Patents by Inventor Kuo-Shu Tseng
Kuo-Shu Tseng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230369084Abstract: A lithography includes a storage tank that stores process chemical fluid, an anti-collision frame, and an integrated sensor assembly. The storage tank includes a dispensing port positioned at a lowest part of the storage tank in a gravity direction. The anti-collision frame is coupled to the storage tank. An integrated sensor assembly is disposed on at least one of the anti-collision frame and the storage tank to measure a variation in fluid quality in response to fluid quality measurement of fluid.Type: ApplicationFiled: July 24, 2023Publication date: November 16, 2023Inventors: Tzu-Yang LIN, Cheng-Han WU, Chen-Yu LIU, Kuo-Shu TSENG, Shang-Sheng LI, Chen Yi HSU, Yu-Cheng CHANG
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Publication number: 20230360938Abstract: A wafer cleaning method for cleaning contaminants on a wafer is provided, wherein the backside of the wafer has a clear area and an unclear area, and the contaminants are located in the unclear area. The wafer cleaning method includes inspecting the backside of the wafer and generating an inspection signal by an inspection device. The wafer cleaning method includes generating a control signal according to the inspection signal by a process module, wherein the control signal includes movement information of a brush element according to coordinates of the contaminants obtained from the inspection signal. The wafer cleaning method includes controlling the brush element to clean the contaminants on the backside of the wafer according to the control signal by a control device along a predetermined path.Type: ApplicationFiled: July 13, 2023Publication date: November 9, 2023Inventors: Kuo-Shu TSENG, Yao-Yuan SHANG, You-Feng CHEN
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Patent number: 11769678Abstract: A lithography includes a storage tank that stores process chemical fluid, an anti-collision frame, and an integrated sensor assembly. The storage tank includes a dispensing port positioned at a lowest part of the storage tank in a gravity direction. The anti-collision frame is coupled to the storage tank. An integrated sensor assembly is disposed on at least one of the anti-collision frame and the storage tank to measure a variation in fluid quality in response to fluid quality measurement of fluid.Type: GrantFiled: November 20, 2020Date of Patent: September 26, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tzu-Yang Lin, Cheng-Han Wu, Chen-Yu Liu, Kuo-Shu Tseng, Shang-Sheng Li, Chen Yi Hsu, Yu-Cheng Chang
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Patent number: 11742227Abstract: A wafer cleaning system and method are provided. A brush element is configured to clean a backside of the wafer. The backside has a clear area and an unclear area, and some contaminants are located in the unclear area. A control device performs a first cleaning process to the brush element when the brush element is located at the clear area, and the control device performs a second cleaning process when the brush element is located at the unclear area. The contaminants are cleaned by an enhanced cleaning process. Since the contaminants are cleaned, the backside of the wafer is flatter, and quality of the exposed photoresist on the wafer is improved.Type: GrantFiled: December 23, 2019Date of Patent: August 29, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTDInventors: Kuo-Shu Tseng, Yao-Yuan Shang, You-Feng Chen
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Publication number: 20230264208Abstract: A nozzle assembly for use in liquid-dispensing system, the nozzle assembly includes a pipe having lumens; a body, an end of the pipe being mounted to the body; the pipe having a wall and a septum, the wall enclosing a space, the septum dividing the space enclosed by the wall into the lumens; each of the lumens being correspondingly terminated in an orifice such that a liquid is escapable from each lumen through the corresponding orifice and is thereby dispensable from the nozzle assembly.Type: ApplicationFiled: April 27, 2023Publication date: August 24, 2023Inventors: Channing CHAN, Kuo-Shu TSENG, Chun-Chih LIN
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Patent number: 11642682Abstract: A nozzle assembly for use in liquid-dispensing system, the nozzle assembly including: a body configured to receive a pipe; and the pipe, an end of the pipe being mounted on the body. The pipe includes multiple lumens correspondingly terminated in multiple orifices such that a liquid is escapable from each lumen through the corresponding orifice and is thereby dispensable from the nozzle assembly. The pipe has a first flow-capacity to supply a first volume of the liquid at a first flow-rate and at a first pressure. Each orifice and corresponding lumen has a second flow-capacity to supply a second volume of the liquid at a second flow-rate and at a second pressure.Type: GrantFiled: December 8, 2020Date of Patent: May 9, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Channing Chan, Kuo-Shu Tseng, Chun-Chih Lin
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Patent number: 11387123Abstract: A method for fault detection in a fabrication facility is provided. The method includes moving a wafer carrier along a predetermined path multiple times using a transportation apparatus. The method also includes collecting data associated with an environmental condition within the wafer carrier or around the wafer carrier using a metrology tool on the predetermined path in a previous movement of the transportation apparatus. The method further includes measuring the environmental condition within the wafer carrier or around the wafer carrier using the metrology tool during the movement of the wafer carrier. In addition, the method includes issuing a warning when the measured environmental condition is outside a range of acceptable values. The range of acceptable values is derived from the data collected in the previous movement of the transportation apparatus.Type: GrantFiled: April 24, 2020Date of Patent: July 12, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTDInventors: Powen Huang, Yao-Yuan Shang, Kuo-Shu Tseng, Yen-Yu Chen, Chun-Chih Lin, Yi-Ming Dai
