Patents by Inventor Kyle M. Hanson
Kyle M. Hanson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20210026257Abstract: Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.Type: ApplicationFiled: October 2, 2020Publication date: January 28, 2021Inventors: Viachslav BABAYAN, Ludovic GODET, Kyle M. HANSON, Robert B. MOORE
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Publication number: 20210017665Abstract: Cleaning substrates or electroplating system components may include methods of rinsing a substrate at a semiconductor plating chamber. The methods may include moving a head from a plating bath to a first position. The head may include a substrate coupled with the head. The methods may include rotating the head for a first period of time to sling bath fluid back into the plating bath. A residual amount of bath fluid may remain. The methods may include delivering a first fluid to the substrate from a first fluid nozzle to at least partially expel the residual amount of bath fluid back into the plating bath. The methods may include moving the head to a second position. The methods may include rotating the head for a second period of time. The methods may also include delivering a second fluid across the substrate from a second fluid nozzle.Type: ApplicationFiled: July 16, 2019Publication date: January 21, 2021Applicant: Applied Materials, Inc.Inventors: Sam Lee, Kyle M. Hanson, Eric J. Bergman
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Publication number: 20200387074Abstract: Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. Electrodes may be disposed adjacent the process volume and process fluid is provided to the process volume via a plurality of fluid conduits to facilitate immersion field guided post exposure bake processes. A post process chamber for rinsing, developing, and drying a substrate is also provided.Type: ApplicationFiled: August 24, 2020Publication date: December 10, 2020Inventors: Kyle M. HANSON, Gregory J. WILSON, Viachslav BABAYAN
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Patent number: 10845715Abstract: Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.Type: GrantFiled: August 22, 2019Date of Patent: November 24, 2020Assignee: APPLIED MATERIALS, INC.Inventors: Viachslav Babayan, Ludovic Godet, Kyle M. Hanson, Robert B. Moore
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Patent number: 10754252Abstract: Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. In one embodiment, a major axis of the processing volume is oriented vertically and a minor axis of the processing volume is oriented horizontally. One or more electrodes may be disposed adjacent the processing volume and at least partially define the processing volume. Process fluid is provided to the processing volume via a plurality of fluid conduits to facilitate immersion field guided post exposure bake processes. A plurality of seals maintains the fluid containment integrity of the processing volume during processing. A post process chamber for rinsing, developing, and drying a substrate is also provided.Type: GrantFiled: December 15, 2017Date of Patent: August 25, 2020Assignee: Applied Materials, Inc.Inventors: Kyle M. Hanson, Gregory J. Wilson, Viachslav Babayan
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Publication number: 20190377272Abstract: Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.Type: ApplicationFiled: August 22, 2019Publication date: December 12, 2019Inventors: Viachslav BABAYAN, Ludovic GODET, Kyle M. HANSON, Robert B. MOORE
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Publication number: 20190345624Abstract: Electroplating systems according to the present technology may include a two-bath electroplating chamber including a separator configured to provide fluid separation between a first bath configured to maintain a catholyte during operation and a second bath configured to maintain an anolyte during operation. The system may include a catholyte tank fluidly coupled with the first bath of the two-bath electroplating chamber. The system may also include a contaminant retrieval system configured to remove contaminant ions from the catholyte.Type: ApplicationFiled: May 9, 2019Publication date: November 14, 2019Applicant: Applied Materials, Inc.Inventors: Kwan Wook Roh, Paul McHugh, Sam Lee, Kyle M. Hanson, Marvin L. Bernt, Bioh Kim
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Publication number: 20190323141Abstract: Electroplating system seals may include an annular busbar characterized by an inner annular radius and an outer annular radius. The annular busbar may include a plurality of contact extensions. The seals may include an external seal member characterized by an inner annular radius and an outer annular radius. The external seal member may be vertically aligned with and extend inward of the contact extensions at the inner annular radius of the external seal member. The external seal member may include an interior surface at least partially facing the contact extensions. The seals may also include an internal seal member extending a first distance along the interior surface of the external seal member from the inner annular radius. The internal seal member may include a deformable material configured to support a substrate between the internal seal member and the plurality of contact extensions.Type: ApplicationFiled: April 17, 2019Publication date: October 24, 2019Applicant: Applied Materials, Inc.Inventors: Kyle M. Hanson, Manjunatha Vishwanatha Adagoor, Karthikeyan Balaraman, Karthick Vasu, Shailesh Chouriya
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Publication number: 20190321861Abstract: Systems for cleaning electroplating system components may include a seal cleaning assembly incorporated with an electroplating system. The seal cleaning assembly may include an arm pivotable between a first position and a second position. The arm may be rotatable about a central axis of the arm. The seal cleaning assembly may include a cleaning head coupled with a distal portion of the arm. The cleaning head may include a bracket having a faceplate coupled with the arm, and a housing extending from the faceplate. The housing may define one or more arcuate channels extending through the housing to a front surface of the bracket. The cleaning head may also include a rotatable cartridge extending from the housing of the bracket. The cartridge may include a mount cylinder defining one or more apertures configured to deliver a cleaning solution to a pad coupled about the mount cylinder.Type: ApplicationFiled: April 17, 2019Publication date: October 24, 2019Applicant: Applied Materials, Inc.Inventors: Joseph A. Jonathan, Kyle M. Hanson, Jason Rye, James Brown, Greg Wilson, Eric J. Bergman, Tricia A. Youngbull, Timothy Gale Stolt
