Abstract: A plasma processing system is described. The system may include a showerhead. The system may further include a first RF generator in electrical communication with the showerhead. The first RF generator may be configured to deliver a first voltage at a first frequency to the showerhead. Additionally, the system may include a second RF generator in electrical communication with a pedestal. The second RF generator may be configured to deliver a second voltage at a second frequency to the pedestal. The second frequency may be less than the first frequency. The system may also include a terminator in electrical communication with the showerhead. The terminator may provide a path to ground for the second voltage. Methods of depositing material using the plasma processing system are described. A method of seasoning a chamber by depositing silicon oxide and silicon nitride on the wall of the chamber is also described.

Abstract: An apparatus and method for processing an image are disclosed. The method includes: segmenting both a first image and a second image and generating segmentation mask pairs, each segmentation mask pair having a segmentation mask of the first image and a segmentation mask of the second image; generating local homography matrices of the first image with respect to the second image, based on the segmentation mask pairs, the first image, and the second image; and generating a synthetic image obtained by aligning the first image with the second image, wherein the aligning is performed based on the local homography matrices, the segmentation mask pairs, the first image, and the second image.

Abstract: A tire mold cleaning device includes a protective cover, a cleaning mechanism, a loading mechanism and a limiting mechanism. The cleaning mechanism is disposed in the protective cover; the loading mechanism includes linear sliding rails and a loading platform, the linear sliding rails are mounted at a bottom end of an interior of the protective cover, and the loading platform is connected to movable ends of the linear sliding rails. The limiting mechanism includes a base plate and limiting rods, and the base plate is disposed on a bottom end of the interior of the protective cover. A tire mold is cleaned through cooperation of the linear sliding rails and the loading platform, the limiting rods can limit a moving range of the tire mold, thereby preventing the tire mold from sliding under the action of inertia.

Abstract: A method for clinical target contouring in radiotherapy may include obtaining one or more target images of a subject. The subject may include a target region to which a radiation treatment is directed. The method may also include obtaining a target volume segmentation model having been trained according to a machine learning technique. The method may further include determining boundary information relating to a target volume, the target volume including at least part of the target region based on the one or more target images and the target volume segmentation model.

Abstract: The present disclosure provides a system and method for X-ray imaging. The method of calculating scatter in an X-ray image may include forming a modulated X-ray image. The method of forming the modulated X-ray image may include acquiring X-rays through a collimator module and an imaged object in sequence to generate an X-ray image group; the acquisition may be performed during a movement of the collimator module in a first direction and the X-ray image group may include a plurality of X-ray images acquired at different times during the movement of the collimator; extracting sub-zones from the plurality of X-ray images in the X-ray image group; combining the sub-zones in the first direction to form the modulated X-ray image. In the present disclosure, an intensity distribution of the X-rays may be adjusted flexibly using a collimator without adding any extra hardware. In addition, scatter components in the X-ray images may be calculated to eliminate the scatter in the X-ray images finally.

Abstract: A system is described. The system includes: a support; a first emitter coupled to the support, facing radially outwardly, and configured to emit a continuous-wave (CW) beam; and a second emitter coupled to the support, facing radially outwardly, and configured to emit a pulsed beam. The system may determine reflectivity using the first emitter and may determine a range using the second emitter.

Abstract: Embodiments of the present disclosure provide a chuck structure of a semiconductor cleaning apparatus and a semiconductor cleaning apparatus. The chuck structure includes a chuck base, a gas inlet control device, and a first gas channel and a second gas channel arranged in the chuck base and both configured to spray a gas toward the to-be-processed workpiece. A gas spray direction of the first gas channel is inclined toward the outside of the surface of the to-be-processed workpiece that is opposite to the chuck base. A gas spray direction of the second gas channel is perpendicular to the surface of the to-be-processed workpiece that is opposite to the chuck base. The gas inlet control device is configured to selectively supply the gas to at least one of the first gas channel and the second gas channel to cause the to-be-processed workpiece to be able to float at different height positions over the chuck base.

Abstract: A computer is programmed to determine a localization of a first vehicle, including location coordinates and an orientation of the first vehicle, based on first vehicle sensor data, and to wirelessly receive localizations of respective second vehicles, wherein a first vehicle field of view at least partially overlaps respective fields of view of each of the second vehicles. The computer is programmed to determine pair-wise localizations for respective pairs of the first vehicle and one of the second vehicles, wherein each of the pair-wise localizations defines a localization of the first vehicle relative to a global coordinate system based on a (a) relative localization of the first vehicle with reference to the respective second vehicle and (b) a second vehicle localization relative to the global coordinate system, and to determine an adjusted localization for the first vehicle that has a minimized sum of distances to the pair-wise localizations.

Abstract: A method for adjusting a medical device is provided. The method includes obtaining an initial trajectory of a component of the medical device. The initial trajectory of the component includes a plurality of initial positions. For each of the plurality of initial positions, the method further includes determining whether a collision is likely to occur between a subject and the component according to the initial trajectory of the component. In response to the determination that the collision is likely to occur, the method further includes updating the initial trajectory of the component to determine an updated trajectory of the component.

