Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a presence of macro and micro defects. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

Abstract: A cartridge for an IOL delivery system that has a straight thinned walled distal nozzle. The transition region between the tapered folding portion of the cartridge and the nozzle contain reinforcing gussets to help prevent splitting of the cartridge. Flow leaders in the nozzle direct the flow of material during molding at the 12:00 o'clock position, positioning the weld line of the flow front at the 6:00 o'clock position.

Abstract: Runout characterization is performed on a moving body by positioning a light source and optical sensor at a nominal distance from the moving body, with a beam directed from the light source against a surface of the moving body. The reflected light is detected at a sampling rate with the optical sensor as the moving body moves, and a data stream of the measurements over time is stored. In the case where an interferometer is used as the optical sensor, relative distance measurements are made. The data stream is analyzed to detect repeating signatures in the data stream, where the signatures represent features on the surface of the moving body. At least one of the features is selected as a reference, and the data stream is processed into segments based on the reference, where each segment represents one period of motion of the moving body. The data segments are overlaid on top of each other to produce ordered sets of data points within the segments.

Abstract: Consistent with one embodiment of the invention, a wireless mobile device is configured to receive a configuration file from a configuration server. After receiving the configuration file, the wireless mobile device establishes a wireless communication session with a computing device within proximity of the mobile device. The mobile device is configured to send the configuration file to the computing device so as to enable a configuration application executing on the computing device to configure the computing device in accordance with configuration information included in the configuration file.

Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a property of a specimen prior to, during, or subsequent to lithography. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

Abstract: The present invention is a multi-protocol object distribution system. The multi-protocol object distribution system can include one or more remote procedure call (RPC) transport protocol stubs; and, a meta-stub configured to select individual ones of the RPC transport protocol stubs through which distributed object services can be provided to requesting clients in the object distribution system. The RPC transport protocol stubs can include both a default RPC transport stub, and at least one other RPC transport stub which the meta-stub can select based upon changing conditions in the object distribution system. Importantly, the meta-stub can automatically select the default RPC transport stub by default.

Abstract: A system is disclosed for integrating electronic mail, voice mail, and fax mail in a universal mailbox. Message receivers may access their messages with a telephone or a computer regardless of the communication medium used by the message sender. Using a telephone, message receivers may playback voice mail, redirect fax mail, and “listen” to e-mail through a text-to-speech conversion process. Using a computer and modem, message receivers may playback voice mail, view fax mail, and read e-mail by accessing the universal mailbox via connection software. Message senders and receivers may choose from a variety of filter and forward options that allow them to manage their communications via the universal mailbox. Forwarding and conversion of messages is performed automatically. The options are used to define a set of rules to be applied to inbound and outbound messages so that messages are sent and received in accordance with the preferences of the senders and receivers.

Abstract: A method, apparatus, and computer-usable medium for determining that at least one resource among a collection of resources implemented in a data processing system has become unavailable, identifying at least one dependent resource among the collection of resources that is dependent on at least one unavailable resource, in response to identifying the at least one dependent resource, disabling the at least one dependent resource, detecting recovery of the at least one unavailable resource, and in response to detecting recovery of the at least one unavailable resource, restarting the at least one dependent resource.

Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a thin film characteristic and an electrical property of a specimen. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

Abstract: A method, system and computer program product is provided for deploying software in a data processing system. A topology pattern is selected in which the selected topology pattern describes an arrangement of software and hardware devices. Augments to the selected topology pattern are received to form an augmented topology pattern after a selection of a selected topology pattern from a plurality of topology patterns. The augmented topology pattern is transformed into a set of deployable scripts, wherein the set of deployable scripts is used for the software deployment.

Abstract: A computer implemented method, an apparatus, and a computer usable program product for controlling startup request flooding. An application server instance is started. If the application server instance is throttled during a startup interval, a Web container thread manager is initiated. If the Web container thread manager identifies it is time to increment a Web container maximum thread pool size for the application server instance, the application server instance is notified to increment its Web container maximum thread pool size by a programmable amount. If the Web container maximum thread pool size for the application server instance has not reached a final maximum thread pool size, and if the startup interval for the application server instance has not completed, the Web container thread manager is suspended for an interval, after which the Web container thread manager identifies if it is time to increment the Web container maximum thread pool size for the application server instance.

Abstract: A lens delivery system having a plunger, an injector body and a nozzle portion connected to the injector body, the nozzle portion having a hinged lid and a hollow body with a lens holding platform formed beneath the hinged lid. The cartridge has an elongated nozzle tube or tip with a bore, the bore communicating with the lens holding platform. The bottom of the bore is rounded, which causes the edges of the lens between the lens haptics to fold upwardly as the lens is pushed down the bore from the platform by the plunger. A removable pin fits into the lid and prevents the lens from moving down the bore of the tip during shipment and storage.

Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a composition and a thickness. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, an adhesion characteristic and a thickness. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a presence of defects on the specimen and a thin film characteristic of the specimen. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

Abstract: Methods and systems for evaluating and controlling a lithography process are provided. For example, a method for reducing within wafer variation of a critical metric of a lithography process may include measuring at least one property of a resist disposed upon a wafer during the lithography process. A critical metric of a lithography process may include, but may not be limited to, a critical dimension of a feature formed during the lithography process. The method may also include altering at least one parameter of a process module configured to perform a step of the lithography process to reduce within wafer variation of the critical metric. The parameter of the process module may be altered in response to at least the one measured property of the resist.

Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a presence of macro and micro defects. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, overlay and flatness. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

Abstract: Methods and systems for evaluating and controlling a lithography process are provided. For example, a method for reducing within wafer variation of a critical metric of a lithography process may include measuring at least one property of a resist disposed upon a wafer during the lithography process. A critical metric of a lithography process may include, but may not be limited to, a critical dimension of a feature formed during the lithography process. The method may also include altering at least one parameter of a process module configured to perform a step of the lithography process to reduce within wafer variation of the critical metric. The parameter of the process module may be altered in response to at least the one measured property of the resist.

Abstract: A method, system, and computer instructions for using the language of the business domain to express subscriptions to a publish/subscribe messaging system. The resulting notifications sent to the subscriber are instances of the business model used to create the subscription. In other words, a subscriber may subscribe to the messaging system against the same information that the subscriber receives in a notification from the messaging system. The present invention uses the model from the business domain as the basis for notification subscriptions to allow for defining filters directly against the model's attributes, reducing problems caused by translating business models to a middleware description.