Patents by Inventor Kyle Brown

Kyle Brown has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020179864
    Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a thin film characteristic and an electrical property of a specimen. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
    Type: Application
    Filed: September 20, 2001
    Publication date: December 5, 2002
    Inventors: John Fielden, Ady Levy, Kyle Brown, Gary Bultman, Mehrdad Nikoonahad, Dan Wack
  • Publication number: 20020107650
    Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, critical dimension and a presence of defects. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
    Type: Application
    Filed: September 20, 2001
    Publication date: August 8, 2002
    Inventors: Dan Wack, Ady Levy, Kyle A. Brown, Gary Bultman, Mehrdad Nikoonahad, John Fielden
  • Publication number: 20020107660
    Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, critical dimension and a thin film characteristic. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
    Type: Application
    Filed: September 20, 2001
    Publication date: August 8, 2002
    Inventors: Mehrdad Nikoonahad, Ady Levy, Kyle A. Brown, Gary Bultman, Dan Wack, John Fielden
  • Publication number: 20020106848
    Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a property of a specimen prior to, during, or subsequent to lithography. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
    Type: Application
    Filed: September 20, 2001
    Publication date: August 8, 2002
    Inventors: Dan Wack, Ady Levy, Kyle A. Brown, Gary Bultman, Mehrdad Nikoonahad, John Fielden
  • Publication number: 20020103564
    Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a composition and a thickness. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
    Type: Application
    Filed: September 20, 2001
    Publication date: August 1, 2002
    Inventors: John Fielden, Ady Levy, Kyle A. Brown, Gary Bultman, Mehrdad Nikoonahad, Dan Wack
  • Publication number: 20020102749
    Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a characteristic of a layer formed on a specimen by a deposition process. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
    Type: Application
    Filed: September 20, 2001
    Publication date: August 1, 2002
    Inventors: John Fielden, Ady Levy, Kyle A. Brown, Gary Bultman, Mehrdad Nikoonahad, Dan Wack
  • Publication number: 20020097406
    Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a thickness of a structure on a specimen and at least one additional property of the specimen. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
    Type: Application
    Filed: September 20, 2001
    Publication date: July 25, 2002
    Inventors: John Fielden, Ady Levy, Kyle A. Brown, Gary Bultman, Mehrdad Nikoonahad, Dan Wack
  • Publication number: 20020093648
    Abstract: Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, an implant characteristic and a presence of defects. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
    Type: Application
    Filed: September 20, 2001
    Publication date: July 18, 2002
    Inventors: Mehrdad Nikoonahad, Ady Levy, Kyle A. Brown, Gary Bultman, Dan Wack, John Fielden
  • Publication number: 20020072001
    Abstract: Methods and systems for evaluating and controlling a lithography process are provided. For example, a method for reducing within wafer variation of a critical metric of a lithography process may include measuring at least one property of a resist disposed upon a wafer during the lithography process. A critical metric of a lithography process may include, but may not be limited to, a critical dimension of a feature formed during the lithography process. The method may also include altering at least one parameter of a process module configured to perform a step of the lithography process to reduce within wafer variation of the critical metric. The parameter of the process module may be altered in response to at least the one measured property of the resist.
    Type: Application
    Filed: May 4, 2001
    Publication date: June 13, 2002
    Inventors: Kyle A. Brown, Matt Hankinson, Ady Levy, Suresh Lakkapragada
  • Patent number: 6332470
    Abstract: An apparatus for cleaning a substrate includes a source of pressurized carrier gas and a body of cleaning agent in liquid form. A first conduit directs the pressurized carrier gas from the carrier gas source to the body of cleaning agent. A second conduit carries a flow of the carrier gas away from the body of the cleaning agent. The carrier gas flow carried by the second conduit includes cleaning agent in vapor form acquired from the body of cleaning agent. A nozzle is coupled to the second conduit to cause droplets of the cleaning agent to impinge upon a first face of the substrate to be cleaned.
    Type: Grant
    Filed: December 30, 1997
    Date of Patent: December 25, 2001
    Inventors: Boris Fishkin, Kyle A. Brown
  • Patent number: 6280299
    Abstract: The present invention provides a method and apparatus for delivering one or more rinse agents to a surface, such as a polishing pad surface and preferably one or more polishing fluids. The invention also provides a method of cleaning one or more surfaces, such as a polishing pad surface and a substrate surface, by delivering a spray of one or more rinse agents to the surface and, preferably, causing the rinse agent to flow across the surface from a central region to an outer region where unwanted debris and material is collected.
    Type: Grant
    Filed: February 16, 2000
    Date of Patent: August 28, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Daniel Kennedy, Boris Fuksshimov, Victor Belitsky, Boris Fishkin, Kyle Brown, Tom Osterheld, Jeff Beeler, Ginetto Addiego
  • Patent number: 6241588
    Abstract: A chemical mechanical polishing system comprising a moving polishing pad and an ultrasonic conditioning head. The head is positioned in close facing relationship to the pad surface and agitates a liquid on the rotating pad surface at an appropriate frequency and sufficient amplitude to produce cavitation of the slurry in the vicinity of the pad surface. The action of cavitational collapse vigorously conditions the pad, driving out contaminants and re-texturizing the pad.
    Type: Grant
    Filed: August 21, 2000
    Date of Patent: June 5, 2001
    Assignee: Applied Materials, Inc.
