Patents by Inventor Manabu Takakuwa

Manabu Takakuwa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140340660
    Abstract: According to one embodiment, a pattern formation method includes preparing a mold including a first pattern, preparing a substrate including a second pattern, coating a photosensitive resin onto the substrate, bringing the mold into contact with the photosensitive resin, determining whether or not the photosensitive resin is filled between the first pattern and the second pattern, performing an alignment of the first pattern and the second pattern according to a first reference in the case where the photosensitive resin is filled between the first pattern and the second pattern, and performing the alignment of the first pattern and the second pattern according to a second reference different from the first reference in the case where the photosensitive resin is not filled between the first pattern and the second pattern, curing the photosensitive resin, and releasing the mold from the photosensitive resin.
    Type: Application
    Filed: August 21, 2013
    Publication date: November 20, 2014
    Inventors: Masato SUZUKI, Manabu Takakuwa, Kentaro Kasa
  • Publication number: 20140242799
    Abstract: According to one embodiment, a pattern formation method includes forming a first mask layer including a first and a second concave pattern on a first surface of a substrate. The method can include providing a protection film in the first concave pattern. The method can include providing a self-assembling material in the second concave pattern. The method can include forming a first and a second phase in the second concave pattern by phase-separating the self-assembling material. The method can include removing the protection film together with the first phase to form a second mask layer having the first concave pattern and a third concave pattern. The third concave pattern is provided in the second concave pattern, and has an opening width narrower than an opening width of the second concave pattern. The method can include processing the substrate using the second mask layer as a mask.
    Type: Application
    Filed: August 27, 2013
    Publication date: August 28, 2014
    Inventors: Manabu TAKAKUWA, Masaki Hirano
  • Patent number: 8765034
    Abstract: According to one embodiment, a pattern formation method includes placing a master on a substrate including a concave-convex pattern, performing alignment between the master and the substrate, curing a photosensitive resin applied onto the substrate, with the pattern brought into contact with the resin, and removing the master from the resin. The performing alignment includes measuring amount of misalignment of first marks provided at least three of four corners of the shot region and performing alignment of the corners, after the alignment of the corners, measuring misalignment of a second mark, calculating a target value of amount of movement of the corners so as to minimize the amount of misalignment of the first marks and amount of misalignment of the second mark, and performing alignment between the master and the substrate so that the amount of movement of the corners is made close to the value.
    Type: Grant
    Filed: February 14, 2013
    Date of Patent: July 1, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Manabu Takakuwa
  • Publication number: 20140094015
    Abstract: According to one embodiment, an alignment measurement system is configured to measure a position of a mark having the highest identifiability of a plurality of marks formed in a substrate. The plurality of marks are made of mutually different patterns. A device pattern is formed in the substrate using directed self-assembly after the plurality of marks is formed.
    Type: Application
    Filed: February 20, 2013
    Publication date: April 3, 2014
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Kentaro KASA, Manabu TAKAKUWA, Masato SUZUKI, Shizuo KINOSHITA
  • Publication number: 20140071413
    Abstract: According to one embodiment, a pattern formation method includes placing a master on a substrate including a concave-convex pattern, performing alignment between the master and the substrate, curing a photosensitive resin applied onto the substrate, with the pattern brought into contact with the resin, and removing the master from the resin. The performing alignment includes measuring amount of misalignment of first marks provided at least three of four corners of the shot region and performing alignment of the corners, after the alignment of the corners, measuring misalignment of a second mark, calculating a target value of amount of movement of the corners so as to minimize the amount of misalignment of the first marks and amount of misalignment of the second mark, and performing alignment between the master and the substrate so that the amount of movement of the corners is made close to the value.
    Type: Application
    Filed: February 14, 2013
    Publication date: March 13, 2014
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventor: Manabu TAKAKUWA
  • Publication number: 20140065528
    Abstract: An exposure apparatus according to an embodiment controls the positioning between layers using an alignment correction value calculated on the basis of lower layer position information of a lower-layer-side pattern and upper layer position information of an upper-layer-side pattern. The lower layer position information includes alignment data, a focus map, and a correction value which is set on the basis of the previous substrate. The upper layer position information includes alignment data, a focus map, and a correction value which is a correction value for the positioning and is used when the upper-layer-side pattern is transferred.
