Abstract: A gate dielectric layer including a tunneling gate dielectric layer, a charge trapping gate dielectric layer, and a cap gate dielectric layer is formed on a horizontal semiconductor channel. An alternating stack of insulating layers and spacer material layers is formed over the gate dielectric layer. The spacer material layers are formed as, or are subsequently replaced with, electrically conducive layers. Memory stack structures are formed through the alternating stack and the gate dielectric layer. Electrical charges can be injected into the charge trapping gate dielectric layer from the horizontal semiconductor channel to program the threshold voltage of a select field effect transistor employing a bottommost electrically conductive layer as a select gate electrode. The programmable threshold voltage can be advantageously employed to provide enhanced electrical isolation among word lines.

Abstract: Techniques are provided for improving the accuracy of read operations of memory cells, where the threshold voltage (Vth) of a memory cell can shift depending on when the read operation occurs. Countermeasures are provided for a first read situation in which a memory is read after a power on event or after a long delay since a last read. Read voltages of lower or higher programmed data states are set according to a positive or negative temperature coefficient (Tco), respectively. Read voltages for error recovery can be set similarly. In another aspect, a wait period between a dummy voltage and a read voltage is a function of temperature. In another aspect, word line voltages of unselected blocks are set according to a negative Tco. In another aspect, pass voltages are set based on a Tco for each programmed data state.

Abstract: Disclosed herein are methods of forming memory cell films in 3D memory. An opening having a sidewall may be formed through a stack of alternating layers of silicon oxide and silicon nitride. Bird's beaks may be formed in the silicon nitride at interfaces with the silicon oxide. In one aspect, bird's beaks are formed using a wet SiN etch. In one aspect, bird's beaks are formed by oxidizing SiN. A dilute hydrofluoric acid (DHF) clean may be performed within the opening after forming the bird's beaks in the silicon nitride. A memory cell film may be formed in the opening after performing the DHF clean. The memory cell film is straight, or nearly straight, from top to bottom in a memory hole. The memory cell film is not as susceptible to parasitic charge trapping as a memory cell film having a wavy contour. Therefore, neighbor WL interference may be reduced.

Abstract: Techniques are provided for fabricating a three-dimensional, charge-trapping memory device with improved long term data retention. A corresponding three-dimensional, charge-trapping memory device is also provided which includes a stack of alternating word line layers and dielectric layers. A charge-trapping layer is deposited in a memory hole. The refractive index of portions of the charge-trapping layer which are adjacent to the word line layers is increased relative to the refractive index of portions of the charge-trapping layer which are adjacent to the dielectric layers. This can be achieved by doping the portions of the charge-trapping layer which are adjacent to the word line layers. In one approach, the charge-trapping layer is SiON and is doped with Si or N. In another approach, the charge-trapping layer is HfO and is doped with Hf. In another approach, the charge-trapping layer is HfSiON and is doped with Hf, Si or N.

Abstract: Techniques are disclosed for accurately sensing memory cells without having to wait for a voltage that creeps up on word line after a sensing operation to die down. In one aspect, a read pass voltage is discharged in a manner that purges residual electrons from a memory string channel after a sensing operation. A control circuit may begin to discharge the read pass voltage from memory cell control gates at different strategic times in order to provide a path for residual electrons to leave the channel. Because residual electrons have been purged from the channel, no or very few electrons will be trapped in shallow interface traps of the memory cell if the word line voltage does creep up following sensing. Thus, the word line voltage may still creep up after the sensing operation without changing a threshold voltage of the memory cell.

Abstract: Techniques are disclosed for accurately sensing memory cells without having to wait for a voltage that creeps up on word line after a sensing operation to die down. The word line creep up could cause electrons to trap in shallow interface traps of a memory cell, hence impacting its threshold voltage. In one aspect, trapped electrons are removed (e.g., de-trapped) from shallow interface traps of a memory cell using a weak erase operation. Therefore, problems associated with word line voltage creep up are reduced or prevented. Thus, the memory cell can be sensed without waiting, while still providing an accurate result. The weak erase could be part of a sensing operation, but that is not required. For example, the weak erase could be incorporated into the beginning part of a read operation, which provides for a very efficient solution.

