Abstract: The present invention provides a parameter determination method of determining an optical parameter and a process parameter by using an optical simulator which calculates a resist image to be formed on a resist applied on a substrate, based on the optical parameter of an exposure apparatus which transfers a pattern of a mask onto the substrate, and a process simulator which calculates a process image to be formed on the substrate, based on the process parameter representing information concerning the resist and information concerning a process to be performed on the resist.

Abstract: An exposure method comprises setting an exposure condition using a value of an exposure parameter when plural types of patterns are transferred onto a substrate. The method of determining a value of an exposure parameter comprises calculating an optical image, formed on an image plane upon illuminating a pattern on an object plane, for each of combinations of plural values of an exposure parameter and plural values of at least one of an exposure amount and a defocus amount, calculating, for each of the plural values of the exposure parameter, a deviation between a contour of a target optical image and a calculated contour of the optical image, in each of the plural types of patterns, and determining a value of the exposure parameter, at which a maximum value of the deviations among the plural types of patterns is minimum, as a value of the exposure parameter when exposing the substrate.

Abstract: The present invention provides a method of generating a database of effective light source shapes including a generation step of generating an initial database representing an effective light source shapes corresponding to a plurality of conditions settable for an illumination optical system, a measurement step of setting an arbitrary condition for the illumination optical system, and measuring an effective light source shape, a calculation step of calculating a difference amount between an effective light source shape when each of the plurality of conditions is set for the illumination optical system and the effective light source shape included in the initial database, and a correction step of correcting the effective light source shapes included in the initial database using the difference amounts and compiling the corrected effective light source shapes into an actual database.

Abstract: The present invention provides a parameter determination method of determining an optical parameter and a process parameter by using an optical simulator which calculates a resist image to be formed on a resist applied on a substrate, based on the optical parameter of an exposure apparatus which transfers a pattern of a mask onto the substrate, and a process simulator which calculates a process image to be formed on the substrate, based on the process parameter representing information concerning the resist and information concerning a process to be performed on the resist.

Abstract: A signal receiver apparatus includes a waveform shaping data storage device storing waveform shaping data of a signal transmitted with a given timing from a signal transmitter device of a plurality of signal transmitter devices which are coupled to the signal receiver apparatus for each of the plurality of signal transmitter devices, and a waveform shaping device reading waveform shaping data of the signal transmitter device in the plurality of signal transmitter device from the waveform shaping data storage device when a signal from the signal transmitter device is received, and shaping a waveform of a received signal from the signal transmitter device.

Abstract: A transmitting/receiving system includes a control field controlling a transmitting priority of a dynamic slot is included in each communication cycle, and a node of the transmitting/receiving system sets control information including a preferential usage request for a dynamic slot that the node transmits in the control field and notifies all nodes in the transmitting/receiving system of the preferential usage request for the dynamic slot.

Abstract: Each embodiment of this invention implements step-by-step and empirical authentication of devices upon digital authentication among a plurality of devices. Each of a plurality of authentication devices of each embodiment can unidirectionally generate a hash value of a low experience rank from a hash value of a high experience rank, and receives a set of high experience rank and hash value in accordance with an experience. Upon receiving a certification request of the experience rank from another authentication device, the authentication device transmits a corresponding hash value to the authentication device as a request source. Upon sending a certification request of an experience rank to another authentication device, the authentication device verifies a hash value obtained from the other authentication device on the basis of a self hash value. In this way, the authentication devices authenticate each other's experience ranks.

Abstract: A method for calculating an offset of an exposure dose and a focus position in an exposure apparatus that exposes a substrate via an original includes the steps of obtaining information of a shape of a pattern formed on the substrate using the exposure apparatus, calculating a shift amount between a critical dimension contained in the information of the shape of the pattern and a reference value of the critical dimension, and calculating an offset of the focus position based on the information of the shape of the pattern, and calculating the offset of the exposure dose based on the shift amount and the offset of the focus position.

Abstract: An exposure apparatus for exposing a pattern of a reticle onto a plate using a light from a light source and an optical system includes a measuring part for obtaining polarization information of the light that has passed the optical system, the polarization information including at least one of polarized light intensities, a ratio between the polarized light intensities, a degree of polarization, and a retardation of two orthogonal directions that are both parallel to the optical axis, and a controller for controlling, based on a measurement result by the measuring part, at least one exposure parameter of the light source and the optical system.

Abstract: To provide meat that is beneficial to human health, for the purpose to produce transgenic animals in which the content of unsaturated fatty acids increase is increased, transgenic animals characterized by increased content of unsaturated fatty acids that are beneficial to human health is provided by the present invention. Furthermore, the present invention also provides a method to enhance levels of unsaturated fatty acid in animals.

