Abstract: The present invention provides integrated semiconductor devices that are formed upon an SOI substrate having different crystal orientations that provide optimal performance for a specific device. Specifically, an integrated semiconductor structure including at least an SOI substrate having a top semiconductor layer of a first crystallographic orientation and a semiconductor material of a second crystallographic orientation, wherein the semiconductor material is substantially coplanar and of substantially the same thickness as that of the top semiconductor layer and the first crystallographic orientation is different from the second crystallographic orientation is provided. The SOI substrate is formed by wafer bonding, ion implantation and annealing.

Abstract: A method of fabricating a SOI wafer having a gate-quality, thin buried oxide region is provided. The wafer is fabricating by forming a substantially uniform thermal oxide on a surface of a Si-containing layer of a SOI substrate which includes a buried oxide region positioned between the Si-containing layer and a Si-containing substrate layer. Next, a cleaning process is employed to form a hydrophilic surface on the thermal oxide. A carrier wafer having a hydrophilic surface is provided and positioned near the substrate such that the hydrophilic surfaces adjoin each other. Room temperature bonding is then employed to bond the carrier wafer to the substrate. An annealing step is performed and thereafter, the Si-containing substrate of the silicon-on-insulator substrate and the buried oxide region are selectively removed to expose the Si-containing layer.

Abstract: A sub-0.05 ?m channel length fully-depleted SOI MOSFET device having low source and drain resistance and minimal overlap capacitance and a method of fabricating the same are provided. The sub-0.05 ?m channel length fully-depleted SOI MOSFET device includes an SOI structure which contains at least an SOI layer having a channel region of a first thickness and abutting source/drain regions of a second thickness present therein, wherein the second thickness is greater than the first thickness and the source/drain regions having a salicide layer present thereon. A gate region is present also atop the SOI layer.

Abstract: A method of fabricating a SOI wafer having a gate-quality, thin buried oxide region is provided. The wafer is fabricating by forming a substantially uniform thermal oxide on a surface of a Si-containing layer of a SOI substrate which includes a buried oxide region positioned between the Si-containing layer and a Si-containing substrate layer. Next, a cleaning process is employed to form a hydrophilic surface on the thermal oxide. A carrier wafer having a hydrophilic surface is provided and positioned near the substrate such that the hydrophilic surfaces adjoin each other. Room temperature bonding is then employed to bond the carrier wafer to the substrate. An annealing step is performed and thereafter, the Si-containing substrate of the silicon-on-insulator substrate and the buried oxide region are selectively removed to expose the Si-containing layer.

Abstract: The present invention provides integrated semiconductor devices that are formed upon an SOI substrate having different crystal orientations that provide optimal performance for a specific device. Specifically, an integrated semiconductor structure including at least an SOI substrate having a top semiconductor layer of a first crystallographic orientation and a semiconductor material of a second crystallographic orientation, wherein the semiconductor material is substantially coplanar and of substantially the same thickness as that of the top semiconductor layer and the first crystallographic orientation is different from the second crystallographic orientation is provided. The SOI substrate is formed by wafer bonding, ion implantation and annealing.

Abstract: Described is a method for making silicon on sapphire structures, and devices therefrom. The inventive method of forming integrated circuits on a sapphire substrate comprises the steps of providing a device layer on an oxide layer of a temporary substrate; bonding the device layer to a handling substrate; removing the temporary substrate to provide a structure containing the device layer between the oxide layer and the handling substrate; bonding a sapphire substrate to the oxide layer; removing the handling substrate from the structure; and annealing the final structure to provide a substrate comprising the oxide layer between the device layer and the sapphire substrate. The sapphire substrate may comprise bulk sapphire or may be a conventional substrate material with an uppermost sapphire layer.

Abstract: Described is a wet chemical surface treatment involving NH4OH that enables extremely strong direct bonding of two wafer such as semiconductors (e.g., Si) to insulators (e.g., SiO2) at low temperatures (less than or equal to 400° C.). Surface energies as high as ˜4835±675 mJ/m2 of the bonded interface have been achieved using some of these surface treatments. This value is comparable to the values reported for significantly higher processing temperatures (less than 1000° C.). Void free bonding interfaces with excellent yield and surface energies of 2500 mJ/m2 have also be achieved herein.

Abstract: The present invention provides a method for fabricating sub-0.05 &mgr;m double-gated MOSFET devices utilizing a damascene-gate process. The damascene-gate process provides sub-0.05 &mgr;m double-gated MOSFET devices which include a frontside poly gate electrode and a backside implant region. The two gates are separated by two gate dielectrics that include a thin (on the order of about 200 Å or less) Si layer which is sandwiched between the gate dielectrics. The Si layer serves as the channel region of the device. Short-channel effects are greatly suppressed in the present double-gate MOSFET device because the two gates terminate the drain filed lines, preventing the drain potential from being felt at the source end of the channel.

Abstract: A method of fabricating a SOI wafer having a gate-quality, thin buried oxide region is provided. The wafer is fabricating by forming a substantially uniform thermal oxide on a surface of a Si-containing layer of a SOI substrate which includes a buried oxide region positioned between the Si-containing layer and a Si-containing substrate layer. Next, a cleaning process is employed to form a hydrophilic surface on the thermal oxide. A carrier wafer having a hydrophilic surface is provided and positioned near the substrate such that the hydrophilic surfaces adjoin each other. Room temperature bonding is then employed to bond the carrier wafer to the substrate. An annealing step is performed and thereafter, the Si-containing substrate of the silicon-on-insulator substrate and the buried oxide region are selectively removed to expose the Si-containing layer.

