Patents by Inventor Maik Stegemann

Maik Stegemann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10386255
    Abstract: A manufacturing method includes providing a semiconductor substrate having a pressure sensor structure; and forming, during a BEOL process (BEOL=back-end-of-line), a metal-insulator-stack arrangement on the semiconductor substrate, wherein the metal-insulator-stack arrangement is formed to comprise (1) a cavity adjacent to the pressure sensor structure and extending over the pressure sensor structure, and (2) a pressure port through the metal-insulator-stack arrangement for providing a fluidic connection between the cavity and an environmental atmosphere, wherein the pressure port has a cross-sectional area, which is smaller than 10% of a footprint area of the pressure sensor structure within the cavity.
    Type: Grant
    Filed: July 12, 2017
    Date of Patent: August 20, 2019
    Assignee: Infineon Technologies Dresden GmbH
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Marco Haubold, Andre Roeth, Maik Stegemann, Mirko Vogt
  • Patent number: 10347778
    Abstract: An optical system and photo sensor pixel are provided. The photo sensor pixel includes a substrate including an active region and a peripheral region that is peripheral to the active region, an optical sensor disposed at the active region of the substrate and configured to receive light and output a measurement signal based on the received light, and an encapsulation layer disposed over the active region and the first peripheral region of the substrate. The encapsulation layer includes at least one subwavelength-based graded index structure provided over the peripheral region of the substrate, and the subwavelength-based graded index structure is configured to redirect the light from a region over the peripheral region onto the optical sensor.
    Type: Grant
    Filed: August 20, 2018
    Date of Patent: July 9, 2019
    Assignee: Infineon Technologies AG
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Maik Stegemann, Mirko Vogt
  • Publication number: 20190189509
    Abstract: A power semiconductor component includes a power semiconductor partial structure having an insulating layer arranged on an upper side of a semiconductor body. A contact hole arranged on an upper side of the insulating layer proceeds from that side, extending at least partly within the insulating layer. An adhesion promoter layer arranged on an upper side of the power semiconductor partial structure at least partly covers the insulating layer upper side and a surface of the contact hole. A tungsten-comprising layer arranged on the adhesion promoter layer at least partly covers the adhesion promoter layer and has a first thickness in a region of the contact hole and dimensioned such that the tungsten-comprising layer fills the contact hole. The tungsten-comprising layer has a second thickness in the region of the insulating layer upper side which is less than the first thickness. A connection layer is arranged on the tungsten-comprising layer.
    Type: Application
    Filed: December 19, 2018
    Publication date: June 20, 2019
    Inventors: Thomas Bertrams, Maik Stegemann, Armin Tilke, Sascha Weber
  • Patent number: 10290805
    Abstract: A method for manufacturing an emitter comprises providing a semiconductor substrate having a main surface, the semiconductor substrate comprising a cavity adjacent to the main surface. A portion of the semiconductor substrate arranged between the cavity and the main surface of the semiconductor substrate forms a support structure. The method comprises arranging an emitting element at the support structure, the emitting element being configured to emit a thermal radiation of the emitter, wherein the cavity provides a reduction of a thermal coupling between the emitting element and the semiconductor substrate.
    Type: Grant
    Filed: February 5, 2018
    Date of Patent: May 14, 2019
    Assignee: Infineon Technologies Dresden GmbH
    Inventors: Steffen Bieselt, Heiko Froehlich, Thoralf Kautzsch, Maik Stegemann, Mirko Vogt
  • Publication number: 20190081158
    Abstract: A method for manufacturing a MOSFET semiconductor device includes providing a wafer including a semiconductor body having a first side, a first semiconductor region adjacent to the first side, a second semiconductor region adjacent to the first side and forming a first pn-junction with the first semiconductor region, and a third semiconductor region adjacent to the first side and forming a second pn-junction with the second semiconductor region, a first dielectric layer arranged on the first side, a gate electrode embedded in the first dielectric layer, and a second dielectric layer arranged on the first dielectric layer. Next to the gate electrode, a trench is formed through the first dielectric layer and the second dielectric layer. At a side wall of the trench, a dielectric spacer is formed. The trench is extended into the semiconductor body to form a contact trench.