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Publication number: 20210202284Abstract: A lithography includes a storage tank that stores process chemical fluid, an anti-collision frame, and an integrated sensor assembly. The storage tank includes a dispensing port positioned at a lowest part of the storage tank in a gravity direction. The anti-collision frame is coupled to the storage tank. An integrated sensor assembly is disposed on at least one of the anti-collision frame and the storage tank to measure a variation in fluid quality in response to fluid quality measurement of fluid.Type: ApplicationFiled: November 20, 2020Publication date: July 1, 2021Inventors: Tzu-Yang LIN, Cheng-Han WU, Chen-Yu LIU, Kuo-Shu TSENG, Shang-Sheng LI, Chen Yi HSU, Yu-Cheng CHANG
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Publication number: 20210086207Abstract: A nozzle assembly for use in liquid-dispensing system, the nozzle assembly including: a body configured to receive a pipe; and the pipe, an end of the pipe being mounted on the body. The pipe includes multiple lumens correspondingly terminated in multiple orifices such that a liquid is escapable from each lumen through the corresponding orifice and is thereby dispensable from the nozzle assembly. The pipe has a first flow-capacity to supply a first volume of the liquid at a first flow-rate and at a first pressure. Each orifice and corresponding lumen has a second flow-capacity to supply a second volume of the liquid at a second flow-rate and at a second pressure.Type: ApplicationFiled: December 8, 2020Publication date: March 25, 2021Inventors: Channing CHAN, Kuo-Shu TSENG, Chun-Chih LIN
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Patent number: 10864533Abstract: A nozzle assembly for use in liquid-dispensing system, the nozzle assembly including: a body configured to receive a pipe; and the pipe, an end of the pipe being mounted on the body. The pipe includes multiple lumens correspondingly terminated in multiple orifices such that a liquid is escapable from each lumen through the corresponding orifice and is thereby dispensable from the nozzle assembly. The pipe has a first flow-capacity to supply a first volume of the liquid at a first flow-rate and at a first pressure. Each orifice and corresponding lumen has a second flow-capacity to supply a second volume of the liquid at a second flow-rate and at a second pressure.Type: GrantFiled: February 26, 2018Date of Patent: December 15, 2020Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Channing Chan, Chun-Chih Lin, Kuo-Shu Tseng
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Publication number: 20200251365Abstract: A method for fault detection in a fabrication facility is provided. The method includes moving a wafer carrier along a predetermined path multiple times using a transportation apparatus. The method also includes collecting data associated with an environmental condition within the wafer carrier or around the wafer carrier using a metrology tool on the predetermined path in a previous movement of the transportation apparatus. The method further includes measuring the environmental condition within the wafer carrier or around the wafer carrier using the metrology tool during the movement of the wafer carrier. In addition, the method includes issuing a warning when the measured environmental condition is outside a range of acceptable values. The range of acceptable values is derived from the data collected in the previous movement of the transportation apparatus.Type: ApplicationFiled: April 24, 2020Publication date: August 6, 2020Inventors: Powen HUANG, Yao-Yuan SHANG, Kuo-Shu TSENG, Yen-Yu CHEN, Chun-Chih LIN, Yi-Ming DAI
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Patent number: 10651066Abstract: A method for fault detection in a fabrication facility is provided. The method includes moving a wafer carrier using a transportation apparatus. The method further includes measuring an environmental condition within the wafer carrier or around the wafer carrier using a metrology tool positioned on the wafer carrier during the movement of the wafer carrier. The method also includes issuing a warning when the detected environmental condition is outside a range of acceptable values.Type: GrantFiled: January 25, 2018Date of Patent: May 12, 2020Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Powen Huang, Yao-Yuan Shang, Kuo-Shu Tseng, Yen-Yu Chen, Chun-Chih Lin, Yi-Ming Dai
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Publication number: 20200135516Abstract: A wafer cleaning system and method are provided. A brush element is configured to clean a backside of the wafer. The backside has a clear area and an unclear area, and some contaminants are located in the unclear area. A control device performs a first cleaning process to the brush element when the brush element is located at the clear area, and the control device performs a second cleaning process when the brush element is located at the unclear area. The contaminants are cleaned by an enhanced cleaning process. Since the contaminants are cleaned, the backside of the wafer is flatter, and quality of the exposed photoresist on the wafer is improved.Type: ApplicationFiled: December 23, 2019Publication date: April 30, 2020Inventors: Kuo-Shu TSENG, Yao-Yuan SHANG, You-Feng CHEN
