Patents by Inventor Kunihiko Kodama

Kunihiko Kodama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive photosensitive composition and pattern-forming method using the same
    Patent number: 7960087
    Abstract: A positive photosensitive composition comprising: (A) a resin having at least one repeating unit having a specific lactone structure at a side chain and being capable of decomposing by the action of an acid to increase the solubility in an alkali developer; and (B) a compound capable of generating a specific acid upon irradiation with an actinic ray or a radiation, and a pattern-forming method using the positive photosensitive composition, are provided.
    Type: Grant
    Filed: March 9, 2006
    Date of Patent: June 14, 2011
    Assignee: Fujifilm Corporation
    Inventor: Kunihiko Kodama
  • POSITIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
    Publication number: 20110104610
    Abstract: A positive photosensitive composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B1) a resin of which solubility in an alkali developer increases under an action of an acid; and (B2) a resin that has at least one group selected from (a) an alkali-soluble group and (b) a group capable of decomposing under an action of an alkali to produce an alkali-soluble group, and the resin (B2) does not have a group capable of decomposing under an action of an acid; and a pattern forming method using the same.
    Type: Application
    Filed: October 29, 2010
    Publication date: May 5, 2011
    Applicant: FUJIFILM Corporation
    Inventors: Kunihiko KODAMA, Fumiyuki Nishiyama
  • CURABLE COMPOSITION FOR IMPRINT, PATTERNING METHOD AND PATTERN
    Publication number: 20110059302
    Abstract: A curable composition for imprints, which is excellent in patternability and in line edge roughness, is provided. The curable composition for imprints comprises at least one kind of polymerizable monomer (A) and at least one kind of photopolymerization initiator (B). The polymerizable monomer (A) comprises at least two fluorine-containing groups selected from a fluoroalkyl group and a fluoroalkylether group and each of two of the fluorine-containing groups is connected with each other through a linking group having at least two carbon atoms.
    Type: Application
    Filed: March 8, 2010
    Publication date: March 10, 2011
    Applicant: FUJIFILM CORPORATION
    Inventor: Kunihiko Kodama
  • Positive resist composition and pattern forming method using the same
    Patent number: 7887988
    Abstract: A resist composition, which comprises: (A) a resin containing a repeating unit represented by formula (I); and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation: wherein AR represents a benzene ring or a naphthalene ring; R represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group; Z represents a linking group for forming a ring together with AR; and A represents an atom or group selected from the group consisting of a hydrogen atom, an alkyl group, a halogen atom, a cyano group and an alkyloxycarbonyl group, and a pattern forming method using the resist composition.
    Type: Grant
    Filed: March 14, 2007
    Date of Patent: February 15, 2011
    Assignee: FUJIFILM Corporation
    Inventors: Kazuyoshi Mizutani, Kaoru Iwato, Kunihiko Kodama, Masaomi Makino
  • Positive photosensitive composition and method of forming resist pattern
    Patent number: 7867697
    Abstract: A positive photosensitive composition comprises: (A) 5 to 20 parts by weight of the total amount of at least one compound that generates an acid upon irradiation with an actinic ray; and (B) 100 parts by weight of the total amount of at least one fluorine atom-containing resin having a group that increases a solubility of the resin in an alkaline developer by the action of an acid.
    Type: Grant
    Filed: July 22, 2004
    Date of Patent: January 11, 2011
    Assignee: FUJIFILM Corporation
    Inventor: Kunihiko Kodama
  • POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORMING METHOD USING THE SAME
    Publication number: 20100310991
    Abstract: A positive resist composition for immersion exposure comprises: (A) a resin capable of increasing its solubility in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, wherein the acid satisfies conditions of V?230 and V/S?0.93 taking van der Waals volume of the acid as V (?3), and van der Waals surface area of the acid as S (?2).
    Type: Application
    Filed: August 17, 2010
    Publication date: December 9, 2010
    Applicant: FUJIFILM Corporation
    Inventors: Haruki INABE, Hiromi Kanda, Kunihiko Kodama
  • PHOTOSENSITIVE COMPOSITION AND PATTERN-FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION
    Publication number: 20100304300
    Abstract: A photosensitive composition comprises (A) a sulfonium or iodonium salt having an anion represented by one of formulae (I) and (II): wherein Y represents an alkylene group substituted with at least one fluorine atom, and R represents an alkyl group or a cycloalkyl group.
    Type: Application
    Filed: August 10, 2010
    Publication date: December 2, 2010
    Applicant: FUJIFILM CORPORATION
    Inventor: Kunihiko KODAMA
  • POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING RESIST PATTERN
    Publication number: 20100261117
    Abstract: A positive photosensitive composition comprises: (A) 5 to 20 parts by weight of the total amount of at least one compound that generates an acid upon irradiation with an actinic ray; and (B) 100 parts by weight of the total amount of at least one fluorine atom-containing resin having a group that increases a solubility of the resin in an alkaline developer by the action of an acid.
    Type: Application
    Filed: June 21, 2010
    Publication date: October 14, 2010
    Applicant: FUJIFILM Corporation
    Inventor: Kunihiko KODAMA
  • Positive photosensitive composition
    Patent number: 7812194
    Abstract: A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.
    Type: Grant
    Filed: August 30, 2006
    Date of Patent: October 12, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Toshiaki Aoai
  • POSITIVE PHOTOSENSITIVE COMPOSITION
    Publication number: 20100255419
    Abstract: A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.
