Patents by Inventor Kyle M. Hanson

Kyle M. Hanson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10845715
    Abstract: Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: November 24, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Viachslav Babayan, Ludovic Godet, Kyle M. Hanson, Robert B. Moore
  • Patent number: 10754252
    Abstract: Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. In one embodiment, a major axis of the processing volume is oriented vertically and a minor axis of the processing volume is oriented horizontally. One or more electrodes may be disposed adjacent the processing volume and at least partially define the processing volume. Process fluid is provided to the processing volume via a plurality of fluid conduits to facilitate immersion field guided post exposure bake processes. A plurality of seals maintains the fluid containment integrity of the processing volume during processing. A post process chamber for rinsing, developing, and drying a substrate is also provided.
    Type: Grant
    Filed: December 15, 2017
    Date of Patent: August 25, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Kyle M. Hanson, Gregory J. Wilson, Viachslav Babayan
  • Publication number: 20190377272
    Abstract: Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.
    Type: Application
    Filed: August 22, 2019
    Publication date: December 12, 2019
    Inventors: Viachslav BABAYAN, Ludovic GODET, Kyle M. HANSON, Robert B. MOORE
  • Publication number: 20190345624
    Abstract: Electroplating systems according to the present technology may include a two-bath electroplating chamber including a separator configured to provide fluid separation between a first bath configured to maintain a catholyte during operation and a second bath configured to maintain an anolyte during operation. The system may include a catholyte tank fluidly coupled with the first bath of the two-bath electroplating chamber. The system may also include a contaminant retrieval system configured to remove contaminant ions from the catholyte.
    Type: Application
    Filed: May 9, 2019
    Publication date: November 14, 2019
    Applicant: Applied Materials, Inc.
    Inventors: Kwan Wook Roh, Paul McHugh, Sam Lee, Kyle M. Hanson, Marvin L. Bernt, Bioh Kim
  • Publication number: 20190321861
    Abstract: Systems for cleaning electroplating system components may include a seal cleaning assembly incorporated with an electroplating system. The seal cleaning assembly may include an arm pivotable between a first position and a second position. The arm may be rotatable about a central axis of the arm. The seal cleaning assembly may include a cleaning head coupled with a distal portion of the arm. The cleaning head may include a bracket having a faceplate coupled with the arm, and a housing extending from the faceplate. The housing may define one or more arcuate channels extending through the housing to a front surface of the bracket. The cleaning head may also include a rotatable cartridge extending from the housing of the bracket. The cartridge may include a mount cylinder defining one or more apertures configured to deliver a cleaning solution to a pad coupled about the mount cylinder.
    Type: Application
    Filed: April 17, 2019
    Publication date: October 24, 2019
    Applicant: Applied Materials, Inc.
    Inventors: Joseph A. Jonathan, Kyle M. Hanson, Jason Rye, James Brown, Greg Wilson, Eric J. Bergman, Tricia A. Youngbull, Timothy Gale Stolt
  • Publication number: 20190323141
    Abstract: Electroplating system seals may include an annular busbar characterized by an inner annular radius and an outer annular radius. The annular busbar may include a plurality of contact extensions. The seals may include an external seal member characterized by an inner annular radius and an outer annular radius. The external seal member may be vertically aligned with and extend inward of the contact extensions at the inner annular radius of the external seal member. The external seal member may include an interior surface at least partially facing the contact extensions. The seals may also include an internal seal member extending a first distance along the interior surface of the external seal member from the inner annular radius. The internal seal member may include a deformable material configured to support a substrate between the internal seal member and the plurality of contact extensions.
    Type: Application
    Filed: April 17, 2019
    Publication date: October 24, 2019
    Applicant: Applied Materials, Inc.
    Inventors: Kyle M. Hanson, Manjunatha Vishwanatha Adagoor, Karthikeyan Balaraman, Karthick Vasu, Shailesh Chouriya
  • Patent number: 10401742
    Abstract: Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.
    Type: Grant
    Filed: April 6, 2018
    Date of Patent: September 3, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Viachslav Babayan, Ludovic Godet, Kyle M. Hanson, Robert B. Moore
  • Publication number: 20190233966
    Abstract: Systems for cleaning electroplating system components may include a seal cleaning assembly incorporated with an electroplating system. The seal cleaning assembly may include an arm pivotable between a first position and a second position. The arm may be rotatable about a central axis of the arm. The seal cleaning assembly may also include a cleaning head including a bracket portion coupled with a distal portion of the arm. The cleaning head may be characterized by a front portion formed to interface with a seal of the electroplating apparatus. The cleaning head may define a trench along the front portion, and the cleaning head may define a plurality of fluid channels through the cleaning head, each fluid channel of the plurality of fluid channels fluidly accessing a backside of the trench.
    Type: Application
    Filed: February 1, 2019
    Publication date: August 1, 2019
    Applicant: Applied Materials, Inc.
    Inventor: Kyle M. Hanson
  • Publication number: 20180224754
    Abstract: Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.
    Type: Application
    Filed: April 6, 2018
    Publication date: August 9, 2018
    Inventors: Viachslav BABAYAN, Ludovic GODET, Kyle M. HANSON, Robert B. MOORE
  • Publication number: 20180217504
    Abstract: Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. Electrodes may be disposed adjacent the process volume and process fluid is provided to the process volume via a plurality of fluid conduits to facilitate immersion field guided post exposure bake processes. A post process chamber for rinsing, developing, and drying a substrate is also provided.
