Abstract: A semiconductor package structure includes: a first substrate; a first semiconductor die connected to the first substrate; a second semiconductor die stack structure located on the first semiconductor die, the second semiconductor die stack structure includes a plurality of second semiconductor dies sequentially stacked onto one another in a first direction, a plurality of second conductive bumps being formed on a side of the second semiconductor die stack structure in the first direction, in which the first direction is a direction parallel to a plane where the first substrate is located; and a second substrate, a signal line in the second substrate being connected to the plurality of second conductive bumps, the second substrate being connected to the first substrate in a direction perpendicular to the plane where the first substrate is located.

Abstract: Provided are semiconductor package structure and a method for manufacturing the same. The semiconductor package structure includes: a first base; a first semiconductor chip connected to the first base; a second semiconductor chip stack structure located on the first semiconductor chip, the second semiconductor chip stack structure including a plurality of second semiconductor chips stacked in sequence in a first direction, the second semiconductor chip stack structure being provided with a plurality of first leads on an outermost side of the second semiconductor chips in the first direction, in which the first direction is a direction parallel to a plane of the first base; and at least one second base, signal lines in the at least one second base being connected to the first leads, the at least one second base being connected to the first base in a direction perpendicular to the plane of the first base.

Abstract: A head mounted display, a display device and an image display method thereof are provided. The display device includes a first display and a second display. The first display is configured to provide a first display image to a peripheral area of a target zone. The second display is configured to provide a second display image to a central area of the target zone. A resolution of the second display image is higher than a resolution of the first display image.

Abstract: A head mounted display, a display device and an image display method thereof are provided. The display device includes a first display and a second display. The first display is configured to provide a first display image to a peripheral area of a target zone. The second display is configured to provide a second display image to a central area of the target zone. A resolution of the second display image is higher than a resolution of the first display image.

Abstract: A semiconductor structure and a manufacturing method thereof are disclosed. The semiconductor structure includes a semiconductor substrate, a metal pad, a bump, a metal barrier layer, and a solder layer. The metal pad is arranged on the semiconductor substrate; the bump is arranged on the metal pad; the metal barrier layer is arranged on the side of the bump away from the metal pad; the metal barrier layer contains a storage cavity; the sidewall of the metal barrier layer is configured with an opening connecting to the storage cavity; the solder layer is arranged inside the storage cavity, and the top side of the solder layer protrudes from the upper side of storage cavity. During the flip-chip soldering process, solder is heated to overflow, the opening allows the solder flow out through the opening. The openings achieve good solder diversion in overflow, thus mitigating the problem of solder bridging between bumps.

Abstract: The disclosed semiconductor structure includes a semiconductor substrate, a metal pad, a bump, a first solder layer, a barrier layer, and a second solder layer. The metal pad is disposed on the semiconductor substrate; the bump is arranged on the metal pad; the barrier layer is configured on the side of the bump away from the metal pad. The barrier layer includes a first surface and a second surface. The first solder layer is arranged between the bump and the first surface of the barrier layer. The second solder layer is configured on the second surface of the barrier layer. Since the first solder layer and the second solder layer are formed by reflowed and melt solder at a high temperature and can be stretched, the height of the second solder can be adjusted automatically, which reduces the non-wetting problem caused by the package substrate deformation after reflow.

Abstract: Embodiments provide a semiconductor structure and a semiconductor memory, relating to the field of semiconductor technology. The semiconductor structure includes a substrate, active pillars spaced on the substrate, word lines spaced on the substrate along a second direction, and a dielectric layer covering the active pillars and the word lines. Each of the word lines extends along a first direction and is connected to the active pillars positioned in the first direction. In any adjacent two word lines, a groove is provided on a surface of at least one of the two adjacent word lines towards other one of the two adjacent word lines, and an air gap is provided in the dielectric layer positioned between adjacent word lines.

Abstract: A method for manufacturing a semiconductor device and a semiconductor device are provided. The method includes: providing a carrier; providing multiple wafers each including multiple chips; stacking the multiple wafers on the carrier sequentially in a vertical direction, and bonding the chips respectively disposed on two adjacent ones of the wafers in a one-to-one correspondence; performing a first cutting process on the multiple wafers to form multiple cutting slots located above the carrier and penetrating through the multiple wafers to divide the multiple wafers into multiple chip stacks each including multiple chips stacked in the vertical direction, and the carrier enabling the chip stacks to be in an un-separated state; forming a cladding layer covering at least one chip stack; and performing a second cutting process on the cladding layer along the cutting slots to form multiple chip stacks covered with the cladding layer.

Abstract: A wafer warpage adjustment structure is provided. The wafer warpage adjustment structure includes a wafer, a first dielectric layer, and a second dielectric layer. Each of the first and second dielectric layers includes at least a first area or a second area, and other areas other than at least the first area or the second area. The first area covers a portion of the wafer protruded in a direction perpendicular to a surface of the wafer and extending from the wafer to the dielectric layer, and the second area covers a portion of the wafer recessed in the direction. CTE of a material of the first area is greater than CTE of a material of the wafer, and CTE of a material of the second area is less than CTE of the material of the wafer. A method for manufacturing the same is also provided.

