Patents by Inventor Koichiro Ishibashi

Koichiro Ishibashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7132871
    Abstract: A data retaining circuit has been disclosed in which, even if a soft error occurs, it is corrected and a normal value can be maintained, the configuration is simple, and high-speed operations are enabled. In this circuit, when a soft error occurs in the data to be put out, it is corrected by a pull-up path or a pull-down path, and when a soft error occurs in the data in the pull-up path or the pull-down path, the error data in the pull-up path or the pull-down path is prevented from affecting each other, as well as turning off the correcting function to prevent the influence on the data to be put out.
    Type: Grant
    Filed: June 15, 2005
    Date of Patent: November 7, 2006
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Yukio Arima, Takahiro Yamashita, Koichiro Ishibashi
  • Publication number: 20060226449
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Application
    Filed: June 14, 2006
    Publication date: October 12, 2006
    Inventors: Kenichi Osada, Koichiro Ishibashi, Yoshikazu Saitoh, Akio Nishida, Masaru Nakamichi, Naoki Kitai
  • Patent number: 7112999
    Abstract: A semiconductor integrated circuit device comprising a logical circuit including a MIS transistor formed on a semiconductor substrate, a control circuit for controlling a threshold voltage of the MIS transistor forming the logical circuit, an oscillation circuit including a MIS transistor formed on the semiconductor substrate, the oscillation circuit being constructed so that the frequency of an oscillation output thereof can be made variable, and a buffer circuit, in which the control circuit is supplied with a clock signal having a predetermined frequency and the oscillation output of the oscillation circuit so that the control circuit compares the frequency of the oscillation output and the frequency of the clock signal to output a first control signal, the oscillation circuit is controlled by the first control signal so that the frequency of the oscillation output corresponds to the frequency of the clock signal, the control of the frequency of the oscillation output being performed in such a manner that
    Type: Grant
    Filed: May 9, 2005
    Date of Patent: September 26, 2006
    Assignee: Renesas Technology Corporation
    Inventors: Hiroyuki Mizuno, Masataka Minami, Koichiro Ishibashi, Masayuki Miyazaki
  • Patent number: 7099183
    Abstract: A logic circuit in a system LSI is provided with a power switch so as to cut off the switch at the time of standby, reducing leakage current. At the same time, an SRAM circuit of the system LSI controls a substrate bias to reduce leakage current.
    Type: Grant
    Filed: June 15, 2005
    Date of Patent: August 29, 2006
    Assignee: Hitachi, Ltd.
    Inventors: Masanao Yamaoka, Koichiro Ishibashi, Shigezumi Matsui, Kenichi Osada
  • Publication number: 20060176101
    Abstract: In order to provide a semiconductor IC unit such as a microprocessor, etc. which satisfies both fast operation and lower power consumption properties with its high quality kept, the semiconductor IC unit of the present invention is composed so as to include a main circuit (LOG) provided with transistors, which is formed on a semiconductor substrate, and a substrate bias controlling circuit (VBC) used for controlling a voltage to be applied to the substrate, and the main circuit includes switching transistors (MN1 and MP1) used for controlling a voltage to be applied to the substrate and control signals output from the substrate bias controlling circuit is entered to the gate of each of the switching transistors and the control signal is returned to the substrate bias controlling circuit.
    Type: Application
    Filed: April 4, 2006
    Publication date: August 10, 2006
    Inventors: Hiroyuki Mizuno, Koichiro Ishibashi, Takanori Shimura, Toshihiro Hattori
  • Patent number: 7087942
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Grant
    Filed: November 29, 2005
    Date of Patent: August 8, 2006
    Assignees: Renesas Technology Corporation, Hitachi ULSI Systems Co., Ltd.
    Inventors: Kenichi Osada, Koichiro Ishibashi, Yoshikazu Saitoh, Akio Nishida, Masaru Nakamichi, Naoki Kitai
  • Publication number: 20060119395
    Abstract: A CMOS LSI includes an inverter including first and second MOS transistors, a relatively long metal interconnection connected to an input node of the inverter, first and second diodes releasing charges born by the metal interconnection during a plasma process to first and second wells, and first and second MOS transistors maintaining a voltage between the first and second wells at a level not higher than a prescribed voltage. Therefore, even when an antenna ratio is high, a gate oxide film in the first and second MOS transistors is not damaged during the plasma process.
    Type: Application
    Filed: December 1, 2005
    Publication date: June 8, 2006
    Inventors: Shigeki Ohbayashi, Hiroaki Suzuki, Koichiro Ishibashi, Hiroshi Makino
  • Patent number: 7046075
    Abstract: In order to provide a semiconductor IC unit such as a microprocessor, etc., which satisfies both fast operation and lower power consumption properties with its high quality kept, the semiconductor IC unit of the present invention is composed so as to include a main circuit (LOG) provided with transistors, which is formed on a semiconductor substrate, and a substrate bias controlling circuit (VBC) used for controlling a voltage to be applied to the substrate, and the main circuit includes switching transistors (MN1 and MP1) used for controlling a voltage to be applied to the substrate and control signals output from the substrate bias controlling circuit is entered to the gate of each of the switching transistors and the control signal is returned to the substrate bias controlling circuit.