Abstract: Techniques are provided for periodically monitoring and adjusting the threshold voltage levels of memory cells in a charge-trapping memory device. When a criterion is met, such as based on the passage of a specified time period, the memory cells are read to classify them into different subsets according to an amount of downshift in threshold voltage (Vth). Two or more subsets can be used per data state. A subset can also comprise cells which are corrected using Error Correction Code (ECC) decoding. The subsets of memory cells are refresh programmed, without being erased, in which a Vth upshift is provided in proportion to the Vth downshift. The refresh programming can use a fixed or adaptive number of program pulses per subset. Some cells will have no detectable Vth downshift or a minor amount of Vth downshift which can be ignored. These cells need not be refresh programmed.

Abstract: Techniques are provided for avoiding over-programming which can occur on memory cells connected to a data word line at a source-side of a block of word lines. A gradient in the channel potential is created during a program voltage between the data word line and an adjacent dummy word line. This gradient generates electron-hole pairs which can contribute to over programming, where the over programming is worse at higher temperatures. In one aspect, pass voltages of unselected word lines are set to be relatively lower when the temperature is relatively higher, and when the selected word line is among a set of one or more source-side word lines. On the other hand, the pass voltages are set to be relatively higher when the temperature is relatively higher, and when the selected word line is not among the one or more source-side word lines.

Abstract: A memory stack structure can be formed through a stack of an alternating plurality of first material layers and second material layers and through an overlying temporary material layer having a different composition than the first and second material layers. The memory stack structure can include a memory film and a semiconductor channel layer. The overlying temporary material layer is removed selective to the stack to form a lateral recess. Portions of the memory film are removed around the lateral recess, and dopants are laterally introduced into an upper portion of the semiconductor channel to form a self-aligned drain region.

Abstract: Fabrication techniques for a three-dimensional stack memory device remove the charge-trapping material from the select gate transistors and the dummy memory cells to avoid unintentional programming which increases the threshold voltage. In one approach, a stack is formed with a sacrificial material for the a) control gate layers of the select gate transistors and the dummy memory cells and the b) control gate layers of the data memory cells. A slit is formed to allow etchants to be introduced to selectively remove the sacrificial material and then the charge-trapping material for the select gate transistors and dummy memory cells. A protective layer is provided partway in the slit, or the slit is etched in two steps.

Abstract: Fabrication techniques for a three-dimensional stack memory device remove the charge-trapping material from the select gate transistors and the dummy memory cells to avoid unintentional programming which increases the threshold voltage. In one approach, a stack is formed with a sacrificial material for the a) control gate layers of the select gate transistors and the dummy memory cells and the b) control gate layers of the data memory cells. A slit is formed to allow etchants to be introduced to selectively remove the sacrificial material and then the charge-trapping material for the select gate transistors and dummy memory cells. A protective layer is provided partway in the slit, or the slit is etched in two steps.

Abstract: Techniques are provided for programming a three-dimensional memory device while minimizing over-programming and program disturb. When a selected word line is at the source-side of a set of word lines, a channel gradient is created in the channel adjacent to the selected word line when a program voltage is applied. The gradient generates hot carriers which can cause over-programming of memory cells connected to the selected word line. To reduce the amount of hot carriers, a ramp rate and/or duration of a first step up of the program voltage is reduced. When the selected word line is not at the source-side of the set of word lines, a baseline ramp rate and/or duration can be used. A ramp rate and/or duration of the voltage applied to unselected word lines can be reduced as well but by a lesser amount.

Abstract: Techniques are provided for programming a memory device. A pre-charge phase is used to boost the channel of an unselected NAND string by allowing a bit line voltage to reach the channel. To maximize the channel pre-charge while also minimizing program disturb, a drain-side dummy word line voltage is controlled based on the position of the selected word line. The drain-side dummy word line voltage can be relatively high or low when the selected word line is relatively far from or close to the drain-side dummy word line, respectively. When the drain-side dummy word line voltage is relatively high, the bit line voltage can easily pass through and boost the channel. When the drain-side dummy word line voltage is relatively low, program disturb of drain-side data word lines is reduced due to a smaller channel gradient and a corresponding reduced amount of hot carriers.

