Abstract: An apparatus and a method for preventing contamination to a low pressure chemical vapor deposition chamber (LPCVD) are provided. The apparatus includes an exhaust-vent device which is connected to a vent outlet and a vacuum pump on a process chamber in parallel with and bypassing a gate valve such that the exhaust-vent remains open during a continuous pumping of the process chamber for wafer loading and unloading. The exhaust-vent device is constructed by two end conduits that have a larger diameter connected by a middle conduit that has a smaller diameter such that during vacuum evacuation, the fluid flow rate in the smaller diameter conduit is at least four times that in the large conduit to effectively prevent the deposition in the small conduit of reaction by-products. The present invention apparatus may further be enhanced by mounting heating tapes on the vacuum conduits and heating the conduits to a temperature of between about 100.degree. C. and about 180.degree. C.

Abstract: A laryngoscope comprised of an integral handle and curved blade with a bivalve element to form an enclosed passageway with the curved blade, the handle shaped to receive a fiberoptic bundle assembly and the interior of the curved blade having a channel into which a fiberoptic bundle assembly may be placed, with the distal end of said channel forming a circumference for containing the distal end of the fiberoptic bundle assembly.

Abstract: A laryngoscope comprised of an integral handle and blade wherein the blade is curved to pass over the patient's tongue, the blade also having two fiberoptic bundles for viewing and illuminating the region around the patient's larynx, and a bivalve element that is releasably attachable to the blade to form a passageway for threading an endotracheal tube to the distal end of the blade.