Abstract: A rotor includes a first rotor core, a second rotor core, a field magnet, and a detected portion. The first rotor core includes a first core base and a plurality of first claw-shaped magnetic pole portions. The second rotor core includes a second core base and a plurality of second claw-shaped magnetic pole portions. The first and second core bases face to each other, and the first and second claw-shaped magnetic pole portions are alternately arranged in the circumferential direction. The field magnet is located between the first and second core bases in the axial direction. The field magnet has the first claw-shaped magnetic pole portion function as a first magnetic pole and has the second claw-shaped magnetic pole portion function as a second magnetic pole. A detected portion, which generates a magnetic flux, is arranged at an outer axial end surface of the first rotor core.

Abstract: A brushless motor includes a first rotor core, a second rotor core, and a field magnet member. The first rotor core includes primary projecting pieces arranged along a circumferential direction at equal intervals. The second rotor core has the same shape as the first rotor core, and includes secondary projecting pieces arranged along the circumferential direction at equal intervals. The secondary projecting pieces are positioned between the primary projecting pieces that are adjacent to one another in the circumferential direction. The field magnet member is arranged between the first rotor core and the second rotor core. The field magnet member is magnetized along an axial direction to generate primary magnetic poles in the primary projecting pieces, and generate secondary magnetic poles in the secondary projecting pieces. A rotor includes the first rotor core, the second rotor core, and the field magnet member.

Abstract: The present invention provides a determination method of determining exposure conditions of an exposure apparatus including an illumination optical system which illuminates a mask, and a projection optical system which projects a pattern of the mask onto a substrate, the method including a step of setting an illumination parameter for a light intensity distribution formed on a pupil plane of the illumination optical system, and an aberration parameter for an aberration of the projection optical system, and a step of determining a value of the illumination parameter and a value of the aberration parameter so that an image performance of an optical image of the pattern of the mask satisfies an evaluation criterion set for a target pattern to be formed on an image plane of the projection optical system.

Abstract: A method being performed by a processor includes, acquiring data of patterns of a plurality of cells that include an identified pattern for which an evaluation value of an optical image falls outside a first allowable range among patterns in which each a pattern being single cell alone, creating the pattern of a mask by arranging the patterns of the plurality of cells that include the identified pattern, and evaluating an optical image of the identified pattern in the created pattern of the mask.

Abstract: A rotor includes first and second rotor cores, a disk magnet, and a rectifying magnet. The first and second rotor cores each include a core base and claw-poles. The disk magnet is magnetized in the axial direction so that the claw-poles of the first rotor core function as first poles and the claw-poles of the second rotor core function as second poles. The rectifying magnet includes at least an inter-pole magnet portion or a back-surface magnet portion. The inter-pole magnet portion is located in a gap formed in the circumferential direction between the claw-poles of the first rotor core and the claw-poles of the second rotor core. The back surface magnet portion is located in a gap formed at back surfaces of the claw-poles. The rectifying magnet and the disk magnet are formed from different materials. The rectifying magnet is integrated with the disk magnet in a post-process.

Abstract: A recording medium stores a program for causing a computer to execute a method of calculating a resist pattern.

Abstract: A rotor of a motor includes first and second rotor cores, a field magnet, and a commutator magnet. The first and second rotor cores each include a core base and a plurality of claw poles. The claw poles of the first rotor core and the claw poles of the second rotor core are alternately arranged in a circumferential direction. The field magnet is located between the core bases. The field magnet is magnetized in an axial direction so that the claw poles of the first rotor core and the claw poles of the second rotor core function as different magnetic poles in the circumferential direction. The commutator magnet is located on an outer circumference of the field magnet around the claw poles. The commutator magnet is magnetized so that surfaces having the same polarity face each other between the claw poles and the commutator magnet.

Abstract: A motor includes a shaft, a rotor, and a stator. The rotor includes first and second rotor cores, and a field magnet. Second claw magnetic pole portions of second rotor core are arranged between first claw magnetic pole portions of the first rotor core. The field magnet causes the first claw magnetic pole portions to function as first magnetic poles, and the second claw magnetic pole portions to function as second magnetic poles. Radially inner surfaces of the teeth of a stator core face radially outer surfaces of the first and second claw magnetic poles. Either radially outer surfaces of the first and second claw magnetic pole portions or radially inner surfaces of the teeth each have a cross-sectional shape in a direction orthogonal to the axial direction that is not concentric to a circle of which center is an axis of the rotation shaft.

Abstract: A motor includes a stator, a rotor, a case, and back-surface magnet portions. The rotor has a first rotor core, a second rotor core and a field magnet. Each of the first and second rotor cores has a core base and claw-shaped magnetic poles. The field magnet is sandwiched between the first rotor core and the second rotor core and causes the claw-shaped magnetic poles of the first rotor core and the second rotor core to function as different magnetic poles. The back-surface magnet portions include a second and a first back-surface magnet portions respectively provided on the back surfaces of the claw-shaped magnetic poles of the second rotor core and the first rotor core. Size of the second back-surface magnet portion differs from size of the first back-surface magnet portion are different from each other.

