Patents by Inventor Koen Steffens

Koen Steffens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 8508712
    Abstract: A fluid handling structure and lithographic apparatus is disclosed in which measures are taken, in particular to the dimensions and spacing of an array of openings in a bottom surface of the fluid handling structure, to deal with and/or prevent formation of bubbles in immersion liquid.
    Type: Grant
    Filed: October 21, 2009
    Date of Patent: August 13, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Clemens Johannes Gerardus Van Den Dungen, Danny Maria Hubertus Philips, Koen Steffens, Tijmen Wilfred Mathijs Gunther, David Bessems
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 8472003
    Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.
    Type: Grant
    Filed: June 22, 2010
    Date of Patent: June 25, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul Petrus Joannes Berkvens, Gert-Jan Geradus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Matheus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Ruud Hendrikus Martinus Johannes Bloks
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 8421993
    Abstract: A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.
    Type: Grant
    Filed: May 7, 2009
    Date of Patent: April 16, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Clemens Johannes Gerardus Van Den Dungen, Maikel Adrianus Cornelis Schepers, Paul Petrus Joannes Berkvens, Koen Steffens, Arnold Jan Van Putten
  • Fluid handling device, an immersion lithographic apparatus and a device manufacturing method
    Patent number: 8416388
    Abstract: A fluid handling system for an immersion lithographic apparatus that has a fluid removal device to remove immersion liquid from an immersion space, and a droplet removal device to remove a droplet of immersion liquid, wherein: the droplet removal device is located further from an optical axis than the fluid removal device, and the droplet removal device comprises a porous member which faces, e.g., the substrate being exposed and/or the substrate table.
    Type: Grant
    Filed: April 8, 2010
    Date of Patent: April 9, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Henricus Egidius Catharina Eummelen, Koen Steffens, Takeshi Kaneko, Gregory Martin Mason Corcoran
  • Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method
    Patent number: 8405817
    Abstract: A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.
    Type: Grant
    Filed: February 1, 2010
    Date of Patent: March 26, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Marco Koert Stavenga, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Richard Moerman, Michel Riepen, Sergei Shulepov, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Jan Willem Cromwijk, Ralph Joseph Meijers, Fabrizio Evangelista, David Bessems, Hua Li, Marinus Jochemsen, Pieter Lein Joseph Gunter, Franciscus Wilhelmus Bell, Erik Witberg, Marcus Agnes Johannes Smits, Zhenhua Ma
  • Fluid handling structure, lithographic apparatus and device manufacturing method
    Patent number: 8351018
    Abstract: A fluid handling structure is disclosed in which measures are taken to increase the speed at which meniscus breakdown occurs. Measures include the shape of a plurality of fluid extraction openings and the shape and density of a plurality of fluid supply openings in the fluid handling structure.
    Type: Grant
    Filed: May 6, 2009
    Date of Patent: January 8, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Daniel Jozef Maria Direcks, Danny Maria Hubertus Philips, Clemens Johannes Gerardus Van Den Dungen, Koen Steffens, Arnold Jan Van Putten
  • Immersion lithographic apparatus and device manufacturing method
    Patent number: 8259283
    Abstract: An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.
    Type: Grant
    Filed: March 20, 2009
    Date of Patent: September 4, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Daniël Jozef Maria Direcks, Nicolaas Rudolf Kemper, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Danny Maria Hubertus Philips, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Marcus Johannes Van Der Zanden, Pieter Mulder
  • Lithographic apparatus and device manufacturing method
    Patent number: 8218126
    Abstract: A liquid handling system is disclosed in which an extractor to contain liquid in a space between the projection system of a lithographic apparatus and a substrate has, in plan, a shape with a single corner. The extractor is provided in a rotatable part of a liquid handling system. The rotatable part is rotated under the control of a controller.
    Type: Grant
    Filed: December 2, 2008
    Date of Patent: July 10, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Koen Steffens, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Daniël Jozef Maria Direcks, Gert-Jan Gerardus Johannes Thomas Brands
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20120013865
    Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
    Type: Application
    Filed: July 14, 2011
    Publication date: January 19, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Thibault Simon Mathieu LAURENT, Gerardus Adrianus Antonius Maria Kusters, Bastiaan Andreas Wilhelmus Hubertus Knarren, Raymond Wilhelmus Louis Lafarre, Koen Steffens, Takeshi Kaneko, Robbert Jan Voogd, Gregory Martin Mason Corcoran, Ruud Hendricus Martinus Johannes Bloks, Johan Gertrudis Cornelis Kunnen, Ramin Badie
  • FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
    Publication number: 20110292357
    Abstract: A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.
    Type: Application
    Filed: May 2, 2011
    Publication date: December 1, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Ronald Van Der Ham, Martinus Hendrikus Antonius Leenders, Johannes Catharinus Hubertus Mulkens, Richard Moerman, Michel Riepen, Sergei Shulepov, Koen Steffens, Jan Willem Cromwijk, Johanna Antoinette Maria Sondag-Huethorst, Marco Baragona, Robertus Leonardus Maria In 'T Groen, Ralph Theodorus Hubertus Maessen, Jacob Marinus Jan Den Toonder, Milica Kovacevic-Milivojevic
  • LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
    Publication number: 20110149258
    Abstract: An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.
