Patents by Inventor Koen Jacobus Johannes Maria Zaal
Koen Jacobus Johannes Maria Zaal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9436096Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: GrantFiled: December 30, 2014Date of Patent: September 6, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens
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Patent number: 9195150Abstract: A lithographic apparatus has a support that is provided with burls for holding an object. The support has been fabricated with a lithographic manufacturing method, e.g., a MEMS-technology, so as to create burls whose orientations or positions are individually electrically controllable.Type: GrantFiled: February 4, 2013Date of Patent: November 24, 2015Assignee: ASML Netherlands B.V.Inventors: Theodorus Petrus Maria Cadee, Vadim Yevgenyevich Banine, Koen Jacobus Johannes Maria Zaal, Ramin Badie, Harmeet Singh
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Patent number: 9188882Abstract: A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.Type: GrantFiled: June 14, 2011Date of Patent: November 17, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Joost Jeroen Ottens, Noud Jan Gilissen, Martinus Hendrikus Antonius Leenders, Koen Jacobus Johannes Maria Zaal
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Publication number: 20150323872Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror (510) having an actuator (500) for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller (515a, 515b) for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror.Type: ApplicationFiled: December 12, 2013Publication date: November 12, 2015Applicant: ASML Netherlands B.V.Inventors: Marcus Adrianus VAN DE KERKHOF, Anton Bernhard VAN OOSTEN, Hans BUTLER, Erik Roelof LOOPSTRA, Marc Wilhelmus Maria VAN DER WIJST, Koen Jacobus Johannes Maria ZAAL
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Publication number: 20150227060Abstract: A stage system includes a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.Type: ApplicationFiled: August 19, 2013Publication date: August 13, 2015Applicant: ASML Netherlands B.V.Inventors: Ruud Antonius Catharina Maria Beerens, Rob Johan Theodoor Rutten, Jan Steven Christiaan Westerlaken, Koen Jacobus Johannes Maria Zaal, Richard Henricus Adrianus Van Lieshout, Engelbertus Antonius Fransiscus Van Der Pasch
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Publication number: 20150116676Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: ApplicationFiled: December 30, 2014Publication date: April 30, 2015Applicant: ASML NETHERLANDS B.V.Inventors: Koen Jacobus Johannes Maria ZAAL, Joost Jeroen Ottens
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Publication number: 20150034788Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame (8) configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction. Provisions are made to prevent moments to be exerted on the lens held by the rotatable frame.Type: ApplicationFiled: January 30, 2013Publication date: February 5, 2015Inventors: Arno Jan Bleeker, Thomas Josephus Maria Castenmill, Pieter Willem Herman De Jager, Heine Melle Mulder, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee, Danny Maria Hubertus Philips, Ruud Antonius Catharina Maria Beere, Roger Anton Marie Timmermans
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Patent number: 8947636Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; at least three substrate tables that are each constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the substrate tables are moveable in a common moving area extending substantially in a plane perpendicular to the patterned radiation beam, the moving area comprising at least three working locations of which at least one working location is arranged for exposure of the substrate to the patterned radiation beam and at least one working location is arranged for non-exposure purposes.Type: GrantFiled: March 17, 2011Date of Patent: February 3, 2015Assignee: ASML Netherlands B.V.Inventors: Theodorus Petrus Maria Cadee, Jan Jaap Kuit, Johannes Catharinus Hubertus Mulkens, Koen Jacobus Johannes Maria Zaal
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Patent number: 8947631Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: GrantFiled: May 26, 2011Date of Patent: February 3, 2015Assignee: ASML Netherlands B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens
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Patent number: 8941810Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: GrantFiled: May 26, 2011Date of Patent: January 27, 2015Assignee: ASML Netherlands B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens
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Publication number: 20150002832Abstract: A lithographic apparatus has a support that is provided with burls for holding an object. The support has been fabricated with a lithographic manufacturing method, e.g., a MEMS-technology, so as to create burls whose orientations or positions are individually electrically controllable.Type: ApplicationFiled: February 4, 2013Publication date: January 1, 2015Applicant: ASML Netherlands B.V.Inventors: Theodorus Petrus Maria Cadee, Vadim Yevgenyevich Banine, Koen Jacobus Johannes Maria Zaal, Ramin Badie, Harmeet Singh
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Publication number: 20140340659Abstract: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system.Type: ApplicationFiled: January 25, 2013Publication date: November 20, 2014Applicant: ASML Netherlands B.V.Inventors: Jan Bernard Plechelmus Van Schoot, Adrianus Hendrik Koevoets, Theodorus Petrus Maria Cadee, Sjoerd Nicolaas Lambertus Donders, Koen Jacobus Johannes Maria Zaal
