Abstract: A semiconductor memory system fabricated on one substrate is presented including an SRAM device, a DRAM device and a Flash memory device. In one embodiment the SRAM device is a high-resistive load SRAM device. In another embodiment the DRAM device is a deep trench DRAM device. A method is also presented for fabricating the memory system on one substrate having the SRAM device, the DRAM device and the Flash memory device.

Abstract: An integrated redundancy eDRAM architecture system for an embedded DRAM macro system having a wide data bandwidth and wide internal bus width is disclosed which provides column and row redundancy for defective columns and rows of the eDRAM macro system. Internally generated column and row addresses of defective columns and rows of each micro-cell block are stored in a memory device, such as a fuse bank, during an eDRAM macro test mode in order for the information to be quickly retrieved during each cycle of eDRAM operation to provide an SRAM-like operation. A column steering circuit steers column redundant elements to replace defective column elements. Redundancy information is either supplied from a SRAM fuse data storage device or from a TAG memory device depending on whether a read or write operation, respectively, is being performed.

Abstract: A digitally programmable DC voltage generator system having a programming circuit for controlling a control circuit of a voltage generator system. The programming circuit receives an input control signal, processes the input control signal, and generates an output control signal to the control circuit of the voltage generator system for controlling the control circuit in accordance with the input control signal. The control circuit includes a limiter circuit and an oscillator circuit. The output control signal controls at least one of the limiter circuit for disabling the oscillator circuit upon reaching a target output voltage, and the oscillator circuit for controlling the pumping speed of the oscillator circuit.

Abstract: A method and structure for an electrode device, whereby a second electrode is deposited on a first electrode such that there is an increase in the capacitive coupling between the pair of conductive electrodes. The electrodes are self-aligning such that the patterning manufacturing process is insensitive to variations in the positional placement of the pattern on the substrate. Moreover, a single lithographic masking layer is used for forming the pair of electrodes, which are electrically isolated. Finally, the first electrode is offset from the second electrode by a chemical surface modification of the first electrode, and an anisotropic deposition of the second electrode which is shadowed by the first electrode.

Abstract: A high-resolution focused ion beam programming technique wherein fuse-like and anti-fuse-like elements are provided for on-chip tight-area circuit programming applications. The focused ion beam programming can be used in a very high density circuit area and thus increase the design flexibility. Compared to laser programming techniques, the yield of focused ion beam programming can be much higher due to its high-resolution, localized heating and non-destructive nature.

Abstract: A stacked block array architecture.for a SRAM memory for low power applications. The architecture turns on only the required data cells and sensing circuitry to access a particular set of data cells of interest. The wordline delay is reduced by using a shorter and wider wordline wire size. Although less power is consumed, the performance is improved by the reduction in loading of wordlines and bitlines.

Abstract: A method and structure for a photodiode array comprising a plurality of photodiode cores, light sensing sidewalls along an exterior of the cores, logic circuitry above the cores, trenches separating the cores, and a transparent material in the trenches is disclosed. With the invention, the sidewalls are perpendicular to the surface of the photodiode that receives incident light. The light sensing sidewalls comprise a junction region that causes electron transfer when struck with light. The sidewalls comprise four vertical sidewalls around each island core. The logic circuitry blocks light from the core so light is primarily only sensed by the sidewalls.

Abstract: The speed of memories is increased by trading memory density (or area) for speed (or cycle time). An n by n memory array is used to reduce the memory cycle time by 1/n. For example, if an existing memory cycle time is 6 ns, in order to achieve a 3ns (or n=2) cycle time, a 2 by 2 memory array is used. Or, in order to achieve a 1ns cycle time (or n=6), then a 6 by 6 memory array is used.

Abstract: A method and structure for an integrated circuit chip has a logic core which includes a plurality of insulating and conducting levels, an exterior conductor level and passive devices having a conductive polymer directly connected to the exterior conductor level. The passive devices contain RF devices which also includes resistor, capacitor, and/or inductor. The resistors can be serpentine resistors and the capacitors can be interdigitated capacitors.

Abstract: A method and system for background ECC scrubbing, i.e., checking and correcting scheme, for a memory array are provided which do not affect normal system operation of the memory array and do not add additional time delay to the data flow path, especially a data output flow path. Unlike the prior art, an ECC decoder circuit block is placed outside a critical data output path of a memory array. A data refresh path is provided to periodically pull the data out from the memory array via the ECC decoder circuit block for checking and correcting the data. The outgoing data in response to a read command does not suffer any time delay caused by the ECC checking and correcting scheme, since the data are not read out via the ECC decoder circuit block. Any hard errors are corrected by at least one redundancy circuit.

