Patents by Inventor Licai Jiang

Licai Jiang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7245699
    Abstract: An x-ray optical device includes an optic and an adjustable aperture that selectively occludes a portion of an x-ray beam. The adjustable aperture may be positioned between the optic and a sample and may be integrated with the optic or located in close proximity to the optic. The adjustable aperture enables a user to easily and effectively adjust the convergence of the x-rays. In doing so, the flux and resolution of the x-ray optical device can be optimized by using an optic having the maximum convergence allowed for all potential measurements, and then selecting a convergence for a particular measurement by adjusting the aperture.
    Type: Grant
    Filed: February 26, 2004
    Date of Patent: July 17, 2007
    Assignee: Osmic, Inc.
    Inventors: Boris Verman, Licai Jiang
  • Publication number: 20060269045
    Abstract: A two-dimensional x-ray scattering camera includes a source, an optic, a detector, and a pair of collimating blocks. The source emits x-ray beams that are reflected by the optic towards a sample. The detector detects scattering from the sample, the pair of collimating blocks is positioned between the optic and the detector to collimate the beam. A bottom surface of one block is substantially parallel a top surface of the other block, and the blocks are rotatable relative to the beam about a pivot. The system forms a two-dimensional beam that is symmetric about the primary beam axis at the detector position, regardless how the beam is collimated by the collimating blocks. The system therefore eliminates smearing and can be used for anisotropic small angle scattering at high resolution and low Qmin.
    Type: Application
    Filed: May 31, 2005
    Publication date: November 30, 2006
    Inventor: Licai Jiang
  • Patent number: 7139366
    Abstract: A two-dimensional x-ray scattering camera includes a source, an optic, a detector, and a pair of collimating blocks. The source emits x-ray beams that are reflected by the optic towards a sample. The detector detects scattering from the sample, the pair of collimating blocks is positioned between the optic and the detector to collimate the beam. A bottom surface of one block is substantially parallel a top surface of the other block, and the blocks are rotatable relative to the beam about a pivot. The system forms a two-dimensional beam that is symmetric about the primary beam axis at the detector position, regardless how the beam is collimated by the collimating blocks. The system therefore eliminates smearing and can be used for anisotropic small angle scattering at high resolution and low Qmin.
    Type: Grant
    Filed: May 31, 2005
    Date of Patent: November 21, 2006
    Assignee: Osmic, Inc.
    Inventor: Licai Jiang
  • Publication number: 20040170250
    Abstract: An x-ray optical device includes an optic and an adjustable aperture that selectively occludes a portion of an x-ray beam. The adjustable aperture may be positioned between the optic and a sample and may be integrated with the optic or located in close proximity to the optic. The adjustable aperture enables a user to easily and effectively adjust the convergence of the x-rays. In doing so, the flux and resolution of the x-ray optical device can be optimized by using an optic having the maximum convergence allowed for all potential measurements, and then selecting a convergence for a particular measurement by adjusting the aperture.
    Type: Application
    Filed: February 26, 2004
    Publication date: September 2, 2004
    Applicant: Osmic, Inc.
    Inventors: Boris Verman, Licai Jiang
  • Publication number: 20030128811
    Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
    Type: Application
    Filed: May 14, 2002
    Publication date: July 10, 2003
    Applicant: Osmic, Inc.
    Inventors: Boris Verman, Licai Jiang, Bonglea Kim, Karsten Dan Joensen
  • Patent number: 6504902
    Abstract: A multilayer mirror 1 that has elliptical reflection faces and provides a divergent angle &dgr; of X-rays, is included. The elliptical reflection faces of the multilayer mirror 1 have two focal points. When an X-ray source 2 is arranged at one focal point A, and X-rays that are diverged from the X-ray source 2 are reflected at the multilayer mirror 1, the reflected X-rays converge on another focal point B. The X-ray source 2 is arranged at one focal point A of the multilayer mirror 1. Additionally, a distance L2 from the center of the reflection faces of the multilayer mirror 1 to another focal point B (in other words, convergent point of reflected X-rays) is set to make a convergent angle &thgr;c of X-rays at the focal point B nearly twice as great as the divergent angle &dgr;. With the above-noted configuration, both small angle resolution and intensity of incident X-rays to a sample may be optimized, and small angle scattering may be performed with high precision.
