Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber providing an inner space in which a process with respect to a substrate is performed, a heating plate on which the substrate is placed, the heating plate being fixedly disposed within the chamber, a heater spaced from a lower portion of the heating plate to heat the heating plate, and a lift module lifting the heater.

Abstract: Disclosed are a substrate supporting unit, a substrate processing apparatus, and a method of manufacturing the substrate supporting unit. The substrate supporting unit includes a susceptor provided with heaters to heat a substrate placed on the susceptor, and including a first temperature region and a second temperature region having a higher temperature than that of the first temperature region; and a heat dissipating member including a contact surface being in thermal contact with the second temperature region. The heat dissipating member further includes an opening corresponding to the first temperature region. The heat dissipating member formed in a ring shape, in which the opening is surrounded with the contact surface, and the contact surface of the heat dissipating member makes thermal contact with the lower surface of the susceptor.

Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus in which processes with respect to substrates are performed includes a lower chamber having an opened upper side, the lower chamber including a passage allowing the substrates to pass therethrough in a side thereof, an external reaction tube closing the opened upper side of the lower chamber to provide a process space in which the processes are performed, a substrate holder on which the one ore more substrates are vertically stacked, the substrate holder being movable between a stacking position in which the substrates are stacked within the substrate holder and a process position in which the processes with respect to the substrates are performed, and a gas supply unit disposed inside the external reaction tube to supply a reaction gas into the process space, the gas supply unit forming a flow of the reaction gas having different phase differences in a vertical direction.

Abstract: Provided is a substrate processing apparatus.

Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber body having an opened upper side, the chamber body providing an inner space in which processes with respect to a substrate are performed, a chamber lid disposed on an upper portion of the chamber body to close the opened upper side of the chamber body, and a showerhead disposed on a lower portion of the chamber lid to supply a reaction gas into the inner space. The showerhead includes a flange contacting the chamber lid, the flange having a passage recessed from a top surface of the flange to allow a refrigerant to flow therein, and a flat plate disposed inside the flange, the flat plate having at least one injection hole for injecting the reaction gas in a thickness direction thereof.

Abstract: A projection lens system which is arranged between an object side at which a micro-display panel is located and an image side at which a screen is located, and includes an aperture stop; a front lens group arranged at an object-side of the aperture stop and having a positive refractive power; a rear lens group arranged at an image-side of the aperture stop, the rear lens group including a first aspherical lens at a position closest to the image side and a second aspherical lens adjacent to an object-side surface of the first aspherical lens; and an aspherical mirror having a negative refractive power and reflecting light coming from the rear lens group toward the image side.

Abstract: A method and apparatus for providing information about a plurality of wireless charging pads to an electronic device such that the electronic device performs wireless charging efficiently is provided. The method includes receiving information about the plurality of wireless charging pads and displaying the information about the plurality of wireless charging pads on a screen of the electronic device.

Abstract: According to one embodiment of the present invention, a plasma treatment apparatus comprises: a chamber having an inner space in which processes for an object to be treated are performed; and an antenna which is arranged to cover the side part of the chamber, and which forms electric fields in said inner space to generate plasma from the source gas supplied in the inner space. The antenna includes a helical antenna which is formed into a helical shape from one side of the chamber toward the other side of the chamber along a first rotation direction, and which has a current flowing in the first rotation direction; an extension antenna which is connected to one end of the helical antenna positioned at said one side of the chamber, and which has a current flowing in the direction opposite to the first rotation direction; and a connection antenna for interconnecting the extension antenna and the helical antenna.

Abstract: An electronic device includes a projector, an operating method of an electronic device including a projector, and a non-transitory computer-readable recording medium having recorded thereon instructions for performing the operating method. The electronic device includes a communicator configured to exchange data with an external device, a projector configured to project light; a sensor configured to measure a degree of proximity between the electronic device and an installation surface on which the electronic device is to be installed, and a controller configured to control the communicator and/or the projector based on the degree of proximity measured by the sensor.

Abstract: The fail bit count data, shmoo data, static noise margins and write margins corresponding to a wafer are measured. Using the above mentioned measurements, variables used to generate the curve are calculated. The variables used to generate the curve include the standard deviation of the fail bit count data, the static noise margins and the write margins. The curve is used to determine optimal operating condition of a fabrication process.

Abstract: An electronic device including an optical module, a method of operating the electronic device including the optical module, and a non-transitory computer-readable recording medium having recorded thereon a program for performing the method. The electronic device includes an optical module configured to project content on a projection surface and a processor configured to determine whether the electronic device is positioned within a predetermined range of a projection surface and control the optical module to project the content onto the projection surface based on the determination.

Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber where processes with respect to a substrate are carried out, a substrate support on which the substrate is placed, the substrate support being disposed within the chamber, and an antenna disposed in an upper portion of the chamber to form an electric field within the chamber. The antenna includes a first antenna and a second antenna, which are disposed in rotational symmetry with respect to a preset center. The first antenna includes a first inner antenna and a first intermediate antenna which respectively have semi-circular shapes and first and second radii and are respectively disposed on one side and the other side with respect to the preset center line and a first connection antenna connecting the first inner antenna to the first intermediate antenna.

Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber providing a stacking space in which a substrate is stacked and a process space in which a process with respect to the substrate is performed, a boat including at least one boat frame that vertically stands up, the boat being elevated to move into the stacking space and the process space, a plurality of susceptors disposed on the boat frame and spaced apart from each other along a longitudinal direction of the boat frame, wherein, as the boat moves into the process space, the substrate is successively loaded on a top surface of each of the plurality of susceptors, and at least holder including a vertical rod disposed parallel to the boat frame and a substrate support tip protruding from an inner surface of the vertical rod to support the substrate, wherein, when the boat moves into the process space, the vertical rod relatively moves along the longitudinal direction of the boat frame.

Abstract: The present invention relates to a figure recognition system and method for automatic detection, tracking and recognition of a human face image. 2D image data in the surveillance zone are remotely collected by using an optical sensor, the faces of all persons in the surveillance zone are detected, and corresponding positions are determined. The face is detected, the detected face's feature coordinate is estimated, and the detected face and the feature are tracked in the next frame while processing the video sequence. Image quality of each detected face is determined according to parameters of focus, brightness, contrast, and the presence of glasses. Recognition methods stored in the repository for each detected face are adjusted by considering the face image quality computation value, and a biometric feature set is generated by using the recognition method selected for each detected face.

Abstract: The present invention provides a metal gate structure which is formed in a trench of a dielectric layer. The metal gate structure includes a work function metal layer and a metal layer. The work function metal layer is disposed in the trench and comprises a bottom portion and a side portion, wherein a ratio between a thickness of the bottom portion and a thickness of the side portion is between 2 and 5. The trench is filled with the metal layer. The present invention further provides a method of forming the metal gate structure.

Abstract: The present invention provides a metal gate structure which is formed in a trench of a dielectric layer. The metal gate structure includes a work function metal layer and a metal layer. The work function metal layer is disposed in the trench and comprises a bottom portion and a side portion, wherein a ratio between a thickness of the bottom portion and a thickness of the side portion is between 2 and 5. The trench is filled with the metal layer. The present invention further provides a method of forming the metal gate structure.

Abstract: The present invention relates to a figure recognition system and method for automatic detection, tracking and recognition of a human face image. 2D image data in the surveillance zone are remotely collected by using an optical sensor, the faces of all persons in the surveillance zone are detected, and corresponding positions are determined. The face is detected, the detected face's feature coordinate is estimated, and the detected face and the feature are tracked in the next frame while processing the video sequence. Image quality of each detected face is determined according to parameters of focus, brightness, contrast, and the presence of glasses. Recognition methods stored in the repository for each detected face are adjusted by considering the face image quality computation value, and a biometric feature set is generated by using the recognition method selected for each detected face.

Abstract: A substrate supporting unit, a substrate processing apparatus, and a method of manufacturing the substrate supporting unit are provided. The substrate supporting unit includes a susceptor provided with heaters to heat a substrate placed on the susceptor, and including a first temperature region and a second temperature region having a higher temperature than that of the first temperature region; a heat dissipating member including a contact surface being in thermal contact with the second temperature region; and a reflecting member disposed approximately in parallel with one surface of the susceptor to reflect heat emitted from the susceptor toward the susceptor.

Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber providing a stacking space in which a substrate is stacked and a process space in which a process with respect to the substrate is performed, a boat including at least one boat frame that vertically stands up, the boat being elevated to move into the stacking space and the process space, a plurality of susceptors disposed on the boat frame and spaced apart from each other along a longitudinal direction of the boat frame, wherein, as the boat moves into the process space, the substrate is successively loaded on a top surface of each of the plurality of susceptors, and at least holder including a vertical rod disposed parallel to the boat frame and a substrate support tip protruding from an inner surface of the vertical rod to support the substrate, wherein, when the boat moves into the process space, the vertical rod relatively moves along the longitudinal direction of the boat frame.

Abstract: Provided is a substrate processing apparatus. The substrate processing apparatus includes a process chamber having an inner space in which a substrate transferred from the outside is accommodated, and a process with respect to the substrate is performed, hot-wire heaters disposed in a sidewall of the process chamber, the hot-wire heaters being disposed around the inner space to heat the substrate, and a cooling tube in which a refrigerant supplied from the outside flows, the cooling tube being disposed between the hot-wire heaters along the sidewall of the process chamber.