Patents by Inventor Leonel R. Arana

Leonel R. Arana has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090057881
    Abstract: A microelectronic package comprises a chip stack (110) that includes a substrate (111), a first die (112) over the substrate and a second die (113) over the first die, a first underfill layer (114) between the substrate and the first die, and a second underfill layer (115) between the first die and the second die. The microelectronic package further comprises a fluidic microchannel system (120) in the chip stack, and the fluidic microchannel system comprises a fluid inlet (121) and a fluid outlet (122) connected to each other by a fluidic passage (123).
    Type: Application
    Filed: August 27, 2007
    Publication date: March 5, 2009
    Inventors: Leonel R. Arana, Michael W. Newman, Je-Young Chang
  • Publication number: 20090004317
    Abstract: A molding compound for use in an integrated circuit package comprises an epoxy and a thermally conductive filler material. The thermally conductive filler material comprises between 70% and 95% of the molding compound and has a thermal conductivity between 10 W/m-K and 3000 W/m-K.
    Type: Application
    Filed: June 30, 2007
    Publication date: January 1, 2009
    Inventors: Xuejiao Hu, Leonel R. Arana, Robert M. Nickerson, Rahul N. Manepalli, Dingying Xu
  • Patent number: 7462551
    Abstract: In some embodiments, an adhesive system for supporting thin silicon wafer is presented. In this regard, a method is introduced to bond a silicon wafer to a translucent carrier through the use of an adhesive. Other embodiments are also disclosed and claimed.
    Type: Grant
    Filed: September 30, 2005
    Date of Patent: December 9, 2008
    Assignee: Intel Corporation
    Inventors: Sudhakar N. Kulkarni, Leonel R. Arana, Edward R. Prack
  • Publication number: 20080251932
    Abstract: A method of forming a via having a stress buffer collar, wherein the stress buffer collar can absorb stress resulting from a mismatch in the coefficients of thermal expansion of the surrounding materials. Other embodiments are described and claimed.
    Type: Application
    Filed: June 12, 2008
    Publication date: October 16, 2008
    Inventors: Leonel R. Arana, Devendra Natekar, Michael Newman, Charan K. Gurumurthy
  • Publication number: 20080237841
    Abstract: A microelectronic package includes a substrate (110) having a first die (120) and a second die (130) located thereon, a first thermal interface material (121) located over the first die, and a second thermal interface material (131) located over the second die. The first thermal interface material has a first set of characteristics, the second thermal interface material has a second set of characteristics, and the first set of characteristics is not identical to the second set of characteristics.
    Type: Application
    Filed: March 27, 2007
    Publication date: October 2, 2008
    Inventors: Leonel R. Arana, Vijay S. Wakharkar, James C. Matayabas, Paul A. Koning, Cynthia K. Koning
  • Publication number: 20080237843
    Abstract: A microelectronic package. The package includes a substrate; a die mounted onto the substrate; an integrated heat spreader mounted onto the substrate, and thermally coupled to a backside of the die; and a sealant material bonding the integrated heat spreader to the substrate, the sealant material having a bulk thermal conductivity above about 1 W/m/° C. and a modulus of elasticity lower than a modulus of elasticity of solder.
    Type: Application
    Filed: March 27, 2007
    Publication date: October 2, 2008
    Inventors: Ashish Gupta, Leonel R. Arana, David Song, Chia-Pin Chiu, Ravi Prasher, Chris Matayabas, Nirupama Chakrapani
  • Patent number: 7402515
    Abstract: A method of forming a via having a stress buffer collar, wherein the stress buffer collar can absorb stress resulting from a mismatch in the coefficients of thermal expansion of the surrounding materials. Other embodiments are described and claimed.
    Type: Grant
    Filed: June 28, 2005
    Date of Patent: July 22, 2008
    Assignee: Intel Corporation
    Inventors: Leonel R. Arana, Devendra Natekar, Michael Newman, Charan K. Gurumurthy
  • Publication number: 20080171249
    Abstract: A micromachined device for efficient thermal processing at least one fluid stream includes at least one fluid conducting tube having at least a region with wall thickness of less than 50 ?m. The device optionally includes one or more thermally conductive structures in thermal communication with first and second thermally insulating portions of the fluid conducting tube. The device also may include a thermally conductive region, and at least a portion of the fluid conducting tube is disposed within the region. A plurality of structures may be provided projecting from a wall of the fluid conducting tube into an inner volume of the tube. The structures enhance thermal conduction between a fluid within the tube and a wall of the tube. A method for fabricating, from a substrate, a micromachined device for processing a fluid stream allows the selective removal of portions of the substrate to provide desired structures integrated within the device.
    Type: Application
    Filed: August 7, 2007
    Publication date: July 17, 2008
    Inventors: Leonel R. Arana, Aleksander J. Franz, Klavs F. Jensen, Samuel B. Schaevitz, Martin A. Schmidt
  • Patent number: 7267779
    Abstract: A micromachined device for efficient thermal processing at least one fluid stream includes at least one fluid conducting tube having at least a region with wall thickness of less than 50 ?m. The device optionally includes one or more thermally conductive structures in thermal communication with first and second thermally insulating portions of the fluid conducting tube. The device also may include a thermally conductive region, and at least a portion of the fluid conducting tube is disposed within the region. A plurality of structures may be provided projecting from a wall of the fluid conducting tube into an inner volume of the tube. The structures enhance thermal conduction between a fluid within the tube and a wall of the tube. A method for fabricating, from a substrate, a micromachined device for processing a fluid stream allows the selective removal of portions of the substrate to provide desired structures integrated within the device.