Abstract: Techniques are provided for reducing the effects of short-term charge loss while programming charge-trapping memory cells. Short-term charge loss can result in a downshift and widening of a threshold voltage distribution. A programming operation includes a rough programming pass in which memory cells are programmed close to a final threshold voltage distribution, for each target data state. Subsequently, a negative voltage is applied to control gates of the memory cells. Subsequently, a final programming pass is performed in which the memory cells are programmed to the final threshold voltage distribution. Since the negative voltage accelerates charge loss, there is reduced charge loss after the final programming pass. The rough programming pass can use incremental step pulse programming for the lowest target data state to obtain information regarding programming speed. An initial program voltage in the final programming pass can be set based on the programming speed.

Abstract: Fabrication techniques for a three-dimensional stack memory device remove the charge-trapping material from the select gate transistors and the dummy memory cells to avoid unintentional programming which increases the threshold voltage. In one approach, a stack is formed with a different sacrificial material for the a) control gate layers of the select gate transistors and the dummy memory cells and the b) control gate layers of the data memory cells. A slit is formed to allow etchants to be introduced to selectively remove the sacrificial material and then the charge-trapping material for the select gate transistors and dummy memory cells. Subsequently, an etchant is introduced to remove the sacrificial material but not the charge-trapping material for the data memory cells. In other approaches, a protective layer is provided partway in the slit, or the slit is etched in two steps, and a common sacrificial material can be used.

Abstract: A memory device and corresponding fabrication method prevent undesired diffusion of dopants from a silicon cap of a vertical NAND string to a channel film of the NAND string. Initially, a memory hole is provided in a stack of alternating control gate layers and dielectric layers. The memory hole is filled with annular films and a dielectric core filler. The dielectric core filler is etched back from a top of the memory hole to a topmost control gate layer, forming a void. A dopant stopper liner is deposited in the void before depositing n+ doped silicon which forms the silicon cap. The dopant stopper liner can be a conductive material such as metal or polysilicon doped with carbon. A conductive via is then formed above, and aligned with, the top of the silicon cap. A bit line may be formed over the conductive via.

Abstract: Techniques are provided for periodically monitoring and adjusting the threshold voltage levels of memory cells in a charge-trapping memory device. When a criterion is met, such as based on the passage of a specified time period, the memory cells are read to classify them into different subsets according to an amount of downshift in threshold voltage (Vth). Two or more subsets can be used per data state. A subset can also comprise cells which are corrected using Error Correction Code (ECC) decoding. The subsets of memory cells are refresh programmed, without being erased, in which a Vth upshift is provided in proportion to the Vth downshift. The refresh programming can use a fixed or adaptive number of program pulses per subset. Some cells will have no detectable Vth downshift or a minor amount of Vth downshift which can be ignored. These cells need not be refresh programmed.

Abstract: A memory device and corresponding fabrication method prevent undesired diffusion of dopants from a silicon cap of a vertical NAND string to a channel film of the NAND string. Initially, a memory hole is provided in a stack of alternating control gate layers and dielectric layers. The memory hole is filled with annular films and a dielectric core filler. The dielectric core filler is etched back from a top of the memory hole to a topmost control gate layer, forming a void. A dopant stopper liner is deposited in the void before depositing n+ doped silicon which forms the silicon cap. The dopant stopper liner can be a conductive material such as metal or polysilicon doped with carbon. A conductive via is then formed above, and aligned with, the top of the silicon cap. A bit line may be formed over the conductive via.

Abstract: A memory stack structure can be formed through a stack of an alternating plurality of first material layers and second material layers and through an overlying temporary material layer having a different composition than the first and second material layers. The memory stack structure can include a memory film and a semiconductor channel layer. The overlying temporary material layer is removed selective to the stack to form a lateral recess. Portions of the memory film are removed around the lateral recess, and dopants are laterally introduced into an upper portion of the semiconductor channel to form a self-aligned drain region.

Abstract: A read operation compensates for program disturb when distinguishing between an erased-state and a lowest programmed data state, where the program disturb is a function of the data state of an adjacent, previously-programmed memory cell on a common charge-trapping layer. A programming operation avoids program disturb of the programmed data states by using asymmetric pass voltages. Before reading the memory cells on a selected word line (WLn), the memory cells on the adjacent, previously-programmed word line (WLn?1) are read. The read operation for WLn uses multiple read voltages—one for each data state on WLn?1, and one of the read results is selected based on the data state of the adjacent memory cell. Other read operations distinguish between each pair of adjacent programmed data states using a read voltage which is independent of the data state of the adjacent memory cell.