Abstract: For synthesizing a polymer, a substrate is placed within a reaction chamber, and a polymer synthesis sample is fed into the reaction chamber for forming the polymer on the substrate. In addition, the reaction chamber is shaken during formation of the polymer on the substrate within the reaction chamber for increased reaction yield. In addition, forming bubbles of the inactive gas in the polymer synthesis sample during formation of the polymer on the substrate further increases reaction yield.

Abstract: Biochips for analyzing components of a biological sample using probes and methods of fabricating the same are provided. In some embodiments, a biochip includes a substrate, a plurality of probes immobilized on a top surface of the substrate, and a capping layer formed on a bottom surface of the substrate.

Abstract: A biochip and method of fabricating the same are provided. The biochip can include a substrate, a capping layer pattern partially covering a top surface of the substrate, and a plurality of probes coupled to the top surface of the substrate exposed by the capping layer pattern.

Abstract: A biochip and method of fabricating the same are provided. The biochip can include a substrate, a plurality of active pads formed on the substrate, each of the plurality of active pads having a surface roughness and being patterned so as to produce photonic crystals, and a plurality of probes directly or indirectly coupled with at least some of the plurality of active pads.

Abstract: An apparatus for synthesizing a biopolymer includes a reaction chamber, an outlet tube connected to the reaction chamber, a plurality of recovery tanks connected to the outlet tube, and a plurality of recovery valves configured to open or block the passageway between the outlet tube and each of the recovery tanks.

Abstract: Example embodiments relate to a biosensor using a nanoscale material as a channel of a transistor and a method of fabricating the same. A biosensor according to example embodiments may include a plurality of insulating films. A first signal line and a second signal line may be interposed between the plurality of insulating films. A semiconductor nanostructure may be disposed on the plurality of insulating films, the semiconductor nanostructure having a first side electrically connected to the first signal line and a second side electrically connected to the second signal line. A plurality of probes may be coupled to the semiconductor nanostructure. A biosensor according to example embodiments may have a reduced analysis time.

Abstract: Provided are a barrier coating composition and a method of forming photoresist pattern by an immersion photolithography process using the same. The barrier coating composition includes a polymer corresponding to formula I having a weight average molecular weight (Mw) of 5,000 to 100,000 daltons and an organic solvent, wherein the expressions 1+m+n=1; 0.1?1/(1+m+n)?0.7; 0.3?m/(1+m+n)?0.9; and 0.0?n/(1+m+n)?0.6 are satisfied; Rf is a C1 to C5 fluorine-substituted hydrocarbon group; and Z, if present, includes at least one hydrophilic group. Compositions according to the invention may be used to form barrier layers on photoresist layers to suppress dissolution of photoresist components during immersion photolithography while allowing the barrier layer to be removed by alkaline developing solutions.

Abstract: A coating composition for forming etch mask patterns may include a polymer and an organic solvent. The polymer may have an aromatic ring substituted by a vinyl ether functional group. The polymer may be, for example, a Novolak resin partially substituted by a vinyl ether functional group or poly(hydroxystyrene) partially substituted by a vinyl ether functional group.

Abstract: An integrated circuit semiconductor device including a cell region formed in a first portion of a silicon substrate, the cell region including a first trench formed in the silicon substrate, a first buried insulating layer filled in the first trench, a first insulating pattern formed over the silicon substrate, and a first conductive pattern formed over the first insulating pattern. An overlay key region is formed in a second portion of the silicon substrate and includes a second trench formed in the silicon substrate, a second insulating pattern formed over the silicon substrate and used as an overlay key, and a second conductive pattern formed over the second insulating pattern and formed by correcting overlay and alignment errors using the second insulating pattern.

Abstract: An oligomer probe array includes a substrate, an immobilization layer on the substrate, nanoparticles coupled to the immobilization layer and forming a photonic crystal structure, and oligomer probes coupled to the nanoparticles. The immobilization layer includes probe cell regions coupled to nanoparticles. Adjacent probe cell regions are separated by a probe cell separation region.