    Type: Application
    Filed: February 27, 2013
    Publication date: March 6, 2014
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Kentaro KASA, Manabu Takakuwa, Yosuke Okamoto, Masamichi Kishimoto
  • Publication number: 20130222782
    Abstract: According to one embodiment, a substrate holding apparatus includes a main unit and a plurality of first support units. The main unit has a major surface. The main unit has a plate configuration. The first support units are disposed on the major surface. Each of the first support units includes a suction-holding unit capable of holding a substrate by suction. The suction-holding unit is movable along a first direction perpendicular to the major surface and a second direction parallel to the major surface.
    Type: Application
    Filed: August 30, 2012
    Publication date: August 29, 2013
    Inventors: Kentaro KASA, Manabu Takakuwa, Ryoichi Inanami, Kazuto Matsuki, Tetsuro Nakasugi, Hiroshi Koizumi, Minoru Inomoto
  • Publication number: 20130020741
    Abstract: According to one embodiment, an imprint method comprises coating a photo-curable organic material on a film to be processed, bringing a concave-convex pattern of a template into contact with the photo-curable organic material, applying a force to the template in such a state that the template is brought into contact with the photo-curable organic material, curing the photo-curable organic material by irradiating light onto the photo-curable organic material, in such a state that the template is brought into contact with the photo-curable organic material, and releasing the template from the photo-curable organic material after the light irradiation. The force applied to the template corresponds to a gap between a surface of the film to be processed and the template.
    Type: Application
    Filed: June 21, 2012
    Publication date: January 24, 2013
    Inventors: Masato SUZUKI, Takuya Kono, Manabu Takakuwa, Kazuya Fukuhara
  • Publication number: 20120068372
    Abstract: According to one embodiment, a nanoimprint template using a pattern transcription to a substrate by a nanoimprint technique, the template includes a transcription pattern and an alignment mark on a main surface of a main body, wherein the alignment mark comprises a polarizer.
    Type: Application
    Filed: September 15, 2011
    Publication date: March 22, 2012
    Inventors: Akiko Mimotogi, Ryoichi Inanami, Kentaro Kasa, Masato Suzuki, Manabu Takakuwa, Yohko Furutono, Yumi Nakajima
  • Patent number: 6842230
    Abstract: Lens distortion correction is characterized by obtaining a correction parameter by using the difference between the latest QC data used when exposing a overlaying layer and the latest QC data used when exposing a overlaid layer.
    Type: Grant
    Filed: November 27, 2002
    Date of Patent: January 11, 2005
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Manabu Takakuwa, Keita Asanuma, Tatsuhiko Higashiki
  • Patent number: 6741327
    Abstract: The method of correcting a residual aberration of a projection optical system, which is used for projecting a pattern of a photo mask onto a photosensitive film located on a substrate, the method includes calculating an effect of a residual aberration on a given pattern on the basis of the residual aberration of the projection optical system obtained by measurement, calculating a moving amount of an adjustable aberration in the projection optical system such that the effect of the residual aberration becomes minimum in a given area, and moving the adjustable aberration in accordance with the calculated moving amount.
    Type: Grant
    Filed: June 29, 2001
    Date of Patent: May 25, 2004
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Hiroshi Nomura, Kenji Konomi, Manabu Takakuwa
  • Publication number: 20030117599
    Abstract: Lens distortion correction is characterized by obtaining a correction parameter by using the difference between the latest QC data used when exposing a overlaying layer and the latest QC data used when exposing a overlaid layer.
    Type: Application
    Filed: November 27, 2002
    Publication date: June 26, 2003
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Manabu Takakuwa, Keita Asanuma, Tatsuhiko Higashiki
  • Publication number: 20020001071
    Abstract: The method of correcting a residual aberration of a projection optical system, which is used for projecting a pattern of a photo mask onto a photosensitive film located on a substrate, the method includes calculating an effect of a residual aberration on a given pattern on the basis of the residual aberration of the projection optical system obtained by measurement, calculating a moving amount of an adjustable aberration in the projection optical system such that the effect of the residual aberration becomes minimum in a given area, and moving the adjustable aberration in accordance with the calculated moving amount.
    Type: Application
    Filed: June 29, 2001
    Publication date: January 3, 2002
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Hiroshi Nomura, Kenji Konomi, Manabu Takakuwa