    Type: Grant
    Filed: April 10, 2001
    Date of Patent: January 7, 2003
    Assignee: Rigaku Corporation
    Inventors: Yoshio Iwasaki, Boris Verman, Licai Jiang
  • Patent number: 6421417
    Abstract: An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.
    Type: Grant
    Filed: August 2, 1999
    Date of Patent: July 16, 2002
    Assignee: Osmic, Inc.
    Inventors: Licai Jiang, Boris Verman
  • Publication number: 20020080916
    Abstract: An electromagnetic reflector having a multilayer structure where the electromagnetic reflector is configured to reflect multiple electromagnetic frequencies.
    Type: Application
    Filed: August 2, 1999
    Publication date: June 27, 2002
    Inventors: LICAI JIANG, BORIS VERMAN
  • Patent number: 6389100
    Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
    Type: Grant
    Filed: April 9, 1999
    Date of Patent: May 14, 2002
    Assignee: Osmic, Inc.
    Inventors: Boris Verman, Licai Jiang, Bonglea Kim, Karsten Dan Joensen
  • Publication number: 20020044626
    Abstract: A modular x-ray lens system for use in directing x-rays comprising a radiation source which generates x-rays and a lens system which directs the x-rays, wherein the x-ray lens system may be configured to focus x-rays to a focal point and vary the intensity of said focal point.
    Type: Application
    Filed: April 9, 1999
    Publication date: April 18, 2002
    Inventors: BORIS VERMAN, LICAI JIANG, BONGLEA KIM, KARSTEN DAN JOENSEN
  • Patent number: 6330301
    Abstract: An x-ray analysis system including a focusing optic for focusing an x-ray beam to a focal point, a first slit optically coupled to the focusing optic, a second slit optically coupled to the first slit, and an x-ray detector, where the focal point is located in front of the detector.
    Type: Grant
    Filed: December 17, 1999
    Date of Patent: December 11, 2001
    Assignee: Osmic, Inc.
    Inventor: Licai Jiang
  • Patent number: 6069934
    Abstract: An x-ray diffractometer system comprising an x-ray optic which directs x-rays, a sample placed into said directed x-rays, wherein said sample diffracts said directed x-rays, creating a diffraction pattern, a translation stage coupled to said sample for moving said sample within said directed x-rays, whereby the resolution, angular range, and intensity of said diffraction pattern may be adjusted, and an x-ray detector for registering said diffraction pattern.
    Type: Grant
    Filed: April 7, 1998
    Date of Patent: May 30, 2000
    Assignee: Osmic, Inc.
    Inventors: Boris Verman, Licai Jiang
  • Patent number: 6041099
    Abstract: An x-ray reflecting system comprising a Kirkpatrick-Baez side-by-side optic in a single corner configuration having multi-layer Bragg x-ray reflective surfaces.
    Type: Grant
    Filed: February 19, 1998
    Date of Patent: March 21, 2000
    Assignee: Osmic, Inc.
    Inventors: George Gutman, Licai Jiang, Boris Verman
  • Patent number: 6014423
    Abstract: An x-ray reflecting system comprising a plurality of x-ray reflectors, wherein the x-ray reflectors are coupled together to form a Kirkpatrick-Baez side-by-side system of multiple corners and may include multi-layer or graded-d multi-layer Bragg x-ray reflective surfaces.
    Type: Grant
    Filed: February 19, 1998
    Date of Patent: January 11, 2000
    Assignee: OSMIC, Inc.
    Inventors: George Gutman, Licai Jiang, Boris Verman