    Type: Grant
    Filed: July 18, 2005
    Date of Patent: September 11, 2007
    Assignee: Massachusetts Institute of Technology
    Inventors: Leonel R. Arana, Aleksander J. Franz, Klavs F. Jensen, Samuel B. Schaevitz, Martin A. Schmidt
  • Patent number: 7243833
    Abstract: Embodiments include electronic assemblies and methods for forming electronic assemblies. One embodiment includes a method of forming a MEMS device assembly, including forming an active MEMS region on a substrate. A plurality of bonding pads electrically coupled to the active MEMS region are formed. A seal ring wetting layer is also formed on the substrate, the seal ring wetting layer surrounding the active MEMS region. A single piece solder preform is positioned on the bonding pads and on the seal ring wetting layer, the single piece solder preform including a seal ring region and a bonding pad region. The seal ring region is connected to the bonding pad region by a plurality of solder bridges. The method also includes heating the single piece solder preform to a temperature above the reflow temperature, so that the bridges split and the solder from the preform accumulates on the seal ring wetting layer and the bonding pads. A lid is coupled to the solder.
    Type: Grant
    Filed: June 30, 2005
    Date of Patent: July 17, 2007
    Assignee: Intel Corporation
    Inventors: Leonel R. Arana, John Heck
  • Patent number: 7224050
    Abstract: Integrated circuit packages and their manufacture are described, wherein the packages comprise dendrimers or hyperbranched polymers. In some implementations, the dendrimers or hyperbranched polymers include repeat units having one or more ring structures and having surface groups to react with one or more components of a plastic. In some implementations, the dendrimers or hyperbranched polymers have a glass transition temperature of less than an operating temperature of the integrated circuit and form at least a partially separate phase.
    Type: Grant
    Filed: May 25, 2005
    Date of Patent: May 29, 2007
    Assignee: Intel Corporation
    Inventors: James C. Matayabas, Jr., Leonel R. Arana, Stephen E. Lehman, Jr.
  • Patent number: 7144299
    Abstract: Electronic device support and processing methods are described. One embodiment includes a method of processing an electronic device including solder bumps extending therefrom. The method includes providing at least one fluid selected from the group consisting of electrorheological fluids and magnorheological fluids on a support structure. The solder bumps extending from the electronic device are positioned in the fluid. The fluid is activated by applying a field selected from the group consisting of an electric field and a magnetic field to the fluid. The activated fluid mechanically holds the electronic device in place. A surface of the electronic device is polished while the electronic device is held in place by the activated fluid. The fluid is deactivated by removing the applied field from the fluid, and the electronic device is separated from the deactivated fluid. Other embodiments are described and claimed.
    Type: Grant
    Filed: May 9, 2005
    Date of Patent: December 5, 2006
    Assignee: Intel Corporation
    Inventors: Leonel R. Arana, Terry L. Sterrett, Devendra Natekar
  • Patent number: 7087451
    Abstract: A microfabricated vacuum sensor may be formed using semiconductor integrated circuit processes. The sensor may be formed inside an enclosure with a microfabricated component. The sensor may then be used to measure the pressure within the enclosure.
    Type: Grant
    Filed: March 24, 2004
    Date of Patent: August 8, 2006
    Assignee: Intel Corporation
    Inventors: Leonel R. Arana, Yuelin Lee Zou, John Heck
  • Patent number: 6939632
    Abstract: A micromachined device for efficient thermal processing at least one fluid stream includes at least one fluid conducting tube having at least a region with wall thickness of less than 50 ?m. The device optionally includes one or more thermally conductive structures in thermal communication with first and second thermally insulating portions of the fluid conducting tube. The device also may include a thermally conductive region, and at least a portion of the fluid conducting tube is disposed within the region. A plurality of structures may be provided projecting from a wall of the fluid conducting tube into an inner volume of the tube. The structures enhance thermal conduction between a fluid within the tube and a wall of the tube. A method for fabricating, from a substrate, a micromachined device for processing a fluid stream allows the selective removal of portions of the substrate to provide desired structures integrated within the device.
    Type: Grant
    Filed: August 6, 2001
    Date of Patent: September 6, 2005
    Assignee: Massachusetts Institute of Technology
    Inventors: Leonel R. Arana, Aleksander J. Franz, Klavs F. Jensen, Samuel B. Schaevitz, Martin A. Schmidt
  • Publication number: 20030027022
    Abstract: A micromachined device for efficient thermal processing at least one fluid stream includes at least one fluid conducting tube having at least a region with wall thickness of less than 50 &mgr;m. The device optionally includes one or more thermally conductive structures in thermal communication with first and second thermally insulating portions of the fluid conducting tube. The device also may include a thermally conductive region, and at least a portion of the fluid conducting tube is disposed within the region. A plurality of structures may be provided projecting from a wall of the fluid conducting tube into an inner volume of the tube. The structures enhance thermal conduction between a fluid within the tube and a wall of the tube. A method for fabricating, from a substrate, a micromachined device for processing a fluid stream allows the selective removal of portions of the substrate to provide desired structures integrated within the device.
    Type: Application
    Filed: August 6, 2001
    Publication date: February 6, 2003
    Inventors: Leonel R. Arana, Aleksander J. Franz, Klavs F. Jensen, Samuel B. Schaevitz, Martin A. Schmidt