Abstract: A copper pillar bump structure on a copper pillar on a metal pad of a semiconductor device and a method of fabricating thereof are disclosed. The copper pillar bump structure includes: a metal barrier layer formed on the copper pillar. The metal barrier layer has a U-shaped cross section, a central portion of the metal barrier layer covers the top surface of the copper pillar, an opening of the U-shaped cross section faces away from the copper pillar. The copper pillar bump structure further includes a solder layer on the copper pillar and filling the U-shaped cross section. The copper pillar bump structure provides a metal barrier layer having a U-shaped cross section and fills a solder layer in the U-shaped cross section, the metal barrier layer wraps sides of the solder layer, which can improve the non-wetting problem caused by insufficient tin, or the solder bridging problem caused by excessive solder, during a flip die soldering process.

Abstract: A package structure includes the following: a logic die; and a plurality of core dies sequentially stacked on the logic die along a vertical direction, in which the plurality of core dies include a first core die and a second core die interconnected through a hybrid bonding member; the hybrid bonding member includes: a first contact pad located on a surface of the first core die; and a second contact pad located on a surface of the second core die; the first contact pad is in contact bonding with the second contact pad.

Abstract: A semiconductor package structure and a method for preparing the same are provided. The semiconductor package structure includes: a substrate; a first semiconductor chip located on the substrate, the first semiconductor chip having a first surface that is bare and the first surface having a silicon-containing surface; second semiconductor chip structures located on the first surface of the first semiconductor chip, the second semiconductor chip structures having second surfaces opposite to the first surface; a first package compound structure having a joint surface, the joint surface covering at least the first surface of the first semiconductor chip and the second surfaces of the second semiconductor chip structures. The joint surface has a silicon-containing surface.

Abstract: A method for manufacturing a semiconductor structure and the semiconductor structure are provided. In the method, a first wafer is provided, in which the first wafer has a first side and a second side opposite to each other, and a first conductive structure is provided in the first wafer, and an end of the first conductive structure is located in the first wafer. The first wafer is thinned from the second side along a direction perpendicular to the first side, until a thickness of the remaining first wafer reaches a preset thickness to expose the end of the first conductive structure. The thinning includes performing film peeling at least once. In the film peeling, hydrogen ion implantation is performed on the second side to form a hydrogen ion-containing layer in the first wafer; and the first wafer is heated to cause the hydrogen ion-containing layer to fall off.

Abstract: The present disclosure provides a chip structure and a semiconductor structure. The chip structure includes: a substrate; a functional region located on the substrate; a guard ring structure surrounding the functional region; and an auxiliary bonding region located above the guard ring structure, where there is an overlapping region between a projection of at least part of the auxiliary bonding region on the substrate and a projection of the guard ring structure on the substrate.

Abstract: Embodiments disclose a package structure and a fabricating method. The package structure includes: a semiconductor chip; a first non-conductive layer covering a front surface of the semiconductor chip and part of a side wall of the semiconductor chip; a second non-conductive layer positioned on an upper surface of the first non-conductive layer and covering at least part of a side wall of the first non-conductive layer, wherein a melt viscosity of the first non-conductive layer is greater than a melt viscosity of the second non-conductive layer; a substrate; and a solder mask layer positioned on a surface of the substrate, where a first opening is provided in the solder mask layer. The semiconductor chip is flip-chip bonded on the substrate, a surface of the second non-conductive layer away from the first non-conductive layer and a surface of the solder mask layer away from the substrate are bonding surfaces.

Abstract: A method for forming a semiconductor structure is provided. The method includes: providing a substrate; forming a groove in the substrate, in which a side wall of the groove is formed by sequential connection of a plurality of pits recessed into the substrate; forming a first material in the groove, in which the pits are completely filled with the first material; and exposing and developing the first material in the groove to obtain a through via structure.

Abstract: A method for forming a semiconductor structure includes the following operations. A substrate is provided, and the substrate includes an active surface and a back surface opposite to the active surface. An etching stop layer is formed on the back surface of the substrate. The substrate is fixed onto a first temporary carrier to make the etching stop layer be located between the substrate and the first temporary carrier. The substrate is etched until reaching the etching stop layer to form a via structure penetrating through the substrate.

Abstract: Provided is a packaging method, including: providing a base with a groove in its surface, which includes at least one pad exposed by the groove; providing a chip having a first surface and a second surface opposite to each other, at least one conductive bump being provided on the first surface of the chip; filling a first binder in the groove; applying a second binder on the first surface of the chip and the conductive bump; and installing the chip on the base, the conductive bump passing through the first binder and the second binder to connect with the pad.

Abstract: A semiconductor structure includes: a first substrate, with a first opening being provided on a surface of first substrate; and a first bonding structure positioned in the first opening. The first bonding structure includes a first metal layer and a second metal layer with a melting point lower than that of the first metal layer. The first metal layer includes a first surface in contact with a bottom surface of the first opening and a second surface opposite to the first surface, the second surface is provided with a first groove, an area, not occupied by the first metal layer and the first groove, of the first opening constitutes a second groove, the second metal layer is formed in the first groove and the second groove, and a surface, exposed from the second groove, of the second metal layer constitutes a bonding surface of the first bonding structure.

Abstract: A semiconductor structure is provided. The semiconductor structure includes a first substrate, and a first bonding structure and a first conductive via which are formed in the first substrate. The first bonding structure includes a first metal layer and a second metal layer with a melting point lower than a melting point of the first metal layer. The first metal layer includes a first surface and a second surface arranged opposite to each other. The first surface of the first metal layer is provided with a first groove, and the second metal layer is arranged in the first groove. The first conductive via is in contact with the second surface of the first metal layer. A projection of the first conductive via coincides with a projection of the first groove in a direction perpendicular to the first surface of the first metal layer.