Abstract: A brushless motor includes a rotor. The rotor includes a first rotor core, a second rotor core and a field magnet. The first rotor core includes a plurality of first magnetic pole portions arranged in a circumferential direction. The second rotor core includes a plurality of second magnetic pole portions arranged in the circumferential direction. The field magnet is arranged between the first rotor core and the second rotor core in an axial direction. When the field magnet is magnetized in the axial direction, the first magnetic pole portions function as first magnetic poles and the second magnetic pole portions function as second magnetic poles.

Abstract: A rotor includes a first rotor core, a second rotor core, a field magnet, and a detected portion. The first rotor core includes a first core base and a plurality of first claw-shaped magnetic pole portions. The second rotor core includes a second core base and a plurality of second claw-shaped magnetic pole portions. The first and second core bases face to each other, and the first and second claw-shaped magnetic pole portions are alternately arranged in the circumferential direction. The field magnet is located between the first and second core bases in the axial direction. The field magnet has the first claw-shaped magnetic pole portion function as a first magnetic pole and has the second claw-shaped magnetic pole portion function as a second magnetic pole. A detected portion, which generates a magnetic flux, is arranged at an outer axial end surface of the first rotor core.

Abstract: A motor includes a shaft, a rotor, and a stator. The rotor includes first and second rotor cores, and a field magnet. Second claw magnetic pole portions of second rotor core are arranged between first claw magnetic pole portions of the first rotor core. The field magnet causes the first claw magnetic pole portions to function as first magnetic poles, and the second claw magnetic pole portions to function as second magnetic poles. Radially inner surfaces of the teeth of a stator core face radially outer surfaces of the first and second claw magnetic poles. Either radially outer surfaces of the first and second claw magnetic pole portions or radially inner surfaces of the teeth each have a cross-sectional shape in a direction orthogonal to the axial direction that is not concentric to a circle of which center is an axis of the rotation shaft.

Abstract: A pattern generation method for generating a pattern of a cell used to generate a pattern of a mask using a computer, includes obtaining data of pattern of the cell, calculating image of the pattern of the cell to obtain an evaluation value of the image by repeatedly changing a parameter value of an exposure condition when the mask which has the pattern of the cell is illuminated to project image of the pattern of the cell onto a substrate to expose the substrate, and a parameter value of the pattern of the cell, and determining parameter value of the pattern of the cell when the evaluation value satisfies a predetermined evaluation standard.

Abstract: A brushless motor includes a first rotor core, a second rotor core, and a field magnet member. The first rotor core includes primary projecting pieces arranged along a circumferential direction at equal intervals. The second rotor core has the same shape as the first rotor core, and includes secondary projecting pieces arranged along the circumferential direction at equal intervals. The secondary projecting pieces are positioned between the primary projecting pieces that are adjacent to one another in the circumferential direction. The field magnet member is arranged between the first rotor core and the second rotor core. The field magnet member is magnetized along an axial direction to generate primary magnetic poles in the primary projecting pieces, and generate secondary magnetic poles in the secondary projecting pieces. A rotor includes the first rotor core, the second rotor core, and the field magnet member.

Abstract: The present invention provides a method of generating a database of effective light source shapes including a generation step of generating an initial database representing an effective light source shapes corresponding to a plurality of conditions settable for an illumination optical system, a measurement step of setting an arbitrary condition for the illumination optical system, and measuring an effective light source shape, a calculation step of calculating a difference amount between an effective light source shape when each of the plurality of conditions is set for the illumination optical system and the effective light source shape included in the initial database, and a correction step of correcting the effective light source shapes included in the initial database using the difference amounts and compiling the corrected effective light source shapes into an actual database.

Abstract: A signal receiver apparatus includes a waveform shaping data storage device storing waveform shaping data of a signal transmitted with a given timing from a signal transmitter device of a plurality of signal transmitter devices which are coupled to the signal receiver apparatus for each of the plurality of signal transmitter devices, and a waveform shaping device reading waveform shaping data of the signal transmitter device in the plurality of signal transmitter device from the waveform shaping data storage device when a signal from the signal transmitter device is received, and shaping a waveform of a received signal from the signal transmitter device.

Abstract: The present invention provides a determination method of determining exposure conditions of an exposure apparatus including an illumination optical system which illuminates a mask, and a projection optical system which projects a pattern of the mask onto a substrate, the method including a step of setting an illumination parameter for a light intensity distribution formed on a pupil plane of the illumination optical system, and an aberration parameter for an aberration of the projection optical system, and a step of determining a value of the illumination parameter and a value of the aberration parameter so that an image performance of an optical image of the pattern of the mask satisfies an evaluation criterion set for a target pattern to be formed on an image plane of the projection optical system.

Abstract: An exposure method comprises setting an exposure condition using a value of an exposure parameter when plural types of patterns are transferred onto a substrate. The method of determining a value of an exposure parameter comprises calculating an optical image, formed on an image plane upon illuminating a pattern on an object plane, for each of combinations of plural values of an exposure parameter and plural values of at least one of an exposure amount and a defocus amount, calculating, for each of the plural values of the exposure parameter, a deviation between a contour of a target optical image and a calculated contour of the optical image, in each of the plural types of patterns, and determining a value of the exposure parameter, at which a maximum value of the deviations among the plural types of patterns is minimum, as a value of the exposure parameter when exposing the substrate.