    Inventors: Kyle A. Brown, Boris Fishkin
  • Patent number: 6149505
    Abstract: A chemical mechanical polishing system comprising a moving polishing pad and an ultrasonic conditioning head. The head is positioned in close facing relationship to the pad surface and agitates a liquid on the rotating pad surface at an appropriate frequency and sufficient amplitude to produce cavitation of the slurry in the vicinity of the pad surface. The action of cavitational collapse vigorously conditions the pad, driving out contaminants and re-texturizing the pad.
    Type: Grant
    Filed: August 4, 1999
    Date of Patent: November 21, 2000
    Assignee: Applied Materials, Inc.
    Inventors: Kyle A. Brown, Boris Fishkin
  • Patent number: 6143001
    Abstract: A lens injector cartridge having an asymmetric bore. The asymmetric bore initiates the folding of the lens on one side only, thereby reducing the amount of energy imparted to the lens and the potential for damage to the lens. The gentle folding of the lens also assists in positioning the travel of the haptics down the bore, thereby reducing the potential for damage to the haptics.
    Type: Grant
    Filed: October 1, 1999
    Date of Patent: November 7, 2000
    Assignee: Alcon Laboratories, Inc.
    Inventors: Kyle Brown, Thomas M. Heyman
  • Patent number: 6139406
    Abstract: The present invention provides a method and apparatus for delivering one or more rinse agents to a surface, such as a polishing pad surface and preferably one or more polishing fluids. The invention also provides a method of cleaning one or more surfaces, such as a polishing pad surface and a substrate surface, by delivering a spray of one or more rinse agents to the surface and, preferably, causing the rinse agent to flow across the surface from a central region to an outer region where unwanted debris and material is collected.
    Type: Grant
    Filed: June 24, 1997
    Date of Patent: October 31, 2000
    Assignee: Applied Materials, Inc.
    Inventors: Daniel Kennedy, Boris Fuksshimov, Victor Belitsky, Boris Fishkin, Kyle Brown, Tom Osterheld, Jeff Beeler, Ginetto Addiego
  • Patent number: 6083231
    Abstract: A lens injector cartridge having an asymmetric bore. The asymmetric bore initiate; the folding of the lens on one side only, thereby reducing the amount of energy imparted to the lens and the potential for damage to the lens. The gentle folding of the lens also assists in positioning the travel of the haptics down the bore, thereby reducing the potential for damage to the haptics.
    Type: Grant
    Filed: April 19, 1999
    Date of Patent: July 4, 2000
    Assignee: Alcon Laboratories, Inc.
    Inventors: Stephen J. Van Noy, Kyle Brown, David A. Downer, David Eister, Lars D. Jensen
  • Patent number: 6010510
    Abstract: An intraocular lens injector plunger having a blunt, rounded tip offset from the centerline of the plunger rod. The offset tip assures that the tip is biased downward against the bottom of the cartridge bore. Such a downward bias helps prevent the tip from riding up over the IOL and being folded within the IOL. The offset also helps prevent the haptics of the IOL from becoming trapped between the plunger rod and the cartridge bore, thereby damaging the haptics and/or preventing the IOL from being advanced down the bore.
    Type: Grant
    Filed: June 2, 1998
    Date of Patent: January 4, 2000
    Assignee: Alcon Laboratories, Inc.
    Inventors: Kyle Brown, Stephen J. Van Noy
  • Patent number: 5957754
    Abstract: A chemical mechanical polishing system comprising a moving polishing pad and an ultrasonic conditioning head. The head is positioned in close facing relationship to the pad surface and agitates a liquid on the rotating pad surface at an appropriate frequency and sufficient amplitude to produce cavitation of the slurry in the vicinity of the pad surface. The action of cavitational collapse vigorously conditions the pad, driving out contaminants and re-texturizing the pad.
    Type: Grant
    Filed: August 29, 1997
    Date of Patent: September 28, 1999
    Assignee: Applied Materials, Inc.
    Inventors: Kyle A. Brown, Boris Fishkin
  • Patent number: 5947976
    Abstract: A lens injector cartridge having an asymmetric bore. The asymmetric bore initiates the folding of the lens on one side only, thereby reducing the amount of energy imparted to the lens and the potential for damage to the lens. The gentle folding of the lens also assists in positioning the travel of the haptics down the bore, thereby reducing the potential for damage to the haptics.
    Type: Grant
    Filed: June 2, 1998
    Date of Patent: September 7, 1999
    Assignee: Alcon Laboratories, Inc.
    Inventors: Stephen J. Van Noy, Kyle Brown, David A. Downer, David Eister, Lars D. Jensen
  • Patent number: 5702400
    Abstract: A single piece intraocular lens folder that has a generally planar, open frame in the shape of a rounded "A" with a rimmed, open head at the top of the "A". The base of the "A" forms a pairs of opposing legs or handles that join to form a hinge at the intersection where the handles attach to the head. The hinge allows the handle to be squeezed together and spring apart when released. Squeezing the handles together causes the sides of the head to spread apart, thereby stretching the top edge of the head rim and pulling the top edge downward toward the hinge. The open head contains a pair of support jaws and a pair of serpentine folding jaws. The location of the serpentine jaws is such that when the top edge of the head rim moves toward the hinge, the serpentine jaws are squeezed together, causing the IOL to be folded in half. The serpentine shape of the folding jaws allow the haptics to pivot downward, thereby permitting the IOL to be folded along a plurality of axes.
    Type: Grant
    Filed: December 11, 1996
    Date of Patent: December 30, 1997
    Assignee: Alcon Laboratories, Inc.
    Inventors: Kyle Brown, Stephen J. Van Noy, Yi-Ren Woo, Lars D. Jensen