Abstract: Disclosed is a maintenance liquid for property carrying out imprints excellent in patternability. The maintenance liquid for imprints of an ink-jet discharging device comprises a compound comprising an ester group and/or an ether group.

Abstract: A liquid application device includes: a liquid discharge head having a structure in which nozzles for performing droplet ejection of a functional liquid onto a substrate are aligned in a row in a predetermined direction, and including liquid chambers connected to the nozzles respectively and piezoelectric elements which are provided correspondingly to the liquid chambers and serve to pressurize the liquid in the liquid chambers; a relative movement unit for causing relative movement between the substrate and the liquid discharge head; and a droplet ejection control unit for operating the piezoelectric elements so as to cause the liquid to land discretely on the substrate, and controlling operation of the piezoelectric elements according to each of groups formed by grouping the nozzles correspondingly to the structure of the liquid discharge head.

Abstract: A nozzle ejects a functional liquid having a viscosity of not less than 5 millipascal·second and not more than 20 millipascal·second, onto a substrate. The functional liquid inside a pressure chamber connected to the nozzle is pressurized. A drive voltage having a pull waveform element which causes the pressure chamber to expand from a steady state and a push waveform element which causes the expanded pressure chamber to contract, is generated with a relationship between a slope ?1 representing voltage change per unit time in the pull waveform element, the viscosity ? of the functional liquid, a resonance period Tc of the head, and a slope ?2 representing voltage change per unit time in the push waveform element satisfying (2/Tc)??1?(?/10) and ?2??1.

Abstract: Provide a curable composition for imprint, which is improved in the surface roughness of the cured film. A curable composition for imprint comprising a polymerizable compound (A), a polymerization initiator (B), and a non-polymerizable compound (C), the non-polymerizable compound (C) comprising at least one species of surfactant (C1) which contains 20% by mass or more of fluorine atom, and, at least one species of polymer (C2) which contains 3% by mass or more and less than 20% by mass of fluorine atom and/or 5% by mass or more and less than 40% by mass of silicon atom, and has a weight-average molecular weight (Mw) of 1,000 to 100,000.

Abstract: A method for producing a curable composition for imprints includes the step of passing a curable composition containing a polymerizable monomer (A) and a polymerization initiator (B) through a filter having an effective filter area of 200 cm2 or more at least one time. The method suppresses pattern-peeling when peeling the mold employed in forming a pattern using the curable composition for imprints, and thus provides excellent patternability.

Abstract: A positive resist composition for immersion exposure comprises: (A) a resin capable of increasing its solubility in an alkali developer by an action of an acid, and (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, wherein the acid satisfies conditions of V?230 and V/S?0.93 taking van der Waals volume of the acid as V (?3), and van der Waals surface area of the acid as S (?2).

Abstract: Provide is a curable composition for imprints, capable of effectively suppressing chipping of the cured pattern. A curable composition for imprints comprising (A) curable compound and (B) photo-polymerization initiator, having a moisture content ratio, relative to the total weight of all components excluding solvent, of less than 0.8% by weight.

Abstract: Provided is the pattern formability and line edge roughness of the resultant substrate. An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.

Abstract: Disclosed is a maintenance liquid for property carrying out imprints excellent in patternability. The maintenance liquid for imprints of an ink-jet discharging device comprises a compound comprising an ester group and/or an ether group.

Abstract: A positive photosensitive composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B1) a resin of which solubility in an alkali developer increases under an action of an acid; and (B2) a resin that has at least one group selected from (a) an alkali-soluble group and (b) a group capable of decomposing under an action of an alkali to produce an alkali-soluble group, and the resin (B2) does not have a group capable of decomposing under an action of an acid; and a pattern forming method using the same.

Abstract: Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.

Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance.

Abstract: A curable composition for imprints, comprising a polymerizable monomer (Ax) represented by the following formula: wherein Ar represents a divalent or trivalent aromatic group, X represents a single bond or an organic linking group, R1 represents a hydrogen atom or an alkyl group, and n represents 2 or 3. The content of the polymerizable monomer (Ax) is 45% by mass or more, or the total content of solid polymerizable monomers and liquid polymerizable monomers with high viscosity is less than 50% by mass.

Abstract: A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.

Abstract: Provide is a curable composition for imprints capable of keeping a good pattern and heat resistance. A curable composition for imprints comprising a polymerizable compound (Ax-1) having maleimide structure(s), or a compound (Ax-2) having a partial structure represented by formula (I) below.

Abstract: Disclosed is a maintenance liquid for property carrying out imprints excellent in patternability. The maintenance liquid for imprints of an ink-jet discharging device comprises a compound comprising an ester group and/or an ether group.

Abstract: A curable composition for imprints, comprising at least one polymerizable monomer and a photopolymerization initiator, wherein the content of a polymerizable monomer having a viscosity at 25° C. of 7 mPa·s or more is 80% by mass or more, relative to all the polymerizable monomers contained in the composition. The curable composition for imprints has low volatility of the components even in a thin film coating on a substrate and is thus capable of forming a good pattern.

Abstract: A photosensitive composition containing a compound having a specific structure, a pattern-forming method using the photosensitive composition, and a compound having a specific structure used in the photosensitive composition.

Abstract: Provided is a curable composition for imprints capable of ensuring good patternability after repetitive transfer of pattern, and less causative of defects. The curable composition for imprints comprising a polymerizable compound (A), a photo-polymerization initiator (B) and a non-polymerizable compound (C); the non-polymerizable compound (C) dissolving into the curable composition for imprints in an exothermic manner.

Abstract: Provided is a curable composition for imprints which ensures satisfactory pattern formability and defect-preventive performance even in the process of high-speed pattern transfer. The curable composition for imprints, comprises at least one species of polymerizable monomer(s) (A), and a photo-polymerization initiator (B), wherein the polymerizable monomer (A) contains a polymerizable monomer (Ax) having a hydrogen-bondable group and fluorine-containing group(s).