Abstract: A sub-0.05 &mgr;m channel length fully-depleted SOI MOSFET device having low source and drain resistance and minimal overlap capacitance and a method of fabricating the same are provided. In accordance with the method of the present invention, at least one dummy gate region is first formed atop an SOI layer. The dummy gate region includes at least a sacrificial polysilicon region and first nitride spacers located on sidewalls of the sacrificial polysilicon region. Next, an oxide layer that is coplanar with an upper surface of the dummy gate region is formed and then the sacrificial polysilicon region is removed to expose a portion of the SOI layer. A thinned device channel region is formed in the exposed portion of the SOI layer and thereafter inner nitride spacers are formed on exposed walls of the fist nitride spacers. Next, a gate region is formed over the thinned device channel region and then the oxide layer is removed so as to expose thicker portions of the SOI layer than de device channel region.

Abstract: A sub-0.05 &mgr;m channel length fully-depleted SOI MOSFET device having low surface and drain resistance and minimal overlap capacitance and a method of fabricating the same are provided. The sub-0.05 &mgr;m channel length fully-depleted SOI MOSFET device includes an SOI structure which contains at least an SOI layer having a channel region of a first thickness and abutting source/drain regions of a second thickness present therein, wherein the second thickness is greater than the first thickness and the source/drain regions having a salicide layer present thereon. A gate region is present also atop the SOI layer.

Abstract: A sub-0.05 &mgr;m channel length fully-depleted SOI MOSFET device having low source and drain resistance and minimal overlap capacitance and a method of fabricating the same are provided. The sub-0.05 &mgr;m channel length fully-depleted SOI MOSFET device includes an SOI structure which contains at least an SOI layer having a channel region of a first thickness and abutting source/drain regions of a second thickness present therein, wherein the second thickness is greater than the first thickness and the source/drain regions having a salicide layer present thereon. A gate region is present also atop the SOI layer.

Abstract: The present invention is directed to a structure comprising a substrate having a surface; a plurality of elongated electrical conductors extending away from the surface; each of said elongated electrical conductors having a first end affixed to the surface and a second end projecting away from the surface; there being a plurality of second ends; and a means for positioning and maintaining the plurality of the second ends in substantially fixed positions with respect to each other. The structure is useful as a probe for testing and burning in integrated circuit chips at the wafer level.

Abstract: A improved method of making of silicon on sapphire structure and/or device is disclosed. In a first preferred embodiment, a single silicon oxide layer is placed between the silicon layer and the sapphire layer. This can be done by attaching the silicon oxide layer on the silicon layer, e.g. by growing or depositing, and then attaching the sapphire layer to the oxide layer using wafer bonding. In an alternative embodiment, a first silicon oxide layer is attached to the silicon layer, e.g. by growing or depositing. A second silicon oxide layer is then attached to the sapphire layer, e.g. by depositing. Then the first and second silicon oxide layers are attached by a wafer bonding technique.

Abstract: An improved silicon on sapphire structure and/or device has one or more buffer layers. In a first preferred embodiment, the buffer layer is layer of silicon oxide material that prevents the stress induced defects in the silicon layer. In an alternative embodiment, the buffer layer comprises two layers. A first silicon oxide layer attached to the silicon to insure a perfect interface between the silicon. A second silicon oxide layer then is attached to the sapphire layer. The first and second silicon oxide layers are then attached, e.g., by a wafer bonding technique. This structure has no conductive paths beneath the oxide insulator(s) and therefore enables improved performance in radio frequency applications.

Abstract: The present invention provides a method for fabricating sub-0.05 &mgr;m double-gated MOSFET devices utilizing a damascene-gate process. The damascene-gate process provides sub-0.05 &mgr;m double-gated MOSFET devices which include a frontside poly gate electrode and a backside implant region. The two gates are separated by two gate dielectrics that include a thin (on the order of about 200 Å or less) Si layer which is sandwiched between the gate dielectrics. The Si layer serves as the channel region of the device. Short-channel effects are greatly suppressed in the present double-gate MOSFET device because the two gates terminate the drain filed lines, preventing the drain potential from being felt at the source end of the channel.

Abstract: Communication signal mixing and filtering systems and methods utilizing an encapsulated micro electro-mechanical system (MEMS) device. Furthermore, disclosed is a method of fabricating a simple, unitarily constructed micro electromechanical system (MEMS) device which combines the steps of signal mixing and filtering, and which is smaller, less expensive and more reliable in construction and operation than existing devices currently employed in the technology.

Abstract: Communication signal mixing and filtering systems and methods utilizing an encapsulated micro electromechanical system (MEMS) device. Furthermore, disclosed is a method of fabricating a simple, unitarily constructed micro electromechanical system (MEMS) device which combines the steps of signal mixing and filtering, and which is smaller, less expensive and more reliable in construction and operation than existing devices currently employed in the technology.

Abstract: Communication signal mixing and filtering systems and methods utilizing an encapsulated micro electro-mechanical system (MEMS) device. Furthermore, disclosed is a method of fabricating a simple, unitarily constructed micro electro-mechanical system (MEMS) device which combines the steps of signal mixing and filtering, and which is smaller, less expensive and more reliable in construction and operation than existing devices currently employed in the technology.

Abstract: An interconnection structure suitable for the connection of microelectronic circuit chips to packages is provided by this invention. In particular, the invention pertains to the area-array or flip-chip technology often called C4 (controlled collapse chip connection). The structure comprises an adhesion/barrier layer deposited on a passivated substrate (e.g., a silicon wafer), optionally an additional adhesion layer, a solderable layer of a metal selected from the group consisting of Ni, Co, Fe, NiFe, NiCo, CoFe and NiCoFe on the adhesion/barrier layer, and a lead-free solder ball comprising tin as the predominate component and one or more alloying elements selected from Bi, Ag, and Sb, and further optionally including one or more elements selected from the group consisting of Zn, In, Ni, Co and Cu.