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Patent number: 10625193Abstract: An intelligent air-conditioning controlling system at least comprises an intelligent controlling device, an air-conditioning, and a plurality of beacons respectively arranged at different zones of a space for sensing environment information in the space. The intelligent controlling device receives the environment information from the beacons, and determines if the space is a comfortable environment based on the environment information. If the entire space is determined an uncomfortable environment, the intelligent controlling device controls the air-conditioning to directly set a target temperature to a comfortable range. If only a specific zone of the space is determined the uncomfortable environment, the intelligent controlling device controls the air-conditioning to execute an adjusting operation in accordance with a position of the specific zone.Type: GrantFiled: August 13, 2015Date of Patent: April 21, 2020Assignee: DELTA ELECTRONICS, INC.Inventors: Ping-Chieh Chan, Cheng-Yi Huang, Kuo-Shu Tseng, Hua-Yi Hsieh, Yuan-Ping Hsieh
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Patent number: 10515833Abstract: Embodiments of a wafer cleaning system and method are provided. A brush element is configured to clean a backside of the wafer. The backside has a clear area and an unclear area, and some contaminants are located in the unclear area. A control device performs a first cleaning process to the brush element when the brush element is located at the clear area, and the control device performs a second cleaning process when the brush element is located at the unclear area. The contaminants are cleaned by an enhanced cleaning process. Since the contaminants are cleaned, the backside of the wafer is flatter, and quality of the exposed photoresist on the wafer is improved.Type: GrantFiled: January 24, 2014Date of Patent: December 24, 2019Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTDInventors: Kuo-Shu Tseng, Yao-Yuan Shang, You-Feng Chen
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Patent number: 10361352Abstract: A present invention includes at least two light cups and a composite material base. The composite material base comprises a first surface, a second surface and a third surface adjacent to the first surface, and a fourth surface opposite to the first surface. The at least two light cups are formed on the first surface. At least two first metal plates and at least two second metal plates having different polarities and corresponding to the quantity of the light cups are provided on the second surface. One ends of the at least two first and second metal plates individually pass through the composite material base and extend into the light cup to form two electrode contacts, and the other ends of the at least two first metal plates extend to the fourth surface to form an exposed heat dissipation structure.Type: GrantFiled: March 22, 2018Date of Patent: July 23, 2019Assignee: Excellence Opto, Inc.Inventors: Chun-Der Wu, Tzeng-Guang Tsai, Kuo-Shu Tseng, Chih-Chiang Chang
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Patent number: 10345716Abstract: A method for fault detection in a fabrication system is provided. The method includes transferring a reticle carrier containing a reticle from an original position to a destination position. The method further includes detecting environmental condition in the reticle carrier during the transfer of the reticle carrier using a metrology tool that is positioned at the reticle carrier. The method also includes issuing a warning when the detected environmental condition is outside a range of acceptable values.Type: GrantFiled: January 23, 2018Date of Patent: July 9, 2019Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Yao-Yuan Shang, Kuo-Shu Tseng, Yen-Yu Chen, Chun-Chih Lin, Yi-Ming Dai
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Publication number: 20190163070Abstract: A method for fault detection in a fabrication system is provided. The method includes transferring a reticle carrier containing a reticle from an original position to a destination position. The method further includes detecting environmental condition in the reticle carrier during the transfer of the reticle carrier using a metrology tool that is positioned at the reticle carrier. The method also includes issuing a warning when the detected environmental condition is outside a range of acceptable values.Type: ApplicationFiled: January 23, 2018Publication date: May 30, 2019Inventors: Yao-Yuan SHANG, Kuo-Shu TSENG, Yen-Yu CHEN, Chun-Chih LIN, Yi-Ming DAI
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Publication number: 20190164792Abstract: A method for fault detection in a fabrication facility is provided. The method includes moving a wafer carrier using a transportation apparatus. The method further includes measuring an environmental condition within the wafer carrier or around the wafer carrier using a metrology tool positioned on the wafer carrier during the movement of the wafer carrier. The method also includes issuing a warning when the detected environmental condition is outside a range of acceptable values.Type: ApplicationFiled: January 25, 2018Publication date: May 30, 2019Inventors: Powen HUANG, Yao-Yuan SHANG, Kuo-Shu TSENG, Yen-Yu CHEN, Chun-Chih LIN, Yi-Ming DAI
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Publication number: 20180369836Abstract: A nozzle assembly for use in liquid-dispensing system, the nozzle assembly including: a body configured to receive a pipe; and the pipe, an end of the pipe being mounted on the body. The pipe includes multiple lumens correspondingly terminated in multiple orifices such that a liquid is escapable from each lumen through the corresponding orifice and is thereby dispensable from the nozzle assembly. The pipe has a first flow-capacity to supply a first volume of the liquid at a first flow-rate and at a first pressure. Each orifice and corresponding lumen has a second flow-capacity to supply a second volume of the liquid at a second flow-rate and at a second pressure.Type: ApplicationFiled: February 26, 2018Publication date: December 27, 2018Inventors: Channing CHAN, Chun-Chih LIN, Kuo-Shu TSENG