    Type: Application
    Filed: June 16, 2010
    Publication date: October 7, 2010
    Applicant: FUJIFILM Corporation
    Inventors: Kunihiko KODAMA, Toshiaki Aoai
  • Positive resist composition for immersion exposure and pattern-forming method using the same
    Patent number: 7803511
    Abstract: A positive resist composition for immersion exposure comprises: (A) a resin capable of increasing its solubility in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, wherein the acid satisfies conditions of V?230 and V/S?0.93 taking van der Waals volume of the acid as V (?3), and van der Waals surface area of the acid as S (?2).
    Type: Grant
    Filed: August 15, 2006
    Date of Patent: September 28, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Haruki Inabe, Hiromi Kanda, Kunihiko Kodama
  • PHOTOSENSITIVE COMPOSITION, AND PATTERN-FORMING METHOD AND RESIST FILM USING THE PHOTOSENSITIVE COMPOSITION
    Publication number: 20100239978
    Abstract: A photosensitive composition containing a compound having a specific structure, a pattern-forming method using the photosensitive composition, and a compound having a specific structure used in the photosensitive composition.
    Type: Application
    Filed: May 24, 2010
    Publication date: September 23, 2010
    Applicant: FUJIFILM CORPORATION
    Inventors: Kenji Wada, Kunihiko Kodama
  • Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition
    Patent number: 7799505
    Abstract: The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.
    Type: Grant
    Filed: October 23, 2007
    Date of Patent: September 21, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Tomotaka Tsuchimura, Hiroshi Saegusa, Hideaki Tsubaki
  • Positive photosensitive composition
    Patent number: 7776512
    Abstract: A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.
    Type: Grant
    Filed: January 29, 2009
    Date of Patent: August 17, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Toshiaki Aoai
  • Optical disk driving unit, pickup controller, and laser driver provided in a pickup
    Patent number: 7773477
    Abstract: An optical disk driving unit includes a pickup configured to supply a drive current to a laser unit, and to irradiate a laser beam to an optical disk. A plurality of signal lines are configured to transmit control information of the drive current to the pickup. A pickup controller is configured to control operation of the pickup by transferring control data to the pickup via the signal lines when the drive current is a constant value.
    Type: Grant
    Filed: December 2, 2004
    Date of Patent: August 10, 2010
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Kunihiko Kodama
  • Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition
    Patent number: 7749679
    Abstract: A photosensitive composition containing a compound having a specific structure, a pattern-forming method using the photosensitive composition, and a compound having a specific structure used in the photosensitive composition.
    Type: Grant
    Filed: December 21, 2006
    Date of Patent: July 6, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Kenji Wada, Kunihiko Kodama
  • POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD
    Publication number: 20100104974
    Abstract: A positive resist composition comprises: (A) a compound that generates an acid upon irradiation with an actinic ray or radiation; and (B) a resin that has an acid-decomposable repeating unit represented by formula (I?), has a dispersity of 1.5 or less and increases its solubility in an alkali developer by action of an acid, wherein Xa1 represents a hydrogen atom, an alkyl group, a cyano group or a halogen atom; Ry1 to Ry3 each independently represents an alkyl group or a cycloalkyl group, and at least two members out of Ry1 to Ry3 may combine to form a ring structure; and Z represents a divalent linking group.
    Type: Application
    Filed: March 26, 2008
    Publication date: April 29, 2010
    Applicant: FUJIFILM CORPORATION
    Inventors: Yushi Kaneko, Kunihiko Kodama, Akinori Shibuya, Yuko Yoshida
  • Positive photosensitive composition and a pattern-forming method using the same
    Patent number: 7700261
    Abstract: A positive photosensitive composition comprises: (A) a compound that generates an acid upon irradiation with actinic ray or radiation; and (B) a resin that increases its solubility in an alkali developer by action of an acid, wherein the resin (B) has a repeating unit that has an acid-decomposable group and is represented by formula (I): wherein Xa1 represents a hydrogen atom, an alkyl group, a cyano group, or a halogen atom; Ry1 and Ry2 each independently represents an alkyl group or a cycloalkyl group; Rx represents an alkyl group having 2 or more carbon atoms, or a cycloalkyl group; and Z represents an alkylene group.
    Type: Grant
    Filed: March 26, 2008
    Date of Patent: April 20, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Kaoru Iwato, Hideaki Tsubaki, Norihiko Taguchi
  • Positive resist composition and pattern formation method using the positive resist composition
    Patent number: 7687219
    Abstract: A positive resist composition comprises: (A) a resin that contains a repeating unit (A1) having a lactone structure and a cyano group, and increases its solubility to an alkali developer by action of an acid; (B) a compound that generates an acid by irradiation with actinic ray or radiation; and (C) a solvent.
    Type: Grant
    Filed: November 8, 2006
    Date of Patent: March 30, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Kaoru Iwato, Kunihiko Kodama
  • Positive photosensitive composition and method of forming resist pattern
    Patent number: 7670746
    Abstract: A positive photosensitive composition comprises: (A) 5 to 20 parts by weight of the total amount of at least one compound that generates an acid upon irradiation with an actinic ray; and (B) 100 parts by weight of the total amount of at least one fluorine atom-containing resin having a group that increases a solubility of the resin in an alkaline developer by the action of an acid.
    Type: Grant
    Filed: July 22, 2004
    Date of Patent: March 2, 2010
    Assignee: FUJIFILM Corporation
    Inventor: Kunihiko Kodama