Abstract: In a bandwidth control service management apparatus of a network operated by a network offerer and a customer, an available bandwidth of a premium bandwidth control service demand, accepted from the customer, with a higher priority than a regular bandwidth control service of best effort type, is compared with an applied threshold value, accepted from a network offerer through a network interface 7 to determine an availability of the premium bandwidth control service. The result is notified to the customer through the customer interface 2, and the serviceable bandwidth manager 3 is provided which demands that the network should secure a bandwidth in order that the customer who has received the notification of a service permission can start the premium bandwidth control service when the premium bandwidth control service is determined to be available.

Abstract: The object of the present invention is to produce general machine parts, OA machine part, and the like which can be produced by injection molding and which have excellent mechanical properties, thermal resistance, dimension stability and processability. The thermoplastic hydraulic composition of the present invention comprises 100 parts by weight of two types of thermoplastic resins differing in melting point and from 500 to 1000 parts by weight of a hydraulic composition. It is characterized by further comprising from 1 to 200 parts by weight of a fiber and/or from 0.5 to 10.0 parts by weight of a releasing agent added. It is characterized in that the hydraulic composition preferably is a mixed powder which comprises from 50 to 90 wt % of a hydraulic powder and from 10 to 50 wt % of a non-hydraulic powder having an average particle diameter of 1/10 that of the hydraulic powder or less.

Abstract: Each embodiment of this invention implements step-by-step and empirical authentication of devices upon digital authentication among a plurality of devices. Each of a plurality of authentication devices of each embodiment can unidirectionally generate a hash value of a low experience rank from a hash value of a high experience rank, and receives a set of high experience rank and hash value in accordance with an experience. Upon receiving a certification request of the experience rank from another authentication device, the authentication device transmits a corresponding hash value to the authentication device as a request source. Upon sending a certification request of an experience rank to another authentication device, the authentication device verifies a hash value obtained from the other authentication device on the basis of a self hash value. In this way, the authentication devices authenticate each other's experience ranks.

Abstract: A device for controlling multi-window display on a screen includes a screen-operation detecting unit which detects user screen operations including a user operation of a pointer on the screen. The device further includes a control unit which controls a window to increase an amount of information displayed therein when said screen-operation detecting unit detects a move of the pointer into an area of the window.

Abstract: A data processing system which provides increased reliability by properly managing a plurality of basic modules. System configuration data is a collection of information regarding basic modules constituting each target system. Compatibility data is compiled to keep statistics of past failures occurred in a target system, which maintains the following associated records: properties of failed basic modules, properties of their related modules, failure types, and failure counts. When a basic module is changed in a target system, the target system sends out a notification message. This message is received by a notification message parser and supplied to a system configuration manager via a hardware change manager. The system configuration manager first consults the system configuration data to identify the changed basic module and its related basic modules, and then retrieves information about compatibility of such basic modules by consulting the compatibility data.

Abstract: In a bandwidth control service management apparatus of a network operated by a network offerer and a customer, an available bandwidth of a premium bandwidth control service demand, accepted from the customer, with a higher priority than a regular bandwidth control service of best effort type, is compared with an applied threshold value, accepted from a network offerer through a network interface 7 to determine an availability of the premium bandwidth control service. The result is notified to the customer through the customer interface 2, and the serviceable bandwidth manager 3 is provided which demands that the network should secure a bandwidth in order that the customer who has received the notification of a service permission can start the premium bandwidth control service when the premium bandwidth control service is determined to be available.

Abstract: A projection exposure apparatus usable with a reticle having a pattern and a wafer onto which the pattern of the reticle is transferred. The apparatus includes an illumination system for illuminating the reticle, a projection optical system for projecting the pattern of the reticle onto the wafer, wherein the projection optical system includes two lens groups which are individually movable along an optical axis direction, but are not juxtaposed with each other, and a controller for simultaneously adjusting distortion and projection magnification of the pattern projected onto the wafer. The controller performs the adjustment such that the two lens groups of the projection optical system are moved separately along the optical axis direction.

Abstract: An aluminum alloy for cladding excellent in sacrificial anode property and erosion-corrosion resistance, which consists essentially of, in weight percentage:Zinc: from 0.3 to 3.0%,Magnesium: from 0.2 to 4.0%,Manganese: from 0.3 to 2.0%,and,the balance aluminum and incidental impurities;said alloy including an aluminum alloy also containing at least one element selected from the group consisting of, in weight percentage:Indium: from 0.005 to 0.2%,Tin: from 0.01 to 0.3%,and,Bismuth: from 0.01 to 0.3%;provided that the total content of indium, tin and bismuth being up to 0.3%.