    Type: Application
    Filed: December 16, 2010
    Publication date: June 23, 2011
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Jeroen Gerard Gosen, Albert Johannes Maria Jansen, Nicolaas Ten Kate, Marco Koert Stavenga, Koen Steffens, Laurentius Johannes Adrianus Van Bokhoven, Henricus Jozef Castelijns, Koen Cuypers
  • FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110005603
    Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.
    Type: Application
    Filed: June 22, 2010
    Publication date: January 13, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Hrishikesh Patel, Johannes Henricus Wilhelmus Jacobs, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul Petrus Joannes Berkvens, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Matheus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete, Ruud Hendricus Martinus Johannes Bloks
  • SUBSTRATE TABLE, IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100277709
    Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.
    Type: Application
    Filed: March 11, 2010
    Publication date: November 4, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Marco Koert STAVENGA, Sergei Shulepov, Koen Steffens, Matheus Anna Karel Van Lierop, Samuel Bertrand Dominique David, David Bessems
  • FLUID HANDLING DEVICE, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD
    Publication number: 20100259735
    Abstract: A fluid handling system for an immersion lithographic apparatus that has a fluid removal device to remove immersion liquid from an immersion space, and a droplet removal device to remove a droplet of immersion liquid, wherein: the droplet removal device is located further from an optical axis than the fluid removal device, and the droplet removal device comprises a porous member which faces, e.g., the substrate being exposed and/or the substrate table.
    Type: Application
    Filed: April 8, 2010
    Publication date: October 14, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Erik Henricus Egidius Catharina Eummelen, Koen Steffens, Takeshi Kaneko, Gregory Martin Mason Corcoran
  • LITHOGRAPHIC APPARATUS, A METHOD OF CONTROLLING THE APPARATUS AND A DEVICE MANUFACTURING METHOD
    Publication number: 20100214543
    Abstract: A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.
    Type: Application
    Filed: February 1, 2010
    Publication date: August 26, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marco Koert Stavenga, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Richard Moerman, Michel Riepen, Sergei Shulepov, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Jan Willem Cromwijk, Ralph Joseph Meijers, Fabrizio Evangelista, David Bessems, Hua Li, Marinus Jochemsen, Pieter Lein Joseph Gunter, Franciscus Wilhelmus Bell, Erik Witberg, Marcus Agnes Johannes Smits, Zhenhua Ma
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100110410
    Abstract: A seal between a table and a component in a lithographic apparatus is disclosed. The seal bridges a gap between the component and the table when the component is in a position relative to the table. The component is moveable, in use, relative to the table and in an embodiment is attached to the table. The seal may be integral with the component or the table.
    Type: Application
    Filed: October 27, 2009
    Publication date: May 6, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: KOEN STEFFENS, RONALD VAN DER HAM, ERIK HENRICUS EGIDIUS CATHARINA EUMMELEN
  • FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100103391
    Abstract: A fluid handling structure and lithographic apparatus is disclosed in which measures are taken, in particular to the dimensions and spacing of an array of openings in a bottom surface of the fluid handling structure, to deal with and/or prevent formation of bubbles in immersion liquid.
    Type: Application
    Filed: October 21, 2009
    Publication date: April 29, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Clemens Johannes Gerardus VAN DEN DUNGEN, Danny Maria Hubertus PHILIPS, Koen STEFFENS, Tijmen Wilfred Mathijs GUNTHER, David BESSEMS
  • LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20100045950
    Abstract: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.
    Type: Application
    Filed: August 18, 2009
    Publication date: February 25, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Rudolf Kemper, Nicolaas Ten Kate, Joost Jeroen Ottens, Marcel Beckers, Marco Polizzi, Michel Riepen, Anthonie Kuijper, Koen Steffens, Adrianes Johannes Baeten, Anca Mihaela Antonevici
  • FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090279062
    Abstract: A fluid handling structure is disclosed in which the size and arrangement of the fluid extraction openings is specified in order to reduce the vibrations which are transmitted to the fluid handling structure as a result of two-phase extraction. The area of each fluid extraction opening and/or the total area of all of the fluid extraction openings and/or the space in between neighboring fluid extraction openings may be controlled. The reduction in vibrations increases the accuracy of the exposure.
    Type: Application
    Filed: May 7, 2009
    Publication date: November 12, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Daniel Jozef Maria DIRECKS, Danny Maria Hubertus PHILIPS, Clemens Johannes Gerardus VAN DEN DUNGEN, Maikel Adrianus Cornelis SCHEPERS, Paul Petrus Joannes BERKVENS, Koen STEFFENS, Arnold Jan VAN PUTTEN
  • FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090279060
    Abstract: A fluid handling structure is disclosed in which measures are taken to increase the speed at which meniscus breakdown occurs. Measures include the shape of a plurality of fluid extraction openings and the shape and density of a plurality of fluid supply openings in the fluid handling structure.
    Type: Application
    Filed: May 6, 2009
    Publication date: November 12, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Daniel Jozef Maria DIRECKS, Danny Maria Hubertus PHILIPS, Clemens Johannes Gerardus VAN DEN DUNGEN, Koen STEFFENS, Arnold Jan VAN PUTTEN