    Type: Application
    Filed: March 29, 2018
    Publication date: August 2, 2018
    Inventors: Kyle M. HANSON, Gregory J. WILSON, Viachslav BABAYAN
  • Patent number: 9984867
    Abstract: In some embodiments, a system is provided that includes (1) a loading position; (2) a drying position; (3) a movable tank configured to (a) hold at least one substrate; (b) hold a cleaning chemistry so as to expose a substrate within the movable tank to the cleaning chemistry; and (c) translate between the loading position and the drying position; and (4) a drying station located at the drying position and configured to rinse and dry a substrate as the substrate is unloaded from the movable tank when the movable tank is at the drying position. Numerous other aspects are provided.
    Type: Grant
    Filed: January 21, 2015
    Date of Patent: May 29, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Ekaterina Mikhaylichenko, Brian J. Brown, Kyle M. Hanson, Vincent S. Francischetti
  • Patent number: 9964863
    Abstract: Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.
    Type: Grant
    Filed: February 16, 2017
    Date of Patent: May 8, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Viachslav Babayan, Ludovic Godet, Kyle M. Hanson, Robert B. Moore
  • Patent number: 9958782
    Abstract: Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. Electrodes may be disposed adjacent the process volume and process fluid is provided to the process volume via a plurality of fluid conduits to facilitate immersion field guided post exposure bake processes. A post process chamber for rinsing, developing, and drying a substrate is also provided.
    Type: Grant
    Filed: June 29, 2016
    Date of Patent: May 1, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Kyle M. Hanson, Gregory J. Wilson, Viachslav Babayan
  • Publication number: 20180107119
    Abstract: Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. Electrodes may be disposed adjacent the process volume and process fluid is provided to the process volume via a plurality of fluid conduits to facilitate immersion field guided post exposure bake processes. A post process chamber for rinsing, developing, and drying a substrate is also provided.
    Type: Application
    Filed: December 15, 2017
    Publication date: April 19, 2018
    Inventors: Kyle M. HANSON, Gregory J. WILSON, Viachslav BABAYAN
  • Patent number: 9937802
    Abstract: A vehicle includes a traction battery, an electric machine, and a variable voltage converter. The variable voltage converter includes an inductor and is disposed electrically between the traction battery and electric machine. The vehicle also includes a controller programmed to issue duty cycle commands for the variable voltage converter based on a product of an AC component of current flowing through the inductor and a calibrated resistance.
    Type: Grant
    Filed: January 14, 2015
    Date of Patent: April 10, 2018
    Assignee: Ford Global Technologies, LLC
    Inventors: Daniel Richard Luedtke, Yulei Chen, Kyle M. Hanson, Fazal Urrahman Syed, Wei Xu
  • Publication number: 20180004094
    Abstract: Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. Electrodes may be disposed adjacent the process volume and process fluid is provided to the process volume via a plurality of fluid conduits to facilitate immersion field guided post exposure bake processes. A post process chamber for rinsing, developing, and drying a substrate is also provided.
    Type: Application
    Filed: June 29, 2016
    Publication date: January 4, 2018
    Inventors: Kyle M. HANSON, Gregory J. WILSON, Viachslav BABAYAN
  • Patent number: 9859135
    Abstract: An example waterfall apparatus includes (1) a first portion of a first width having (a) a first plenum, a second plenum, and a restricted fluid path therebetween; (b) a first coupling surface; and (c) an inlet opening that creates a fluid path between the first coupling surface and the first plenum; and (2) a second portion of a second width larger than the first width and having (a) a second coupling surface; and (b) an inlet aligned with the first portion inlet opening. The first and second coupling surfaces form a slot that extends along at least a portion of a length of the waterfall apparatus and that connects to the second plenum. Fluid introduced into the second portion inlet fills the first plenum, travels through the restricted fluid path to the second plenum, and exits the slot between the first and second portions to form a rinsing fluid waterfall.
    Type: Grant
    Filed: February 19, 2015
    Date of Patent: January 2, 2018
    Assignee: Applied Materials, Inc.
    Inventors: Jonathan S. Frankel, Brian J. Brown, Vincent S. Francischetti, Paul McHugh, Kyle M. Hanson, Ekaterina Mikhaylichenko
  • Patent number: 9799537
    Abstract: A processing assembly for a semiconductor workpiece generally includes a rotor assembly capable of spinning a workpiece, a chemistry delivery assembly for delivering chemistry to the workpiece, and a chemistry collection assembly for collecting spent chemistry from the workpiece. The chemistry collection assembly may include a weir that is configured to spin with the rotor assembly. A method of processing a semiconductor workpiece is also provided.
    Type: Grant
    Filed: December 3, 2010
    Date of Patent: October 24, 2017
    Assignee: APPLIED Materials, Inc.
    Inventors: Jason Rye, Kyle M. Hanson
  • Publication number: 20170263472
    Abstract: A wafer processor has a rotor holding wafers within a process tank. The rotor rotates sequentially moving the wafers through a process liquid held in the process tank. The tank may have an I-beam shape to reduce the volume of process liquid. A load port is provided at a top of the process tank for loading and unloading wafers into and out of the process tank. Rinsing and cleaning chambers may be associated with the load port to remove process liquid from processed wafers. The processor may be oriented with the rotor rotating about a horizontal axis or about a vertical axis.
    Type: Application
    Filed: February 23, 2017
    Publication date: September 14, 2017
    Inventors: John L. Klocke, Kyle M. Hanson, Joseph A. Jonathan, Stuart Crane
  • Patent number: 9673742
    Abstract: A method of compensating for magnetic flux resulting from variance from a first electric machine to a second electric machine. A magnetic flux change for the first machine is calculated as a function of a flux difference between the first machine and the second machine. Operation of the first machine is controlled using the magnetic flux change.
    Type: Grant
    Filed: April 21, 2014
    Date of Patent: June 6, 2017
    Assignee: FORD GLOBAL TECHNOLOGIES, LLC
    Inventors: Kyle M. Hanson, Edward W. Haran