Abstract: Provided are a lubricant composition in which low friction and low abrasion are compatible in various temperatures and loads, and a manufacturing method of a lubricant composition. A lubricant composition of the present invention contains at least trivalent or more polyol a1; a mixture b1 of at least one of a polymerization reaction mixture of an unsaturated fatty acid having 18 to 22 carbon atoms which contains at least 75 mass % of a divalent carboxylic acid having 36 to 44 carbon atoms or a mixture obtained by performing hydrogenation with respect to the polymerization reaction mixture; and composite ester A containing polyester in which monool c1 represented by General Formula (1) described below is condensed, in which a feed ratio of the number of moles of a hydroxyl group of a1/the number of moles of a carboxylic acid of b1/the number of moles of a hydroxyl group of c1 is 1/1.5 to 2.0/0.7 to 1.5, and a content of the composite ester A is 0.

Abstract: An object of the present invention is to provide a lubricant composition having excellent lubrication properties in rigorous conditions such as a high temperature and/or a high pressure. The present invention relates to lubricant composition containing a condensate A which is obtained by condensing at least: an alkylene oxide adduct a1 of trihydric or more polyhydric alcohol formed by adding alkylene oxide to at least one hydroxyl group of the trihydric or more polyhydric alcohol; a divalent or more polyvalent carboxylic acid a2 or a precursor of the divalent or more polyvalent carboxylic acid a2; and at least one of a monovalent carboxylic acid a3, a precursor of the monovalent carboxylic acid a3, or monohydric alcohol a4.

Abstract: Provided is the pattern formability and line edge roughness of the resultant substrate. An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.8 or larger, and a molecular weight of 400 or larger: the Ohnishi parameter=(total number of atoms)/(number of carbon atoms?number of oxygen atoms).

Abstract: Provide is a curable composition for imprints capable of keeping a good pattern and heat resistance. A curable composition for imprints comprising a polymerizable compound (Ax-1) having maleimide structure(s), or a compound (Ax-2) having a partial structure represented by formula (I) below.

Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.

Abstract: A curable composition for imprints which comprises a polymerizable compound having at least one of a fluorine atom and a silicon atom, a photopolymerization initiator, and a compound having a functional group capable of bonding to a substrate exhibits good patternability in transferring patterns, particularly micropatterns.

Abstract: A nonaqueous electrolyte solution including a nonaqueous solvent; an electrolyte; and a combustion inhibitor, in which the combustion inhibitor contains a phosphazene compound, and specific conditions are defined by boiling points of a combustion inhibitor, a boiling point of a solvent, and the like.

Abstract: A non-aqueous liquid electrolyte for a secondary battery, containing: a compound (A) having a cyclopropane structure; an electrolyte; and an organic solvent, in which the compound (A) satisfies at least one selected from (Aa) to (Ac): (Aa) a compound having two or more cyclopropane structures in the molecule thereof (Ab) a compound having a cyclopropane structure and a group selected from an acryloyl group and a vinylphenyl group (Ac) a compound having a cyclopropane structure and a particular group

Abstract: A positive photosensitive composition includes: a resin (A) whose dissolution rate in an alkaline developing solution increases by the action of an acid, the resin (A) containing an acid decomposable repeating unit represented by a general formula (I) and an acid nondecomposable repeating unit represented by a general formula (II); and a compound (B) capable of generating an acid upon irradiation with one of active rays and radiations: wherein Xa1 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A1 represents one of a single bond and a divalent connecting group, ALG represents an acid leaving hydrocarbon group, Xa2 represents one of a hydrogen atom, an alkyl group, a cyano group, and a halogen atom, A2 represents one of a single bond and a divalent connecting group, and ACG represents an acid nonleaving hydrocarbon group.

Abstract: A non-aqueous liquid electrolyte for a secondary battery, containing an electrolyte and a compound (A) represented by any one of formulae (I-1) to (I-3) in an organic solvent: wherein X1 represents an alkyl group substituted with a halogen atom; Y1 represents a hydrogen atom or an organic group; and ma represents an integer from 1 to 6; wherein X2 represents a group having an oxygen atom; Y2 represents a hydrogen atom or an organic group; and mb represents an integer from 1 to 6; and wherein Y3 represents an organic group having 4 or more carbon atoms, or an organic group having an oxygen atom or a nitrogen atom; and mc represents an integer from 1 to 6.

Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance.

Abstract: A non-aqueous liquid electrolyte for a secondary battery, containing: a compound represented by formula (I); an electrolyte; and an organic solvent, in which the non-aqueous liquid electrolyte has a viscosity of 20 mPa·s at 25° C. or less, wherein Ra, Re and Rf each represent an organic group, and Re and Rf may be bonded with each other to form a ring; Xa represents a substituent represented by formula (a) or (b); Rb and Rc each represent a hydrogen atom or a substituent; and Rd represents a hydrogen atom or an organic group.

Abstract: A composition for imprints comprising a polymerizable monomer, a photopolymerization initiator, and a polymer having a functional group with at least one of a fluorine atom or a silicon atom and having a polymerizable functional group, wherein the polymer has a weight-average molecular weight of at least 2000 and the amount of the polymer is from 0.01 to 20% by mass relative to the polymerizable monomer, is excellent in patternability and mold releasability, capable of forming good patterns and free from a problem of mold contamination.

Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.

Abstract: Provide a curable composition for imprint, which is improved in the surface roughness of the cured film. A curable composition for imprint comprising a polymerizable compound (A), a polymerization initiator (B), and a non-polymerizable compound (C), the non-polymerizable compound (C) comprising at least one species of surfactant (C1) which contains 20% by mass or more of fluorine atom, and, at least one species of polymer (C2) which contains 3% by mass or more and less than 20% by mass of fluorine atom and/or 5% by mass or more and less than 40% by mass of silicon atom, and has a weight-average molecular weight (Mw) of 1,000 to 100,000.

Abstract: A non-aqueous liquid electrolyte for a secondary battery, containing: at least one selected from a carbonate compound having a halogen atom and a sulfur-containing ring compound; an aromatic ketone compound; an organic solvent; and an electrolyte salt, in which, with respect to 100 parts by mass of the organic solvent, the aromatic ketone compound is 0.001 to 10 parts by mass and the at least one selected from a carbonate compound having a halogen atom and a sulfur-containing ring compound is 0.001 to 10 parts by mass, and more than 50% by mass of the whole amount of the organic solvent is composed of a solvent with a melting point of 10° C. or less.

Abstract: A liquid application device includes: a liquid discharge head having a structure in which nozzles for performing droplet ejection of a functional liquid onto a substrate are aligned in a row in a predetermined direction, and including liquid chambers connected to the nozzles respectively and piezoelectric elements which are provided correspondingly to the liquid chambers and serve to pressurize the liquid in the liquid chambers; a relative movement unit for causing relative movement between the substrate and the liquid discharge head; and a droplet ejection control unit for operating the piezoelectric elements so as to cause the liquid to land discretely on the substrate, and controlling operation of the piezoelectric elements according to each of groups formed by grouping the nozzles correspondingly to the structure of the liquid discharge head.

Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.

Abstract: Provided is a method of producing a curable composition for imprints including (A) a polymerizable monomer, (B) a polymerization initiator, and (C) a solvent which is capable of effectively suppressing lifting or separation of patterns, excellent in coatability, and excellent in time-dependent stability. The method of producing a curable composition for imprints comprises preparing one species of liquid (D) which contains at least either one of the polymerizable monomer (A) and the polymerization initiator (B), passing the liquid (D) through a filter, and then adding the solvent (C).

Abstract: A curable composition for imprints, which is excellent in patternability and in line edge roughness, is provided. The curable composition for imprints comprises at least one kind of polymerizable monomer (A) and at least one kind of photopolymerization initiator (B). The polymerizable monomer (A) comprises at least two fluorine-containing groups selected from a fluoroalkyl group and a fluoroalkylether group and each of two of the fluorine-containing groups is connected with each other through a linking group having at least two carbon atoms.