Abstract: A motor includes a stator, a rotor, and a case. The stator includes a stator core and windings. The rotor is provided inside the stator. The rotor includes first and second rotor cores and a field magnet. The first and second rotor cores each includes a core base and claw-shaped magnetic poles. The core bases are opposed to each other and the claw-shaped magnetic poles of the first and second rotor cores are alternately disposed in a circumferential direction. The field magnet is disposed between the core bases in the axial direction. The field magnet is magnetized in the axial direction so as to cause the claw-shaped magnetic poles of the first rotor core and the second rotor core to function respectively as first magnetic poles and second magnetic poles. At least part of an end part of the case in the axial direction is made of a non-magnetic body.

Abstract: A method being performed by a processor includes, acquiring data of patterns of a plurality of cells that include an identified pattern for which an evaluation value of an optical image falls outside a first allowable range among patterns in which each a pattern being single cell alone, creating the pattern of a mask by arranging the patterns of the plurality of cells that include the identified pattern, and evaluating an optical image of the identified pattern in the created pattern of the mask.

Abstract: A computer readable storage medium is provided, storing a computer-executable program for causing a computer to determine at least one of mask pattern and exposure condition of an exposure apparatus having an illumination optical system for illuminating a mask with light from a light source and a projection optical system for projecting the mask pattern onto a substrate. The program causes the computer to perform calculation of an image of a pattern on an object plane of the projection optical system using information about lateral shift of an image caused by the exposure apparatus, and determination of at least one of the exposure condition and the mask pattern based on a calculation result.

Abstract: A rotor includes a first rotor core, a second rotor core, a first magnet, a second magnet, and an annular magnet. The first magnet is arranged between first extensions of the first rotor core. The annular magnet, which is arranged between second extensions of the second rotor core, is held between the first core base and the second core base. The first magnet and the second magnet are formed integrally.

Abstract: A rotor includes first and second rotor cores, a disk magnet, and a rectifying magnet. The first and second rotor cores each include a core base and claw-poles. The disk magnet is magnetized in the axial direction so that the claw-poles of the first rotor core function as first poles and the claw-poles of the second rotor core function as second poles. The rectifying magnet includes at least an inter-pole magnet portion or a back-surface magnet portion. The inter-pole magnet portion is located in a gap formed in the circumferential direction between the claw-poles of the first rotor core and the claw-poles of the second rotor core. The back surface magnet portion is located in a gap formed at back surfaces of the claw-poles. The rectifying magnet and the disk magnet are formed from different materials. The rectifying magnet is integrated with the disk magnet in a post-process.

Abstract: A determining method includes the steps of setting a first parameter to define the shape of the plurality of pattern elements of the mask, setting a second parameter to define the effective light source distribution; and repeating the process of calculation of the image of the mask pattern and calculation of a value of an evaluation item while varying the value of the first parameter and the second parameter to thereby determine the effective light source distribution and the mask pattern, wherein parameters of pattern elements are set as one parameter by using a value of an index representing the proximity effect.

Abstract: A method of determining a pattern of a mask to be used in an exposure apparatus. The mask is arranged on an object plane of a projection optical system. The method includes calculating a value of a first evaluation function used to evaluate a cost of drawing a provisional pattern on a mask blank to manufacture the mask, calculating a value of a second evaluation function used to evaluate an image of the provisional pattern, which is formed on an image plane of the projection optical system when a mask having the provisional pattern is arranged on the object plane, and changing the provisional pattern. The calculations are repeated, and the provisional pattern is determined as the pattern of the mask, when the value of the first evaluation function meets a first predetermined standard and the value of the second evaluation function meets a second predetermined standard.

Abstract: A motor includes a stator, a rotor and a case. The rotor includes a first rotor core, a second rotor core, and a field magnet. Each of the first rotor core and the second rotor core includes a core base and a plurality of claw poles. The field magnet is located between the core bases. The case includes a cylindrical yoke housing and a lid. To balance magnetic flux from the first rotor core with magnetic flux from the second rotor core, the distance between the rotor and the stator is varied from the distance between the rotor and the yoke housing or the teeth of the stator are shaped to enable magnetic saturation.

Abstract: The present invention provides a determination method of determining a light intensity distribution to be formed on a pupil plane of an illumination optical system in an exposure apparatus, the method including a step of setting a cutline used to evaluate an image of a pattern of a mask, which is formed on an image plane of a projection optical system, and a target position of the image, and a step of determining an intensity of an element light source such that the position of a midpoint between edges of the image of the pattern of the mask on the cutline from a calculated image comes close to the target position, thereby determining the light intensity distribution.

Abstract: A rotor includes a first rotor core, a second rotor core, a permanent magnet and a resin layer. The first rotor core includes a first core base and first claw-shaped magnetic poles arranged at equal intervals on a peripheral portion of the first core base. The second rotor core includes a second core base and second claw-shaped magnetic poles arranged at equal intervals on a peripheral portion of the second core base. The first rotor core and the second rotor core are combined with each other so that the first and second core bases are opposed to each other and the first and second claw-shaped magnetic poles are alternately arranged in the circumferential direction of the rotor. The permanent magnet includes at least a main field magnet. The main field magnet is located between the first and second core bases in the axial direction, and is magnetized in the axial direction.

Abstract: A determining method includes the steps of setting a first parameter to define the shape of the plurality of pattern elements of the mask, setting a second parameter to define the effective light source distribution; and repeating the process of calculation of the image of the mask pattern and calculation of a value of an evaluation item while varying the value of the first parameter and the second parameter to thereby determine the effective light source distribution and the mask pattern, wherein parameters of pattern elements are set as one parameter by using a value of an index representing the proximity effect.