Patents by Inventor Koen Steffens

Koen Steffens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090237632
    Abstract: An immersion lithographic apparatus is described in which a droplet removal device removes droplets from the substrate, e.g. during exposures, using an angled flow of gas from a gas knife.
    Type: Application
    Filed: March 20, 2009
    Publication date: September 24, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Daniel Jozef Maria Direcks, Nicolaas Rudolf Kemper, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Danny Maria Hubertus Philips, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Marcus Johannes Van Der Zanden, Pieter Mulder
  • Lithographic apparatus having parts with a coated film adhered thereto
    Patent number: 7561250
    Abstract: A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.
    Type: Grant
    Filed: June 19, 2007
    Date of Patent: July 14, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Paulus Martinus Maria Liebregts, Menno Fien, Erik Roelof Loopstra, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens
  • Lithographic apparatus and device manufacturing method
    Publication number: 20090147227
    Abstract: A liquid handling system is disclosed in which an extractor to contain liquid in a space between the projection system of a lithographic apparatus and a substrate has, in plan, a shape with a single corner. The extractor is provided in a rotatable part of a liquid handling system. The rotatable part is rotated under the control of a controller.
    Type: Application
    Filed: December 2, 2008
    Publication date: June 11, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Koen Steffens, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Daniel Jozef Maria Direcks, Gert-Jan Gerardus Johannes Thomas Brands
  • Lithographic apparatus and device manufacturing method
    Publication number: 20090073395
    Abstract: An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.
    Type: Application
    Filed: September 13, 2007
    Publication date: March 19, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Paul Petrus Joannes Berkvens, Roelof Frederik De Graaf, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Paul William Scholtes-Van Eijk, Gert-Jan Gerardus Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Spruytenburg, Joris Johan Verstraete
  • Lithographic apparatus having parts with a coated film adhered thereto
    Publication number: 20080316441
    Abstract: A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.
    Type: Application
    Filed: June 19, 2007
    Publication date: December 25, 2008
    Applicant: ASML NETHERLAND B.V.
    Inventors: Paulus Martinus Maria Liebregts, Menno Fien, Erik Roelof Loopstra, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Jozef Maria Direcks, Franciscus Johannes Joseph Janssen, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens
  • Lithographic apparatus and device manufacturing method
    Publication number: 20080212046
    Abstract: A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
    Type: Application
    Filed: November 30, 2007
    Publication date: September 4, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Michel Riepen, Christiaan Alexander Hoogendam, Paulus Martinus Maria Liebregts, Ronald Van Der Ham, Wilhelmus Franciscus Johannes Simons, Daniel Josef Maria Direcks, Paul Petrus Joannes Berkvens, Eva Mondt, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Han Henricus Aldegonda Lempens, Mathieus Anna Karel Van Lierop, Christophe De Metsenaere, Marcio Alexandre Cano Miranda, Patrick Johannes Wilhelmus Spruytenburg, Joris Johan Anne-Marie Verstraete