Abstract: A transmitting/receiving system includes a control field controlling a transmitting priority of a dynamic slot is included in each communication cycle, and a node of the transmitting/receiving system sets control information including a preferential usage request for a dynamic slot that the node transmits in the control field and notifies all nodes in the transmitting/receiving system of the preferential usage request for the dynamic slot.

Abstract: A recording medium stores a program for causing a computer to execute a method of calculating a resist pattern.

Abstract: The present invention provides a determination method of determining a light intensity distribution to be formed on a pupil plane of an illumination optical system in an exposure apparatus, the method including a step of setting a cutline used to evaluate an image of a pattern of a mask, which is formed on an image plane of a projection optical system, and a target position of the image, and a step of determining an intensity of an element light source such that the position of a midpoint between edges of the image of the pattern of the mask on the cutline from a calculated image comes close to the target position, thereby determining the light intensity distribution.

Abstract: The present invention provides a decision method of causing a computer to decide an exposure condition to be set in an exposure apparatus including an illumination optical system that illuminates a pattern including a plurality of pattern elements, and a projection optical system that projects the pattern onto a substrate, including a step of obtaining a distance between intersections of a first line, used to evaluate dimensions of images of the pattern elements, and contours of the images of the pattern elements by obtaining the image of the pattern formed on the image plane of the projection optical system, and a step of determining whether there exist intersections of a second line, used to evaluate whether the images of the pattern elements are resolved, and the contours of the images of the pattern elements to evaluate whether the images of the pattern elements are resolved.

Abstract: A method includes setting a target pattern to be formed on a substrate using a reticle, obtaining a first pattern using the reticle and a first illumination condition, calculating, a second illumination condition under which the target pattern is transferred onto the substrate using the reticle, and a third illumination condition under which the first pattern is transferred onto a substrate using the reticle, using mathematical models each of which defines the relationship between an illumination condition and a virtual pattern transferred onto a substrate using the illumination condition, determining a fourth illumination condition, obtained by adding the difference between the calculated second illumination condition and third illumination condition to the first illumination condition, as the illumination condition, and transferring the pattern of the reticle onto the substrate by illuminating the reticle using the determined illumination condition.

Abstract: A method comprises determining an exposure condition by executing a process including computing an image formed on an image plane under the current exposure condition while changing the exposure condition, and evaluating a line width of the computed image, and exposing the substrate under the determined exposure condition, wherein the determining includes, computing a simplified evaluation value of the computed image, changing the exposure condition and executing the process in the changed exposure condition, after evaluating the computed image if the simplified evaluation value satisfies an allowable value, and changing the exposure condition and executing the process in the changed exposure condition without evaluating the computed image if the simplified evaluation value does not satisfy the allowable value.

Abstract: A computer readable storage medium is provided, storing a computer-executable program for causing a computer to determine at least one of mask pattern and exposure condition of an exposure apparatus having an illumination optical system for illuminating a mask with light from a light source and a projection optical system for projecting the mask pattern onto a substrate. The program causes the computer to perform calculation of an image of a pattern on an object plane of the projection optical system using information about lateral shift of an image caused by the exposure apparatus, and determination of at least one of the exposure condition and the mask pattern based on a calculation result.

Abstract: An exposure apparatus for exposing a pattern of a reticle onto a plate using a light from a light source and an optical system includes a measuring part for obtaining polarization information of the light that has passed the optical system, the polarization information including at least one of polarized light intensities, a ratio between the polarized light intensities, a degree of polarization, and a retardation of two orthogonal directions that are both parallel to the optical axis, and a controller for controlling, based on a measurement result by the measuring part, at least one exposure parameter of the light source and the optical system.

Abstract: A method for calculating an offset of an exposure dose and a focus position in an exposure apparatus that exposes a substrate via an original includes the steps of obtaining information of a shape of a pattern formed on the substrate using the exposure apparatus, calculating a shift amount between a critical dimension contained in the information of the shape of the pattern and a reference value of the critical dimension, and calculating an offset of the focus position based on the information of the shape of the pattern, and calculating the offset of the exposure dose based on the shift amount and the offset of the focus position.

Abstract: A method includes setting a target pattern to be formed on a substrate using a reticle, obtaining a first pattern using the reticle and a first illumination condition, calculating, a second illumination condition under which the target pattern is transferred onto the substrate using the reticle, and a third illumination condition under which the first pattern is transferred onto a substrate using the reticle, using mathematical models each of which defines the relationship between an illumination condition and a virtual pattern transferred onto a substrate using the illumination condition, determining a fourth illumination condition, obtained by adding the difference between the calculated second illumination condition and third illumination condition to the first illumination condition, as the illumination condition, and transferring the pattern of the reticle onto the substrate by illuminating the reticle using the determined illumination condition.

Abstract: A method comprises determining an exposure condition by executing a process including computing an image formed on an image plane under the current exposure condition while changing the exposure condition, and evaluating a line width of the computed image, and exposing the substrate under the determined exposure condition, wherein the determining includes, computing a simplified evaluation value of the computed image, changing the exposure condition and executing the process in the changed exposure condition, after evaluating the computed image if the simplified evaluation value satisfies an allowable value, and changing the exposure condition and executing the process in the changed exposure condition without evaluating the computed image if the simplified evaluation value does not satisfy the allowable value.