Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a cross couple design for high density standard cells and methods of manufacture. The structure includes a first contact connected in a cross couple circuit to at least two gate structures, and a second contact connected to the first contact at a location which is devoid of any via connection.

Abstract: An apparatus includes a series of pipeline stages that have logic components connected to supply output data to latch components, timing correction blocks connected to the latch components, and a memory component connected to supply a correction pattern to the timing correction blocks. The timing correction blocks have a buffer connected to a multiplexor. The correction pattern controls whether the multiplexor receives an adjusted clock signal through the buffer to control whether the timing correction blocks supply an unadjusted clock signal or the adjusted clock signal to the latch components.

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to local interconnect power rails merged with upper power rails and methods of manufacture. The structure includes: an active cell including contacts enclosed in active regions; at least one local interconnect power rail connecting to the contacts of the active regions; and at least one power rail above and connected to the at least one local interconnect power rail.

Abstract: Embodiments of the disclosure provide a circuit structure and related method to provide a radiation resistant memory cell. A circuit structure may include a first latch having an input node and an output node. A second latch has an input node and an output node, in which the output node of the second latch is coupled to the input node of the first latch, and the input node of the second latch is coupled to the output node of the first latch. A read/write (R/W) circuit includes a plurality of transistors coupling a word line, a bit line, and an inverted bit line to at least two outputs. One of the at least two outputs is coupled to the input node of the first latch and another of the outputs is coupled to the input node of the second latch.

Abstract: Integrated structures include (among other components) a deep well structure having a first impurity, well rows contacting the deep well structure and having a second impurity, a well contact ring enclosing the well rows within an enclosed area, a transistor layer on the well rows, transistors within the transistor layer, and at least one ring-enclosed contact contacting the deep well structure. The ring-enclosed contact is positioned within the enclosed area. Such structures further include a well contact connection contacting the well contact ring and the ring-enclosed contact.

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to cell layouts in semiconductor structures and methods of manufacture. A structure includes: a plurality of abutting cells each of which include transistors with gate structures having diffusion regions; a contact spanning across abutting cells of the plurality of abutting cells and contacting to the diffusion regions of separate cells of the abutting cells; and a continuous active region spanning across the plurality of abutting cells, wherein the continuous active region includes a drain-source abutment with L-shape construct, a source-source abutment with U-shape construct, and a drain-drain abutment with a filler cell located between a drain-drain abutment.

Abstract: Disclosed are embodiments of a computer-aided design system and corresponding method for power-optimized timing closure of an integrated circuit (IC) design. In the embodiments, a cell library includes sets of cells, where each cell in the same set has the same internal structure but different combinations of cell boundary isolation structures associated with different passive delay values. Timing closure includes replacement of a cell in a previously generated layout with another cell from the same set in order to adjust delay (e.g., increase delay) of a data signal or clock signal and, thereby facilitate fixing of a previously identified violation of a timing constraint. By eliminating or at least minimizing the need to insert buffer and/or inverter cells into a layout to add delay to a data signal and/or a clock signal during timing closure, the embodiments avoid or at least limit concurrent increases in power consumption and area consumption.

Abstract: A semiconductor device including four transistors. Gates of first and third transistors extend longitudinally as part of a first linear strip. Gates of second and fourth transistors extend longitudinally as part of a second linear strip parallel to and spaced apart from first linear strip. Aligned first and second gate cut isolations separate gates of first and second transistor from gates of third transistor and fourth transistor respectively. First and second CB layers connect to the gate of first transistor and second transistor respectively. CA layer extends longitudinally between first end and second end of CA layer connects to CB layers. CB layers are electrically connected to gates of first transistor adjacent first end of CA layer and second transistor adjacent second end of CA layer respectively. CA layer extends substantially parallel to first and second linear strips and is substantially perpendicular to first and second CB layers.

Abstract: A disclosed sense circuit for a memory circuit includes sense amplifiers that detect differences in voltage levels on complementary bitlines during read operations. Instead of the sense amplifiers having built-in footer devices that lead to significant leakage, the sense circuit incorporates a common footer device for all sense amplifiers. To ensure that this footer device has sufficient drive strength to enable voltage differential detection by each sense amplifier, the sense circuit also includes a sense signal generation and boost circuit (SSG&B circuit) that generates a sense mode control signal (SEN) to control the on/off states of the footer device and that further boosts SEN, at the appropriate time, to increase the drive current. By using the common footer device and the SSG&B circuit, leakage from the sense circuit is reduced during a pre-charge operation mode without sacrificing performance during a read operation mode. Also disclosed are associated method embodiments.

Abstract: A semiconductor device is provided for implementing at least one logic element. The semiconductor device includes a semiconductor substrate. The first transistor and a second transistor are formed on the semiconductor substrate. Each transistor comprises a source, a drain, and a gate. The gate of the first transistor extends longitudinally as part of a first linear strip and the gate of the second transistor extends longitudinally as part of the second linear strip parallel to and spaced apart from the first linear strip. A first CB layer forms a local interconnect layer electrically connected to the gate of the first transistor. A second CB layer forms a local interconnect layer electrically connected to the gate of the second transistor. A CA layer forms a local interconnect layer extending longitudinally between a first end and a second end of the CA layer. The CA layer is electrically connected to the first and second CB layers.