    Type: Application
    Filed: September 10, 2018
    Publication date: March 14, 2019
    Inventors: Andreas Riegler, Wolfgang Jantscher, Manfred Pippan, Maik Stegemann
  • Publication number: 20180358483
    Abstract: An optical system and photo sensor pixel are provided. The photo sensor pixel includes a substrate including an active region and a peripheral region that is peripheral to the active region, an optical sensor disposed at the active region of the substrate and configured to receive light and output a measurement signal based on the received light, and an encapsulation layer disposed over the active region and the first peripheral region of the substrate. The encapsulation layer includes at least one subwavelength-based graded index structure provided over the peripheral region of the substrate, and the subwavelength-based graded index structure is configured to redirect the light from a region over the peripheral region onto the optical sensor.
    Type: Application
    Filed: August 20, 2018
    Publication date: December 13, 2018
    Applicant: Infineon Technologies AG
    Inventors: Thoralf KAUTZSCH, Heiko FROEHLICH, Maik STEGEMANN, Mirko VOGT
  • Publication number: 20180297838
    Abstract: A microelectromechanical systems (MEMS) device is provided and includes a bulk semiconductor substrate, a cavity formed in the bulk semiconductor substrate, a movably suspended mass, a cap structure and a capacitive structure is shown. The movably suspended mass is defined in the bulk semiconductor substrate by one or more trenches extending from a main surface area of the bulk semiconductor substrate to the cavity. The cap is structure arranged on the main surface area of the bulk semiconductor substrate. The capacitive structure comprises a first electrode structure arranged on the movably suspended mass and a second electrode structure arranged at the cap structure such that the first electrode structure and the second electrode structure are spaced apart in a direction perpendicular to the main surface area of the bulk semiconductor substrate.
    Type: Application
    Filed: April 12, 2018
    Publication date: October 18, 2018
    Applicant: Infineon Technologies Dresden GmbH
    Inventors: Thoralf KAUTZSCH, Steffen BIESELT, Heiko FROEHLICH, Andre ROETH, Maik STEGEMANN, Mirko VOGT
  • Patent number: 10084101
    Abstract: An optical system and photo sensor pixel are provided. The photo sensor pixel includes a substrate including an active region and a peripheral region that is peripheral to the active region, an optical sensor disposed at the active region of the substrate and configured to receive light and output a measurement signal based on the received light, and an encapsulation layer disposed over the active region and the first peripheral region of the substrate. The encapsulation layer includes at least one subwavelength-based graded index structure provided over the peripheral region of the substrate, and the subwavelength-based graded index structure is configured to redirect the light from a region over the peripheral region onto the optical sensor.
    Type: Grant
    Filed: November 7, 2016
    Date of Patent: September 25, 2018
    Assignee: Infineon Technologies AG
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Maik Stegemann, Mirko Vogt
  • Patent number: 10060816
    Abstract: Embodiments relate to sensors and more particularly to structures for and methods of forming sensors that are easier to manufacture as integrated components and provide improved deflection of a sensor membrane, lamella or other movable element. In embodiments, a sensor comprises a support structure for a lamella, membrane or other movable element. The support structure comprises a plurality of support elements that hold or carry the movable element. The support elements can comprise individual points or feet-like elements, rather than a conventional interconnected frame, that enable improved motion of the movable element, easier removal of a sacrificial layer between the movable element and substrate during manufacture and a more favorable deflection ratio, among other benefits.
    Type: Grant
    Filed: December 8, 2016
    Date of Patent: August 28, 2018
    Assignee: Infineon Technologies AG
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Mirko Vogt, Maik Stegemann, Andre Roeth, Bernhard Winkler, Boris Binder
  • Publication number: 20180159034
    Abstract: A method for manufacturing an emitter comprises providing a semiconductor substrate having a main surface, the semiconductor substrate comprising a cavity adjacent to the main surface. A portion of the semiconductor substrate arranged between the cavity and the main surface of the semiconductor substrate forms a support structure. The method comprises arranging an emitting element at the support structure, the emitting element being configured to emit a thermal radiation of the emitter, wherein the cavity provides a reduction of a thermal coupling between the emitting element and the semiconductor substrate.
