Patents by Inventor Koen Jacobus Johannes Maria Zaal
Koen Jacobus Johannes Maria Zaal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20110241259Abstract: A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.Type: ApplicationFiled: June 14, 2011Publication date: October 6, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Joost Jeroen OTTENS, Noud Jan Gilissen, Martinus Hendrikus Antonius Leenders, Koen Jacobus Johannes Maria Zaal
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Publication number: 20110242518Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; at least three substrate tables that are each constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the substrate tables are moveable in a common moving area extending substantially in a plane perpendicular to the patterned radiation beam, the moving area comprising at least three working locations of which at least one working location is arranged for exposure of the substrate to the patterned radiation beam and at least one working location is arranged for non-exposure purposes.Type: ApplicationFiled: March 17, 2011Publication date: October 6, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Theodorus Petrus Maria Cadee, Jan Jaap Kuit, Johannes Catharinus Hubertus Mulkens, Koen Jacobus Johannes Maria Zaal
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Publication number: 20110222035Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: ApplicationFiled: May 26, 2011Publication date: September 15, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Koen Jacobus Johannes Maria ZAAL, Joost Jeroen OTTENS
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Publication number: 20110222036Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: ApplicationFiled: May 26, 2011Publication date: September 15, 2011Applicant: ASML NETHERLANDS B.V.Inventors: Koen Jacobus Johannes Maria ZAAL, Joost Jeroen Ottens
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Publication number: 20110141447Abstract: An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame. The measurement system further includes a compensation device configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensation device may include a passive or an active damping device and/or a feedback position control system. In an alternative embodiment, the compensation device includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.Type: ApplicationFiled: February 2, 2011Publication date: June 16, 2011Applicant: ASML Netherlands B.V.Inventors: Marc Wilhelmus Maria VAN DER WIJST, Engelbertus Antonius Fransiscus VAN DER PASCH, Koen Jacobus Johannes Maria ZAAL
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Patent number: 7903866Abstract: An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame. The measurement system further includes a compensation device configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensation device may include a passive or an active damping device and/or a feedback position control system. In an alternative embodiment, the compensation device includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.Type: GrantFiled: March 29, 2007Date of Patent: March 8, 2011Assignee: ASML Netherlands B.V.Inventors: Marc Wilhelmus Maria Van Der Wijst, Engelbertus Antonius Fransiscus Van Der Pasch, Koen Jacobus Johannes Maria Zaal
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Publication number: 20100302518Abstract: The invention relates to a lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, including a cooling system to cool a part of the lithographic apparatus, the cooling system including a droplet ejector to form droplets and fire the droplets towards a cooling surface of the part of the lithographic apparatus to cool the part by evaporation of the droplets.Type: ApplicationFiled: April 28, 2010Publication date: December 2, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Jan VAN EIJK, Sjoerd Nicolaas Lambertus DONDERS, Johannes Henricus Wilhelmus JACOBS, Nicolaas TEN KATE, Johannes Petrus Martinus Bernardus VERMEULEN, Koen Jacobus Johannes Maria ZAAL, Marinus Jan REMIE
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Patent number: 7830493Abstract: A system and method are used to compensate for thermal effect on a lithographic apparatus. The system comprises a patterning device, a projection system, a substrate position controller, and a substrate-position-based expansion-compensator. The patterning device modulates a radiation beam. The projection system projects the modulated radiation beam onto a target portion of a substrate. The substrate position controller moves the substrate relative to the projection system sequentially through a plurality of exposure positions. The substrate-position-based expansion-compensator interacts with the substrate position controller to modify the exposure positions in order at least partially to compensate for thermally-induced geometrical changes of at least one of the substrate and projection system.Type: GrantFiled: October 25, 2005Date of Patent: November 9, 2010Assignee: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus Tinnemans, Willem Jurrianus Venema, Koen Jacobus Johannes Maria Zaal
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Patent number: 7804582Abstract: A lithographic apparatus includes a system to compensate for the effect of thermal distortion of the substrate table on position measurements of the substrate table using lateral mirrors in the substrate table. Methods of calibrating a lithographic apparatus using various substrate table scan trajectories and measurements of the localized position and rotation of lateral mirrors in the substrate table are presented. A dual stage lithographic apparatus with alignment marks defining the geometry of a lateral mirror used only at the exposure station to measure the geometry of the lateral mirror when the substrate table is at the measurement station.Type: GrantFiled: July 28, 2006Date of Patent: September 28, 2010Assignee: ASML Netherlands B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Joost Jeroen Ottens, Judocus Marie Dominicus Stoeldraijer, Antonius Johannes De Kort, Franciscus Van De Mast, Marteijn De Jong
