Patents by Inventor Koen Steffens
Koen Steffens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220121131Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.Type: ApplicationFiled: December 29, 2021Publication date: April 21, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Marco Koert STAVENGA, Sergei Shulepov, Koen Steffens, Matheus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems
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Patent number: 11215933Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.Type: GrantFiled: October 18, 2019Date of Patent: January 4, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Marco Koert Stavenga, Sergei Shulepov, Koen Steffens, Matheus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems
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Patent number: 10591828Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.Type: GrantFiled: February 8, 2019Date of Patent: March 17, 2020Assignee: ASML Netherlands B.V.Inventors: Thibault Simon Mathieu Laurent, Gerardus Adrianus Antonius Maria Kusters, Bastiaan Andreas Wilhelmus Hubertus Knarren, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Takeshi Kaneko, Robbert Jan Voogd, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Johan Gertrudis Cornelis Kunnen, Ramin Badie
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Publication number: 20200050116Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.Type: ApplicationFiled: October 18, 2019Publication date: February 13, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Marco Koert STAVENGA, Sergei SHULEPOV, Koen STEFFENS, Matheus Ana Karel VAN LIEROP, Samuel Bertrand Dominique DAVID, David BESSEMS
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Patent number: 10481502Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.Type: GrantFiled: March 12, 2018Date of Patent: November 19, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Wilhelmus Franciscus Johannes Simons, Martijn Houben, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Han Henricus Aldegonda Lempens, Rogier Hendrikus Magdalena Cortie, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Siegfried Alexander Tromp, Theodorus Wilhelmus Polet, Jim Vincent Overkamp, Van Vuong Vy
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Patent number: 10451980Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.Type: GrantFiled: April 18, 2017Date of Patent: October 22, 2019Assignee: ASML Netherlands B.V.Inventors: Marco Koert Stavenga, Sergei Shulepov, Koen Steffens, Matheus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems
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Patent number: 10324384Abstract: An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.Type: GrantFiled: June 4, 2015Date of Patent: June 18, 2019Assignee: ASML Netherlands B.V.Inventors: Gerben Pieterse, Theodorus Wilhelmus Polet, Johannes Jacobus Matheus Baselmans, Willem Jan Bouman, Theodorus Marinus Modderman, Cornelius Maria Rops, Bart Smeets, Koen Steffens, Ronald Van Der Ham
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Publication number: 20190171113Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.Type: ApplicationFiled: February 8, 2019Publication date: June 6, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu LAURENT, Gerardus Adrianus Antonius Maria KUSTERS, Bastiaan Andreas Wilhelmus Hubertus KNARREN, Raymond Wilhelmus Louis LAFARRE, Koen STEFFENS, Takeshi KANEKO, Robbert Jan VOOGD, Gregory Martin Mason CORCORAN, Ruud Hendrikus Martinus Johannes BLOKS, Johan Gertrudis Cornelis KUNNEN, Ramin BADIE
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Patent number: 10268127Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.Type: GrantFiled: May 8, 2017Date of Patent: April 23, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Michel Riepen, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniƫl Jozef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Franciscus Johannes Joseph Janssen
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Patent number: 10203611Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.Type: GrantFiled: November 20, 2017Date of Patent: February 12, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu Laurent, Gerardus Adrianus Antonius Maria Kusters, Bastiaan Andreas Wilhelmus Hubertus Knarren, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Takeshi Kaneko, Robbert Jan Voogd, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Johan Gertrudis Cornelis Kunnen, Ramin Badie
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Publication number: 20180292762Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.Type: ApplicationFiled: June 14, 2018Publication date: October 11, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf KEMPER, Nicolaas TEN KATE, Joost Jeroen OTTENS, Marcel BECKERS, Marco POLIZZI, Michel RIEPEN, Anthonie KUIJPER, Koen STEFFENS, Adrianes Johannes BAETEN, Anca Mihaela ANTONEVICI
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Publication number: 20180267412Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.Type: ApplicationFiled: March 12, 2018Publication date: September 20, 2018Applicant: ASML Netherlands B.V.Inventors: Thibault Simon Mathieu LAURENT, Johannes Henricus Wilhelmus JACOBS, Wilhelmus Franciscus Johannes SIMONS, Martijn HOUBEN, Raymond Wilhelmus Louis LAFARRE, Koen STEFFENS, Han Henricus Aldegonda LEMPENS, Rogier Hendrikus Magdalena CORTIE, Ruud Hendrikus Martinus Johannes BLOKS, Gerben PIETERSE, Siegfried Alexander TROMP, Theodorus Wilhelmus POLET, Jim Vincent OVERKAMP, Van Vuong VY