    Type: Application
    Filed: February 5, 2018
    Publication date: June 7, 2018
    Inventors: Steffen BIESELT, Heiko Froehlich, Thoralf Kautzsch, Maik Stegemann, Mirko Vogt
  • Publication number: 20180155188
    Abstract: The present disclosure relates to an integrated semiconductor device, comprising a semiconductor substrate; a cavity formed into the semiconductor substrate; a sensor portion of the semiconductor substrate deflectably suspended in the cavity at one side of the cavity via a suspension portion of the semiconductor substrate interconnecting the semiconductor substrate and the sensor portion thereof, wherein an extension of the suspension portion along the side of the cavity is smaller than an extension of said side of the cavity.
    Type: Application
    Filed: January 19, 2018
    Publication date: June 7, 2018
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Alessia Scire, Maik Stegemann, Bernhard Winkler, Andre Roeth, Steffen Bieselt, Mirko Vogt
  • Publication number: 20180130914
    Abstract: An optical system and photo sensor pixel are provided. The photo sensor pixel includes a substrate including an active region and a peripheral region that is peripheral to the active region, an optical sensor disposed at the active region of the substrate and configured to receive light and output a measurement signal based on the received light, and an encapsulation layer disposed over the active region and the first peripheral region of the substrate. The encapsulation layer includes at least one subwavelength-based graded index structure provided over the peripheral region of the substrate, and the subwavelength-based graded index structure is configured to redirect the light from a region over the peripheral region onto the optical sensor.
    Type: Application
    Filed: November 7, 2016
    Publication date: May 10, 2018
    Applicant: Infineon Technologies AG
    Inventors: Thoralf KAUTZSCH, Heiko FROEHLICH, Maik STEGEMANN, Mirko VOGT
  • Patent number: 9896329
    Abstract: The present disclosure relates to an integrated semiconductor device, comprising a semiconductor substrate; a cavity formed into the semiconductor substrate; a sensor portion of the semiconductor substrate deflectably suspended in the cavity at one side of the cavity via a suspension portion of the semiconductor substrate interconnecting the semiconductor substrate and the sensor portion thereof, wherein an extension of the suspension portion along the side of the cavity is smaller than an extension of said side of the cavity.
    Type: Grant
    Filed: July 13, 2016
    Date of Patent: February 20, 2018
    Assignee: Infineon Technologies Dresden GmbH
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Alessia Scire, Maik Stegemann, Bernhard Winkler, Andre Roeth, Steffen Bieselt, Mirko Vogt
  • Patent number: 9887355
    Abstract: A method for manufacturing an emitter comprises providing a semiconductor substrate having a main surface, the semiconductor substrate comprising a cavity adjacent to the main surface. A portion of the semiconductor substrate arranged between the cavity and the main surface of the semiconductor substrate forms a support structure. The method comprises arranging an emitting element at the support structure, the emitting element being configured to emit a thermal radiation of the emitter, wherein the cavity provides a reduction of a thermal coupling between the emitting element and the semiconductor substrate.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: February 6, 2018
    Assignee: Infineon Technologies Desden GmbH
    Inventors: Steffen Bieselt, Heiko Froehlich, Thoralf Kautzsch, Maik Stegemann, Mirko Vogt
  • Publication number: 20180017456
    Abstract: A manufacturing method includes providing a semiconductor substrate having a pressure sensor structure; and forming, during a BEOL process (BEOL=back-end-of-line), a metal-insulator-stack arrangement on the semiconductor substrate, wherein the metal-insulator-stack arrangement is formed to comprise (1) a cavity adjacent to the pressure sensor structure and extending over the pressure sensor structure, and (2) a pressure port through the metal-insulator-stack arrangement for providing a fluidic connection between the cavity and an environmental atmosphere, wherein the pressure port has a cross-sectional area, which is smaller than 10% of a footprint area of the pressure sensor structure within the cavity.
