Abstract: A semiconductor nonvolatile memory device of an embodiment includes: a plurality of transistors arranged in a matrix, the transistors in the same row being connected in series to form a transistor string having a first terminal and a second terminal; a plurality of first wiring lines each corresponding to one of the columns, and being connected to the gates of the transistors of the corresponding column; a common first electrode connected to each semiconductor region in which each transistor is disposed; and a write unit that selects one of the first wiring lines and one of the transistor strings, and applies a first voltage to the first electrode, a first write voltage to the selected first wiring line, a second voltage to the other first wiring lines, and a second write voltage to the first terminal and the second terminal of the selected transistor string in a write operation.

Abstract: A nonvolatile programmable logic switch of an embodiment includes: a cell including: a first memory including a first terminal connected to a first wiring line, and a second terminal; a second memory including a third terminal connected to a second wiring line, and a fourth terminal connected to the second terminal of the first memory; a first transistor, of which one of a source and a drain is connected to the second and fourth terminals, the other of the source and the drain is connected to a third wiring line, and a gate is connected to a fourth wiring line; and a second transistor, of which one of a source and a drain is connected to the second and fourth terminals, the other of the source and the drain is connected to a gate of a pass transistor, and a gate is connected to a fifth wiring line.

Abstract: A programmable logic circuit includes: first to third wiring lines, the second wiring lines intersecting with the first wiring lines; and cells provided in intersecting areas, at least one of cells including a first transistor and a programmable device with a first and second terminals, the first terminal connecting to one of a source and a drain of the first transistor, the second terminal being connected to one of the second wiring lines, the other of the source and the drain being connected to one of the first wiring lines, and a gate of the first transistor being connected to one of the third wiring lines. One of source and drain of each of the first cut-off transistors is connected to the one of the second wiring lines, and an input terminal of each of first CMOS inverters is connected to the other of the source and the drain.

Abstract: According to one embodiment, a non-volatile programmable switch according to this embodiment includes first and second non-volatile memory transistors, and a common node that is connected to the output side terminals of the first and second non-volatile memory transistors, and a logic transistor unit that is connected to the common node. A length of a gate electrode of the first and second non-volatile memory transistors in a channel longitudinal direction is shorter than a length of the charge storage film in the channel longitudinal direction.

Abstract: A semiconductor device according to an embodiment includes: a first transistor including a gate connected to a first interconnection, a first source, and a first drain, one of the first source and the first drain being connected to a second interconnection; and a second transistor including a gate structure, a second source, and a second drain, one of the second source and second drain being connected to a third interconnection and the other of the second source and second drain being connected to a fourth interconnection. The gate structure includes a gate insulation film, a gate electrode, and a threshold-modulating film provided between the gate insulation film and the gate electrode to modulate a threshold voltage, the other of the first source and first drain of the first transistor is connected to the gate electrode.

Abstract: A semiconductor integrated circuit includes a transistor with a source region, a drain region, and a control gate electrode. The integrated circuit additionally includes a controller that selectively applies voltages to the control gate of the transistor. The controller may apply a first voltage that forms a permanent conductive path between the source and drain of the transistor.

Abstract: According to one embodiment, a memory system including a key-value store containing key-value data as a pair of a key and a value corresponding to the key, includes an interface, a memory block, an address acquisition circuit and a controller. The interface receives a data write/read request or a request based on the key-value store. The memory block has a data area for storing data and a metadata table containing the key-value data. The address acquisition circuit acquires an address in response to input of the key. The controller executes the data write/read request for the memory block, and outputs the address acquired to the memory block and executes the request based on the key-value store. The controller outputs the value corresponding to the key via the interface.

Abstract: According to one embodiment, a semiconductor integrated circuit includes nonvolatile memory areas, each includes a first nonvolatile memory transistor, a second nonvolatile memory transistor and an output line, the first nonvolatile memory transistor includes a first source diffusion region, a first drain diffusion region and a first control gate electrode, the second nonvolatile memory transistor includes a second source diffusion region, a second drain diffusion region and a second control gate electrode, the output line connected the first drain diffusion region and the second drain diffusion region, and logic transistor areas, each includes a logic transistor, the logic transistor includes a third source diffusion region, a third drain diffusion region and a first gate electrode.

Abstract: A semiconductor device has a semiconductor substrate, and a semiconductor element having an FET on the semiconductor substrate and comprises a different threshold voltage depending on an OFF state and an ON state. The semiconductor element has an insulating film disposed above a part where a channel of the semiconductor substrate is formed, a gate electrode disposed above the insulating film, and a charge trap film disposed between the insulating film and the gate electrode, and to exchange more electrons with the gate electrode than with the channel.

Abstract: A circuit according to embodiments includes: a plurality of bit-string comparators each of which includes a plurality of single-bit comparators each of which includes first and second input terminals, first and second match-determination terminals, and a memory storing data and inverted data in a pair, the first input terminal being connected to a respective search line, the second input terminal being connected to an inverted search line being paired with the respective search line, and a matching line connecting the first and second match-determination terminals of the single-bit comparators; a pre-charge transistor of which source is connected to a supply voltage line; a common matching line connected to a drain of the pre-charge transistor and the matching lines of the bit-string comparators; and an output inverter of which input is connected to the common matching line.