Abstract: A photolabile compound, an oligomer probe array, and a substrate for oligomer probe array comprising the same, and a manufacturing method of the same are disclosed.

Abstract: Top coating compositions capable of being used in immersion lithography, and methods of forming photoresist patterns using the same, are provided. The top coating composition includes: a polymer, a base; and a solvent, wherein the polymer may be represented by Formula I: wherein R1 and R2 are independently selected from the group consisting of hydrogen, fluoro, methyl, and trifluoromethyl; X is a carboxylic acid group or a sulfonic acid group; Y is a carboxylic acid group or a sulfonic acid group, wherein the carboxylic acid group or sulfonic acid group is protected; Z is a monomer selected from the group consisting of a vinyl monomer, an alkyleneglycol, a maleic anhydride, an ethyleneimine, an oxazoline-containing monomer, acrylonitrile, an allylamide, a 3,4-dihydropyran, a 2,3-dihydrofuran, tetrafluoroethylene, or a combination thereof; and m, n, and q are integers wherein 0.03?m/(m+n+q)?0.97, 0.03?n/(m+n+q)?0.97, 0?q/(m+n+q)?0.5; and wherein the solvent includes deionized water.

Abstract: An integrated circuit semiconductor device including a cell region formed in a first portion of a silicon substrate, the cell region including a first trench formed in the silicon substrate, a first buried insulating layer filled in the first trench, a first insulating pattern formed over the silicon substrate, and a first conductive pattern formed over the first insulating pattern. An overlay key region is formed in a second portion of the silicon substrate and includes a second trench formed in the silicon substrate, a second insulating pattern formed over the silicon substrate and used as an overlay key, and a second conductive pattern formed over the second insulating pattern and formed by correcting overlay and alignment errors using the second insulating pattern.

Abstract: A coating composition for forming etch mask patterns may include a polymer and an organic solvent. The polymer may have an aromatic ring substituted by a vinyl ether functional group. The polymer may be, for example, a Novolak resin partially substituted by a vinyl ether functional group or poly(hydroxystyrene) partially substituted by a vinyl ether functional group.

Abstract: A probe array includes a substrate having at least two projecting features adjacent to one another, each feature including a top surface and a side surface, an isolation region separating the at least two features, at least two active regions, the at least two active regions including the top surfaces of the at least two features, and an inactive region separating the at least two active regions, the inactive region including the isolation region.

Abstract: Provided is a substrate for an oligomer probe array to which a photolabile material having an acetylene derivative is directly attached or attached via a linker.

Abstract: According to some embodiments of the invention, provided herein is a microarray comprising a substrate; a plurality of probe cells formed in the substrate, wherein at least one probe cell includes a linker; and a probe cell separation area. In addition, in some embodiments, the microarray may include a molecular probe coupled to the linker. Related methods are also described herein.

Abstract: An oligomer probe array having improved reaction yield is provided. The oligomer probe array includes a substrate, an immobilization layer on the substrate, a plurality of nano particles coupled with a surface of the immobilization layer, and a plurality of oligomer probes coupled with surfaces of the nano particles.

Abstract: According to some embodiments of the invention, a substrate doped with a P type impurity is provided. An N type impurity is doped into the substrate to divide the substrate into a P type impurity region and an N type impurity region. Active patterns having a first pitch are formed in the P type and N type impurity regions. Gate patterns having a second pitch are formed on the active patterns in a direction substantially perpendicular to the active patterns. Other embodiments are described and claimed.

Abstract: A polymer, a top coating layer, a top coating composition and an immersion lithography process using the same are disclosed. The top coating layer polymer may include a deuterated carboxyl group having a desired acidity such that the top coating layer polymer may be insoluble with water and a photoresist, and soluble in a developer. The polymer may be included in a top coating layer and a top coating composition.