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Publication number: 20180210350Abstract: An immersion lithographic apparatus including: a liquid confinement structure configured to supply and confine immersion liquid to an immersion space between a final lens element of a projection system and a surface of the substrate and/or of a substrate table; and a passageway-former between the projection system and the liquid confinement structure, and a passageway between the passageway-former and an optically active part of the final lens element, the passageway being in liquid communication via an opening with the immersion space and extending radially outwardly, with respect to an optical axis of the projection system, at least to an edge of an exposed bottom surface of the final lens element and being constructed and configured such that in use it is filled with liquid from the immersion space by capillary action.Type: ApplicationFiled: June 4, 2015Publication date: July 26, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Gerben PIETERSE, Theodorus Wilhelmus POLET, Johannes Jacobus Matheus BASELMANS, Willem Jan BOUMAN, Theodorus Marinus MODDERMAN, Cornelius Maria ROPS, Bart SMEETS, Koen STEFFENS, Ronald VAN DER HAM
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Patent number: 10018925Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.Type: GrantFiled: March 7, 2017Date of Patent: July 10, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf Kemper, Nicolaas Ten Kate, Joost Jeroen Ottens, Marcel Beckers, Marco Polizzi, Michel Riepen, Anthonie Kuijper, Koen Steffens, Adrianes Johannes Baeten, Anca Mihaela Antonevici
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Patent number: 10001712Abstract: An immersion lithographic apparatus includes a projection system. The projection system is configured to project a patterned radiation beam through an immersion liquid onto a target portion of a substrate. An external surface of the projection system includes a first surface. The first surface has a non-planar shape. An element is attached to the first surface and positioned so that at least a portion of the element contacts the immersion liquid in use. The element includes a closed loop of continuously integral material in a preformed state and conforms to the non-planar shape of the first surface.Type: GrantFiled: June 26, 2015Date of Patent: June 19, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Theodorus Wilhelmus Polet, Johannes Jacobus Matheus Baselmans, Willem Jan Bouman, Han Henricus Aldegonda Lempens, Theodorus Marinus Modderman, Cornelius Maria Rops, Bart Smeets, Koen Steffens, Ronald Van Der Ham
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Publication number: 20180074411Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.Type: ApplicationFiled: November 20, 2017Publication date: March 15, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu Laurent, Gerardus Adrianus Antonius Maria Kusters, Bastiaan Andreas Wilhelmus Hubertus Knarren, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Takeshi Kaneko, Robbert Jan Voogd, Gregory Martin Mason Corcoran, Ruud Henrikus Martinus Johannes Bloks, Johan Gertrudis Cornelis Kunnen, Ramin Badie
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Patent number: 9915877Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.Type: GrantFiled: June 21, 2017Date of Patent: March 13, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Wilhelmus Franciscus Johannes Simons, Martijn Houben, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Han Henricus Aldegonda Lempens, Rogier Hendrikus Magdalena Cortie, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Siegfried Alexander Tromp, Theodorus Wilhelmus Polet, Jim Vincent Overkamp, Van Vuong Vy
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Patent number: 9823589Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.Type: GrantFiled: March 23, 2016Date of Patent: November 21, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu Laurent, Gerardus Adrianus Antonius Maria Kusters, Bastiaan Andreas Wilhelmus Hubertus Knarren, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Takeshi Kaneko, Robbert Jan Voogd, Gregory Martin Mason Corcoran, Ruud Hendrikus Martinus Johannes Bloks, Johan Gertrudis Cornelis Kunnen, Ramin Badie
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Publication number: 20170315454Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.Type: ApplicationFiled: June 21, 2017Publication date: November 2, 2017Applicant: ASML Netherlands B.V.Inventors: Thibault Simon Mathieu LAURENT, Johannes Henricus Wilhelmus JACOBS, Wilhelmus Franciscus Johannes SIMONS, Martijn HOUBEN, Raymond Wilhelmus Louis LAFARRE, Koen STEFFENS, Han Henricus Aldegonda LEMPENS, Rogier Hendrikus Magdalena CORTIE, Ruud Hendrikus Martinus Johannes BLOKS, Gerben PIETERSE, Siegfried Alexander TROMP, Theodorus Wilhelmus POLET, Jim Vincent OVERKAMP, Van Vuong VY
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Patent number: 9785055Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.Type: GrantFiled: May 7, 2013Date of Patent: October 10, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Thibault Simon Mathieu Laurent, Johannes Henricus Wilhelmus Jacobs, Wilhelmus Franciscus Johannes Simons, Martijn Houben, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Han Henricus Aldegonda Lempens, Rogier Hendrikus Magdalena Cortie, Ruud Hendrikus Martinus Johannes Bloks, Gerben Pieterse, Siegfried Alexander Tromp, Theodorus Wilhelmus Polet, Jim Vincent Overkamp, Van Vuong Vy