed via a pattern that is made on the surface of the stamp, thereby transferring the pattern to the substrate.
    Type: Application
    Filed: March 4, 2004
    Publication date: September 8, 2005
    Applicant: ASML Netherlands B.V.
    Inventor: Klaus Simon
  • Immersion photolithography system and method using microchannel nozzles
    Publication number: 20050168713
    Abstract: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.
    Type: Application
    Filed: February 9, 2005
    Publication date: August 4, 2005
    Applicant: ASML Holding N.V.
    Inventors: Herman Vogel, Klaus Simon, Antonius Maria Derksen
  • Immersion photolithography system and method using microchannel nozzles
    Patent number: 6867844
    Abstract: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.
    Type: Grant
    Filed: June 19, 2003
    Date of Patent: March 15, 2005
    Assignee: ASML Holding N.V.
    Inventors: Herman Vogel, Klaus Simon, Antonius Theodorus Anna Maria Derksen
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050046813
    Abstract: An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit.
    Type: Application
    Filed: July 14, 2004
    Publication date: March 3, 2005
    Applicant: ASMIL NETHERLANDS B.V.
    Inventors: Bob Streefkerk, Antonius Maria Derksen, Joeri Lof, Klaus Simon, Alexander Straaijer
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050018156
    Abstract: The pressure and/or height of liquid in a liquid reservoir of an immersion lithography apparatus is obtained by a measurement device. The pressure and/or height can be used to determine the height and/or tilt of the substrate.
    Type: Application
    Filed: June 23, 2004
    Publication date: January 27, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Catharinus Mulkens, Antonius Theodorus Anna Derksen, Joeri Lof, Klaus Simon, Alexander Straaijer, Bob Streefkerk