Abstract: Disclosed is an application of Stachyose in preparation of a drug for treating castration-resistant prostate cancer, belonging to the technical field of biological medicine. The disclosure proposes a new strategy of using Stachyose in combination with an androgen receptor antagonist to prepare a drug for treating CRPC for the first time, and conducts multi-angle and multi-level verification research. The drug composition of the Stachyose in combination with the androgen receptor in the disclosure can be used for treating castration-resistant prostate cancer, and significantly improves the effect of Enzalutamide on inhibiting castration-resistant prostate cancer. The natural compound is applied to the advanced stage of cancer, and has important clinical therapeutic significance.

Abstract: The present disclosure provides a coating device including a first storage tank for storing a material to be coated, a needle cannula to which the first storage tank is connected by means of a corresponding first line, a gas output device for outputting a first pressurized gas from a gas source, including a first gas output line extending into the first storage tank, wherein the gas output device is capable of outputting the first pressurized gas to the first storage tank through the first gas output line such that the material to be coated stored in the first storage tank is discharged under a gas pressure and enters the needle cannula through the first line.

Abstract: Embodiments of this application disclose example methods for processing data blocks and controllers. One example method includes configuring, by a controller, a counter of a global write stamp where the global write stamp is used to represent a total quantity of times that the controller performs writing on a storage medium. When a write operation is performed on a physical data block in the storage medium, a global write stamp can be used at a current moment as an instant write stamp of the physical data block, and the instant write stamp can be stored. Physical data blocks can be inspected periodically. When the physical data block is inspected, a determination as to whether the physical data block is a to-be-moved data block can be made based on the stored instant write stamp.

Abstract: A method may include obtaining a first image associated with an image to be segmented, and performing an iteration process for obtaining a target image. The iteration process may include one or more iterations each of which includes: obtaining an image to be modified; obtaining one or more modifications performed on the image to be modified; generating a second image by inputting the image to be segmented, the image to be modified, and the one or more modifications into the image segmentation model; in response to determining that the second image satisfies the first condition, terminating the iteration process by determining the second image as the target image; or in response to determining that the second image does not satisfy the first condition, initiating a new iteration of the iteration process by determining the second image as the image to be modified.

Abstract: Disclosed herein is a method and apparatus for forming carbon hard masks to improve deposition uniformity and etch selectivity. The carbon hard mask may be formed in a PECVD process chamber and is a nitrogen-doped carbon hardmask. The nitrogen-doped carbon hardmask is formed using a nitrogen containing gas, an argon containing gas, and a hydrocarbon gas.

Abstract: A computer, including a processor and a memory, the memory including instructions to be executed by the processor to receive a vehicle path from a server computer and verify the vehicle path based on vehicle dynamics and vehicle constraints. The instruction can include further instructions to, when the vehicle path is verified as correct, operating the vehicle on the vehicle path and, when the vehicle path is verified as incorrect, stopping the vehicle.

Abstract: Exemplary methods of semiconductor processing may include forming a first plasma of a silicon-containing precursor and an oxygen-containing precursor within a processing region of a semiconductor processing chamber. The methods may also include depositing a coating from first effluents of the first plasma on surfaces defining the processing region to a target thickness greater than or about 0.5 ?m. Forming the first plasma may occur at a first power greater than or about 300 W. The surfaces defining the processing region may include a surface of a faceplate that faces the processing region.

Abstract: Luminescent solar concentrators in accordance with various embodiments of the invention can be designed to minimize photon thermalization losses and incomplete light trapping using various components and techniques. Cadmium selenide core, cadmium sulfide shell (CdSe/CdS) quantum dot (“QD”) technology can be implemented in such devices to allow for near-unity QDs and sufficiently large Stokes shifts. Many embodiments of the invention include a luminescent solar concentrator that incorporates CdSe/CdS quantum dot luminophores. In further embodiments, anisotropic luminophore emission can be implemented through metasurface/plasmonic antenna coupling. In several embodiments, red-shifted luminophores are implemented. Additionally, top and bottom spectrally-selective filters, such as but not limited to selectively-reflective metasurface mirrors and polymeric stack filters, can be implemented to enhance the photon collection efficiency.

Abstract: The present disclosure provides a coating device including a first storage tank for storing a material to be coated, a needle cannula to which the first storage tank is connected by means of a corresponding first line, a gas output device for outputting a first pressurized gas from a gas source, including a first gas output line extending into the first storage tank, wherein the gas output device is capable of outputting the first pressurized gas to the first storage tank through the first gas output line such that the material to be coated stored in the first storage tank is discharged under a gas pressure and enters the needle cannula through the first line.

Abstract: Disclosed herein is a method and apparatus for forming carbon hard masks to improve deposition uniformity and etch selectivity. The carbon hard mask may be formed in a PECVD process chamber and is a nitrogen-doped carbon hardmask. The nitrogen-doped carbon hardmask is formed using a nitrogen containing gas, an argon containing gas, and a hydrocarbon gas.