    Type: Application
    Filed: July 12, 2017
    Publication date: January 18, 2018
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Marco Haubold, Andre Roeth, Maik Stegemann, Mirko Vogt
  • Publication number: 20170290098
    Abstract: A light emitter device contains a heater structure configured to emit light if a predefined current flows through the heater structure. The heater structure is arranged at a heater carrier structure. The light emitter device contains an upper portion of a cavity located vertically between the heater carrier structure and a cover structure. The light emitter device contains a lower portion of the cavity located vertically between the heater carrier structure and at least a portion of a carrier substrate. The heater carrier structure contains a plurality of holes connecting the upper portion of the cavity and the lower portion of the cavity. A pressure within the cavity is less than 100 mbar.
    Type: Application
    Filed: March 17, 2017
    Publication date: October 5, 2017
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Uwe Rudolph, Alessia Scire, Maik Stegemann, Mirko Vogt
  • Patent number: 9752943
    Abstract: Embodiments relate to sensors and more particularly to structures for and methods of forming sensors that are easier to manufacture as integrated components and provide improved deflection of a sensor membrane, lamella or other movable element. In embodiments, a sensor comprises a support structure for a lamella, membrane or other movable element. The support structure comprises a plurality of support elements that hold or carry the movable element. The support elements can comprise individual cylindrical points or feet-like elements with straight or concave sidewalls, rather than a conventional interconnected frame, that enable improved motion of the movable element, easier removal of a sacrificial layer between the movable element and substrate during manufacture and a more favorable deflection ratio, among other benefits.
    Type: Grant
    Filed: September 26, 2014
    Date of Patent: September 5, 2017
    Assignee: Infineon Technologies Dresden GmbH
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Mirko Vogt, Maik Stegemann, Andre Röth, Bernhard Winkler, Boris Binder
  • Patent number: 9663355
    Abstract: Embodiments relate to structures, systems and methods for more efficiently and effectively etching sacrificial and other layers in substrates and other structures. In embodiments, a substrate in which a sacrificial layer is to be removed to, e.g., form a cavity comprises an etch dispersion system comprising a trench, channel or other structure in which etch gas or another suitable gas, fluid or substance can flow to penetrate the substrate and remove the sacrificial layer. The trench, channel or other structure can be implemented along with openings or other apertures formed in the substrate, such as proximate one or more edges of the substrate, to even more quickly disperse etch gas or some other substance within the substrate.
    Type: Grant
    Filed: August 25, 2015
    Date of Patent: May 30, 2017
    Assignee: Infineon Technologies Dresden GmbH
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Mirko Vogt, Maik Stegemann
  • Patent number: 9641153
    Abstract: A method of forming a resonator by providing a first layer; forming a sacrificial layer on the first layer; forming a capping layer on the sacrificial layer; forming at least one etching aperture in the capping layer; forming at least one additional aperture having a different size than the at least one etching aperture; forming a cavity and releasing a resonator structure within the cavity by removing the sacrificial layer by etching via the at least one etching aperture; sealing the at least one etching aperture; and forming a lining in the at least one additional aperture.
    Type: Grant
    Filed: November 4, 2015
    Date of Patent: May 2, 2017
    Assignee: Infineon Technologies Dresden GmbH
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Mirko Vogt, Maik Stegemann, Thomas Santa, Markus Burian
  • Publication number: 20170089790
    Abstract: Embodiments relate to sensors and more particularly to structures for and methods of forming sensors that are easier to manufacture as integrated components and provide improved deflection of a sensor membrane, lamella or other movable element. In embodiments, a sensor comprises a support structure for a lamella, membrane or other movable element. The support structure comprises a plurality of support elements that hold or carry the movable element. The support elements can comprise individual points or feet-like elements, rather than a conventional interconnected frame, that enable improved motion of the movable element, easier removal of a sacrificial layer between the movable element and substrate during manufacture and a more favorable deflection ratio, among other benefits.
    Type: Application
    Filed: December 8, 2016
    Publication date: March 30, 2017
    Inventors: Thoralf Kautzsch, Heiko Froehlich, Mirko Vogt, Maik Stegemann, Andre Roeth, Bernhard Winkler, Boris Binder