    Type: Grant
    Filed: June 6, 2005
    Date of Patent: May 16, 2006
    Assignee: Renesas Technology Corporation
    Inventors: Hiroyuki Mizuno, Koichiro Ishibashi, Takanori Shimura, Toshihiro Hattori
  • Publication number: 20060076610
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Application
    Filed: November 29, 2005
    Publication date: April 13, 2006
    Inventors: Kenichi Osada, Koichiro Ishibashi, Yoshikazu Saitoh, Akio Nishida, Masaru Nakamichi, Naoki Kitai
  • Publication number: 20060050588
    Abstract: Prior known static random access memory (SRAM) cells are required that a diffusion layer be bent into a key-like shape in order to make electrical contact with a substrate with a P-type well region formed therein, which would result in a decrease in asymmetry leading to occurrence of a problem as to the difficulty in micropatterning. To avoid this problem, the P-type well region in which an inverter making up an SRAM cell is formed is subdivided into two portions, which are disposed on the opposite sides of an N-type well region NW1 and are formed so that a diffusion layer forming a transistor has no curvature while causing the layout direction to run in a direction parallel to well boundary lines and bit lines. At intermediate locations of an array, regions for use in supplying power to the substrate are formed in parallel to word lines in such a manner that one regions is provided per group of thirty two memory cell rows or sixty four cell rows.
    Type: Application
    Filed: October 31, 2005
    Publication date: March 9, 2006
    Inventors: Kenichi Osada, Masataka Minami, Shuji Ikeda, Koichiro Ishibashi
  • Patent number: 6998674
    Abstract: The gate tunnel leakage current is increased in the up-to-date process, so that it is necessary to reduce the gate tunnel leakage current in the LSI which is driven by a battery for use in a cellular phone and which needs to be in a standby mode at a low leakage current. In a semiconductor integrated circuit device, the ground source electrode lines of logic and memory circuits are kept at a ground potential in an active mode, and are kept at a voltage higher than the ground potential in an unselected standby mode. The gate tunnel leakage current can be reduced without destroying data.
    Type: Grant
    Filed: April 13, 2005
    Date of Patent: February 14, 2006
    Assignees: Renesas Technology Corp., Hitachi ULSI Systems Co., Ltd.
    Inventors: Kenichi Osada, Koichiro Ishibashi, Yoshikazu Saitoh, Akio Nishida, Masaru Nakamichi, Naoki Kitai
  • Patent number: 6987415
    Abstract: In order to provide a semiconductor IC unit such as a microprocessor, etc., which satisfies both fast operation and lower power consumption properties with its high quality kept, the semiconductor IC unit of the present invention is composed so as to include a main circuit (LOG) provided with transistors, which is formed on a semiconductor substrate, and a substrate bias controlling circuit (VBC) used for controlling a voltage to be applied to the substrate, and the main circuit includes switching transistors (MN1 and MP1) used for controlling a voltage to be applied to the substrate and control signals output from the substrate bias controlling circuit is entered to the gate of each of the switching transistors and the control signal is returned to the substrate bias controlling circuit.
    Type: Grant
    Filed: January 29, 2004
    Date of Patent: January 17, 2006
    Assignee: Renesas Technology Corporation
    Inventors: Hiroyuki Mizuno, Koichiro Ishibashi, Takanori Shimura, Toshihiro Hattori
  • Publication number: 20050285210
    Abstract: In an integrated circuit device, there are various optimum gate lengths, thickness of gate oxide films, and threshold voltages according to the characteristics of circuits. In a semiconductor integrated circuit device in which the circuits are integrated on the same substrate, the manufacturing process is complicated in order to set the circuits to the optimum values. As a result, in association with deterioration in the yield and increase in the number of manufacturing days, the manufacturing cost increases. In order to solve the problems, according to the invention, transistors of high and low thresholds are used in a logic circuit, a memory cell uses a transistor of the same high threshold voltage and a low threshold voltage transistor, and an input/output circuit uses a transistor having the same high threshold voltage and the same concentration in a channel, and a thicker gate oxide film.
    Type: Application
    Filed: July 26, 2005
    Publication date: December 29, 2005
    Inventors: Koichiro Ishibashi, Kenichi Osada
  • Publication number: 20050248379
    Abstract: A data retaining circuit has been disclosed in which, even if a soft error occurs, it is corrected and a normal value can be maintained, the configuration is simple, and high-speed operations are enabled. In this circuit, when a soft error occurs in the data to be put out, it is corrected by a pull-up path or a pull-down path, and when a soft error occurs in the data in the pull-up path or the pull-down path, the error data in the pull-up path or the pull-down path is prevented from affecting each other, as well as turning off the correcting function to prevent the influence on the data to be put out.