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Publication number: 20140340666Abstract: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric center of the movable frame and to cause the frame to rotate around an axis through the center of mass of the frame.Type: ApplicationFiled: December 5, 2012Publication date: November 20, 2014Applicant: ASML Netherlands B.V.Inventors: Hans Butler, Arno Jan Bleeker, Pieter Renaat Marie Hennus, Martinus Hendricus Henricus Hoeks, Sven Antoin Johan Hol, Harmen Klaas Van Der Schoot, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Marc Wilhelmus Maria Van Der Wijst, Koen Jacobus Johannes Maria Zaal, Theodorus Petrus Maria Cadee, Ruud Antonius Catharina Maria Beerens, Olof Martinus Josephus Fischer, Wilhelmus Henricus Theodorus Maria Aangenent, Niels Johannes Maria Bosch
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Patent number: 8749754Abstract: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.Type: GrantFiled: December 28, 2009Date of Patent: June 10, 2014Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Henrikus Herman Marie Cox, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Maria Mertens, Koen Jacobus Johannes Maria Zaal, Minne Cuperus
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Patent number: 8743339Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: GrantFiled: December 4, 2009Date of Patent: June 3, 2014Assignee: ASML NetherlandsInventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens
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Patent number: 8616598Abstract: An apparatus configured to handle an object in a contactless manner, the apparatus includes a carrying body having a carrying surface which is configured to be directed towards the object, the carrying surface being provided with a plurality of traction members and a plurality of overpressure members, each overpressure member being provided with at least one exhaust opening, each traction member being provided with an indentation and at least two suction openings that are arranged in the indentation, the at least two suction openings of each traction member being configured to generate a pressure gradient between them so as to create a traction fluid flow in the indentation in a direction substantially parallel to the carrying surface; and a pressure controller configured to control the pressure gradient between the at least two suction openings of each traction member.Type: GrantFiled: April 7, 2011Date of Patent: December 31, 2013Assignee: ASML Netherlands B.V.Inventors: Theodorus Petrus Maria Cadee, Koen Jacobus Johannes Maria Zaal, Timo Hol, Michael Wilhelmus Theodorus Koot
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Patent number: 8553201Abstract: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.Type: GrantFiled: October 1, 2008Date of Patent: October 8, 2013Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Henrikus Herman Marie Cox, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Maria Mertens, Koen Jacobus Johannes Maria Zaal, Minne Cuperus
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Patent number: 8514365Abstract: An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.Type: GrantFiled: June 1, 2007Date of Patent: August 20, 2013Assignee: ASML Netherlands B.V.Inventors: Frederik Eduard De Jong, Marcel Hendrikus Maria Beems, Marinus Aart Van Den Brink, Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Leon Martin Levasier, Frits Van Der Meulen, Joost Jeroen Ottens, Koen Jacobus Johannes Maria Zaal, Richard Bernardus Johannes Droste, Johannes Wilhelmus De Klerk, Peter Franciscus Wanten, Jan Cornelis Van Der Hoeven, Edwin Cornelis Kadijk, Marteijn De Jong, David Lucien Anstotz
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Patent number: 8457385Abstract: An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame. The measurement system further includes a compensation device configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensation device may include a passive or an active damping device and/or a feedback position control system. In an alternative embodiment, the compensation device includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.Type: GrantFiled: February 2, 2011Date of Patent: June 4, 2013Assignee: ASML Netherlands B.V.Inventors: Marc Wilhelmus Maria Van Der Wijst, Engelbertus Antonius Fransiscus Van Der Pasch, Koen Jacobus Johannes Maria Zaal
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Publication number: 20110280703Abstract: An apparatus configured to handle an object in a contactless manner, the apparatus includes a carrying body having a carrying surface which is configured to be directed towards the object, the carrying surface being provided with a plurality of traction members and a plurality of overpressure members, each overpressure member being provided with at least one exhaust opening, each traction member being provided with an indentation and at least two suction openings that are arranged in the indentation, the at least two suction openings of each traction member being configured to generate a pressure gradient between them so as to create a traction fluid flow in the indentation in a direction substantially parallel to the carrying surface; and a pressure controller configured to control the pressure gradient between the at least two suction openings of each traction memberType: ApplicationFiled: April 7, 2011Publication date: November 17, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Theodorus Petrus Maria CADEE, Koen Jacobus Johannes Maria ZAAL, Timo HOL, Michael Wilhelmus Theodorus KOOT