Abstract: A disclosed sense circuit for a memory circuit includes sense amplifiers that detect differences in voltage levels on complementary bitlines during read operations. Instead of the sense amplifiers having built-in footer devices that lead to significant leakage, the sense circuit incorporates a common footer device for all sense amplifiers. To ensure that this footer device has sufficient drive strength to enable voltage differential detection by each sense amplifier, the sense circuit also includes a sense signal generation and boost circuit (SSG&B circuit) that generates a sense mode control signal (SEN) to control the on/off states of the footer device and that further boosts SEN, at the appropriate time, to increase the drive current. By using the common footer device and the SSG&B circuit, leakage from the sense circuit is reduced during a pre-charge operation mode without sacrificing performance during a read operation mode. Also disclosed are associated method embodiments.

Abstract: A single-rail memory circuit includes an array of memory cells arranged in rows and columns and peripheral circuitry connected to the array for facilitating read and write operations with respect to selected memory cells. The peripheral circuitry includes, but is not limited to, boost circuits for the rows. Each boost circuit is connected to a wordline for a row and to a discrete voltage supply line for the same row. Each boost circuit for a row is configured to increase the voltage levels on the wordline and the voltage supply line for the row during a read of any selected memory cell within the row. Increasing the voltage levels on the wordline and on the voltage supply line during the read operation effectively boosts the read current. A method of operating the memory circuit reduces the probability of a read fail.

Abstract: The present disclosure relates to integrated circuits, and more particularly, to a low clock load dynamic dual output latch circuit and methods of operation. The structure includes: a plurality of dynamic clocked stacks which are configured to receive input data and provide a true logical value and a complement logical value; and a plurality of holding stacks which are configured to provide a hold signal to the dynamic clocked stacks and output the true logical value and the complement logical value in response to the hold signal being activated.

Abstract: The present disclosure relates to integrated circuits, and more particularly, to a low clock load dynamic dual output latch circuit and methods of operation. The structure includes: a plurality of dynamic clocked stacks which are configured to receive input data and provide a true logical value and a complement logical value; and a plurality of holding stacks which are configured to provide a hold signal to the dynamic clocked stacks and output the true logical value and the complement logical value in response to the hold signal being activated.

Abstract: A dynamic single input-dual output latch includes input, feedback, and output stages. In the input stage, operations are dependent on a clock signal (CLK) and a feedback signal (FB) from the feedback stage. For example, when FB is at a low voltage level and CLK switches to a high voltage level, the input stage enters a data capture mode. Once data has been captured, FB switches back to the high voltage level, placing the input stage in a data hold mode. In the output stage, operations are dependent on CLK but independent of FB. For example, instead of initiating output signal stabilization only after both CLK and FB are at high voltage levels, weak pull-down transistors (including at least one CLK-controlled pull-down transistor) are employed in the output stage to ensure output signal stabilization is initiated after data capture has begun but before FB switches to the high voltage level.

Abstract: A semiconductor device is provided for implementing at least one logic element. The semiconductor device includes a semiconductor substrate. The first transistor and a second transistor are formed on the semiconductor substrate. Each transistor comprises a source, a drain, and a gate. The gate of the first transistor extends longitudinally as part of a first linear strip and the gate of the second transistor extends longitudinally as part of the second linear strip parallel to and spaced apart from the first linear strip. A first CB layer forms a local interconnect layer electrically connected to the gate of the first transistor. A second CB layer forms a local interconnect layer electrically connected to the gate of the second transistor. A CA layer forms a local interconnect layer extending longitudinally between a first end and a second end of the CA layer. The CA layer is electrically connected to the first and second CB layers.

Abstract: A semiconductor device includes a substrate with first and second transistors disposed thereon and including sources, drains, and gates, wherein the first and second gates extend longitudinally as part of linear strips that are parallel to and spaced apart. The device further includes a first CB layer forming a local interconnect electrically connected to the first gate, a second CB layer forming a local interconnect electrically connected to the second gate, and a CA layer forming a local interconnect extending longitudinally between first and second ends of the CA layer. The first and second CB layers and the CA layer are disposed between a first metal layer and the substrate. The first metal layer is disposed above each source, drain, and gate of the transistors, The CA layer extends parallel to the first and second linear strips and is substantially perpendicular to the first and second CB layers.

Abstract: The present disclosure relates to semiconductor structures and, more particularly, to electrostatic discharge (ESD) protection circuits and methods of use and manufacture. The structure includes: an electrostatic discharge (ESD) clamp which receives an input signal from a trigger circuit; and a voltage node connecting to a back gate of the ESD clamp, the voltage node providing a voltage to the ESD clamp during an electrostatic discharge (ESD) event.

Abstract: Embodiments of the disclosure provide a circuit structure for producing a full range biasing voltage including: a logic control node; first and second voltage generators, coupled to the logic control node, the first and second voltage generators configured to generate a positive voltage output at a positive voltage node and a negative voltage output at a negative voltage node; first and second multiplexer cells, coupled to the logic control node, configured to multiplex the positive voltage level received from the first or the second positive voltage node and the negative voltage level received from the first or the second negative voltage node to provide a multiplexed output; and an output node coupled to each of the first multiplexer cell and the second multiplexer cell configured to receive the multiplexed output to provide a biasing voltage range to at least one transistor having a back-gate terminal.

Abstract: In an exemplary structure, a first conductor connects a power source to integrated circuit devices. The first conductor includes a first axis defining a first side and a second side. A second conductor, perpendicular to the first conductor, is connected to the first conductor by first vias. A third conductor, parallel to the first conductor, is connected to the second conductor by second vias. The third conductor includes a second axis defining a third side and a fourth side. The first side and the third side are aligned in a first plane perpendicular to the conductors and the second side and the fourth side are aligned in a second plane perpendicular to the conductors. The first vias contact the first conductor in only the first side. The second vias contact the third conductor in only the third side. And the second conductor is outside the second plane.