Patents by Inventor Koen Jacobus Johannes Maria Zaal
Koen Jacobus Johannes Maria Zaal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11669021Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: GrantFiled: March 11, 2022Date of Patent: June 6, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens
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Publication number: 20220197154Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: ApplicationFiled: March 11, 2022Publication date: June 23, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Koen Jacobus Johannes Maria ZAAL, Joost Jeroen OTTENS
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Patent number: 11275316Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: GrantFiled: August 27, 2020Date of Patent: March 15, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens
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Patent number: 11150560Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to suppress the zeroth order of reflected radiation for at least a first component wavelength. The grating structure has a periodic profile including regularly spaced structures providing three surface levels, such that radiation diffracted by the grating structure includes radiation of three phases which destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength. The grating structure is on a radiation collector within the source.Type: GrantFiled: May 22, 2020Date of Patent: October 19, 2021Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Anton Bernhard Van Oosten, Hans Butler, Erik Roelof Loopstra, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal
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Publication number: 20200393768Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: ApplicationFiled: August 27, 2020Publication date: December 17, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Koen Jacobus Johannes Maria ZAAL, Joost Jeroen OTTENS
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Publication number: 20200285155Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to suppress the zeroth order of reflected radiation for at least a first component wavelength. The grating structure has a periodic profile including regularly spaced structures providing three surface levels, such that radiation diffracted by the grating structure includes radiation of three phases which destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength. The grating structure is on a radiation collector within the source.Type: ApplicationFiled: May 22, 2020Publication date: September 10, 2020Applicant: ASML Netherlands B.V.Inventors: Marcus Adrianus VAN DE KERKHOF, Anton Bernhard VAN OOSTEN, Hans BUTLER, Erik Roelof LOOPSTRA, Marc Wilhelmus Maria VAN DER WIJST, Koen Jacobus Johannes Maria ZAAL
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Patent number: 10761433Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: GrantFiled: March 1, 2019Date of Patent: September 1, 2020Assignee: ASML Netherlands B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens
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Patent number: 10732511Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror having an actuator for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.Type: GrantFiled: January 25, 2019Date of Patent: August 4, 2020Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Anton Bernhard Van Oosten, Hans Butler, Erik Roelof Loopstra, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal
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Publication number: 20190196342Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: ApplicationFiled: March 1, 2019Publication date: June 27, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Koen Jacobus Johannes Maria ZAAL, Joost Jeroen OTTENS
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Publication number: 20190171109Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror having an actuator for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.Type: ApplicationFiled: January 25, 2019Publication date: June 6, 2019Applicant: ASML Netherlands B.V.Inventors: Marcus Adrianus VAN DE KERKHOF, Anton Bernhard Van Oosten, Hans Butler, Erik Roelof Loopstra, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal
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Patent number: 10222711Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table, the cover plate configured to be to a side of the substrate during exposure, the cover plate being removable from the substrate table and supported on the substrate table by a protrusion. The lithographic apparatus further includes a linear encoder system configured to measure at least translation of the substrate table, a part of the linear encoder system being on the substrate table and located outward of the cover plate.Type: GrantFiled: December 12, 2017Date of Patent: March 5, 2019Assignee: ASML Netherlands B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens
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Patent number: 10216093Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror (510) having an actuator (500) for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller (515a, 515b) for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.Type: GrantFiled: December 12, 2013Date of Patent: February 26, 2019Assignee: ASML Netherlands B.V.Inventors: Marcus Adrianus Van De Kerkhof, Anton Bernhard Van Oosten, Hans Butler, Erik Roelof Loopstra, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal
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Publication number: 20180113388Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: ApplicationFiled: December 12, 2017Publication date: April 26, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Koen Jacobus Johannes Maria ZAAL, Joost Jeroen OTTENS
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Patent number: 9851644Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: GrantFiled: August 15, 2016Date of Patent: December 26, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens
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Patent number: 9785060Abstract: A stage system includes a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.Type: GrantFiled: August 19, 2013Date of Patent: October 10, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Ruud Antonius Catharina Maria Beerens, Rob Johan Theodoor Rutten, Jan Steven Christiaan Westerlaken, Koen Jacobus Johannes Maria Zaal, Richard Henricus Adrianus Van Lieshout, Engelbertus Antonius Fransiscus Van Der Pasch
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Patent number: 9618859Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.Type: GrantFiled: January 25, 2013Date of Patent: April 11, 2017Assignee: ASML Netherlands B.V.Inventors: Adrianus Hendrik Koevoets, Sjoerd Nicolaas Lambertus Donders, Jan Bernard Plechelmus Van Schoot, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee
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Patent number: 9581916Abstract: A substrate handling system for an apparatus, the substrate handling system including a substrate table constructed to hold a substrate, a surrounding structure configured to surround the substrate, a sensor configured to determine a thickness of the substrate, and a control system configured to configure the apparatus responsive to a determination that the determined thickness is outside a thickness range associated with the surrounding structure.Type: GrantFiled: November 16, 2015Date of Patent: February 28, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Joost Jeroen Ottens, Noud Jan Gilissen, Martinus Hendrikus Antonius Leenders, Koen Jacobus Johannes Maria Zaal
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Publication number: 20160349629Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: ApplicationFiled: August 15, 2016Publication date: December 1, 2016Applicant: ASML NETHERLANDS B.V.Inventors: Koen Jacobus Johannes Maria ZAAL, Joost Jeroen OTTENS
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Patent number: 9494869Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.Type: GrantFiled: December 5, 2012Date of Patent: November 15, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Hans Butler, Arno Jan Bleeker, Pieter Renaat Maria Hennus, Martinus Hendricus Henricus Hoeks, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee, Ruud Antonius Catharina Maria Beerens, Olof Martinus Josephus Fischer, Wilhelmus Henricus Theodorus Maria Aangenent, Niels Johannes Maria Bosch
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Patent number: 9470969Abstract: A support for an object, e.g., a semiconductor substrate, includes a main body having a surface configured and arranged to have a plurality of projections. Each of the projections has an associated electrostatic actuator for displacing a free end of the associated projection relative to the main body at least in a direction in a plane parallel to a main surface of the object.Type: GrantFiled: November 27, 2012Date of Patent: October 18, 2016Assignee: ASML Netherlands B.V.Inventors: Theodorus Petrus Maria Cadee, Koen Jacobus Johannes Maria Zaal, Harmeet Singh