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Patent number: 10401742Abstract: Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.Type: GrantFiled: April 6, 2018Date of Patent: September 3, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Viachslav Babayan, Ludovic Godet, Kyle M. Hanson, Robert B. Moore
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Publication number: 20190233966Abstract: Systems for cleaning electroplating system components may include a seal cleaning assembly incorporated with an electroplating system. The seal cleaning assembly may include an arm pivotable between a first position and a second position. The arm may be rotatable about a central axis of the arm. The seal cleaning assembly may also include a cleaning head including a bracket portion coupled with a distal portion of the arm. The cleaning head may be characterized by a front portion formed to interface with a seal of the electroplating apparatus. The cleaning head may define a trench along the front portion, and the cleaning head may define a plurality of fluid channels through the cleaning head, each fluid channel of the plurality of fluid channels fluidly accessing a backside of the trench.Type: ApplicationFiled: February 1, 2019Publication date: August 1, 2019Applicant: Applied Materials, Inc.Inventor: Kyle M. Hanson
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Publication number: 20180224754Abstract: Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.Type: ApplicationFiled: April 6, 2018Publication date: August 9, 2018Inventors: Viachslav BABAYAN, Ludovic GODET, Kyle M. HANSON, Robert B. MOORE
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Publication number: 20180217504Abstract: Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. Electrodes may be disposed adjacent the process volume and process fluid is provided to the process volume via a plurality of fluid conduits to facilitate immersion field guided post exposure bake processes. A post process chamber for rinsing, developing, and drying a substrate is also provided.Type: ApplicationFiled: March 29, 2018Publication date: August 2, 2018Inventors: Kyle M. HANSON, Gregory J. WILSON, Viachslav BABAYAN
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Patent number: 9984867Abstract: In some embodiments, a system is provided that includes (1) a loading position; (2) a drying position; (3) a movable tank configured to (a) hold at least one substrate; (b) hold a cleaning chemistry so as to expose a substrate within the movable tank to the cleaning chemistry; and (c) translate between the loading position and the drying position; and (4) a drying station located at the drying position and configured to rinse and dry a substrate as the substrate is unloaded from the movable tank when the movable tank is at the drying position. Numerous other aspects are provided.Type: GrantFiled: January 21, 2015Date of Patent: May 29, 2018Assignee: Applied Materials, Inc.Inventors: Ekaterina Mikhaylichenko, Brian J. Brown, Kyle M. Hanson, Vincent S. Francischetti
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Patent number: 9964863Abstract: Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.Type: GrantFiled: February 16, 2017Date of Patent: May 8, 2018Assignee: Applied Materials, Inc.Inventors: Viachslav Babayan, Ludovic Godet, Kyle M. Hanson, Robert B. Moore
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Patent number: 9958782Abstract: Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. Electrodes may be disposed adjacent the process volume and process fluid is provided to the process volume via a plurality of fluid conduits to facilitate immersion field guided post exposure bake processes. A post process chamber for rinsing, developing, and drying a substrate is also provided.Type: GrantFiled: June 29, 2016Date of Patent: May 1, 2018Assignee: Applied Materials, Inc.Inventors: Kyle M. Hanson, Gregory J. Wilson, Viachslav Babayan
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Publication number: 20180107119Abstract: Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. Electrodes may be disposed adjacent the process volume and process fluid is provided to the process volume via a plurality of fluid conduits to facilitate immersion field guided post exposure bake processes. A post process chamber for rinsing, developing, and drying a substrate is also provided.Type: ApplicationFiled: December 15, 2017Publication date: April 19, 2018Inventors: Kyle M. HANSON, Gregory J. WILSON, Viachslav BABAYAN
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Patent number: 9937802Abstract: A vehicle includes a traction battery, an electric machine, and a variable voltage converter. The variable voltage converter includes an inductor and is disposed electrically between the traction battery and electric machine. The vehicle also includes a controller programmed to issue duty cycle commands for the variable voltage converter based on a product of an AC component of current flowing through the inductor and a calibrated resistance.Type: GrantFiled: January 14, 2015Date of Patent: April 10, 2018Assignee: Ford Global Technologies, LLCInventors: Daniel Richard Luedtke, Yulei Chen, Kyle M. Hanson, Fazal Urrahman Syed, Wei Xu
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Publication number: 20180004094Abstract: Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. Electrodes may be disposed adjacent the process volume and process fluid is provided to the process volume via a plurality of fluid conduits to facilitate immersion field guided post exposure bake processes. A post process chamber for rinsing, developing, and drying a substrate is also provided.Type: ApplicationFiled: June 29, 2016Publication date: January 4, 2018Inventors: Kyle M. HANSON, Gregory J. WILSON, Viachslav BABAYAN
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Patent number: 9859135Abstract: An example waterfall apparatus includes (1) a first portion of a first width having (a) a first plenum, a second plenum, and a restricted fluid path therebetween; (b) a first coupling surface; and (c) an inlet opening that creates a fluid path between the first coupling surface and the first plenum; and (2) a second portion of a second width larger than the first width and having (a) a second coupling surface; and (b) an inlet aligned with the first portion inlet opening. The first and second coupling surfaces form a slot that extends along at least a portion of a length of the waterfall apparatus and that connects to the second plenum. Fluid introduced into the second portion inlet fills the first plenum, travels through the restricted fluid path to the second plenum, and exits the slot between the first and second portions to form a rinsing fluid waterfall.Type: GrantFiled: February 19, 2015Date of Patent: January 2, 2018Assignee: Applied Materials, Inc.Inventors: Jonathan S. Frankel, Brian J. Brown, Vincent S. Francischetti, Paul McHugh, Kyle M. Hanson, Ekaterina Mikhaylichenko