    Type: Application
    Filed: June 15, 2005
    Publication date: November 10, 2005
    Inventors: Yukio Arima, Takahiro Yamashita, Koichiro Ishibashi
  • Publication number: 20050242863
    Abstract: A data retaining circuit has been disclosed in which, even if a soft error occurs, it is corrected and a normal value can be maintained, the configuration is simple, and high-speed operations are enabled. In this circuit, when a soft error occurs in the data to be put out, it is corrected by a pull-up path or a pull-down path, and when a soft error occurs in the data in the pull-up path or the pull-down path, the error data in the pull-up path or the pull-down path is prevented from affecting each other, as well as turning off the correcting function to prevent the influence on the data to be put out.
    Type: Application
    Filed: June 15, 2005
    Publication date: November 3, 2005
    Inventors: Yukio Arima, Takahiro Yamashita, Koichiro Ishibashi
  • Publication number: 20050232054
    Abstract: A logic circuit in a system LSI is provided with a power switch so as to cut off the switch at the time of standby, reducing leakage current. At the same time, an SRAM circuit of the system LSI controls a substrate bias to reduce leakage current.
    Type: Application
    Filed: June 15, 2005
    Publication date: October 20, 2005
    Inventors: Masanao Yamaoka, Koichiro Ishibashi, Shigezumi Matsui, Kenichi Osada
  • Publication number: 20050231257
    Abstract: A data retaining circuit has been disclosed in which, even if a soft error occurs, it is corrected and a normal value can be maintained, the configuration is simple, and high-speed operations are enabled. In this circuit, when a soft error occurs in the data to be put out, it is corrected by a pull-up path or a pull-down path, and when a soft error occurs in the data in the pull-up path or the pull-down path, the error data in the pull-up path or the pull-down path is prevented from affecting each other, as well as turning off the correcting function to prevent the influence on the data to be put out.
    Type: Application
    Filed: June 15, 2005
    Publication date: October 20, 2005
    Inventors: Yukio Arima, Takahiro Yamashita, Koichiro Ishibashi
  • Publication number: 20050226077
    Abstract: A static memory cell, composed of cross-coupled MOS transistors having a relatively high threshold voltage, is equipped with MOS transistors for controlling the power supply line voltage of the memory cell. To permit the voltage difference between two data storage nodes in the inactivated memory cell to exceed the voltage difference between the two nodes when write data is applied from a data line pair DL and /DL to the two nodes in the activated memory cell, the power supply line voltage control transistors are turned on to apply a high voltage VCH to the power supply lines after the word line voltage is turned off. The data holding voltage in the memory cell can be activated to a high voltage independent of the data line voltage, and the data holding voltage can be dynamically set so that read and write operations can be performed at high speed with low power consumption.
    Type: Application
    Filed: June 9, 2005
    Publication date: October 13, 2005
    Inventors: Kiyoo Itoh, Koichiro Ishibashi
  • Patent number: 6953975
    Abstract: In an integrated circuit device, there are various optimum gate lengths, thickness of gate oxide films, and threshold voltages according to the characteristics of circuits. In a semiconductor integrated circuit device in which the circuits are integrated on the same substrate, the manufacturing process is complicated in order to set the circuits to the optimum values. As a result, in association with deterioration in the yield and increase in the number of manufacturing days, the manufacturing cost increases. In order to solve the problems, according to the invention, transistors of high and low thresholds are used in a logic circuit, a memory cell uses a transistor of the same high threshold voltage and a low threshold voltage transistor, and an input/output circuit uses a transistor having the same high threshold voltage and the same concentration in a channel, and a thicker gate oxide film.
    Type: Grant
    Filed: December 10, 2003
    Date of Patent: October 11, 2005
    Assignee: Renesas Technology Corp.
    Inventors: Koichiro Ishibashi, Kenichi Osada
  • Publication number: 20050218965
    Abstract: In order to provide a semiconductor IC unit such as a microprocessor, etc., which satisfies both fast operation and lower power consumption properties with its high quality kept, the semiconductor IC unit of the present invention is composed so as to include a main circuit (LOG) provided with transistors, which is formed on a semiconductor substrate, and a substrate bias controlling circuit (VBC) used for controlling a voltage to be applied to the substrate, and the main circuit includes switching transistors (MN1 and MP1) used for controlling a voltage to be applied to the substrate and control signals output from the substrate bias controlling circuit is entered to the gate of each of the switching transistors and the control signal is returned to the substrate bias controlling circuit.
    Type: Application
    Filed: June 6, 2005
    Publication date: October 6, 2005
    Inventors: Hiroyuki Mizuno, Koichiro Ishibashi, Takanori Shimura, Toshihiro Hattori