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Patent number: 7746447Abstract: An immersion lithographic apparatus has a plurality of substrate holders arranged to hold substrates, each substrate holder having a conduit therein for passing a temperature control fluid. The thermal responses of the different substrate holders are calibrated and flow rates calculated and used so that all the holders return to a predetermined temperature in the same time.Type: GrantFiled: December 22, 2005Date of Patent: June 29, 2010Assignee: ASML Netherlands B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Johannes Henricus Wilhelmus Jacobs, Erik Roelof Loopstra, Joost Jeroen Ottens, Frederik Eduard De Jong
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Publication number: 20100073650Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: ApplicationFiled: December 4, 2009Publication date: March 25, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Koen Jacobus Johannes Maria ZAAL, Joost Jeroen Ottens
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Patent number: 7649611Abstract: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.Type: GrantFiled: December 30, 2005Date of Patent: January 19, 2010Assignee: ASML Netherlands B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Jeroen Joost Ottens
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Patent number: 7528935Abstract: A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.Type: GrantFiled: December 21, 2005Date of Patent: May 5, 2009Assignee: ASML Netherlands B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Tjarko Adriaan Rudolf Van Empel, Hendricus Johannes Maria Meijer, Joost Jeroen Ottens, Marco Le Kluse, Jan Hopman
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Patent number: 7492440Abstract: A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, may render the manufactured device unusable and/ or may render the control system complex. Therefore an actuator assembly frame with flexible coupling devices coupled to the support is provided with a number of actuators configured to move the support in a number of degrees of freedom. Thus, the resonances are damped by the flexible coupling devices resulting in a larger bandwidth for the control system and thus enabling a better position accuracy of the support.Type: GrantFiled: September 9, 2004Date of Patent: February 17, 2009Assignee: ASML Netherlands B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Edwin Johan Buis, Henrikus Herman Marie Cox, Noud Jan Gilissen, Harmen Klaas Van Der Schoot
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Patent number: 7486381Abstract: An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.Type: GrantFiled: May 21, 2004Date of Patent: February 3, 2009Assignee: ASML Netherlands B.V.Inventors: Bob Streefkerk, Henrikus Herman Marie Cox, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Maria Mertens, Koen Jacobus Johannes Maria Zaal, Minne Cuperus
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Publication number: 20080297744Abstract: An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain.Type: ApplicationFiled: June 1, 2007Publication date: December 4, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Frederik Eduard De Jong, Marcel Hendrikus Maria Beems, Marinus Aart Van Den Brink, Johannes Henricus Wilhelmus Jacobs, Martinus Hendrikus Antonius Leenders, Leon Martin Levasier, Frits Van Der Meulen, Joost Jeroen Ottens, Koen Jacobus Johannes Maria Zaal, Richard Bernardus Johannes Droste, Johannes Wilhelmus De Klerk, Peter Franciscus Wanten, Jan Cornelis Van Der Hoeven, Edwin Cornelis Kadijk, Marteijn De Jong, David Lucien Anstotz
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Publication number: 20080240501Abstract: An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame. The measurement system further includes a compensation device configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensation device may include a passive or an active damping device and/or a feedback position control system. In an alternative embodiment, the compensation device includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.Type: ApplicationFiled: March 29, 2007Publication date: October 2, 2008Applicant: ASML Netherlands B.V.Inventors: Marc Wilhelmus Maria Van Der Wijst, Engelbertus Antonius Fransiscus Van Der Pasch, Koen Jacobus Johannes Maria Zaal
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Patent number: 7426011Abstract: In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using normal and reversed meanders. The two data sets can then be used to eliminate effects due to wafer cooling.Type: GrantFiled: September 12, 2005Date of Patent: September 16, 2008Assignee: ASML Netherlands B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Antonius Johannes De Kort, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Hermen Folken Pen
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Patent number: 7423725Abstract: In calibration of overlay performance of an immersion lithographic apparatus, two sets of overlay data are obtained from exposures carried out using, for example, normal and reversed meanders. The two data sets can then be used to eliminate effects due to substrate cooling.Type: GrantFiled: September 6, 2006Date of Patent: September 9, 2008Assignee: ASML Netherlands B.V.Inventors: Koen Jacobus Johannes Maria Zaal, Antonius Johannes De Kort, Frederik Eduard De Jong, Koen Goorman, Boris Menchtchikov, Hermen Folken Pen
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Patent number: 7411657Abstract: A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.Type: GrantFiled: November 17, 2004Date of Patent: August 12, 2008Assignee: ASML Netherlands B.V.Inventors: Joost Jeroen Ottens, Noud Jan Gilissen, Martinus Hendrikus Antonius Leenders, Koen Jacobus Johannes Maria Zaal