Abstract: One embodiment provides a programmable logic switch in which a first nonvolatile memory and a second nonvolatile memory are formed in the same well, and in which to change the first nonvolatile memory from an erased state to a written state and leave the second nonvolatile memory being in the erased state, a first write voltage is applied to a first line connected with gate electrodes of the first and second nonvolatile memories, a second write voltage is applied to a second line connected to a source in the first nonvolatile memory, and a third write voltage lower than the second write voltage is applied to a fourth line connected to a source of the second nonvolatile memory.

Abstract: A nonvolatile programmable logic switch according to an embodiment includes first and second cells, each of the first and second cells including: a first memory having a first to third terminals, the third terminal being receiving a control signal; a first transistor connected at one of source/drain to the second terminal; and a second transistor connected at a gate to the other of the source/drain of the first transistor, the third terminal of the first memory in the first cell and the third terminal of the first memory in the second cell being connected in common. When conducting writing into the first memory in the first cell, the third terminal is connected to a write power supply generating a write voltage, the first terminals in the first and second cells are connected to a ground power supply and a write inhibit power supply generating a write inhibit voltage respectively.

Abstract: According to one embodiment, a semiconductor integrated circuit includes nonvolatile memory areas, each includes a first nonvolatile memory transistor, a second nonvolatile memory transistor and an output line, the first nonvolatile memory transistor includes a first source diffusion region, a first drain diffusion region and a first control gate electrode, the second nonvolatile memory transistor includes a second source diffusion region, a second drain diffusion region and a second control gate electrode, the output line connected the first drain diffusion region and the second drain diffusion region, and logic transistor areas, each includes a logic transistor, the logic transistor includes a third source diffusion region, a third drain diffusion region and a first gate electrode.

Abstract: According to one embodiment, a configuration memory includes first and second data lines, a first memory string which comprises at least first and second nonvolatile memory transistors which are connected in series between a common node and the first data line, a second memory string which comprises at least third and fourth nonvolatile memory transistors which are connected in series between the common node and the second data line, and a flip-flop circuit which comprises a first data holding node connected to the common node and a second data holding node connected to a configuration data output node.

Abstract: According to one embodiment, a programmable logic switch includes first and second word lines above a first path transistor, a first pillar passing through the first and second word lines and connected to the first path transistor, a second pillar passing through the first and second word lines and connected to the first path transistor, a first memory device between the first pillar and the first word line, a second memory device between the first pillar and the second word line, a third memory device between the second pillar and the first word line, and a fourth memory device between the second pillar and the second word line.

Abstract: A nonvolatile programmable switch according to an embodiment includes: a first nonvolatile memory transistor including a first to third terminals connected to a first to third interconnects respectively; a second nonvolatile memory transistor including a fourth terminal connected to a fourth interconnect, a fifth terminal connected to the second interconnect, and a sixth terminal connected to the third interconnect, the first and second nonvolatile memory transistors having the same conductivity type; and a pass transistor having a gate electrode connected to the second interconnect. When the first and fourth interconnects are connected to a first power supply while the third interconnect is connected to a second power supply having a higher voltage than that of the first power supply, a threshold voltage of the first nonvolatile memory transistor increases, and a threshold voltage of the second nonvolatile memory transistor decreases.

Abstract: A semiconductor device of an embodiment includes: a first transistor having a first source region and a first drain region arranged in a first protruded semiconductor region, a first channel region having a first corner portion in its upper portion in a section perpendicular to a first direction, the first corner portion having a first radius of curvature; a second transistor having a second source region and a second drain region arranged in a second protruded semiconductor region, and a second channel region having a second corner portion in its upper portion in a section that is perpendicular to a second direction, the second corner portion having a second radius of curvature greater than the first radius of curvature.

Abstract: According to one embodiment, a storage device includes an interface, a first and second memory blocks and a controller. The interface receives a content search request. The first memory block stores files and inverted files corresponding to contents included in the files. The second memory block stores a file search table. The controller creates the inverted file for each content included in the files and stores IDs of the files including the content in the inverted file. The controller obtains, by search of the content, a corresponding inverted file from the inverted files stored in the first memory block and stores, in the file search table, the IDs of the files included in the obtained inverted file. The controller outputs the IDs of the files stored in the file search table from the interface as a search result for the content search request.

Abstract: A semiconductor integrated circuit includes a transistor with a source region, a drain region, and a control gate electrode. The integrated circuit additionally includes a controller that selectively applies voltages to the control gate of the transistor. The controller may apply a first voltage that that forms a permanent conductive path between the source and drain of the transistor.

Abstract: According to one embodiment, a fabrication method of a semiconductor device comprising forming a dummy gate with a gate length direction set to a [111] direction perpendicular to a [110] direction on a surface of a supporting substrate having Si1-xGex (0?x<0.5) with a crystal orientation perpendicular to the surface set to the [110] direction on the surface, forming source/drain regions and forming insulating films on side portions of the dummy gate. Next, the dummy gate is etched with using the insulating films as a mask, and a surface portion of the substrate between the source/drain regions is further etched. Next, a channel region formed of a III-V group semiconductor or Ge is grown between the source/drain regions by using the edge portions of the source/drain regions as seeds. Then, a gate electrode is formed above the channel region via a gate insulating film.