Abstract: An integrated redundancy eDRAM architecture system for an embedded DRAM macro system having a wide data bandwidth and wide internal bus width is disclosed which provides column and row redundancy for defective columns and rows of the eDRAM macro system. Internally generated column and row addresses of defective columns and rows of each micro-cell block are stored in a memory device, such as a fuse bank, during an eDRAM macro test mode in order for the information to be quickly retrieved during each cycle of eDRAM operation to provide an SRAM-like operation. A column steering circuit steers column redundant elements to replace defective column elements. Redundancy information is either supplied from a SRAM fuse data storage device or from a TAG memory device depending on whether a read or write operation, respectively, is being performed.

Abstract: The present invention is directed to a method of fabricating a dual gate structure for use in FET devices wherein the dual gate structure comprises a bottom gate that is substantially a mirror image of the top gate. The method utilizes a shallow trench isolation process for the purpose of planarization and gate alignment. Also disclosed is a dual gate structure which is fabricated utilizing the method of the present invention.

Abstract: In a high density dynamic memory circuit, the sense amplifiers are shared by several bitlines in order to maintain a high density and low power design. However, the bitline equalization level drifts after several cycles of operation, caused by an unbalanced capacitance resulting from a size difference of n-FET and p-FET latches in the sense amplifiers. An extra compensating capacitance Ce is added to the NCS node to adjust the loading capacitance to eliminate the bitline drifting.

Abstract: A decoding scheme for simultaneously executing multiple operations for a stacked-bank type semiconductor memory device is disclosed. A decoding unit is provided to a memory bank group comprising a plurality of memory banks. When read and write bank addresses match with two different memory banks within the same memory bank group, the decoding unit receives the read and write addresses and generates two different row selection signals for the read and write operations in two different banks. Based on the row selection signals, the row decoder unit in the two matching banks simultaneously activates a target row designated by the read/write addresses.

Abstract: A method for fabricating DRAM and flash memory cells on a single chip includes providing a silicon substrate, forming a trench capacitor for each of the DRAM cells in the silicon substrate, forming isolation regions in the silicon substrate which are electrically isolated from each other, forming first type wells for DRAM and flash memory cells at first predetermined regions of the silicon substrate by implanting a first type impurity in the first predetermined regions, forming second type wells for DRAM and flash memory cells at second predetermined regions in the first type wells by implanting a second type impurity in the second predetermined regions, forming oxide layers for DRAM and flash memory cells on the second type wells, forming gate electrodes for DRAM and flash memory cells on the oxide layers for DRAM and flash memory cells, and forming source and drain regions for DRAM and flash memory cells in the respective second type wells for DRAM and flash memory cells, in which the source and drain regio

Abstract: A method is provided for fabricating memory devices on a semiconductor substrate using a dual damascene process. The method includes the steps of forming at least one dummy gate structure for at least one memory device on the semiconductor substrate, depositing dielectric material on surroundings of the at least one dummy gate structure, etching the dielectric material and the at least one dummy gate structure to form at least one control gate void and at least one floating gate void, forming a gate dielectric layer on a bottom surface of the at least one floating gate void, depositing floating gate material on the gate dielectric layer in the at least one floating gate void to form a floating gate, depositing a dielectric layer on the floating gate, and depositing control gate material on the dielectric layer in the at least one control gate void to form a control gate.

Abstract: A compact SRAM cell that incorporates refractory metal-silicon-nitrogen resistive elements as its pull-up transistors is described which includes a semi-conducting substrate, a pair of NMOS transfer devices formed vertically on the sidewalls of an etched substrate by a metal conductor providing electrical communication between an n+ region in the substrate and a bitline on top, a pair of pull-down nMOS devices on the substrate connected to ground interconnects, and a pair of vertical high-resistive elements formed of a refractory metal-silicon-nitrogen and function as a load for connecting to Vdd. The invention further describes a method for fabricating such compact SRAM cell.

Abstract: Hierarchical built-in self-test methods and arrangement for verifying system functionality. As a result, an effective built-in self-test methodology is provided for conducting complete system-on-chip testing, to ensure both the circuit reliability and performance of system-on-chip design. As an added advantage, development costs are reduced for system-on-chip applications.

Abstract: An ultra high-speed DDP-SRAM (Dual Dual-Port Static Random Access Memory) cache having a cache speed in approximately the GHz range. This is accomplished by (1) a specially designed dual-port SRAM whose size is slightly larger than that of a conventional single port SRAM, and (2) the use of a dual dual-port SRAM architecture which doubles its speed by interleaved read and write operations. A first embodiment provides a 6-T (transistor) all nMOS dual-port SRAM cell. A second embodiment provides a dual port 7T-SRAM cell which has only one port for write, and both ports for read.

Abstract: A semiconductor memory system fabricated on one substrate is presented including an SRAM device, a DRAM device and a Flash memory device. In one embodiment the SRAM device is a high-resistive load SRAM device. In another embodiment the DRAM device is a deep trench DRAM device. A method is also presented for fabricating the memory system on one substrate having the SRAM device, the DRAM device and the Flash memory device.